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    • 1. 发明授权
    • Method and embossing structure for maximizing pressure buildup at rotational embossing of foils
    • US11453190B2
    • 2022-09-27
    • US16470624
    • 2017-12-19
    • BOEGLI-GRAVURES SA
    • Charles BoegliWerner Steffen
    • B31F1/07
    • An embossing method allowing to emboss a material on both sides comprises feeding the foil material into a roll nip between a pair of a first roll and a second roll, providing the first roll and the second roll each with a plurality of positive projections and a plurality of negative projections of identical shaped polyhedral structures, a first subset of the plurality of positive projections being disposed with a first periodicity on a first grid in axial direction and a second periodicity on the first grid in circumferential direction on the first roll, and a second subset of the plurality of negative projections being disposed with the first periodicity in axial direction and the second periodicity in circumferential direction on the first grid intertwined with the positive projections, in axial and circumferential directions respectively, and projections complementary to the first grid, on the second roll, each of the positive projections and the negative projections on the first roll during operation of the rolls and in the roll nip being surrounded on all sides by positive projections and negative projections on the second roll, the positive projections of the first roll together with alternating corresponding negative projections on the second roll forming during the operation of the rolls and in the roll nip, a first straight line substantially parallel to the axial direction, and the negative projections of the first roll together with alternating corresponding positive projections on the second roll forming during the operation of the rolls and in the roll nip, a second straight line substantially parallel to the axial direction. The positive projections and the negative projections are such that in the axial direction on the first roll each positive projection shares a lateral base border with at least one negative projection adjacent to the positive projection, and during the operation of the rolls and in the roll nip, all lateral oblique surfaces of the positive and negative projections of the first roll are just above the surface in full faced view with the corresponding lateral oblique surfaces of the respective negative and positive projections of the second roll, thereby enabling a homogeneous distribution of pressure to the material.
    • 4. 发明授权
    • Method and device for embossing planar material
    • US11554570B2
    • 2023-01-17
    • US16305467
    • 2017-05-04
    • BOEGLI-GRAVURES SA
    • Charles BoegliWerner Steffen
    • B31F1/07B31B50/88B44B5/00B44B5/02
    • A method for embossing a first grating in a planar material, by means of an embossing body and a counter embossing body, having each a hard surface, the first grating to be embossed comprising alternating substantially parallel and straight ridges and recesses, whereby the top surfaces of the ridges are intended to weaken a direct angular reflection of light by diffuse omnidirectional reflection, thereby producing a visible contrast between the ridges and the recesses. The method comprises on the embossing body providing a first plurality of obtuse pyramids intended to emboss the recesses of the first grating by exerting pressure on a first side of the planar material, the first plurality of obtuse pyramids forming first intermitted lines (row1, row2) corresponding to the intended recesses, and the pyramids in each subset corresponding to one of the first intermitted lines, being separated from each other by a determined distance that creates a gap in the line in such a manner that each gap from a line of pyramids may be connected to a corresponding gap from an adjacent line of pyramids by an imaginary line perpendicular to both of the adjacent lines; and roughening portions of the hard surface of the embossing body, the portions being located between adjacent lines of pyramids and intersecting at least one of the imaginary lines that connect one gap from one line to the corresponding gap from the adjacent line. On the counter embossing body, the method comprises providing a second plurality of obtuse pyramids intended to emboss the ridges of the first grating by exerting pressure on a second side of the planar material opposite to the first side, during embossing the obtuse summits of the pyramid pressing the planar material against a roughened portion of the hard surface of the embossing body, thereby satirizing the top surfaces of the ridges on the first side.
    • 7. 发明授权
    • Device for mask projection of femtosecond and picosecond laser beams with blade, mask, and lens system
    • US10780525B2
    • 2020-09-22
    • US15302792
    • 2015-05-12
    • Boegli Gravures SA
    • Günter ReisseSteffen WeissmantelAndy EngelManuel PfeifferAlexander KratschCharles BoegliMatthias Kahl
    • B23K26/066B23K26/046B23K26/06B23K26/12B23K26/0622B23K26/16B23K26/14
    • The present application relates to a device for the mask projection of femtosecond or picosecond laser beams (2) onto a substrate surface, in which the laser beam (2) consisting of laser beam pulses is, at a location of the optical axis, formed to make laser beam pulses with an expanded laser beam cross section or laser beam pulses with a reduced laser beam cross section and said laser beam (2) has a homogeneous intensity distribution over the laser beam cross section. A stop (6) with a predetermined stop aperture geometry and a mask (7) with a predetermined mask aperture geometry are positioned in succession in the beam (2) path at the location. The device contains a field lens system (8) and an imaging lens (10), which are positioned in such a way that the non-diffracted and diffracted beam components of the laser beam (2) pulses transmitted by the stop (6) and the mask (7) are directed into the imaging lens (10) with a predetermined aperture with the aid of the field lens system (8) in such a way that a reduced image, ac curate in every detail and having a predetermined imaging ratio, of the intensity profile generated by the stop (6) and the mask (7) is generated over the laser beam cross section of the laser beam pulses in the imaging plane. In a beam guiding variant 1, an added lens system (16), the field lens system (8) and the imaging lens (10) are positioned relative to one another in such a way that a focus (19) is generated between the imaging lens (10) and the substrate surface and, in a beam guiding variant 2, the added lens system (16), the field lens system (8) and the imaging lens (10) are positioned relative to one another in such a way that a focus (22) is generated between the field lens system (8) and the imaging lens (10). At least one vacuum cuvette, which surrounds the region of the focus (19) and of the focus (22), is present.
    • 8. 发明申请
    • Micro-Embossing
    • US20170282635A1
    • 2017-10-05
    • US15531481
    • 2015-12-21
    • Boegli-Gravures SA
    • Charles BoegliMatthias KahlGünter ReisseWerner SteffenWolfgang Brickenkamp
    • B44B5/00A61J1/00B65D85/60B65D85/18B31F1/07B65D65/40
    • A method for embossing optically diffracting microstructures in a thin foil, such as used to pack at least one of the list comprising food, chocolate, chewing gum, gifts, jewellery, clothes, tobacco products, pharmaceutical products, the embossing being produced with an embossing rollers set-up comprising at least one cylindrical embossing roller and a cambered counter roller. The method comprises confining the at least one cylindrical embossing roller and the cambered counter roller in a single roller stand of relatively small outer dimensions designed to withstand a pressure for the at least one cylindrical embossing roller and the cambered counter roller; using on a surface of a first one of the at least one cylindrical embossing rollers at least one raised embossing element adapted for microstructure embossing, whereby one of the at least one raised embossing elements comprises a platform distant at a height in a range between 5 m and 30 m above a surrounding surface of the first cylindrical embossing roller adjacent to it, and a pattern engraved on top of the platform (5), whereby the pattern comprises the optically diffracting microstructures with periodicity of gratings in the range smaller than 30 gm that produce from a diffuse or directed source of light in the visible wavelength range diffraction images with high contrast and high luminosity in a defined observation angle; and adjusting the pressure for the at least one cylindrical embossing roller on the thin foil in a range less than 80 bar relative to a platform area of approximately 100 mm2.
    • 9. 发明申请
    • Device for Embossing Packaging Material with a Set of Embossing Rollers of the Male-Female Die Type
    • 用于压花包装材料的装置,其具有一组公阴模型的压花辊
    • US20160200066A1
    • 2016-07-14
    • US14908144
    • 2014-08-26
    • BOEGLI-GRAVURES SA
    • Charles BoegliWerner SteffenAlain Droz
    • B31F1/07
    • B31F1/07B31F2201/0725B31F2201/0733B31F2201/0738B31F2201/0741B31F2201/0743B31F2201/0774B44B5/026
    • The embossing device for embossing packaging material comprises a set of embossing rollers with male die and female die rollers co-operating with one another, the surface of which is provided with texture elements, wherein the texture elements (M6R6) on the surface of the female die roller (M6), which are assigned to the texture elements (P6E6) on the surface of the male die roller (P6) are not inversely congruent by an amount of above 15 μm in axial and radial direction and the texture elements of the male die and female roller associated with one another comprise facets (F) for the purpose of local pressure elevation. A facet (F) comprises faces (FN), which with respect to the imaginary, continuous surface of the texture is inclined. With such facetted rollers, a very large variety of films can be embossed in an aesthetically appealing manner, wherein the films can be mainly employed in the tobacco and foodstuff industry.
    • 用于压花包装材料的压花装置包括一组具有相互配合的阳模和阴模辊的压花辊,其表面设置有纹理元件,其中在母体表面上的织构元件(M6R6) 分配给阳模辊(P6)表面上的纹理元件(P6E6)的模具辊(M6)在轴向和径向方向上与15μm以上的量不相反,并且男性的纹理元素 彼此相关联的模和母辊包括面(F),用于局部压力升高。 面(F)包括面(FN),其相对于纹理的假想连续表面倾斜。 利用这种多面体的辊子,可以以美观的方式压印非常多种类的膜,其中膜可以主要用于烟草和食品工业。