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    • 5. 发明申请
    • Process for the preparation of 5-substituted-1-(4-fluorophenyl)-1,3-dihydroisobenzofurans
    • 制备5-取代-1-(4-氟苯基)-1,3-二氢异苯并呋喃的方法
    • US20060116522A1
    • 2006-06-01
    • US10526302
    • 2003-08-28
    • Ambati Narahari BabuVaddamari GoudSanthosh GaonkarSulur ManjunathaAshok Kulkarni
    • Ambati Narahari BabuVaddamari GoudSanthosh GaonkarSulur ManjunathaAshok Kulkarni
    • C07D307/87
    • C07D307/87
    • The present invention provides a process for the preparation of a 5-substituted-1-(4-fluorophenyl)-1,3-dihydro-isoben-zofuran of Formula (2), an intermediate for the manufacture of citalopram, which process comprises: (a) carrying out a Grignard reaction on a corresponding 5-substituted phthalide of Formula (3) in a co-solvent system, comprising adding (i) prepared 4-fluorophenyl magnesium halide in an ether solvent to (ii) the 5-substituted phthalide in a suitable organic co-solvent to the ether solvent, to form a corresponding 4-substituted-2-hydroxymethyl-4′-fluorobenzophenone of Formula (4); (b) carrying out a ketone reduction of the 4-substituted-2-hydroxymethyl-4′-fluorobenzophenone of Formula (4) following the Grignard reaction, to form a corresponding 4-substituted-2-hydroxymethylphenyl-1-(4-fluorophenyl) methanol of Formula (5); and (c) carrying out a cyclisation reaction on the 4-substituted-2 hydroxymethylphenyl-1-(4-fluorophenyl) methanol of Formula (5) following the reduction reaction, to form said intermediate of Formula (2); wherein R represents Br or CN.
    • 本发明提供了制备式(2)的5-取代-1-(4-氟苯基)-1,3-二氢 - 异辛氧氟尿苷的方法,该方法是制备西酞普兰的中间体,该方法包括: (a)在共溶剂系统中在相应的式(3)的5-取代的苯并菲酮上进行格氏反应,其包括将(i)制备的4-氟苯基卤化镁在醚溶剂中加入(ii)5-取代的 在合适的有机共溶剂中与醚溶剂反应,形成相应的式(4)的4-取代-2-羟甲基-4'-氟二苯甲酮; (b)在格利雅反应之后进行式(4)的4-取代-2-羟甲基-4'-氟二苯酮的酮还原反应,形成相应的4-取代-2-羟甲基苯基-1-(4-氟苯基 )甲醇; 和(c)在还原反应后对式(5)的4-取代-2-羟甲基苯基-1-(4-氟苯基)甲醇进行环化反应,形成式(2)的所述中间体; 其中R表示Br或CN。
    • 8. 发明授权
    • Systems and methods for detecting defects on a wafer and generating inspection results for the wafer
    • 用于检测晶片上的缺陷并产生晶片检查结果的系统和方法
    • US07756658B2
    • 2010-07-13
    • US12120574
    • 2008-05-14
    • Ashok KulkarniSantosh Bhattacharyya
    • Ashok KulkarniSantosh Bhattacharyya
    • G01N37/00
    • G05B19/41875G05B2219/37224G05B2219/45031H01L22/12H01L22/20H01L2924/0002Y02P90/22H01L2924/00
    • Systems and methods for detecting defects on a wafer and generating inspection results for the wafer are provided. One method includes detecting defects on a wafer by comparing output generated by scanning of the wafer performed by an inspection system to one or more defect detection thresholds. The method also includes sampling outliers in the output by selecting the output having the highest values from bins defined based on one or more predetermined criteria. In addition, the method includes selecting a portion of the sampled outliers based on wafer-level analysis of the sampled outliers. The method further includes generating inspection results for the wafer by combining information about the selected portion of the sampled outliers with information about the defects detected using the one or more defect detection thresholds.
    • 提供了用于检测晶片上的缺陷并产生晶片的检查结果的系统和方法。 一种方法包括通过将由检查系统执行的晶片的扫描产生的输出与一个或多个缺陷检测阈值进行比较来检测晶片上的缺陷。 该方法还包括通过从基于一个或多个预定标准定义的箱中选择具有最高值的输出来对输出中的异常值进行采样。 此外,该方法包括基于采样异常值的晶片级分析来选择一部分采样异常值。 该方法还包括通过将关于所选择的采样异常值的部分的信息与关于使用一个或多个缺陷检测阈值检测到的缺陷的信息组合来产生晶片的检查结果。
    • 10. 发明申请
    • SYSTEMS AND METHODS FOR CREATING INSPECTION RECIPES
    • 用于创建检验录像的系统和方法
    • US20080250384A1
    • 2008-10-09
    • US11960157
    • 2007-12-19
    • Brian DuffyAshok Kulkarni
    • Brian DuffyAshok Kulkarni
    • G06F17/50
    • G03F7/7065G03F7/70525
    • Systems and methods for creating inspection recipes are provided. One computer-implemented method for creating an inspection recipe includes acquiring a first design and one or more characteristics of output of an inspection system for a wafer on which the first design is printed using a manufacturing process. The method also includes creating an inspection recipe for a second design using the first design and the one or more characteristics of the output acquired for the wafer on which the first design is printed. The first and second designs are different. The inspection recipe will be used for inspecting wafers after the second design is printed on the wafers using the manufacturing process.
    • 提供了用于创建检查配方的系统和方法。 用于创建检查配方的一种计算机实现的方法包括采用制造过程获取第一设计和用于印刷第一设计的晶片的检查系统的输出的一个或多个特性。 该方法还包括使用第一设计和为其上印刷有第一设计的晶片获取的输出的一个或多个特性来创建用于第二设计的检查配方。 第一和第二种设计是不同的。 在使用制造工艺将第二设计印刷在晶片上之后,检查配方将用于检查晶片。