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1. 发明授权

US5747180A Electrochemical synthesis of quasi-periodic quantum dot and nanostructure arrays 失效
标题翻译：准周期量子点和纳米结构阵列的电化学合成
公开(公告)号：US5747180A
公开(公告)日：1998-05-05
申请号：US760322
申请日：1996-12-05
申请人： Albert E. Miller , Supriyo Bandyopadhyay
发明人： Albert E. Miller , Supriyo Bandyopadhyay
IPC分类号： C25D11/02 , C25D11/18 , G11B5/84 , G11B5/855 , B32B3/10 , B32B3/26
CPC分类号： C25D1/006 , C25D11/045 , G11B5/8404 , G11B5/855 , B82Y10/00 , C25D11/02 , C25D11/18 , Y10S977/762 , Y10S977/774 , Y10S977/888 , Y10S977/892 , Y10S977/896 , Y10T428/12396 , Y10T428/12486 , Y10T428/12528 , Y10T428/1259
摘要： A method of fabricating two-dimensional regimented and quasi periodic arrays of metallic and semiconductor nanostructures (quantum dots) with diameters of .about.100 .ANG.(10 nm) includes the steps of polishing and anodizing a substrate to form a regimented quasi-periodic array of nanopits. The array forms a template for metallic or semiconductor material. The desired material is deposited in the nanopits by immersing the substrate in an appropriate solution and using the substrate as one cathode and inserting a second cathode in the solution.
摘要翻译：制造具有DIFFERENCE 100 ANGSTROM（10nm）直径的金属和半导体纳米结构（量子点）的二维调制和准周期阵列的方法包括以下步骤：抛光和阳极氧化基底以形成纳米晶体的调制的准周期阵列。阵列形成金属或半导体材料的模板。通过将衬底浸入合适的溶液中并将衬底用作一个阴极并将第二阴极插入溶液中，将期望的材料沉积在纳米孔中。

2. 发明授权

US06869671B1 Enabling nanostructured materials via multilayer thin film precursor and applications to biosensors 有权
标题翻译：通过多层薄膜前体和生物传感器应用纳米结构材料
公开(公告)号：US06869671B1
公开(公告)日：2005-03-22
申请号：US10449618
申请日：2003-06-02
申请人： Michael M. Crouse , Albert E. Miller , Juan Jiang , David T. Crouse , Subash C. Basu
发明人： Michael M. Crouse , Albert E. Miller , Juan Jiang , David T. Crouse , Subash C. Basu
IPC分类号： B32B3/00
CPC分类号： G01N27/30 , Y10S977/856 , Y10S977/888 , Y10T428/12528 , Y10T428/12611 , Y10T428/1266 , Y10T428/12667 , Y10T428/12674 , Y10T428/12736 , Y10T428/12743 , Y10T428/1275 , Y10T428/12764 , Y10T428/12806 , Y10T428/12861 , Y10T428/12875 , Y10T428/12889 , Y10T428/24917 , Y10T428/249953 , Y10T428/249956 , Y10T428/249967 , Y10T428/24997 , Y10T428/249977 , Y10T428/249978 , Y10T428/249979 , Y10T428/24998 , Y10T428/249982 , Y10T428/249985 , Y10T428/249987 , Y10T428/24999 , Y10T428/31678
摘要： A thin film based nanoporous alumina template has been developed which allows the in situ removal of an electrically insulating alumina barrier layer at the pore bases. This barrier free nanoporous system has great utility for electrodeposition of a wide variety of nanowire materials. An exemplary multilayer thin film precursor is provided comprising Al (anodization layer), Ti (diffusion barrier) and Pt (active electrode) on a Si substrate. Aluminum anodization in sulfuric acid with a subsequent applied voltage ramping program produces a Pt electrode at the base of the nanopores without the additional steps of alumina removal, barrier layer dissolution, and metal deposition onto the pore bottoms.
摘要翻译：已经开发了一种基于薄膜的纳米多孔氧化铝模板，其允许在孔底部原位去除电绝缘氧化铝阻挡层。这种无障碍纳米孔系统对于各种纳米线材料的电沉积具有很大的实用价值。在Si衬底上提供了包括Al（阳极氧化层），Ti（扩散阻挡）和Pt（有源电极）的示例性多层薄膜前体。硫酸中的阳极氧化阳极氧化随后的施加电压斜坡程序在纳米孔的底部产生Pt电极，而不需要额外的氧化铝去除步骤，阻挡层溶解和金属沉积到孔底部。

3. 发明授权

US06183547B2 Environmentally acceptable inhibitor formulations for metal surfaces 失效
标题翻译：用于金属表面的环境可接受的抑制剂配方
公开(公告)号：US06183547B2
公开(公告)日：2001-02-06
申请号：US09263712
申请日：1999-03-05
申请人： Albert E. Miller , Gautam Banerjee
发明人： Albert E. Miller , Gautam Banerjee
IPC分类号： C23C2205
CPC分类号： C23C22/50 , C23C22/24 , C23C22/48 , C25D11/246 , Y10T428/31678
摘要： A composition for inhibiting corrosion of metal surfaces comprises permanganate and a very low concentration of chromium (VI). The concentration of chromium (VI) in the aqueous solution is less than about 100 micrograms per liter, and the concentration of permanganate is about 0.2% to about 20% by weight of the aqueous solution. In another embodiment of the invention, a composition for inhibiting corrosion of metal surfaces includes permanganate and acetic acid. The concentration of acetic acid in the aqueous solution is between about 0.2% and 2.0% by volume. The concentration of permanganate is about 0.2% to about 20% by weight of the aqueous solution. Other embodiments of the invention include methods of using the present sealant compositions and the resulting corrosion inhibited metal substrates. In yet another embodiment of the present invention there is provided a kit for preparing corrosion inhibiting solutions for metal treatment.
摘要翻译：用于抑制金属表面腐蚀的组合物包括高锰酸盐和非常低浓度的铬（VI）。水溶液中铬（VI）的浓度低于约100微克/升，高锰酸盐的浓度为水溶液重量的约0.2％至约20％。在本发明的另一个实施方案中，用于抑制金属表面腐蚀的组合物包括高锰酸盐和乙酸。乙酸在水溶液中的浓度为约0.2％至2.0％（体积）。高锰酸盐的浓度为水溶液重量的约0.2％至约20％。本发明的其它实施方案包括使用本发明的密封剂组合物和所得的腐蚀抑制金属基材的方法。在本发明的另一个实施方案中，提供了一种用于制备用于金属处理的腐蚀抑制溶液的试剂盒。

4. 发明申请

US20090053561A1 CATALYST LAYERS AND RELATED METHODS 审中-公开
标题翻译：催化层和相关方法
公开(公告)号：US20090053561A1
公开(公告)日：2009-02-26
申请号：US11745833
申请日：2007-05-08
申请人： Juan Jiang , Albert E. Miller
发明人： Juan Jiang , Albert E. Miller
IPC分类号： B32B15/00 , B05D3/02 , B05D5/12 , H01M4/86 , B05D3/06
CPC分类号： H01M4/8825 , H01M4/8817 , H01M4/8878 , H01M4/8882 , H01M4/90 , H01M4/92 , H01M4/923 , H01M8/1011 , H01M2008/1095 , Y02E60/523 , Y10T428/12493 , Y10T428/31678
摘要： Disclosed is a method of preparing a catalyst and a resultant coated substrate. An example method for preparing a catalyst includes dissolving a precursor salt in water to create a dissolved precursor salt. In addition, the method includes adding an ultra-violet sensitizer to the dissolved precursor salt to create a photo emulsion and mixing the photo emulsion with at least one of a surfactant or a stabilizer to create a modified photo emulsion. Further, the modified photo emulsion is applied to a substrate to create a coated substrate, and then the coated substrate is exposed to ultra-violet light. Further, the example method comprises washing the coated substrate after exposing the coated substrate to ultra-violet light and drying the coated substrate after washing the coated substrate.
摘要翻译：公开了一种制备催化剂和所得涂覆基材的方法。制备催化剂的实例方法包括将前体盐溶解在水中以产生溶解的前体盐。此外，该方法包括向溶解的前体盐中加入紫外线敏化剂以产生光乳剂，并将光乳剂与表面活性剂或稳定剂中的至少一种混合以产生改性的光乳剂。此外，将改性的光乳剂施加到基底以产生涂覆的基底，然后将涂覆的基底暴露于紫外光。此外，该示例性方法包括在将涂覆的基底暴露于紫外线之后洗涤涂覆的基底，并且在洗涤涂覆的基底之后干燥涂覆的基底。

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