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1. 发明授权

US5002011A Vapor deposition apparatus 失效
标题翻译：蒸镀装置
公开(公告)号：US5002011A
公开(公告)日：1991-03-26
申请号：US181091
申请日：1988-04-13
申请人： Toshimitsu Ohmine , Keiichi Akagawa , Akira Ishihata
发明人： Toshimitsu Ohmine , Keiichi Akagawa , Akira Ishihata
IPC分类号： C23C16/458
CPC分类号： C23C16/4588
摘要： A vapor deposition apparatus for forming thin films on substrates with reactive gases, by rotating and revolving the substrates while heating the substrates in a reactor vessel, comprises a hollow susceptor carrier rotatably disposed inside the reactor vessel, susceptors rotatably disposed on the susceptor carrier to hold the substrates respectively, a driving motor for rotating the susceptor carrier such that the substrates held by the susceptors are revolved with respect to the reactor vessel, and a converting mechanism for converting a rotating motion of the susceptor carrier rotated by the driving motor into a motion for rotating the susceptors together with the substrates around themselves. The converting mechanism is disposed within the hollow of the susceptor carrier.
摘要翻译：一种用于在具有反应气体的基板上形成薄膜的气相沉积设备，通过在反应器容器中加热基板的同时旋转和旋转基板，包括可旋转地设置在反应器容器内的中空基座托架，可旋转地设置在基座托架上的托架所述基板分别用于使所述基座托架旋转使得由所述基座保持的基板相对于所述反应堆容器旋转的驱动马达;以及用于将由所述驱动马达旋转的所述基座托架的旋转运动转换成运动的转换机构用于使基座与其周围的基板一起旋转。转换机构设置在基座托架的中空部内。

2. 发明授权

US5151133A Vapor deposition apparatus 失效
标题翻译：蒸镀装置
公开(公告)号：US5151133A
公开(公告)日：1992-09-29
申请号：US639182
申请日：1991-01-09
申请人： Toshimitsu Ohmine , Keiichi Akagawa , Akira Ishihata
发明人： Toshimitsu Ohmine , Keiichi Akagawa , Akira Ishihata
IPC分类号： C23C16/458
CPC分类号： C23C16/4588
摘要： A vapor deposition apparatus for forming thin films on substrates with reactive gases, by rotating and revolving the substrates while heating the substrates in a reactor vessel, comprises a hollow susceptor carrier rotatably disposed inside the reactor vessel, susceptors rotatably disposed on the susceptor carrier to hold the substrates respectively, a driving motor for rotating the susceptor carrier such that the substrates held by the susceptors are revolved with respect to the reactor vessel, and a converting mechanism for converting a rotation motion of the susceptor carrier rotated by the driving motor into a motion for rotating the susceptors together with the substrates around themselves. The converting mechanism is disposed within the hollow of the susceptor carrier.
摘要翻译：一种用于在具有反应气体的基板上形成薄膜的气相沉积设备，通过在反应器容器中加热基板的同时旋转和旋转基板，包括可旋转地设置在反应器容器内的中空基座托架，可旋转地设置在基座托架上的托架所述基板分别用于使所述基座托架旋转使得由所述基座保持的基板相对于所述反应堆容器旋转的驱动马达和用于将由所述驱动马达旋转的所述基座托架的旋转运动转换为运动的转换机构用于使基座与其周围的基板一起旋转。转换机构设置在基座托架的中空部内。

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