专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US6092295A Method and apparatus for measuring the thickness of rubber over a metal reinforced layer 有权
标题翻译：用于测量金属增强层上橡胶厚度的方法和装置
公开(公告)号：US6092295A
公开(公告)日：2000-07-25
申请号：US202703
申请日：1998-12-14
申请人： Gary Charles Parrish
发明人： Gary Charles Parrish
IPC分类号： B29D30/54 , G01B5/00 , G01B5/06 , G01B5/20 , B61K9/12 , G01B3/14 , G01B5/24
CPC分类号： G01B7/105 , B29D30/54 , G01B5/0002 , G01B7/107 , B29C2037/90 , B29D2030/546
摘要： An undertread measuring apparatus which includes a lift cylinder for rasing and lowering a sensor support assembly. The support assembly is attached to a support rod by two collars so that the assembly can rotate away upon impact and will automatically realign itself. The assembly is lowered by the lift cylinder at an angle from the vertical so that first one sensor comes into contact with the tire and then the other. The support assembly has two rollers offset from each other so that the sensor head will locate itself at the correct distance from the tire.
摘要翻译： PCT No.PCT / US96 / 14245 Sec。 371 1998年12月14日第 102（e）1998年12月14日PCT PCT 1996年9月5日PCT公布。公开号WO98 / 10240 日期1998年3月12日一种测量装置，包括用于升降和降低传感器支撑组件的提升缸。支撑组件通过两个套环附接到支撑杆，使得组件可以在冲击时旋转并且将自动重新对准自身。组件通过提升缸与垂直方向成一定角度降低，使得第一传感器与轮胎接触，然后与另一传感器接触。支撑组件具有彼此偏移的两个辊，使得传感器头将自身定位在与轮胎正确的距离处。

2. 发明申请

US20060204859A1 AN EXTRA DOSE TRIM MASK, METHOD OF MANUFACTURE, AND LITHOGRAPHIC PROCESS USING THE SAME 审中-公开
标题翻译：一种额外的剂量仿真面膜，制造方法和使用其的平版印刷方法
公开(公告)号：US20060204859A1
公开(公告)日：2006-09-14
申请号：US10906846
申请日：2005-03-09
申请人： Robert Leidy , Charles Parrish , Jed Rankin , David Shanks , Charles Whiting
发明人： Robert Leidy , Charles Parrish , Jed Rankin , David Shanks , Charles Whiting
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F7/70466 , G03F1/70
摘要： A mask structure and photolithographic method using the same for obtaining shorter and thinner line or feature lengths for optimizing power consumption and performance in semiconductor devices. According to a first aspect, a method for enabling trimming of semiconductor linewidth dimensions implements an extra dose trim mask. The lithographic method using the extra dose trim mask to make small adjustments to patterned linewidth exposures for enhanced CD control may be used to trim or adjust whole or a plurality of regions of a lithographic exposure. There is additionally provided a structure and method of creating a lithographic dual exposure mask having one or more regions comprising one or more partial energy absorptive layers such that, when subject to a blanket dose, enable smaller image size adjustments in those regions. The method using a dual exposure trim mask having multiple attenuator regions facilitates product/process tuning as multiple trim doses may be delivered to different regions of an exposure field resulting in different image size adjustments.
摘要翻译：一种掩模结构和光刻方法，用于获得更短和更薄的线或特征长度，以优化半导体器件的功耗和性能。根据第一方面，一种能够修剪半导体线宽尺寸的方法实现了额外的剂量修剪掩模。可以使用使用额外剂量调整掩模对图案化线宽曝光进行小调整以增强CD控制的光刻方法来修整或调整光刻曝光的整个或多个区域。还提供了一种创建具有包括一个或多个部分能量吸收层的一个或多个区域的光刻双曝光掩模的结构和方法，使得当经受覆盖剂量时，能够实现在那些区域中更小的图像尺寸调整。使用具有多个衰减器区域的双曝光修剪掩模的方法有助于产品/过程调谐，因为多个修整剂量可以被传递到曝光场的不同区域，导致不同的图像尺寸调整。

3. 发明授权

US06521071B2 Tread application apparatus with automated tread centering feature 失效
公开(公告)号：US06521071B2
公开(公告)日：2003-02-18
申请号：US09897296
申请日：2001-06-29
申请人： Gary Charles Parrish , Ralph Michael Parise , Gary Bernard Schumacher , Randy Ray Beller
发明人： Gary Charles Parrish , Ralph Michael Parise , Gary Bernard Schumacher , Randy Ray Beller
IPC分类号： B29D3054
CPC分类号： B29D30/56 , B29D2030/523 , B29D2030/585
摘要： An improved method for applying an annular tread (10) to a pneumatic tire casing (20) which has the steps of mounting the tread (10) on a tread expander assembly (200) wherein the tread (10) pass over a mount wheel (300) prior to the casing (20) being mounted onto the mount wheel. The improved apparatus (100) has all the mechanisms for supporting the casing (20) and the tread (10) extended from one end (405) allowing the operator to work entirely in front of the apparatus.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式