会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Semiconductor device for electrostatic discharge protection
    • 用于静电放电保护的半导体器件
    • US07888704B2
    • 2011-02-15
    • US12222746
    • 2008-08-15
    • Chiu-Chih ChiangHan-Chung Tai
    • Chiu-Chih ChiangHan-Chung Tai
    • H01L29/74
    • H01L27/0262H01L29/7436
    • A semiconductor device for electrostatic discharge protection is disclosed, and at least comprises a high-voltage parasite silicon controlled rectifier (HVSCR) and a diode. The HVSCR has an anode and a cathode, and the cathode of HVSCR is coupled to a ground. The diode, coupled to the HVSCR in series, also has an anode and a cathode. The anode of the diode is coupled to the anode of the HVSCR, and the cathode of the diode is coupled to a terminal applied with a positive voltage. The diode has a second conductivity type zone that could be constructed to form several strips or small blocks spaced apart from each other. Those small blocks could be any shapes and arranged regularly or randomly.
    • 公开了一种用于静电放电保护的半导体器件,并且至少包括高压寄生器可控硅整流器(HVSCR)和二极管。 HVSCR具有阳极和阴极,HVSCR的阴极耦合到地面。 串联连接到HVSCR的二极管也具有阳极和阴极。 二极管的阳极耦合到HVSCR的阳极,二极管的阴极耦合到施加正电压的端子。 二极管具有第二导电类型区域,其可以构造成形成彼此间隔开的几个条或小块。 这些小块可以是任何形状,并定期或随机排列。
    • 3. 发明申请
    • Semiconductor device for electrostatic discharge protection
    • 用于静电放电保护的半导体器件
    • US20100038677A1
    • 2010-02-18
    • US12222746
    • 2008-08-15
    • Chiu-Chih ChiangHan-Chung Tai
    • Chiu-Chih ChiangHan-Chung Tai
    • H01L29/74
    • H01L27/0262H01L29/7436
    • A semiconductor device for electrostatic discharge protection is disclosed, and at least comprises a high-voltage parasite silicon controlled rectifier (HVSCR) and a diode. The HVSCR has an anode and a cathode, and the cathode of HVSCR is coupled to a ground. The diode, coupled to the HVSCR in series, also has an anode and a cathode. The anode of the diode is coupled to the anode of the HVSCR, and the cathode of the diode is coupled to a terminal applied with a positive voltage. The diode has a second conductivity type zone that could be constructed to form several strips or small blocks spaced apart from each other. Those small blocks could be any shapes and arranged regularly or randomly.
    • 公开了一种用于静电放电保护的半导体器件,并且至少包括高压寄生器可控硅整流器(HVSCR)和二极管。 HVSCR具有阳极和阴极,并且HVSCR的阴极耦合到地面。 串联连接到HVSCR的二极管也具有阳极和阴极。 二极管的阳极耦合到HVSCR的阳极,二极管的阴极耦合到施加正电压的端子。 二极管具有第二导电类型区域,其可以构造成形成彼此间隔开的几个条或小块。 这些小块可以是任何形状,并定期或随机排列。
    • 5. 发明授权
    • Semiconductor structure of a high side driver for two high voltage nodes with partially linked deep wells and method for manufacturing the same
    • 具有部分连接的深井的两个高压节点的高侧驱动器的半导体结构及其制造方法
    • US07589393B2
    • 2009-09-15
    • US11492039
    • 2006-07-25
    • Chiu-Chih ChiangChih-Feng Huang
    • Chiu-Chih ChiangChih-Feng Huang
    • H01L29/06
    • H01L29/10H01L29/063H01L29/7835
    • A semiconductor structure of a high side driver includes an ion-doped junction. The ion-doped junction includes a substrate, a first deep well and a second deep well, a first heavy ion-doped region and a second heavy ion-doped region. The first deep well and second deep well are formed in the substrate, which are separated but partially linked with each other, and the first deep well and the second deep well have the same ion-doped type. The first heavy ion-doped region is formed in the first deep well for connecting to a first high voltage, and the first heavy ion-doped region has the same ion-doped type as the first deep well. The second heavy ion-doped region is formed in the second deep well for connecting to a second high voltage, and the second heavy ion-doped region has the same ion-doped type as the first deep well.
    • 高侧驱动器的半导体结构包括离子掺杂结。 离子掺杂结包括衬底,第一深阱和第二深阱,第一重离子掺杂区和第二重离子掺杂区。 第一深阱和第二深阱形成在衬底中,其被分离但部分地彼此连接,并且第一深阱和第二深阱具有相同的离子掺杂型。 第一重离子掺杂区域形成在第一深阱中以连接到第一高电压,并且第一重离子掺杂区域具有与第一深阱相同的离子掺杂类型。 第二重离子掺杂区域形成在第二深阱中用于连接到第二高电压,并且第二重离子掺杂区域具有与第一深阱相同的离子掺杂类型。
    • 8. 发明申请
    • SELF-DRIVEN LDMOS TRANSISTOR
    • 自激式LDMOS晶体管
    • US20070290261A1
    • 2007-12-20
    • US11424532
    • 2006-06-15
    • Chiu-Chih ChiangChih-Feng Huang
    • Chiu-Chih ChiangChih-Feng Huang
    • H01L29/76
    • H01L29/7816H01L29/0634H01L29/0878H01L29/0886H01L29/42368H01L29/861
    • The present invention provides a self-driven LDMOS, which utilizes a parasitic resistor between a drain terminal and an auxiliary region. The parasitic resistor is formed between two depletion boundaries in a quasi-linked deep N-type well. When the two depletion boundaries pinch off, a gate-voltage potential at a gate terminal will be clipped at a drain-voltage potential at said drain terminal. Since the gate-voltage potential is designed to be equal to or higher than a start-threshold voltage, the LDMOS will be turned on accordingly. Besides, no additional die space and masking process are needed to manufacture the parasitic resistor. Furthermore, the parasitic resistor of the present invention doesn't lower the breakdown voltage and the operating speed of the LDMOS. In addition, when the two depletion boundaries pinch off, the gate-voltage potential doesn't vary in response to an increment of the drain-voltage potential.
    • 本发明提供一种自驱动LDMOS,其利用漏极端子和辅助区域之间的寄生电阻器。 寄生电阻形成在准连接深N型阱中的两个耗尽边界之间。 当两个耗尽边界夹闭时,栅极端子处的栅极电压电位将在所述漏极端子处的漏极电压电位处被钳位。 由于栅极电压电位被设计为等于或高于启动阈值电压,所以LDMOS将被相应地导通。 此外,不需要额外的管芯空间和掩模工艺来制造寄生电阻器。 此外,本发明的寄生电阻器不降低LDMOS的击穿电压和操作速度。 此外,当两个耗尽边界夹断时,栅极电压电位不随着漏极 - 电压电位的增加而变化。