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    • 3. 发明授权
    • Manufacturing methods of asymmetric bumps and pixel structure
    • 不对称凸块和像素结构的制造方法
    • US08007987B2
    • 2011-08-30
    • US12339076
    • 2008-12-19
    • Te-Yu ChenChin-Lung YehYu-Fang Wang
    • Te-Yu ChenChin-Lung YehYu-Fang Wang
    • G03F7/20
    • G03F1/50
    • A manufacturing method of asymmetric bumps is provided. First, a substrate is provided. A film layer is then formed on the substrate. Next, a complex photomask including at least one transparent region, a number of opaque regions, and a number of semi-transparent regions is provided. Each of the semi-transparent regions is disposed between two adjacent opaque regions, and at least one light-shielding pattern is randomly disposed in each of the semi-transparent regions. The film layer is then patterned with use of the complex photomask, and multiple asymmetric bumps are formed on the substrate. By using the complex photomask, manufacturing steps of the asymmetric bumps can be reduced. Besides, a manufacturing method of a pixel structure having the above-mentioned asymmetric bumps is also provided.
    • 提供了一种不对称凸块的制造方法。 首先,提供基板。 然后在基板上形成膜层。 接下来,提供包括至少一个透明区域,多个不透明区域和多个半透明区域的复合光掩模。 每个半透明区域设置在两个相邻的不透明区域之间,并且至少一个遮光图案被随机地布置在每个半透明区域中。 然后使用复合光掩模对膜层进行构图,并且在衬底上形成多个不对称凸起。 通过使用复合光掩模,可以减少不对称凸块的制造步骤。 此外,还提供了具有上述不对称凸块的像素结构的制造方法。
    • 8. 发明申请
    • MANUFACTURING METHODS OF ASYMMETRIC BUMPS AND PIXEL STRUCTURE
    • 不对称的波峰和像素结构的制造方法
    • US20100104956A1
    • 2010-04-29
    • US12339076
    • 2008-12-19
    • Te-Yu ChenChin-Lung YehYu-Fang Wang
    • Te-Yu ChenChin-Lung YehYu-Fang Wang
    • G03F1/00
    • G03F1/50
    • A manufacturing method of asymmetric bumps is provided. First, a substrate is provided. A film layer is then formed on the substrate. Next, a complex photomask including at least one transparent region, a number of opaque regions, and a number of semi-transparent regions is provided. Each of the semi-transparent regions is disposed between two adjacent opaque regions, and at least one light-shielding pattern is randomly disposed in each of the semi-transparent regions. The film layer is then patterned with use of the complex photomask, and multiple asymmetric bumps are formed on the substrate. By using the complex photomask, manufacturing steps of the asymmetric bumps can be reduced. Besides, a manufacturing method of a pixel structure having the above-mentioned asymmetric bumps is also provided.
    • 提供了一种不对称凸块的制造方法。 首先,提供基板。 然后在基板上形成膜层。 接下来,提供包括至少一个透明区域,多个不透明区域和多个半透明区域的复合光掩模。 每个半透明区域设置在两个相邻的不透明区域之间,并且至少一个遮光图案被随机地布置在每个半透明区域中。 然后使用复合光掩模对膜层进行构图,并且在衬底上形成多个不对称凸起。 通过使用复合光掩模,可以减少不对称凸块的制造步骤。 此外,还提供了具有上述不对称凸块的像素结构的制造方法。