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    • 9. 发明授权
    • Ion-sensitive sensor with multilayer construction in the sensitive region
    • 离子敏感传感器在敏感区域具有多层结构
    • US08461587B2
    • 2013-06-11
    • US13260739
    • 2010-03-15
    • Eberhard KurthChristian KunathTorsten Pechstein
    • Eberhard KurthChristian KunathTorsten Pechstein
    • H01L29/66H01L21/02
    • G01N27/227
    • An ion-sensitive sensor with an EIS structure includes: a semiconductor substrate, on which a layer of a substrate oxide 103 is produced; an adapting or matching layer, which is prepared on the substrate oxide; a chemically stable intermediate insulator, which is deposited on the adapting or matching layer; and a sensor layer, which comprises a tantalum oxide or a tantalum oxynitride, and which is applied on the intermediate insulator; wherein the intermediate insulator comprises hafnium oxide or zirconium oxide or a mixture of zirconium oxide and hafnium oxide, and wherein the adapting or matching layer differs in its chemical composition and/or in its structure from the intermediate insulator and from the substrate oxide.
    • 具有EIS结构的离子敏感传感器包括:半导体衬底,其上制备衬底氧化物103的层; 在衬底氧化物上制备的适配或匹配层; 化学稳定的中间绝缘体,其沉积在适配层或匹配层上; 以及传感器层,其包括氧化钽或氮氧化钽,并且被施加在中间绝缘体上; 其中所述中间绝缘体包括氧化铪或氧化锆或氧化锆和氧化铪的混合物,并且其中所述适配或匹配层的化学组成和/或其结构与所述中间绝缘体和所述衬底氧化物不同。