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1. 发明申请

US20110226739A1 PROCESS CHAMBER LINER WITH APERTURES FOR PARTICLE CONTAINMENT 审中-公开
标题翻译：具有颗粒容纳孔的过程室内衬
公开(公告)号：US20110226739A1
公开(公告)日：2011-09-22
申请号：US12727547
申请日：2010-03-19
申请人： Ernest E. Allen , Appu Naveen George Thomas
发明人： Ernest E. Allen , Appu Naveen George Thomas
IPC分类号： C23F1/08 , C23C16/00
CPC分类号： H01J37/32871 , H01J37/32412 , H01J37/3244 , H01J37/32477 , H01J37/32633 , H01J37/32834
摘要： An apparatus for use within a process chamber is provided. The apparatus includes a liner adapted to cover the sidewalls of the process chamber, with apertures corresponding to various inlets and outlets in the process chamber. In addition, the liner has one or more apertures on its bottom surface, which allow particles to pass through the liner. The liner is designed to be shorter in height than the sidewalls of the process chamber. This allows the liner to be placed within the chamber such that its bottom surface is above the floor of the process chamber. This minimizes the possibility of particles that have fallen onto the process chamber floor becoming re-suspended at a later time. According to a second aspect of the disclosure, a bottom liner is provided. This liner can be used in conjunction with a conventional liner or in a process chamber without a liner.
摘要翻译：提供了一种在处理室内使用的装置。该装置包括适于覆盖处理室的侧壁的衬垫，孔中对应于处理室中的各种入口和出口。此外，衬垫在其底表面上具有一个或多个孔，这允许颗粒通过衬垫。衬里的高度设计成比处理室的侧壁短。这使得衬垫能够被放置在腔室内，使得其底面位于处理腔室的地板之上。这样可以最大限度地减少掉落在处理室地板上的颗粒在稍后的时间内被重新悬挂的可能性。根据本公开的第二方面，提供一种底部衬套。该衬垫可以与常规衬垫结合使用，也可以在没有衬垫的工艺室中使用。

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