会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Structure for sensing refrigerant flow rate in a compressor
    • 用于检测压缩机中制冷剂流量的结构
    • US08186172B2
    • 2012-05-29
    • US11894320
    • 2007-08-20
    • Yoshinori InoueHirokazu MesakiAtsuhiro Suzuki
    • Yoshinori InoueHirokazu MesakiAtsuhiro Suzuki
    • F25B49/00
    • F04B27/1804F04B2205/01F04B2205/061F04B2205/062F04B2205/08F04B2205/09F25B2700/13
    • A structure for sensing refrigerant flow rate in a compressor. The structure includes a passage forming member, a restriction hole, a differential pressure-type flow rate sensor, and a partition plate. The compressor includes a housing connected to an external refrigerant circuit via a refrigerant passage. The passage forming member is connected to an outer surface of the housing and forms a part of the refrigerant passage. The restriction hole divides the refrigerant passage into an upstream passage and a downstream passage. The upstream passage is formed in either the housing or the passage forming member. The sensor is provided in the passage forming member and detects pressure in the upstream passage and pressure in the downstream passage to sense flow rate of refrigerant in the refrigerant passage. The partition plate is disposed between the housing and the passage forming member. The restriction hole is formed in the partition plate to extend through the partition plate.
    • 用于感测压缩机中的制冷剂流量的结构。 该结构包括通道形成构件,限制孔,差压式流量传感器和隔板。 压缩机包括通过制冷剂通道连接到外部制冷剂回路的壳体。 通道形成构件连接到壳体的外表面并形成制冷剂通道的一部分。 限制孔将制冷剂通道分成上游通道和下游通道。 上游通道形成在壳体或通道形成构件中。 传感器设置在通道形成构件中,并且检测上游通道中的压力和下游通道中的压力以感测制冷剂通道中制冷剂的流量。 分隔板设置在壳体和通道形成构件之间。 在隔板中形成限制孔以延伸穿过隔板。
    • 3. 发明申请
    • NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING THE SAME
    • 非易失性半导体存储器件及其制造方法
    • US20090189213A1
    • 2009-07-30
    • US12354200
    • 2009-01-15
    • Kazuhiro MATSUOMasayuki TANAKAAtsuhiro SUZUKI
    • Kazuhiro MATSUOMasayuki TANAKAAtsuhiro SUZUKI
    • H01L29/792H01L21/283H01L21/764
    • H01L29/42336H01L27/115H01L27/11521H01L29/94
    • A nonvolatile semiconductor memory device includes a semiconductor substrate having a plurality of active regions separately formed by a plurality of trenches formed in a surface of the substrate at predetermined intervals, a first gate insulating film formed on an upper surface of the substrate corresponding to each active region, a gate electrode of a memory cell transistor formed by depositing an electrical charge storage layer formed on an upper surface of the gate insulating film, a second gate insulating film and a control gate insulating film sequentially, an element isolation insulating film buried in each trench and formed from a coating type oxide film, and an insulating film formed inside each trench on a boundary between the semiconductor substrate and the element isolation insulating film, the insulating film containing nontransition metal atoms and having a film thickness not more than 5 Å.
    • 非易失性半导体存储器件包括:半导体衬底,具有由以形成在衬底的表面中的预定间隔分开形成的多个沟槽分开形成的多个有源区;形成在衬底的上表面上的第一栅极绝缘膜, 区域,通过依次沉积形成在栅极绝缘膜的上表面上的电荷存储层,第二栅极绝缘膜和控制栅极绝缘膜而形成的存储单元晶体管的栅电极,每个区域中埋设的元件隔离绝缘膜 沟槽,并且由涂覆型氧化物膜形成,并且在半导体衬底和元件隔离绝缘膜之间的边界上形成在每个沟槽内的绝缘膜,所述绝缘膜包含非转移金属原子并且具有不大于5的膜厚度。
    • 4. 发明申请
    • SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
    • 半导体器件及其制造方法
    • US20090039444A1
    • 2009-02-12
    • US12180828
    • 2008-07-28
    • Atsuhiro SUZUKI
    • Atsuhiro SUZUKI
    • H01L21/8234H01L27/088
    • H01L29/0847H01L21/823418H01L21/823462H01L29/41775H01L29/66621H01L29/66636H01L29/7834
    • A semiconductor device includes a semiconductor substrate including an upper surface having a first region including a pair of first impurity diffusion regions and a first channel region located between the impurity diffusion regions and a second region including a recess having a predetermined depth relative to the upper surface, a first gate insulating film, a first gate electrode of a first transistor supplying a first voltage, a second gate insulating film having a second thickness larger than a first thickness of the first gate insulating film, an upper surface of the second gate insulating film located at a same level as an upper surface of the first gate insulating film, and a second gate electrode of a second transistor supplying a second voltage being higher than the first voltage.
    • 半导体器件包括:半导体衬底,包括具有包括一对第一杂质扩散区的第一区域和位于杂质扩散区之间的第一沟道区的上表面,以及包括相对于上表面具有预定深度的凹部的第二区 第一栅极绝缘膜,提供第一电压的第一晶体管的第一栅极电极,具有大于第一栅极绝缘膜的第一厚度的第二厚度的第二栅极绝缘膜,第二栅极绝缘膜的上表面 位于与第一栅极绝缘膜的上表面相同的电平上,第二晶体管的第二栅电极提供高于第一电压的第二电压。
    • 5. 发明申请
    • Structure for sensing refrigerant flow rate in a compressor
    • 用于检测压缩机中制冷剂流量的结构
    • US20080104984A1
    • 2008-05-08
    • US11978036
    • 2007-10-26
    • Akinobu KanaiHiroyuki NakaimaYoshinori InoueAtsuhiro Suzuki
    • Akinobu KanaiHiroyuki NakaimaYoshinori InoueAtsuhiro Suzuki
    • F25B49/00
    • F04B27/1804F04B2205/08F25B1/02F25B43/02F25B2400/02F25B2400/076F25B2700/13
    • The compressor has a differential pressure type flow rate detector that obtains the pressure in an upstream passage and the pressure in a downstream passage to detect a refrigerant flow rate within a refrigerant passage. The detector has an accommodation chamber, and a partition body slidably accommodated within the accommodation chamber. The partition body comparts the accommodation chamber into a high pressure chamber to which the pressure in the upstream passage is introduced, and a low pressure chamber to which the pressure in the downstream passage is introduced. The compressor has an oil separator having an oil introduction passage connected to the oil separating chamber and a high pressure introduction passage introducing the pressure in the upstream passage to the high pressure chamber. The oil introduction passage introduces the oil separated from the refrigerant by the oil separator to a pressure zone other than a discharge pressure zone.
    • 压缩机具有压力型流量检测器,其获得上游通路中的压力和下游通道中的压力,以检测制冷剂通道内的制冷剂流量。 检测器具有容纳室和可容纳在容纳室内的分隔体。 分隔体将容纳室配合到上游通路的压力被引入的高压室和下游通路的压力被引入的低压室。 压缩机具有油分离器,该油分离器具有连接到油分离室的油引入通道和将上游通道中的压力引入高压室的高压引入通道。 引油通道将通过油分离器从制冷剂分离的油引入除了排出压力区域之外的压力区域。
    • 6. 发明授权
    • Nonvolatile semiconductor memory device and method of fabricating the same
    • 非易失性半导体存储器件及其制造方法
    • US07812391B2
    • 2010-10-12
    • US12354200
    • 2009-01-15
    • Kazuhiro MatsuoMasayuki TanakaAtsuhiro Suzuki
    • Kazuhiro MatsuoMasayuki TanakaAtsuhiro Suzuki
    • H01L21/76
    • H01L29/42336H01L27/115H01L27/11521H01L29/94
    • A nonvolatile semiconductor memory device includes a semiconductor substrate having a plurality of active regions separately formed by a plurality of trenches formed in a surface of the substrate at predetermined intervals, a first gate insulating film formed on an upper surface of the substrate corresponding to each active region, a gate electrode of a memory cell transistor formed by depositing an electrical charge storage layer formed on an upper surface of the gate insulating film, a second gate insulating film and a control gate insulating film sequentially, an element isolation insulating film buried in each trench and formed from a coating type oxide film, and an insulating film formed inside each trench on a boundary between the semiconductor substrate and the element isolation insulating film, the insulating film containing nontransition metal atoms and having a film thickness not more than 5 Å.
    • 非易失性半导体存储器件包括:半导体衬底,具有由以形成在衬底的表面中的预定间隔分开形成的多个沟槽分开形成的多个有源区;形成在衬底的上表面上的第一栅极绝缘膜, 区域,通过依次沉积形成在栅极绝缘膜的上表面上的电荷存储层,第二栅极绝缘膜和控制栅极绝缘膜而形成的存储单元晶体管的栅电极,每个区域中埋设的元件隔离绝缘膜 沟槽,并且由涂覆型氧化物膜形成,并且在半导体衬底和元件隔离绝缘膜之间的边界上形成在每个沟槽内的绝缘膜,所述绝缘膜包含非转移金属原子并且具有不大于5的膜厚度。
    • 7. 发明授权
    • Structure for sensing refrigerant flow rate in a compressor
    • 用于检测压缩机中制冷剂流量的结构
    • US07658081B2
    • 2010-02-09
    • US11978036
    • 2007-10-26
    • Akinobu KanaiHiroyuki NakaimaYoshinori InoueAtsuhiro Suzuki
    • Akinobu KanaiHiroyuki NakaimaYoshinori InoueAtsuhiro Suzuki
    • F25B49/00
    • F04B27/1804F04B2205/08F25B1/02F25B43/02F25B2400/02F25B2400/076F25B2700/13
    • The compressor has a differential pressure type flow rate detector that obtains the pressure in an upstream passage and the pressure in a downstream passage to detect a refrigerant flow rate within a refrigerant passage. The detector has an accommodation chamber, and a partition body slidably accommodated within the accommodation chamber. The partition body comparts the accommodation chamber into a high pressure chamber to which the pressure in the upstream passage is introduced, and a low pressure chamber to which the pressure in the downstream passage is introduced. The compressor has an oil separator having an oil introduction passage connected to the oil separating chamber and a high pressure introduction passage introducing the pressure in the upstream passage to the high pressure chamber. The oil introduction passage introduces the oil separated from the refrigerant by the oil separator to a pressure zone other than a discharge pressure zone.
    • 压缩机具有压力型流量检测器,其获得上游通路中的压力和下游通道中的压力,以检测制冷剂通道内的制冷剂流量。 检测器具有容纳室和可容纳在容纳室内的分隔体。 分隔体将容纳室配合到上游通路的压力被引入的高压室和下游通路的压力被引入的低压室。 压缩机具有油分离器,该油分离器具有连接到油分离室的油引入通道和将上游通道中的压力引入高压室的高压引入通道。 引油通道将通过油分离器从制冷剂分离的油引入除了排出压力区域之外的压力区域。