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1. 发明授权

US06709561B1 Measurement of the concentration of a reducing agent in an electroless plating bath 有权
标题翻译：化学镀浴中还原剂浓度的测定
公开(公告)号：US06709561B1
公开(公告)日：2004-03-23
申请号：US10288989
申请日：2002-11-06
申请人： Michael Pavlov , Gene Chalyt , Peter Bratin , Alex Kogan , Michael James Perpich
发明人： Michael Pavlov , Gene Chalyt , Peter Bratin , Alex Kogan , Michael James Perpich
IPC分类号： C25D2112
CPC分类号： C23C18/1617 , G01N27/42
摘要： The concentration of a reducing agent in an electroless bath for plating a first metal is determined from the effect of the reducing agent on the electrodeposition rate of a second metal. For electroless cobalt and nickel baths, a sample of the electroless plating bath is added to an acid copper plating solution and the copper electrodeposition rate is measured by cyclic voltammetric stripping (CVS) analysis. Separate analyses for hypophosphite and dimethylamineborane in baths employing both reducing agents are attained via selective decomposition of the dimethylamineborane in acidic solution.
摘要翻译：用于电镀第一金属的无电镀浴中的还原剂的浓度由还原剂对第二金属的电沉积速率的影响决定。对于无电镀钴和镍浴，将化学镀浴的样品加入酸性镀铜溶液中，并通过循环伏安剥离（CVS）分析测量铜电沉积速率。通过在酸性溶液中选择性分解二甲胺硼烷可以获得使用两种还原剂的浴中次亚磷酸盐和二甲胺硼烷的独立分析。

2. 发明授权

US06572753B2 Method for analysis of three organic additives in an acid copper plating bath 有权
标题翻译：在酸性镀铜浴中分析三种有机添加剂的方法
公开(公告)号：US06572753B2
公开(公告)日：2003-06-03
申请号：US09968202
申请日：2001-10-01
申请人： Gene Chalyt , Peter Bratin , Michael Pavlov , Alex Kogan , Michael James Perpich
发明人： Gene Chalyt , Peter Bratin , Michael Pavlov , Alex Kogan , Michael James Perpich
IPC分类号： G01N2726
CPC分类号： C25D21/12 , C25D3/38
摘要： Acid copper electroplating baths used to form ultra-fine circuitry features on semiconductor chips contain suppressor, anti-suppressor and leveler additives that must be closely controlled in order to obtain acceptable copper deposits. Cyclic voltammetric stripping (CVS) methods are available to measure the concentrations of the suppressor and anti-suppressor based on the effects of these additives on the copper electrodeposition rate. The present invention is a method that also uses measurements of the copper electrodeposition rate to determine the concentration of the leveler additive. The other two additives are included in the measurement solution at concentrations determined to provide the optimum compromise between minimal interference, high sensitivity and good reproducibility for the leveler analysis. In this case, measurement precision is greatly improved compared to that provided by inclusion of the interfering additives in the measurement solution at their concentrations in the bath sample at the time of the analysis, which would be the standard analytical procedure.
摘要翻译：用于在半导体芯片上形成超细电路特征的酸性铜电镀浴包含必须严密控制的抑制剂，抗抑制剂和矫味剂添加剂，以获得可接受的铜沉积物。基于这些添加剂对铜电沉积速率的影响，循环伏安法（CVS）方法可用于测量抑制剂和抗抑制剂的浓度。本发明是还使用铜电沉积速率的测量来确定矫光添加剂的浓度的方法。其他两种添加剂被包括在测量溶液中，其浓度被确定为在矫正剂分析的最小干扰，高灵敏度和良好的再现性之间提供最佳折中。在这种情况下，与在分析时在浴样品中浓度测定溶液中包含干扰添加剂所提供的测量精度相比，测量精度大大提高，这将是标准分析程序。

3. 发明授权

US07856388B1 Financial reporting and auditing agent with net knowledge for extensible business reporting language 有权
标题翻译：具有可扩展业务报告语言知识的财务报告和审计代理
公开(公告)号：US07856388B1
公开(公告)日：2010-12-21
申请号：US10914619
申请日：2004-08-09
申请人： Rajendra P. Srivastava , Miklos Vasarhelyi , Alex Kogan
发明人： Rajendra P. Srivastava , Miklos Vasarhelyi , Alex Kogan
IPC分类号： G06Q40/00
CPC分类号： G06F17/30569 , G06Q40/00 , G06Q40/02 , G06Q40/06
摘要： A system and method utilizes intelligent agents for searching, analyzing, and reporting business, financial, or non-financial information available through communication networks, particularly the Internet, regardless of inconsistencies in formats and granularity of that information. This information may then be used by users for financial and non-financial information for business decisions, developing risk profiles and credit worthiness. The intelligent agent may search Internet resources for business information of companies upon a user's request. The intelligent agent parses the retrieved information consisted with series of texts and identifies tables containing various financial statements. Each extracted table may be parsed into line items and every line item may be identified by matching to the appropriate XBRL taxonomy. Finally, the intelligent agent tags the information using XBRL taxonomy and generates financial statements in XBRL. The intelligent agent may be utilized to search through the internet for financial and non-financial information for business decisions, developing risk profiles and credit worthiness.
摘要翻译：一种系统和方法利用智能代理来搜索，分析和报告通过通信网络，特别是因特网可用的业务，财务或非财务信息，而不管信息的格式和粒度不一致。然后，用户可以将这些信息用于财务和非财务信息的业务决策，开发风险简介和信用价值。智能代理可以根据用户的要求搜索公司的商业信息。智能代理解析检索到的信息，包括一系列文本，并识别包含各种财务报表的表。每个提取的表可以被解析成行项目，并且可以通过匹配适当的XBRL分类来识别每个行项目。最后，智能代理使用XBRL分类标记信息，并在XBRL中生成财务报表。智能代理可用于通过互联网搜索财务和非财务信息以进行业务决策，开发风险简介和信用价值。

4. 发明授权

US07186326B2 Efficient analysis of organic additives in an acid copper plating bath 失效
标题翻译：酸性镀铜浴中有机添加剂的有效分析
公开(公告)号：US07186326B2
公开(公告)日：2007-03-06
申请号：US10856619
申请日：2004-05-27
申请人： Eugene Shalyt , Michael Pavlov , Peter Bratin , Alex Kogan , Michael James Perpich
发明人： Eugene Shalyt , Michael Pavlov , Peter Bratin , Alex Kogan , Michael James Perpich
IPC分类号： C25D21/14 , G01N27/26
CPC分类号： C25D21/12 , C25D3/38 , G01N27/42
摘要： Suppressor and anti-suppressor additives in an acid copper sulfate plating bath are analyzed by the cyclic voltammetric stripping (CVS) method without cleaning or rinsing the cell between the two analyses. The suppressor analysis is performed first and the suppressor concentration in the resulting measurement solution is adjusted to a predetermined value corresponding to full suppression. This fully-suppressed solution is then used as the background electrolyte for the anti-suppressor analysis. This integrated analysis approach provides results comparable to those obtained with cell cleaning and rinsing between the analyses but significantly reduces the analysis time, consumption of expensive chemicals, and quantity of hazardous waste generated.
摘要翻译：酸性硫酸铜电镀浴中的抑制剂和抗抑制剂添加剂通过循环伏安法（CVS）方法进行分析，而不需要在两个分析之间进行清洁或冲洗。首先进行抑制分析，将所得测定溶液中的抑制浓度调整为对应于全抑制的规定值。然后将该完全抑制的溶液用作用于抗抑制剂分析的背景电解质。这种综合分析方法提供了与分析之间的细胞清洗和冲洗获得的结果相当的结果，但显着减少了分析时间，昂贵的化学品的消耗和产生的危险废物的数量。

5. 发明授权

US06733656B2 Voltammetric reference electrode calibration 有权
标题翻译：伏安参考电极校准
公开(公告)号：US06733656B2
公开(公告)日：2004-05-11
申请号：US10115539
申请日：2002-04-03
申请人： Gene Chalyt , Peter Bratin , Michael Pavlov , Alex Kogan , Michael James Perpich
发明人： Gene Chalyt , Peter Bratin , Michael Pavlov , Alex Kogan , Michael James Perpich
IPC分类号： G01N2748
CPC分类号： C25D21/12 , G01N27/4163
摘要： In the present invention, the test reference electrode used for voltammetric analysis of a plating bath is calibrated relative to the zero-current point between metal plating and stripping at a rotating platinum disk electrode in the plating bath supporting electrolyte. This calibration is readily performed during the normal course of cyclic voltammetric stripping (CVS) or cyclic pulse voltammetric stripping (CPVS) plating bath analysis the need for additional instrumentation or removal of the test reference electrode from the analysis equipment. Automatic calibration of the reference electrode enabled by the present invention, saves labor, time and expense, and minimizes errors in the plating bath analysis.
摘要翻译：在本发明中，用于电镀液伏安分析的试验参比电极相对于在电镀浴支持电解质中的旋转铂盘电极处的金属电镀和剥离之间的零电流点进行校准。在循环伏安剥离（CVS）或循环脉冲伏安剥离（CPVS）电镀浴分析的正常过程中，这种校准很容易进行，需要额外的仪器仪表或从分析设备中去除测试参比电极。通过本发明实现的参考电极的自动校准，节省人力，时间和成本，并最大限度地减少电镀浴分析中的误差。

6. 发明申请

US20050263399A1 Efficient analysis of organic additives in an acid copper plating bath 失效
标题翻译：酸性镀铜浴中有机添加剂的有效分析
公开(公告)号：US20050263399A1
公开(公告)日：2005-12-01
申请号：US10856619
申请日：2004-05-27
申请人： Eugene Shalyt , Michael Pavlov , Peter Bratin , Alex Kogan , Michael Perpich
发明人： Eugene Shalyt , Michael Pavlov , Peter Bratin , Alex Kogan , Michael Perpich
IPC分类号： C25D3/38 , C25D5/00 , C25D21/12 , G01N27/42
CPC分类号： C25D21/12 , C25D3/38 , G01N27/42
摘要： Suppressor and anti-suppressor additives in an acid copper sulfate plating bath are analyzed by the cyclic voltammetric stripping (CVS) method without cleaning or rinsing the cell between the two analyses. The suppressor analysis is performed first and the suppressor concentration in the resulting measurement solution is adjusted to a predetermined value corresponding to full suppression. This fully-suppressed solution is then used as the background electrolyte for the anti-suppressor analysis. This integrated analysis approach provides results comparable to those obtained with cell cleaning and rinsing between the analyses but significantly reduces the analysis time, consumption of expensive chemicals, and quantity of hazardous waste generated.
摘要翻译：酸性硫酸铜电镀浴中的抑制剂和抗抑制剂添加剂通过循环伏安法（CVS）方法进行分析，而不需要在两个分析之间进行清洁或冲洗。首先进行抑制分析，将所得测定溶液中的抑制浓度调整为对应于全抑制的规定值。然后将该完全抑制的溶液用作用于抗抑制剂分析的背景电解质。这种综合分析方法提供了与分析之间的细胞清洗和冲洗获得的结果相当的结果，但显着减少了分析时间，昂贵的化学品的消耗和产生的危险废物的数量。

7. 发明申请

US20070157178A1 Cross-module program restructuring 审中-公开
标题翻译：跨模块程序重组
公开(公告)号：US20070157178A1
公开(公告)日：2007-07-05
申请号：US11325655
申请日：2006-01-04
申请人： Alex Kogan , Yaakov Yaari
发明人： Alex Kogan , Yaakov Yaari
IPC分类号： G06F9/44
CPC分类号： G06F8/443
摘要： A computer-implemented method for code optimization includes collecting a profile of execution of an application program, which includes a target module, which calls one or more functions in a source module. The source and target modules may be independently-linked object files. Responsively to the profile, at least one function from the source module is identified and cloned to the target module, thereby generating an expanded target module. The expended target module is restructured so as to optimize the execution of the application program.
摘要翻译：一种用于代码优化的计算机实现的方法包括收集应用程序的执行简档，该应用程序包括调用源模块中的一个或多个功能的目标模块。源和目标模块可以是独立链接的目标文件。响应于简档，源模块中的至少一个功能被识别并克隆到目标模块，从而生成扩展的目标模块。重组目标模块，以优化应用程序的执行。

8. 发明授权

US06890758B2 Measurement of complexing agent concentration in an electroless plating bath 有权
标题翻译：化学镀浴中络合剂浓度的测定
公开(公告)号：US06890758B2
公开(公告)日：2005-05-10
申请号：US10461652
申请日：2003-06-13
申请人： Eugene Shalyt , Michael Pavlov , Peter Bratin , Alex Kogan , Michael James Perpich
发明人： Eugene Shalyt , Michael Pavlov , Peter Bratin , Alex Kogan , Michael James Perpich
IPC分类号： G01N27/26 , G01N31/16
CPC分类号： G01N31/164 , Y10T436/116664 , Y10T436/173845 , Y10T436/174614 , Y10T436/19 , Y10T436/193333 , Y10T436/200833
摘要： The concentration of citrate complexing agent in an electroless cobalt or nickel plating bath is determined by titrating a sample of the electroless plating bath containing a small concentration of free fluoride ion with a standard lanthanum nitrate solution. During the titration, La3+ ion first reacts preferentially with the citrate complexing agent and then with fluoride ion, which reduces the free fluoride ion concentration. The endpoint for the titration is indicated by a substantial decrease in the free fluoride ion concentration, which is detected via a fluoride ion specific electrode (ISE). The method can be used for analysis of other complexing agents.
摘要翻译：通过用标准的硝酸镧溶液滴定含有少量游离氟离子的化学镀液的样品来确定无电镀钴或镍电镀浴中柠檬酸盐络合剂的浓度。在滴定过程中，La 3+离子首先优先与柠檬酸盐络合剂反应，然后与氟离子反应，这降低了游离氟离子浓度。通过氟离子特异性电极（ISE）检测到的游离氟离子浓度的显着降低来表示滴定的终点。该方法可用于其他络合剂的分析。

9. 发明授权

US06749739B2 Detection of suppressor breakdown contaminants in a plating bath 有权
标题翻译：检测镀浴中的抑制分解污染物
公开(公告)号：US06749739B2
公开(公告)日：2004-06-15
申请号：US10266006
申请日：2002-10-07
申请人： Gene Chalyt , Peter Bratin , Michael Pavlov , Alex Kogan , Michael James Perpich
发明人： Gene Chalyt , Peter Bratin , Michael Pavlov , Alex Kogan , Michael James Perpich
IPC分类号： G01N2726
CPC分类号： G01N27/42 , C25D21/12
摘要： Relative concentrations of active suppressor additive species and suppressor breakdown contaminants in an acid copper electroplating bath are determined by cyclic voltammetric stripping (CVS) dilution titration analysis using two negative electrode potential limits. The analysis results for the more negative potential limit provide a measure of the suppressor additive concentration alone since the suppressor breakdowvn contaminants are not effective at suppressing the copper deposition rate at the more negative potentials. The analysis results for the less negative potential limit provide a measure of the combined concentrations of the suppressor additive and the suppressor breakdown contaminants. Comparison of the results for the two analyses yields a measure of the concentration of the suppressor breakdown contaminants relative to the suppressor additive concentration.
摘要翻译：通过使用两个负极电位极限的循环伏安法汽提（CVS）稀释滴定法测定酸性铜电镀浴中的活性抑制剂添加物种类和抑制分解污染物的相对浓度。由于抑制剂破坏污染物在抑制更多负电位下的铜沉积速率方面无效，所以对负电位极限的分析结果提供了单独的抑制添加剂浓度的量度。阴极电位极限的分析结果提供了抑制剂添加剂和抑制分解污染物的组合浓度的量度。两个分析结果的比较产生了抑制剂击穿污染物相对于抑制剂添加剂浓度的浓度的量度。

10. 发明授权

US06673226B1 Voltammetric measurement of halide ion concentration 失效
标题翻译：卤离子浓度的伏安测量
公开(公告)号：US06673226B1
公开(公告)日：2004-01-06
申请号：US10325334
申请日：2002-12-20
申请人： Alex Kogan , Eugene Shalyt , Peter Bratin , Michael Pavlov , Michael James Perpich
发明人： Alex Kogan , Eugene Shalyt , Peter Bratin , Michael Pavlov , Michael James Perpich
IPC分类号： G01N2726
CPC分类号： C25D21/12 , G01N27/42 , Y10T436/153333 , Y10T436/193333
摘要： The concentration of chloride ion in an acid copper electroplating bath is determined from the effect that chloride exerts on the copper electrodeposition rate in the presence of organic additives. A cyclic voltammetric stripping (CVS) rate parameter is measured, before and after standard addition of a plating bath sample, in an acid copper electrodeposition solution containing little or no chloride and at least one organic additive. Cross contamination and waste disposal issues associated with the reagents and reaction products involved in chloride titration analyses are avoided. The method may also be applied to analysis of other halides (bromide and iodide) and other solutions.
摘要翻译：酸性铜电镀浴中氯离子的浓度由氯化物在有机添加剂存在下对铜电沉积速率的影响决定。在电镀浴样品标准添加前后，在含有很少或不含氯化物和至少一种有机添加剂的酸性铜电沉积溶液中测量循环伏安法剥离（CVS）速率参数。避免与氯化物滴定分析中涉及的试剂和反应产物相关的交叉污染和废物处理问题。该方法也可以应用于其他卤化物（溴化物和碘化物）和其它溶液的分析。

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