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1. 发明授权

US4595648A Radiation-sensitive plates formed using diazonium salts 失效
标题翻译：使用重氮盐形成的辐射敏感板
公开(公告)号：US4595648A
公开(公告)日：1986-06-17
申请号：US649486
申请日：1984-09-11
申请人： Michael Stanton , Allen P. Gates , Rodney M. Potts
发明人： Michael Stanton , Allen P. Gates , Rodney M. Potts
IPC分类号： G03F7/016 , G03C1/54
CPC分类号： G03F7/016
摘要： A radiation sensitive compound contains at least two groups having the structure ##STR1## in which Ar represents a divalent or other polyvalent radical derived from an aromatic or heteroaromatic compound; X and X' which may be the same or different, each represents O, S or an imino group, provided that at least one of X and X' is an imino group; Y represents O or S; R represents a single bond or a divalent or other polyvalent radical and A.sup.- is an anion. Radiation sensitive compositions comprising the compound and optionally a resin may be used to produce radiation sensitive plates for lithographic printing plate production.
摘要翻译：辐射敏感性化合物含有至少两个具有结构的基团，其中Ar表示衍生自芳族或杂芳族化合物的二价或其它多价基团; X和X'可以相同或不同，各自表示O，S或亚氨基，条件是X和X'中的至少一个是亚氨基; Y表示O或S; R表示单键或二价或其它多价基团，A-表示阴离子。可以使用包含该化合物和任选的树脂的辐射敏感组合物来生产用于平版印刷版生产的辐射敏感板。

2. 发明授权

US4263394A Aqueous alkaline soluble photopolymerizable material 失效
标题翻译：水性碱溶性光聚合材料
公开(公告)号：US4263394A
公开(公告)日：1981-04-21
申请号：US49272
申请日：1979-06-18
申请人： Allen P. Gates , Stephen C. Hinch , Christopher V. Withers
发明人： Allen P. Gates , Stephen C. Hinch , Christopher V. Withers
IPC分类号： C08F2/00 , C07C45/00 , C07C47/24 , C07C57/42 , C07C57/60 , C07C59/68 , C07C205/56 , C08F2/46 , C08F2/48 , C08F8/00 , C08F8/14 , C08F20/26 , C08F20/36 , C08F220/26 , C08F290/00 , C08F299/00 , G03F7/038 , G03C1/68
CPC分类号： G03F7/0388 , C07C205/44 , C07C205/56 , C07C255/00 , C07C45/00 , C07C47/24 , C07C57/42 , C07C59/68 , C08F20/26 , C08F20/36 , G03F7/038
摘要： A photopolymerizable material suitable for use in the production of lithographic printing plates comprises a polymer which includes a plurality of structural units represented by the Formula: ##STR1## in which R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents a hydrogen atom, an alkyl or substituted alkyl group, an aryl or substituted aryl group, or a heterocyclic or substituted heterocyclic group; R.sup.3, R.sup.4 and R.sup.5, which may be the same or different, each represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an aralkyl group, an aralkoxy group or an alkoxy carbonyl group; Z represents a hydroxyl group, or an ester group and a is an integer greater than or equal to 1. The polymer may be produced by reacting a polymer of 2,3-epoxy propyl acrylate or 2,3-epoxy propyl methacrylate with an acid of formula ##STR2##
摘要翻译：适用于平版印刷版生产的可光聚合材料包括聚合物，其包含多个由下式表示的结构单元：其中R 1表示氢原子或甲基; R 2表示氢原子，烷基或取代的烷基，芳基或取代的芳基，或杂环或取代的杂环基; R 3，R 4和R 5可以相同或不同，各自表示氢原子，卤素原子，氰基，烷基，芳基，烷氧基，芳氧基，芳烷基，芳烷氧基基团或烷氧基羰基; Z表示羟基或酯基，a是大于或等于1的整数。聚合物可以通过使丙烯酸2,3-环氧丙酯或甲基丙烯酸2,3-环氧丙酯与丙烯酸的聚合物与酸的公式

3. 发明授权

US5609980A Radiation-sensitive materials comprising a layer having core-shell particles and a second layer with a radiation sensitive component 失效
标题翻译：辐射敏感材料包括具有核 - 壳颗粒的层和具有辐射敏感组分的第二层
公开(公告)号：US5609980A
公开(公告)日：1997-03-11
申请号：US883019
申请日：1992-05-14
申请人： Andrew E. Matthews , David E. Murray , Allen P. Gates , John R. Wade , Michael J. Pratt , William A. King
发明人： Andrew E. Matthews , David E. Murray , Allen P. Gates , John R. Wade , Michael J. Pratt , William A. King
IPC分类号： G03F7/00 , G03F7/021 , G03F7/022 , G03F7/023 , G03F7/027 , G03F7/033 , G03F7/038 , G03F7/039 , G03C1/72 , G03F7/11
CPC分类号： G03F7/0233 , G03F7/021 , G03F7/0212 , G03F7/033 , Y10S430/111
摘要： A radiation sensitive material comprises particles including a water-insoluble heat-softenable core surrounded by a shell which is soluble or swellable in aqueous medium. The material also includes a radiation sensitive component which, on exposure to radiation, causes the solubility characteristics of the material to change. The material may be positive- or negative-working and may be coated onto a substrate from aqueous media to form a radiation sensitive plate which, after image-wise exposure, can be developed in aqueous media and then heated to cause the particles to coalesce and form a durable printing image.
摘要翻译：辐射敏感材料包括包含水溶性可热软化核的颗粒，其由在水性介质中可溶或可溶胀的壳包围。该材料还包括辐射敏感组分，其在暴露于辐射下导致材料的溶解度特性改变。该材料可以是正面或负面工作的，并且可以从水性介质涂覆到基材上以形成辐射敏感板，其在成像曝光之后可以在水性介质中显影，然后加热使颗粒聚结形成耐用的打印图像。

4. 发明授权

US4296194A Positive-working light sensitive diazo materials with azo dye 失效
标题翻译：正色工作的光敏重氮材料与偶氮染料
公开(公告)号：US4296194A
公开(公告)日：1981-10-20
申请号：US122190
申请日：1980-02-19
申请人： Terence Harper , Allen P. Gates
发明人： Terence Harper , Allen P. Gates
IPC分类号： G03F7/105 , G03C1/60 , G03C1/54
CPC分类号： G03F7/105
摘要： A positive working light-sensitive composition comprises in admixture (a) a first component which is an azo dye formed by reacting a p-amino-benzene diazonium salt and a compound including the grouping ##STR1## and (b) a second component which includes a o-quinone diazide and/or a diazonium compound and which, on exposure to light produces an acidic light decomposition product which is capable of reacting with the azo dye to produce a material having a color different to that of the azo dye. The composition exhibits a color change on exposure to light and is useful for the manufacture of light sensitive plates for use in lithographic printing plate production.
摘要翻译：正性工作的感光性组合物包含（a）第一组分，其是通过使对氨基苯重氮盐和包含分组的化合物（IMAGE）反应形成的偶氮染料和（b）第二组分，其包括一种邻醌二叠氮化物和/或重氮化合物，并且在暴露于光时产生酸性光分解产物，其能够与偶氮染料反应以产生具有与偶氮染料不同的颜色的材料。该组合物在曝光时显示出颜色变化，并且可用于制造用于平版印刷版生产的光敏板。

5. 发明授权

US06294298B1 Pigmented recording material having a backing coating for the production of offset printing plates 有权
标题翻译：具有用于生产胶版印刷版的背衬涂料的着色记录材料
公开(公告)号：US06294298B1
公开(公告)日：2001-09-25
申请号：US09504951
申请日：2000-02-16
申请人： Steffen Denzinger , Michael Doerr , Andreas Elsaesser , Guenther Hultzsch , Allen P. Gates , Roland Robinson
发明人： Steffen Denzinger , Michael Doerr , Andreas Elsaesser , Guenther Hultzsch , Allen P. Gates , Roland Robinson
IPC分类号： G03G1328
CPC分类号： B41C1/1016 , B41C2201/06 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , G03F7/092 , G03G5/10
摘要： The invention relates to a recording material for the production of an offset printing plate, having a substrate on whose front a photosensitive image layer is present and on whose back a layer of an organic polymeric material having a glass transition temperature Tg of 45° C. or more is present. The photosensitive image layer, or any top layer present thereon, has a pigment layer formed thereon.
摘要翻译：本发明涉及一种用于生产胶版印刷板的记录材料，其上具有基材，其前面存在感光图像层，在其背面上具有玻璃化转变温度Tg为45℃的有机聚合物材料层。或更多。光敏图像层或其上存在的任何顶层具有在其上形成的颜料层。

6. 发明授权

US5928833A Radiation-sensitive materials 失效
标题翻译：辐射敏感材料
公开(公告)号：US5928833A
公开(公告)日：1999-07-27
申请号：US742735
申请日：1996-11-01
申请人： Andrew E. Matthews , David E. Murray , Allen P. Gates , John R. Wade , Michael J. Pratt , William A. King
发明人： Andrew E. Matthews , David E. Murray , Allen P. Gates , John R. Wade , Michael J. Pratt , William A. King
IPC分类号： G03F7/00 , G03F7/021 , G03F7/022 , G03F7/023 , G03F7/027 , G03F7/033 , G03F7/038 , G03F7/039 , G03C1/72
CPC分类号： G03F7/0233 , G03F7/021 , G03F7/0212 , G03F7/033 , Y10S430/111
摘要： A radiation sensitive material comprises particles including a water-insoluble heat-softenable core surrounded by a shell which is soluble or swellable in aqueous medium. The material also includes a radiation sensitive component which, on exposure to radiation, causes the solubility characteristics of the material to change. The material may be positive- or negative-working and may be coated onto a substrate from aqueous media to form a radiation sensitive plate which, after image-wise exposure, can be developed in aqueous media and then heated to cause the particles to coalesce and form a durable printing image.
摘要翻译：辐射敏感材料包括包含水溶性可热软化核的颗粒，其由在水性介质中可溶或可溶胀的壳包围。该材料还包括辐射敏感组分，其在暴露于辐射下导致材料的溶解度特性改变。该材料可以是正面或负面工作的，并且可以从水性介质涂覆到基材上以形成辐射敏感板，其在成像曝光之后可以在水性介质中显影，然后加热使颗粒聚结形成耐用的打印图像。

7. 发明授权

US4565757A Photoconductive compositions sensitive to both laser light and tungsten halide light 失效
标题翻译：对激光和卤钨灯敏感的光导组合物
公开(公告)号：US4565757A
公开(公告)日：1986-01-21
申请号：US562696
申请日：1983-12-15
申请人： Anthony J. Chalk , Graham Charnock , Allen P. Gates , David E. Murray , Ian S. Smith
发明人： Anthony J. Chalk , Graham Charnock , Allen P. Gates , David E. Murray , Ian S. Smith
IPC分类号： C09B23/00 , G03G5/06 , G03G5/04
CPC分类号： G03G5/067
摘要： A photoconductive composition comprises a photoconductor and a sensitizer. The sensitizer has the formula ##STR1## wherein R represents alkyl; R1 represents H, alkyl or aryl; R2 represents the atoms required to complete a hetero or carboxyclic ring; A.sup.- represents an anion; and n represents the valency of the anion. The composition is sensitive to both laser light sources and tungsten light sources and is useful in electrophotographic reproduction.
摘要翻译：光导组合物包含光电导体和敏化剂。敏化剂具有式“IMAGE”，其中R表示烷基; R1表示H，烷基或芳基; R2表示完成杂环或羧环所需的原子; A-代表阴离子; 并且n表示阴离子的化合价。该组合物对激光光源和钨光源都敏感，并且可用于电子照相再现。

8. 发明授权

US4254244A Light-sensitive materials 失效
标题翻译：感光材料
公开(公告)号：US4254244A
公开(公告)日：1981-03-03
申请号：US866829
申请日：1978-01-04
申请人： Allen P. Gates , Allan Saunderson
发明人： Allen P. Gates , Allan Saunderson
IPC分类号： C08F8/36 , C08G85/00 , C08F261/02 , C08F261/04 , C08F283/10
CPC分类号： C08G85/004
摘要： A light sensitive material suitable for coating onto a support to produce a light sensitive plate for use in, for example, the manufacture of a printing plate comprises groups of the formula: ##STR1## attached to carbon atoms, wherein ##STR2## wherein R.sub.5 represents a hydrogen atom or an alkyl group; R is an aromatic radical; a is zero or unity; R.sub.1, R.sub.2 and R.sub.3 are hydrogen atoms, halogen atoms, cyano groups, or specified aliphatic or aromatic groups; X is a deactivating group; R.sub.4 is a hydrogen atom, a carboxyl group, a cyano group or a specified aliphatic or aromatic group; and Ph is a phenyl group. The material may be produced by reacting a polymer containing epoxide groups, hydroxyl groups, or primary and/or secondary amino groups with the halosulphonyl group of a compound having the forula: ##STR3## wherein R, R.sub.1, R.sub.2 R.sub.3, and a have the above meanings, wherein X has the above meaning or is a halosulphonyl group and R.sub.4 has the above mentioned meaning or, in the case where X is a deactivating group, is a halosulphonyl substituted group.
摘要翻译：适用于涂覆在支撑体上以产生用于例如印刷板的制造的光敏板的感光材料包括与碳原子连接的下列基团：其中或 >其中R5表示氢原子或烷基; R是芳族基团; a是零或统一; R1，R2和R3是氢原子，卤素原子，氰基或特定的脂族或芳族基团; X是失活组; R4是氢原子，羧基，氰基或规定的脂族或芳族基团; Ph为苯基。该材料可以通过使含有环氧基，羟基或伯和/或仲氨基的聚合物与具有所述基团的化合物的卤代磺酰基反应来制备：其中R，R 1，R 2，R 3和上述含义，其中X具有上述含义或为卤素磺酰基，且R4具有上述含义，或在X为失活基团的情况下为卤代磺酰基取代基。

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