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    • 3. 发明授权
    • Thiophene derivatives with antisecretory activity
    • 具有抗分泌活性的噻吩衍生物
    • US4537968A
    • 1985-08-27
    • US564440
    • 1983-12-21
    • Anthony C. ScoteseRobert L. MorrisArthur A. SantilliDonald P. Strike
    • Anthony C. ScoteseRobert L. MorrisArthur A. SantilliDonald P. Strike
    • C07D333/38C07D333/42C07D417/12C07D413/12C07D333/36
    • C07D417/12C07D333/38C07D333/42
    • Compounds of the formula: ##STR1## wherein A is ##STR2## R is mono- or dihalo, amino, nitro, cyano, hydroxy, trifluoromethyl, mercapto, lower alkyl, lower alkoxy, alkanoyl, lower cycloalkyl, carboxy, alkoxycarbonyl, mono- or di-lower alkyl substituted amino, alkanoylamino, lower alkyl thio, loweralkyl-sulfonyl, sulfamoyl, lower alkyl substituted sulfamoyl, phenyl or phenyl substituted with halo, lower alkyl, lower alkoxy, trifluoromethyl, hydroxy, amino, cyano or nitro;X and Y are each, independently, hydrogen or ##STR3## wherein R.sup.1 is hydrogen or lower alkyl;R.sup.2 is hydrogen or lower alkyl; orR.sup.1 and R.sup.2 taken together form a heterocyclic moiety selected from 1-pyrrolidinyl, 1-piperidinyl, 1-hexahydroazepinyl, 1-octahydroazocinyl, 3-thiazolidinyl, 4-morpholinyl or 4-thiomorpholinyl, with the proviso that one of X and Y is always hydrogen;n is 1-4;and the pharmacologically acceptable salts thereof, which are intermediates in preparing H.sub.2 receptor antagonists and which also have antisecretory/antiulcer activity.
    • 硝基,氰基,羟基,三氟甲基,巯基,低级烷基,低级烷氧基,烷酰基,低级环烷基,羧基,烷氧基羰基,单 - 或二低级烷基取代的氨基,烷酰基氨基,低级烷基硫代,低级烷基 - 磺酰基,氨磺酰基,低级烷基取代的氨磺酰基,苯基或被卤素,低级烷基,低级烷氧基,三氟甲基,羟基,氨基,氰基或硝基取代的苯基。 X和Y各自独立地为氢或者其中R 1为氢或低级烷基; R2是氢或低级烷基; 或者R 1和R 2一起形成选自1-吡咯烷基,1-哌啶基,1-六氢氮杂基,1-八氢吖嗪基,3-噻唑烷基,4-吗啉基或4-硫代吗啉基的杂环部分,条件是X和Y之一为 总是氢; n为1-4; 和其药理学上可接受的盐,它们是制备H 2受体拮抗剂的中间体,并且也具有抗分泌/抗溃疡活性。