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1. 发明授权

US09224581B2 Parallel plate reactor for uniform thin film deposition with reduced tool foot-print 有权
标题翻译：平行板反应器，用于均匀薄膜沉积，减少了工具脚印
公开(公告)号：US09224581B2
公开(公告)日：2015-12-29
申请号：US13577701
申请日：2010-07-09
申请人： Joachim Mai , Benjamin Strahm , Guillaume Wahli , Arthur Buechel , Thomas Schulze
发明人： Joachim Mai , Benjamin Strahm , Guillaume Wahli , Arthur Buechel , Thomas Schulze
IPC分类号： H01J37/32 , C23C16/455 , C23C16/509
CPC分类号： H01J37/32449 , C23C16/45565 , C23C16/5096 , H01J37/32091
摘要： A capacitive-coupled parallel plate plasma enhanced chemical vapor deposition reactor includes a gas distribution unit that is integrated in an RF electrode and is formed with a gas outlet. The parallel plate reactor is configured so that layers with high thickness homogeneity and quality can be produced. The capacitively coupled parallel plate plasma enhanced vapor deposition reactor has gas distribution unit with a multiple-stage showerhead constructed in such a way that it provides an independent adjustment of gas distribution and gas emission profile of the gas distribution unit.
摘要翻译：电容耦合平行板等离子体增强化学气相沉积反应器包括集成在RF电极中并形成有气体出口的气体分配单元。平行板反应器被配置成能够产生具有高厚度均匀性和质量的层。电容耦合平行板等离子体增强气相沉积反应器具有气体分配单元，其具有多级喷淋头，其构造成使得气体分配单元的气体分布和气体排放分布的独立调整。

2. 发明授权

US07868246B2 Solar cell module and method of encapsulating same 失效
标题翻译：太阳能电池模块及其封装方法
公开(公告)号：US07868246B2
公开(公告)日：2011-01-11
申请号：US11279152
申请日：2006-04-10
申请人： Arthur Buechel
发明人： Arthur Buechel
IPC分类号： H01L25/00 , H01L31/00
CPC分类号： H01L31/049 , Y02E10/50
摘要： A composite solar collection module includes a thin film solar collection cell that is encapsulated between a transparent substrate, such as glass, on one side, and an electrically insulating film on the other. A metallic layer is disposed over the electrically insulating film to provide protection against diffusion of atmospheric species that may harm the thin film solar collection cell. The insulating and metallic layers are dimensioned so that a larger collection cell can be used to collect solar energy over a larger proportion of the available substrate surface area, without causing arcing between the cell edge and the metallic layer edge.
摘要翻译：复合太阳能收集模块包括薄膜太阳能收集单元，其被封装在一侧的透明基板（例如玻璃）和另一侧的电绝缘膜之间。金属层设置在电绝缘膜上，以提供防止可能损害薄膜太阳能收集单元的大气物种的扩散的保护。绝缘和金属层的尺寸被设计成使得可以使用较大的收集单元在较大比例的可用基底表面积上收集太阳能，而不会引起电池边缘和金属层边缘之间的电弧。

3. 发明授权

US07449220B2 Method for manufacturing a plate-shaped workpiece 有权
标题翻译：板状工件的制造方法
公开(公告)号：US07449220B2
公开(公告)日：2008-11-11
申请号：US10835708
申请日：2004-04-30
申请人： Arthur Buechel , Werner Wieland , Christoph Ellert , Laurent Sansonnens
发明人： Arthur Buechel , Werner Wieland , Christoph Ellert , Laurent Sansonnens
IPC分类号： H05H1/03
CPC分类号： H01J37/32541 , C23C16/45565 , C23C16/5096
摘要： A method for producing a disk shaped workpiece with a dielectric substrate includes treatment in a plasma process volume between two electrode faces bounding a high-frequency plasma discharge. One electrode face is of dielectric material and is at a high-frequency potential with a varying distribution along the face. The other electrode face is metallic. Reactive gas is introduced into the process volume through an aperture pattern. The dielectric substrate, before treatment, is at least regionally coated with a layer material to whose specific resistance applies: 10−5 Ωcm≦≦10−1 Ωcm, and to the resulting surface resistance RS of the layer applies: 0
摘要翻译：用于制造具有电介质基片的圆盘形工件的方法包括在等离子体处理体积中处理两个界定高频等离子体放电的电极面。一个电极面是介电材料，并且处于高频电位，沿着面部具有不同的分布。另一个电极面是金属的。活性气体通过孔径图案引入过程体积。电介质基片在处理之前至少在区域上涂覆有电阻率适用：10 -5以下Omegacm <= <= 10 ＆lt; SUP＆gt; -1＆Omega;以及所得到的表面电阻R S S适用于：0 <= 10 < / SUP>欧米茄。随后，将涂覆的基板定位在金属电极表面上，并在等离子体处理体积等离子体增强下被反应地蚀刻或涂覆。

4. 发明申请

US20050241583A1 Method for the production of a disk-form workpiece based on a dielectric substrate as well as vacuum treatment installation for same 有权
标题翻译：用于制造基于电介质基板的圆盘形工件的方法以及用于其的真空处理装置
公开(公告)号：US20050241583A1
公开(公告)日：2005-11-03
申请号：US10835708
申请日：2004-04-30
申请人： Arthur Buechel , Werner Wieland , Christoph Ellert
发明人： Arthur Buechel , Werner Wieland , Christoph Ellert
IPC分类号： C23C16/00 , C23C16/509 , H01J37/32 , H05H1/24
CPC分类号： H01J37/32541 , C23C16/45565 , C23C16/5096
摘要： A method for producing a disk shaped workpiece with a dielectric substrate includes treatment in a plasma process volume between two electrode faces bounding a high-frequency plasma discharge. One electrode face is of dielectric material and is at a high-frequency potential with a varying distribution along the face. The other electrode face is metallic. Reactive gas is introduced into the process volume through an aperture pattern. The dielectric substrate, before treatment, is at least regionally coated with a layer material to whose specific resistance applies: 10−5 Ωcm≦≦10−1 Ωcm, and to the resulting surface resistance Rs of the layer applies: 0
摘要翻译：用于制造具有电介质基片的圆盘形工件的方法包括在等离子体处理体积中处理两个界定高频等离子体放电的电极面。一个电极面是介电材料，并且处于高频电位，沿着面部具有不同的分布。另一个电极面是金属的。活性气体通过孔径图案引入过程体积。电介质基片在处理之前至少是用特定电阻适用：10 ^{-5 Omegacm <= <= 10 ＆lt; Sup＆gt; -1＆Omega;以及所得到的表面电阻R 1 S 0适用于：0 欧米茄。随后，将涂覆的基板定位在金属电极表面上，并在等离子体处理体积等离子体增强下被反应地蚀刻或涂覆。}

5. 发明授权

US07244086B2 Apparatus for vacuum treating two dimensionally extended substrates and method for manufacturing such substrates 有权
标题翻译：用于真空处理二维延伸基板的设备及其制造方法
公开(公告)号：US07244086B2
公开(公告)日：2007-07-17
申请号：US10713339
申请日：2003-11-14
申请人： Rainer Ostermann , Arthur Buechel , Mustapha Elyaakoubi
发明人： Rainer Ostermann , Arthur Buechel , Mustapha Elyaakoubi
IPC分类号： H01L21/677
CPC分类号： H01L21/67178 , C23C14/566 , C23C14/568 , C23C16/54 , F27B5/04 , F27B5/12 , F27B17/0025 , F27D3/0084 , F27D3/06 , F27D2003/0065 , H01L21/67017 , H01L21/67201 , H01L21/67236 , H01L21/67742 , H01L21/67745 , H01L21/67748 , H01L21/67754 , H01L21/67766 , H01L21/67772 , H01L21/67781 , Y10S414/139
摘要： A vacuum transport chamber has a transport robot arrangement. A processing arrangement has at least one processing station communicating by at least one workpiece pass-through opening with the vacuum transport chamber. A loadlock arrangement communicates by at least one workpiece pass-through opening with an atmosphere outside the vacuum transport chamber and the processing arrangement. One single loadlock and processing tower is formed by the processing arrangement and the loadlock arrangement being arranged vertically on upon the other.
摘要翻译：真空输送室具有运输机器人装置。处理装置具有至少一个与至少一个工件通过开口与真空输送室连通的处理站。负载锁定装置通过至少一个工件通过开口与真空输送室外部的气氛和处理装置连通。一个单一的装载和处理塔由处理装置形成，并且装载锁定装置垂直地布置在另一个上。

6. 发明申请

US20090025632A1 VACUUM TREATMENT INSTALLATION FOR THE PRODUCTION OF A DISK-SHAPED WORKPIECE BASED ON A DIELECTRIC SUBSTRATE 有权
标题翻译：用于生产基于介质基板的盘形工件的真空处理安装
公开(公告)号：US20090025632A1
公开(公告)日：2009-01-29
申请号：US12235845
申请日：2008-09-23
申请人： ARTHUR BUECHEL , Werner Wieland , Christoph Ellert
发明人： ARTHUR BUECHEL , Werner Wieland , Christoph Ellert
IPC分类号： C23C14/00
CPC分类号： H01J37/32541 , C23C16/45565 , C23C16/5096
摘要： A vacuum treatment installation has a vacuum receptacle with a first planar metallic electrode face, a second dielectric electrode face facing the first planar metallic electrode face which forms a surface of a dielectric areal configuration, a metallic coupling face facing a backside of the areal configuration, electric connections on the coupling and on the first electrode face, a gas line system through the coupling face and an areal distributed pattern of apertures through the areal configuration and wherein the areal dielectric configuration is formed by several ceramic tiles.
摘要翻译：真空处理装置具有真空容器，该真空容器具有第一平面金属电极面，面对形成电介质面形状的表面的第一平面金属电极面的第二电介质电极面，面对配置结构的背面的金属结合面，联接器和第一电极面上的电连接，通过耦合面的气体管线系统和通过面形结构的孔的分布图案，并且其中所述面电介质构造由几个瓷砖形成。

7. 发明申请

US20080038095A1 APPARATUS FOR VACUUM TREATING TWO DIMENSIONALLY EXTENDED SUBSTRATES AND METHOD FOR MANUFACTURING SUCH SUBSTRATES 审中-公开
标题翻译：用于真空处理两个尺寸扩展的基板的装置和用于制造这样的基板的方法
公开(公告)号：US20080038095A1
公开(公告)日：2008-02-14
申请号：US11755423
申请日：2007-05-30
申请人： Rainer Ostermann , Arthur Buechel , Mustapha Elyaakoubi
发明人： Rainer Ostermann , Arthur Buechel , Mustapha Elyaakoubi
IPC分类号： H01L21/673
CPC分类号： H01L21/67178 , C23C14/566 , C23C14/568 , C23C16/54 , F27B5/04 , F27B5/12 , F27B17/0025 , F27D3/0084 , F27D3/06 , F27D2003/0065 , H01L21/67017 , H01L21/67201 , H01L21/67236 , H01L21/67742 , H01L21/67745 , H01L21/67748 , H01L21/67754 , H01L21/67766 , H01L21/67772 , H01L21/67781 , Y10S414/139
摘要： A vacuum transport chamber has a transport robot arrangement. A processing arrangement has at least one processing station communicating by at least one workpiece pass-through opening with the vacuum transport chamber. A loadlock arrangement communicates by at least one workpiece pass-through opening with an atmosphere outside the vacuum transport chamber and the processing arrangement. One single loadlock and processing tower is formed by the processing arrangement and the loadlock arrangement being arranged vertically on upon the other.
摘要翻译：真空输送室具有运输机器人装置。处理装置具有至少一个与至少一个工件通过开口与真空输送室连通的处理站。负载锁定装置通过至少一个工件通过开口与真空输送室外部的气氛和处理装置连通。一个单一的装载和处理塔由处理装置形成，并且装载锁定装置垂直地布置在另一个上。

8. 发明申请

US20120304933A1 PARALLEL PLATE REACTOR FOR UNIFORM THIN FILM DEPOSITION WITH REDUCED TOOL FOOT-PRINT 有权
标题翻译：平行平板反应器，用于均匀薄膜沉积与减少工具的打印
公开(公告)号：US20120304933A1
公开(公告)日：2012-12-06
申请号：US13577701
申请日：2010-07-09
申请人： Joachim Mai , Benjamin Strahm , Guillaume Wahli , Arthur Buechel , Thomas Schulze
发明人： Joachim Mai , Benjamin Strahm , Guillaume Wahli , Arthur Buechel , Thomas Schulze
IPC分类号： C23C16/44
CPC分类号： H01J37/32449 , C23C16/45565 , C23C16/5096 , H01J37/32091
摘要： A capacitive-coupled parallel plate plasma enhanced chemical vapor deposition reactor includes a gas distribution unit that is integrated in an RF electrode and is formed with a gas outlet. The parallel plate reactor is configured so that layers with high thickness homogeneity and quality can be produced. The capacitively coupled parallel plate plasma enhanced vapor deposition reactor has gas distribution unit with a multiple-stage showerhead constructed in such a way that it provides an independent adjustment of gas distribution and gas emission profile of the gas distribution unit.
摘要翻译：电容耦合平行板等离子体增强化学气相沉积反应器包括集成在RF电极中并形成有气体出口的气体分配单元。平行板反应器被配置成能够产生具有高厚度均匀性和质量的层。电容耦合平行板等离子体增强气相沉积反应器具有气体分配单元，其具有多级喷淋头，其构造成使得气体分配单元的气体分布和气体排放分布的独立调整。

9. 发明授权

US08205572B2 Vacuum treatment installation for the production of a disk-shaped workpiece based on a dielectric substrate 有权
标题翻译：用于生产基于电介质基片的盘形工件的真空处理设备
公开(公告)号：US08205572B2
公开(公告)日：2012-06-26
申请号：US12235845
申请日：2008-09-23
申请人： Arthur Buechel , Werner Wieland , Christoph Ellert
发明人： Arthur Buechel , Werner Wieland , Christoph Ellert
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32541 , C23C16/45565 , C23C16/5096
摘要： A vacuum treatment installation has a vacuum receptacle with a first planar metallic electrode face, a second dielectric electrode face facing the first planar metallic electrode face which forms a surface of a dielectric areal configuration, a metallic coupling face facing a backside of the areal configuration, electric connections on the coupling and on the first electrode face, a gas line system through the coupling face and an areal distributed pattern of apertures through the areal configuration and wherein the areal dielectric configuration is formed by several ceramic tiles.
摘要翻译：真空处理装置具有真空容器，该真空容器具有第一平面金属电极面，面对形成电介质面形状的表面的第一平面金属电极面的第二电介质电极面，面对配置结构的背面的金属结合面，联接器和第一电极面上的电连接，通过耦合面的气体管线系统和通过面形结构的孔的分布图案，并且其中所述面电介质构造由几个瓷砖形成。

10. 发明申请

US20060225777A1 SOLAR CELL MODULE AND METHOD OF ENCAPSULATING SAME 失效
标题翻译：太阳能电池模块及其封装方法
公开(公告)号：US20060225777A1
公开(公告)日：2006-10-12
申请号：US11279152
申请日：2006-04-10
申请人： Arthur Buechel
发明人： Arthur Buechel
IPC分类号： H02N6/00
CPC分类号： H01L31/049 , Y02E10/50
摘要： A composite solar collection module includes a thin film solar collection cell that is encapsulated between a transparent substrate, such as glass, on one side, and an electrically insulating film on the other. A metallic layer is disposed over the electrically insulating film to provide protection against diffusion of atmospheric species that may harm the thin film solar collection cell. The insulating and metallic layers are dimensioned so that a larger collection cell can be used to collect solar energy over a larger proportion of the available substrate surface area, without causing arcing between the cell edge and the metallic layer edge.
摘要翻译：复合太阳能收集模块包括薄膜太阳能收集单元，其被封装在一侧的透明基板（例如玻璃）和另一侧的电绝缘膜之间。金属层设置在电绝缘膜上，以提供防止可能损害薄膜太阳能收集单元的大气物种的扩散的保护。绝缘和金属层的尺寸被设计成使得可以使用较大的收集单元在较大比例的可用基底表面积上收集太阳能，而不会引起电池边缘和金属层边缘之间的电弧。

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