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1. 发明授权

US08569157B2 Stepped masking for patterned implantation 有权
标题翻译：步进屏蔽图案植入
公开(公告)号：US08569157B2
公开(公告)日：2013-10-29
申请号：US13442571
申请日：2012-04-09
申请人： Benjamin B. Riordon , Nicholas P. T. Bateman , Charles T. Carlson
发明人： Benjamin B. Riordon , Nicholas P. T. Bateman , Charles T. Carlson
IPC分类号： H01L21/425
CPC分类号： H01L21/266 , H01J37/3172 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of moving a mask to perform a pattern implant of a substrate is disclosed. The mask has a plurality of apertures, and is placed between the ion source and the substrate. After the substrate is exposed to the ion beam, the mask is indexed to a new position relative to the substrate and a subsequent implant step is performed. Through the selection of the aperture size and shape, the index distance and the number of implant steps, a variety of implant patterns may be created. In some embodiments, the implant pattern includes heavily doped horizontal stripes with lighter doped regions between the stripes. In some embodiments, the implant pattern includes a grid of heavily doped regions. In other embodiments, the implant pattern is suitable for use with a bus-bar structure.
摘要翻译：公开了一种移动掩模以执行衬底的图案植入的改进方法。掩模具有多个孔，并且被放置在离子源和基底之间。在将衬底暴露于离子束之后，掩模被引导到相对于衬底的新位置，并且执行随后的注入步骤。通过选择孔径尺寸和形状，指数距离和植入步骤的数量，可以产生各种种植体图案。在一些实施例中，注入图案包括在条纹之间具有较轻掺杂区域的重掺杂水平条纹。在一些实施例中，植入模式包括重掺杂区域格栅。在其它实施例中，植入图案适用于汇流条结构。

2. 发明授权

US08173527B2 Stepped masking for patterned implantation 失效
标题翻译：步进屏蔽图案植入
公开(公告)号：US08173527B2
公开(公告)日：2012-05-08
申请号：US12906369
申请日：2010-10-18
申请人： Benjamin B. Riordon , Nicholas P. T. Bateman , Charles T. Carlson
发明人： Benjamin B. Riordon , Nicholas P. T. Bateman , Charles T. Carlson
IPC分类号： H01L21/425
CPC分类号： H01L21/266 , H01J37/3172 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of moving a mask to perform a pattern implant of a substrate is disclosed. The mask has a plurality of apertures, and is placed between the ion source and the substrate. After the substrate is exposed to the ion beam, the mask is indexed to a new position relative to the substrate and a subsequent implant step is performed. Through the selection of the aperture size and shape, the index distance and the number of implant steps, a variety of implant patterns may be created. In some embodiments, the implant pattern includes heavily doped horizontal stripes with lighter doped regions between the stripes. In some embodiments, the implant pattern includes a grid of heavily doped regions. In other embodiments, the implant pattern is suitable for use with a bus-bar structure.
摘要翻译：公开了一种移动掩模以执行衬底的图案植入的改进方法。掩模具有多个孔，并且被放置在离子源和基底之间。在将衬底暴露于离子束之后，掩模被引导到相对于衬底的新位置，并且执行随后的注入步骤。通过选择孔径尺寸和形状，指数距离和植入步骤的数量，可以产生各种种植体图案。在一些实施例中，注入图案包括在条纹之间具有较轻掺杂区域的重掺杂水平条纹。在一些实施例中，植入模式包括重掺杂区域格栅。在其它实施例中，植入图案适用于汇流条结构。

3. 发明申请

US20120017938A1 PLATEN CLEANING 审中-公开
标题翻译：板清洁
公开(公告)号：US20120017938A1
公开(公告)日：2012-01-26
申请号：US13187078
申请日：2011-07-20
申请人： William T. Weaver , Kevin M. Daniels , Dale K. Stone , Russell J. Low , Benjamin B. Riordon , Jeffrey Blahnik
发明人： William T. Weaver , Kevin M. Daniels , Dale K. Stone , Russell J. Low , Benjamin B. Riordon , Jeffrey Blahnik
IPC分类号： B08B1/00
CPC分类号： H01L21/67028 , B08B1/008 , H01J2237/31711 , H01L21/67046
摘要： To achieve cost efficiency, solar cells must be processed at a high throughput. Breakages, which may leave debris on the clamping surface of the platen, adversely affect this throughput. A plurality of embodiments are disclosed which may be used to remove debris from the clamping surface without breaking the vacuum condition within the processing station. In some embodiments, a brush is used to sweep the debris from the surface of the platen. In other embodiments, an adhesive material is used to collect the debris. In some embodiments, the automation equipment used to handle masks may also be used to handle the platen cleaning mechanisms. In still other embodiments, stream of gas or ion beams are used to clean debris from the clamping surface of the platen.
摘要翻译：为了实现成本效益，必须以高产量处理太阳能电池。碎片可能会使碎片在压板的夹紧表面上产生不利影响。公开了多个实施例，其可以用于从夹紧表面去除碎屑而不破坏处理站内的真空状况。在一些实施例中，刷子用于从压板的表面扫掠碎屑。在其他实施例中，使用粘合剂材料来收集碎屑。在一些实施例中，用于处理掩模的自动化设备也可用于处理压板清洁机构。在其它实施例中，气流或离子束用于从压板的夹紧表面清洁碎屑。

4. 发明申请

US20110027463A1 WORKPIECE HANDLING SYSTEM 审中-公开
标题翻译：工作处理系统
公开(公告)号：US20110027463A1
公开(公告)日：2011-02-03
申请号：US12814748
申请日：2010-06-14
申请人： Benjamin B. Riordon , Kevin M. Daniels , William T. Weaver , Charles T. Carlson
发明人： Benjamin B. Riordon , Kevin M. Daniels , William T. Weaver , Charles T. Carlson
IPC分类号： B05D5/00 , B05C13/00 , B05D1/32
CPC分类号： H01L21/67213 , C23C14/48 , H01J37/20 , H01J37/3171 , H01J2237/2001 , H01J2237/2007 , H01J2237/20292 , H01J2237/204 , H01J2237/31711 , H01L21/266 , H01L21/67769 , H01L31/022425 , H01L31/022441 , H01L31/068 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A workpiece handling system includes a process chamber configured to support a workpiece for ion implantation, a first mask stored outside the process chamber in a mask station, and a robot system configured to retrieve the first mask from the mask station, and position the first mask upstream of the workpiece so the workpiece receives a first selective implant through the first mask. A method includes storing a first mask outside a process chamber in a mask station, retrieving the first mask from the mask station, positioning the first mask upstream of a workpiece positioned in the process chamber for ion implantation, and performing a first selective implant through the first mask.
摘要翻译：工件处理系统包括被配置为支撑用于离子注入的工件的处理室，存储在掩模工位中的处理室外部的第一掩模以及被配置为从掩模工位取回第一掩模的机器人系统，并且将第一掩模在工件的上游，使得工件通过第一掩模接收第一选择性植入物。一种方法包括将处理室外的第一掩模存储在掩模站中，从掩模站取回第一掩模，将第一掩模定位在位于处理室中的用于离子注入的工件的上游，以及通过第第一个面具

5. 发明授权

US08164068B2 Mask health monitor using a faraday probe 失效
标题翻译：面罩健康监护仪使用法拉第探头
公开(公告)号：US08164068B2
公开(公告)日：2012-04-24
申请号：US12845665
申请日：2010-07-28
申请人： Benjamin B. Riordon , Nicholas P. T. Bateman , William T. Weaver , Russell J. Low
发明人： Benjamin B. Riordon , Nicholas P. T. Bateman , William T. Weaver , Russell J. Low
IPC分类号： H01J37/317 , H01J37/244 , H01J3/07
CPC分类号： H01J37/3171 , H01J2237/24507 , H01J2237/24528 , H01J2237/31711 , H01L21/26513 , H01L21/2658 , H01L21/266 , H01L31/0288 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： In an ion implanter, an ion current measurement device is disposed behind a mask co-planarly with respect to a surface of a target substrate as if said target substrate was positioned on a platen. The ion current measurement device is translated across the ion beam. The current of the ion beam directed through a plurality of apertures of the mask is measured using the ion current measurement device. In this manner, the position of the mask with respect to the ion beam as well as the condition of the mask may be determined based on the ion current profile measured by the ion current measurement device.
摘要翻译：在离子注入机中，离子电流测量装置相对于目标基板的表面共面设置在掩模的后面，如同所述目标基板位于压板上一样。离子电流测量装置通过离子束平移。使用离子电流测量装置测量引导通过掩模的多个孔的离子束的电流。以这种方式，掩模相对于离子束的位置以及掩模的条件可以基于由离子电流测量装置测量的离子电流分布来确定。

6. 发明申请

US20110039367A1 MASKED ION IMPLANT WITH FAST-SLOW SCAN 有权
标题翻译：带快速慢扫描的离子植入物
公开(公告)号：US20110039367A1
公开(公告)日：2011-02-17
申请号：US12853698
申请日：2010-08-10
申请人： Nicholas P.T. Bateman , Steven M. Anella , Benjamin B. Riordon , Atul Gupta
发明人： Nicholas P.T. Bateman , Steven M. Anella , Benjamin B. Riordon , Atul Gupta
IPC分类号： H01L21/22 , C23C16/00
CPC分类号： H01J37/3171 , H01J37/20 , H01J2237/20228 , H01J2237/31711 , H01L21/266 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of producing solar cells utilizes a mask which is fixed relative to an ion beam in an ion implanter. The ion beam is directed through a plurality of apertures in the mask toward a substrate. The substrate is moved at different speeds such that the substrate is exposed to an ion dose rate when the substrate is moved at a first scan rate and to a second ion dose rate when the substrate is moved at a second scan rate. By modifying the scan rate, various dose rates may be implanted on the substrate at corresponding substrate locations. This allows ion implantation to be used to provide precise doping profiles advantageous for manufacturing solar cells.
摘要翻译：制造太阳能电池的改进方法利用在离子注入机中相对于离子束固定的掩模。离子束被引导通过掩模中的多个孔朝向衬底。衬底以不同的速度移动，使得当衬底以第一扫描速率移动时衬底暴露于离子剂量率，而当衬底以第二扫描速率移动时，衬底暴露于离子剂量率。通过修改扫描速率，可以在相应的衬底位置的衬底上植入各种剂量率。这允许离子注入用于提供有利于制造太阳能电池的精确掺杂分布。

7. 发明授权

US06995381B2 System and method for multi-wafer scanning in ion implanters 有权
标题翻译：离子注入机中多晶圆扫描的系统和方法
公开(公告)号：US06995381B2
公开(公告)日：2006-02-07
申请号：US10730863
申请日：2003-12-08
申请人： Alan P. Sheng , Benjamin B. Riordon , Lawrence M. Ficarra
发明人： Alan P. Sheng , Benjamin B. Riordon , Lawrence M. Ficarra
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/1474
摘要： Methods and systems are provided for increasing the efficiency of the ion beam during scanning workpieces in ion implanting such that multiple wafers are arranged on a platen or support so that a greater portion of the beam scans the workpiece surface. Specifically, an apparatus is provided for ion implanting a plurality of workpieces. The apparatus includes an ion source for generating an ion beam having a scan width and a scan distance which defines a predetermined scan area, a holder for receiving the workpieces that are arranged so as to maximize the surface area of the workpieces present within the predetermined scan area. Thereby, a scanner may scan the ion beam over the predetermined scan area so that the utilization efficiency of said ion beam on the workpieces is increased. More particularly, the workpieces may be semiconductor wafers that are arranged over the holder or a platen according to the formula: ds=√{square root over (Dw2−(ws−Dw))}2*(Qw−1)+Dw+OS As a result of arranging the workpieces on the holder in this manner, the utilization of ion beam is maximized.
摘要翻译：提供了用于在离子注入期间扫描工件期间提高离子束效率的方法和系统，使得多个晶片布置在压板或支撑件上，使得光束的较大部分扫描工件表面。具体地，提供了用于离子注入多个工件的装置。该装置包括用于产生具有限定预定扫描区域的扫描宽度和扫描距离的离子束的离子源，用于接收工件的保持器，其被布置成使存在于预定扫描内的工件的表面积最大化区。因此，扫描仪可以在预定扫描区域上扫描离子束，使得离子束在工件上的利用效率增加。更具体地，工件可以是根据形式布置在保持器或压板上的半导体晶片

8. 发明授权

US08895325B2 System and method for aligning substrates for multiple implants 有权
标题翻译：用于对准多个植入物的基底的系统和方法
公开(公告)号：US08895325B2
公开(公告)日：2014-11-25
申请号：US13458441
申请日：2012-04-27
申请人： John W. Graff , Benjamin B. Riordon , Nicholas P. T. Bateman
发明人： John W. Graff , Benjamin B. Riordon , Nicholas P. T. Bateman
IPC分类号： H01L21/00 , B05C11/00
CPC分类号： H01J37/3171 , H01J37/3045 , H01J2237/31711 , H01L21/266
摘要： A system and method are disclosed for aligning substrates during successive process steps, such as ion implantation steps, is disclosed. Implanted regions are created on a substrate. After implantation, an image is obtained of the implanted regions, and a fiducial is provided on the substrate in known relation to at least one of the implanted regions. A thermal anneal process is performed on the substrate such that the implanted regions are no longer visible but the fiducial remains visible. The position of the fiducial may be used in downstream process steps to properly align pattern masks over the implanted regions. The fiducial also may be applied to the substrate before any ion implanting of the substrate is performed. The position of the fiducial with respect to an edge or a corner of the substrate may be used for aligning during downstream process steps. Other embodiments are described and claimed.
摘要翻译：公开了用于在连续工艺步骤期间对准衬底的系统和方法，例如离子注入步骤。在衬底上形成植入区域。在植入之后，获得植入区域的图像，并且已知关系到至少一个植入区域的基底上提供了基准。在基板上进行热退火处理，使得注入区域不再可见，但基准仍然可见。基准的位置可以用于下游处理步骤，以便在注入区域上正确对准图案掩模。在进行基板的任何离子注入之前，基准也可以应用于基板。基准面相对于衬底的边缘或拐角的位置可用于在下游工艺步骤期间对准。描述和要求保护其他实施例。

9. 发明授权

US08461553B2 Masked ion implant with fast-slow scan 失效
标题翻译：具有快速扫描的掩蔽离子植入物
公开(公告)号：US08461553B2
公开(公告)日：2013-06-11
申请号：US13188837
申请日：2011-07-22
申请人： Nicholas P. T. Bateman , Steven M. Anella , Benjamin B. Riordon , Atul Gupta
发明人： Nicholas P. T. Bateman , Steven M. Anella , Benjamin B. Riordon , Atul Gupta
IPC分类号： H01J37/317 , H01J37/244 , H01J3/07 , G21K5/10
CPC分类号： H01J37/3171 , H01J37/20 , H01J2237/20228 , H01J2237/31711 , H01L21/266 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of producing solar cells utilizes a mask which is fixed relative to an ion beam in an ion implanter. The ion beam is directed through a plurality of apertures in the mask toward a substrate. The substrate is moved at different speeds such that the substrate is exposed to an ion dose rate when the substrate is moved at a first scan rate and to a second ion dose rate when the substrate is moved at a second scan rate. By modifying the scan rate, various dose rates may be implanted on the substrate at corresponding substrate locations. This allows ion implantation to be used to provide precise doping profiles advantageous for manufacturing solar cells.
摘要翻译：制造太阳能电池的改进方法利用在离子注入机中相对于离子束固定的掩模。离子束被引导通过掩模中的多个孔朝向衬底。衬底以不同的速度移动，使得当衬底以第一扫描速率移动时衬底暴露于离子剂量率，而当衬底以第二扫描速率移动时，衬底暴露于离子剂量率。通过修改扫描速率，可以在相应的衬底位置的衬底上植入各种剂量率。这允许离子注入用于提供有利于制造太阳能电池的精确掺杂分布。

10. 发明授权

US08372737B1 Use of a shadow mask and a soft mask for aligned implants in solar cells 失效
标题翻译：在太阳能电池中使用荫罩和软面罩对准植入物
公开(公告)号：US08372737B1
公开(公告)日：2013-02-12
申请号：US13170792
申请日：2011-06-28
申请人： Nicholas P. T. Bateman , Benjamin B. Riordon , Atul Gupta
发明人： Nicholas P. T. Bateman , Benjamin B. Riordon , Atul Gupta
IPC分类号： H01L21/425
CPC分类号： H01L21/266 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of implanting a solar cell is disclosed. A substrate is coated with a soft mask material. A shadow mask is used to perform a pattern ion implant and to set the soft mask material. After the soft mask material is set, the mask is removed and a blanket implant is performed.
摘要翻译：公开了一种改进的植入太阳能电池的方法。用软掩模材料涂覆基材。阴影掩模用于执行图案离子注入并设置软掩模材料。在软掩模材料被设置之后，去除掩模并执行覆盖植入。

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