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1. 发明授权

US10882352B2 Micro-embossing 有权
公开(公告)号：US10882352B2
公开(公告)日：2021-01-05
申请号：US15531481
申请日：2015-12-21
申请人： Boegli-Gravures SA , Inge REISSE
发明人： Charles Boegli , Matthias Kahl , Günter Reisse , Werner Steffen , Wolfgang Brickenkamp
IPC分类号： B31F1/07 , B44B5/00 , A61J1/00 , B65D65/40 , B65D85/18 , B65D85/60 , B31B50/88
摘要： A method for embossing optically diffracting microstructures in a thin foil, such as used to pack at least one of the list comprising food, chocolate, chewing gum, gifts, jewellery, clothes, tobacco products, pharmaceutical products, the embossing being produced with an embossing rollers set-up comprising at least one cylindrical embossing roller and a cambered counter roller. The method comprises confining the at least one cylindrical embossing roller and the cambered counter roller in a single roller stand of relatively small outer dimensions designed to withstand a pressure for the at least one cylindrical embossing roller and the cambered counter roller; using on a surface of a first one of the at least one cylindrical embossing rollers at least one raised embossing element adapted for microstructure embossing, whereby one of the at least one raised embossing elements comprises a platform distant at a height in a range between 5 m and 30 m above a surrounding surface of the first cylindrical embossing roller adjacent to it, and a pattern engraved on top of the platform (5), whereby the pattern comprises the optically diffracting microstructures with periodicity of gratings in the range smaller than 30 μm that produce from a diffuse or directed source of light in the visible wavelength range diffraction images with high contrast and high luminosity in a defined observation angle; and adjusting the pressure for the at least one cylindrical embossing roller on the thin foil in a range less than 80 bar relative to a platform area of approximately 100 mm2.

2. 发明授权

US10780525B2 Device for mask projection of femtosecond and picosecond laser beams with blade, mask, and lens system 有权
公开(公告)号：US10780525B2
公开(公告)日：2020-09-22
申请号：US15302792
申请日：2015-05-12
申请人： Boegli Gravures SA
发明人： Günter Reisse , Steffen Weissmantel , Andy Engel , Manuel Pfeiffer , Alexander Kratsch , Charles Boegli , Matthias Kahl
IPC分类号： B23K26/066 , B23K26/046 , B23K26/06 , B23K26/12 , B23K26/0622 , B23K26/16 , B23K26/14
摘要： The present application relates to a device for the mask projection of femtosecond or picosecond laser beams (2) onto a substrate surface, in which the laser beam (2) consisting of laser beam pulses is, at a location of the optical axis, formed to make laser beam pulses with an expanded laser beam cross section or laser beam pulses with a reduced laser beam cross section and said laser beam (2) has a homogeneous intensity distribution over the laser beam cross section. A stop (6) with a predetermined stop aperture geometry and a mask (7) with a predetermined mask aperture geometry are positioned in succession in the beam (2) path at the location. The device contains a field lens system (8) and an imaging lens (10), which are positioned in such a way that the non-diffracted and diffracted beam components of the laser beam (2) pulses transmitted by the stop (6) and the mask (7) are directed into the imaging lens (10) with a predetermined aperture with the aid of the field lens system (8) in such a way that a reduced image, ac curate in every detail and having a predetermined imaging ratio, of the intensity profile generated by the stop (6) and the mask (7) is generated over the laser beam cross section of the laser beam pulses in the imaging plane. In a beam guiding variant 1, an added lens system (16), the field lens system (8) and the imaging lens (10) are positioned relative to one another in such a way that a focus (19) is generated between the imaging lens (10) and the substrate surface and, in a beam guiding variant 2, the added lens system (16), the field lens system (8) and the imaging lens (10) are positioned relative to one another in such a way that a focus (22) is generated between the field lens system (8) and the imaging lens (10). At least one vacuum cuvette, which surrounds the region of the focus (19) and of the focus (22), is present.

3. 发明申请

US20170282635A1 Micro-Embossing 审中-公开
公开(公告)号：US20170282635A1
公开(公告)日：2017-10-05
申请号：US15531481
申请日：2015-12-21
申请人： Boegli-Gravures SA
发明人： Charles Boegli , Matthias Kahl , Günter Reisse , Werner Steffen , Wolfgang Brickenkamp
IPC分类号： B44B5/00 , A61J1/00 , B65D85/60 , B65D85/18 , B31F1/07 , B65D65/40
摘要： A method for embossing optically diffracting microstructures in a thin foil, such as used to pack at least one of the list comprising food, chocolate, chewing gum, gifts, jewellery, clothes, tobacco products, pharmaceutical products, the embossing being produced with an embossing rollers set-up comprising at least one cylindrical embossing roller and a cambered counter roller. The method comprises confining the at least one cylindrical embossing roller and the cambered counter roller in a single roller stand of relatively small outer dimensions designed to withstand a pressure for the at least one cylindrical embossing roller and the cambered counter roller; using on a surface of a first one of the at least one cylindrical embossing rollers at least one raised embossing element adapted for microstructure embossing, whereby one of the at least one raised embossing elements comprises a platform distant at a height in a range between 5 m and 30 m above a surrounding surface of the first cylindrical embossing roller adjacent to it, and a pattern engraved on top of the platform (5), whereby the pattern comprises the optically diffracting microstructures with periodicity of gratings in the range smaller than 30 gm that produce from a diffuse or directed source of light in the visible wavelength range diffraction images with high contrast and high luminosity in a defined observation angle; and adjusting the pressure for the at least one cylindrical embossing roller on the thin foil in a range less than 80 bar relative to a platform area of approximately 100 mm2.

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