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    • 2. 发明申请
    • DEVICE AND APPARATUS FOR INFANT PLACEMENT
    • 用于婴儿放置的装置和装置
    • US20100235996A1
    • 2010-09-23
    • US12406377
    • 2009-03-18
    • ALAN KING
    • ALAN KING
    • A47D13/08
    • A47D15/008
    • The present invention relates to an infant placement device for preventing infant roll over that may include: an under support padding; at least two winged supporting portions extending from the support padding; and a means to secure an infant onto the support padding. The means to secure the infant may include two crossing straps, or alternatively two straps and a torso cover. The upper support padding may include a head support pillow and a bedding support, where said bedding support extends the entire length of the placement device. In one exemplary embodiment, the head support pillow may include a first side which is substantially flat and a second side which is substantially concaved. The bedding support may also include a first side which is substantially flat and a second side which is substantially concaved. In yet another exemplary embodiment, the head support pillow may include an audio system.
    • 本发明涉及一种用于防止婴儿翻身的婴儿安放装置,其可包括:下支撑垫; 至少两个从所述支撑衬垫延伸的翼状支撑部分; 以及将婴儿固定在支撑垫上的手段。 固定婴儿的方法可能包括两条交叉条带,或者两条带和一个躯干罩。 上支撑衬垫可以包括头部支撑枕头和床垫支撑件,其中所述床垫支撑件延伸放置装置的整个长度。 在一个示例性实施例中,头部支撑枕头可以包括基本上平坦的第一侧面和基本上凹陷的第二侧面。 床上用品支撑件还可以包括基本上平坦的第一侧和基本上是凹的第二侧。 在另一个示例性实施例中,头部支撑枕头可以包括音频系统。
    • 4. 发明申请
    • Enclosed Needle Device with Duckbill Release Mechanism
    • 带鸭嘴释放机构的封闭针装置
    • US20070191776A1
    • 2007-08-16
    • US11276152
    • 2006-02-16
    • Dennis BialeckiNhut DiepAlan KingThomas Koehler
    • Dennis BialeckiNhut DiepAlan KingThomas Koehler
    • A61M5/178
    • A61M25/0631A61M5/3271A61M25/0606A61M2005/3247
    • An enclosed needle catheter insertion device (10) includes a catheter (12) and a needle insertion device (14) which are held together by cooperating arms (52, 53) with one or more detents (56) cooperating with a radially projecting surface (26) of the catheter hub (16). Insertion device (14) includes a guard housing (30) to enclose a needle (34) in a shielded position and a support housing (32) supporting the needle (34) for movement between a ready position, with the tip (36) of the needle (34) exposed, to the shielded position. Cooperating lock elements (47, 78) are provided for the housings (30, 32) which are positioned to define a lock actuation stage between the ready and shielded positions, whereat the needle is still within a passageway (54) defined by the cooperating arms (52, 53).
    • 封闭的针导管插入装置(10)包括导管(12)和针插入装置(14),它们通过配合的臂(52,53)与一个或多个与径向突出的表面配合的棘爪(56) 26)。 插入装置(14)包括用于将针(34)封闭在屏蔽位置的保护壳体(30)和支撑针(34)的支撑壳体(32),用于在就绪位置与准备位置之间移动,该就绪位置与尖端 针(34)暴露于屏蔽位置。 为壳体(30,32)设置合作的锁定元件(47,78),所述壳体(30,32)被定位成在准备位置和屏蔽位置之间限定锁定致动台,其中针仍在由协作臂限定的通道(54)内 (52,53)。
    • 6. 发明申请
    • Method of treating biological materials with translating electrical fields and electrode polarity reversal
    • 用转换电场和电极极性反转处理生物材料的方法
    • US20060089674A1
    • 2006-04-27
    • US10510710
    • 2003-04-11
    • Richard WaltersAlan KingKatherine DeBruin
    • Richard WaltersAlan KingKatherine DeBruin
    • A61N1/32
    • A61N1/0412A61N1/0476A61N1/306A61N1/325A61N1/327
    • A method and apparatus are provided for treating biological cellular material with a treating agent using pulsed electrical fields provided by a waveform generator (12). The treatment method includes obtaining an electrode assembly which includes three or more parallel rows of individual electrodes (19). The electrode assembly is applied to a treatment area. Electrically conductive pathways are established between the electrodes (19) and the waveform generator (12) through an array switch (14). Successive electric fields are applied to the treatment area in the form of successive electric field waveforms from the waveform generator (12), through the array switch (14), to adjacent rows of electrodes (19), wherein each successive electric field has the same direction, and wherein polarities of rows of electrodes are reversed successively during the applying of the successive electric fields between adjacent successive rows of electrodes to the treatment area. As a result, the biological cellular material in the treatment area is treated with the treating agent unidirectionally with uniform electric fields with a minimization of the formation of deleterious electrochemistry products at the electrodes.
    • 提供了一种使用由波形发生器(12)提供的脉冲电场用处理剂处理生物细胞材料的方法和装置。 处理方法包括获得包括三个或更多个平行的单独电极行(19)的电极组件。 将电极组件施加到治疗区域。 通过阵列开关(14)在电极(19)和波形发生器(12)之间建立导电通路。 连续的电场以波形发生器(12),阵列开关(14)的相继电场(19)的连续电场波形的形式施加到处理区域,其中每个连续的电场具有相同的电场 方向,并且其中电极行的极性在将相邻连续的电极行之间的连续电场施加到治疗区域期间相继反转。 结果,处理区域中的生物细胞材料用均匀的电场单向地用处理剂处理,同时在电极处形成有害的电化学产物。
    • 8. 发明授权
    • Process for fabricating bipolar and BiCMOS devices
    • 制造双极和BiCMOS器件的工艺
    • US06121101A
    • 2000-09-19
    • US42388
    • 1998-03-12
    • Clifford Alan KingKwok K. Ng
    • Clifford Alan KingKwok K. Ng
    • H01L21/331H01L21/8222H01L21/8248H01L21/8249H01L27/06H01L29/732
    • H01L21/8249
    • A process for device fabrication in which amorphous silicon is deposited into a narrow gap is disclosed. The gap is an opening between two layers of material. The gap results when a window is formed in one of the two layers and a portion of a third layer at the base of the window is removed. In the formation of a bipolar device, a layer of oxide is formed on a silicon substrate and a layer of silicon is formed on the oxide layer which serves as the extrinsic base for the device. In the bipolar device, a window is formed in the polysilicon and the oxide layer at the base of the window is then removed. In the bipolar device, the silicon substrate underlies the gap and the extrinsic base silicon overlies the gap. When the oxide is removed from the base of the window, a portion of the oxide layer underlying the extrinsic base silicon is removed as well, thereby forming a gap between the extrinsic base silicon and the underlying silicon substrate. In the process of the present invention, the resulting gap has a proximate end which is the opening of the gap into a window and a distal end which is the interface between the gap and the remaining oxide. The width of the gap is less than about 20 nm. The gap is then subjected to conditions that cause the gap to have a first height at its proximate end which is greater than its height at its distal end. The tapered gap is then filled with polysilicon. Because of its tapered configuration, the polysilicon uniformly fills the gap, without significant voids therein.
    • 公开了一种其中非晶硅沉积到窄间隙中的器件制造工艺。 间隙是两层材料之间的开口。 当窗口形成在两个层中的一个层中并且在窗口的基部处的第三层的一部分被去除时,产生间隙。 在双极器件的形成中,在硅衬底上形成氧化物层,并且在作为器件的外在基极的氧化物层上形成硅层。 在双极器件中,在多晶硅中形成窗口,然后去除窗口底部的氧化物层。 在双极器件中,硅衬底位于间隙之下,而外部基极硅覆盖在间隙上。 当从窗口的底部去除氧化物时,除去外部基底硅下面的一部分氧化物层,从而在外部基极硅和下面的硅衬底之间形成间隙。 在本发明的方法中,所得到的间隙具有近端,该近端是间隙进入窗口的开口,而远端是间隙和剩余氧化物之间的界面。 间隙的宽度小于约20nm。 然后使间隙受到使其间隙在其近端具有大于其远端高度的第一高度的条件。 然后用多晶硅填充锥形间隙。 由于其锥形构造,多晶硅均匀地填充间隙,其中没有显着的空隙。