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    • 2. 发明授权
    • Apparatus for measuring a set of electrical characteristics in a plasma
    • 用于测量等离子体中的一组电特性的装置
    • US07319316B2
    • 2008-01-15
    • US11172014
    • 2005-06-29
    • Christopher KimballEric HudsonDouglas KeilAlexei Marakhtanov
    • Christopher KimballEric HudsonDouglas KeilAlexei Marakhtanov
    • C02F1/00
    • H01J37/32431H01J37/32935H05H1/0081Y10T29/49002
    • A probe apparatus configured to measure a set of electrical characteristics in a plasma processing chamber, the plasma processing chamber including a set of plasma chamber surfaces configured to be exposed to a plasma is disclosed. The probe apparatus includes a collection disk structure configured to be exposed to the plasma, whereby the collection disk structure is coplanar with at least one of the set of plasma chamber surfaces. The probe apparatus also includes a conductive path configured to transmit the set of electrical characteristics from the collection disk structure to a set of transducers, wherein the set of electrical characteristics is generated by an ion flux of the plasma. The probe apparatus further includes an insulation barrier configured to substantially electrically separate the collection disk and the conductive path from the set of plasma chamber surfaces.
    • 公开了一种被配置为测量等离子体处理室中的一组电特性的探针装置,所述等离子体处理室包括被配置为暴露于等离子体的一组等离子体室表面。 探针装置包括构造成暴露于等离子体的收集盘结构,由此收集盘结构与等离子体腔表面中的至少一个共面。 探针装置还包括导电路径,该导电路径被配置为将该组特征从收集盘结构发送到一组换能器,其中该组电特性由等离子体的离子通量产生。 探针装置还包括绝缘屏障,其被配置为基本上将采集盘和导电路径与该组等离子体腔表面电分离。
    • 5. 发明授权
    • Methods and apparatus for tuning a set of plasma processing steps
    • 调整一组等离子体处理步骤的方法和装置
    • US07138067B2
    • 2006-11-21
    • US10951552
    • 2004-09-27
    • Vahid VahediJohn DaughertyHarmeet SinghAnthony Chen
    • Vahid VahediJohn DaughertyHarmeet SinghAnthony Chen
    • B44C1/22H01L21/00
    • C03C15/00C03C23/006H01J37/32623H01J37/32642H01L21/32136
    • In a plasma processing system, a method of tuning of a set of plasma processing steps is disclosed. The method includes striking a first plasma comprising neutrals and ions in a plasma reactor of the plasma processing system. The method also includes etching in a first etching step a set of layers on a substrate; positioning a movable uniformity ring around the substrate, wherein a bottom surface of the uniformity ring is about the same height as a top surface of the substrate; and striking a second plasma consisting essentially of neutrals in the plasma reactor of the plasma processing system. The method further includes etching in a second etching step the set of layers on the substrate; and wherein the etching in the first step and the etching in the second step are substantially uniform.
    • 在等离子体处理系统中,公开了一组等离子体处理步骤的调谐方法。 该方法包括在等离子体处理系统的等离子体反应器中击打包含中性粒子和离子的第一等离子体。 该方法还包括在第一蚀刻步骤中蚀刻在衬底上的一组层; 将可移动均匀环定位在基底周围,其中均匀环的底表面与基底的顶表面大致相同的高度; 并且在等离子体处理系统的等离子体反应器中击打基本上由中性体组成的第二等离子体。 该方法还包括在第二蚀刻步骤中蚀刻衬底上的这组层; 并且其中第一步骤中的蚀刻和第二步骤中的蚀刻基本上是均匀的。
    • 6. 发明授权
    • Interface circuits for modularized data optimization engines and methods therefor
    • 用于模块化数据优化引擎的接口电路及其方法
    • US07020160B1
    • 2006-03-28
    • US10026679
    • 2001-12-17
    • Isaac Achler
    • Isaac Achler
    • H04J3/22
    • H04J3/0602H03M7/30H03M7/3088
    • A data optimization engine for optimizing selected frames of a first stream of data. The data optimization engine includes a transmit interface circuit coupled to an optimization processor, the transmit interface circuit being configured for receiving the first stream of data. The transmit interface circuit includes a traffic controller circuit for separating frames in the first stream of data into a first optimizable frame and a first non-optimizable frame, and an optimization front-end circuit coupled to the traffic controller circuit to receive at least a first portion of the first optimizable frame. The optimization front-end circuit includes a protocol conversion circuit configured to convert data in the first portion of the first optimizable frame from a first protocol to a second protocol suitable for processing by the optimization processor, the first protocol specifies a first word length, the second protocol specifies a second word length different from the first word length. The optimization front-end circuit further includes an end-of-optimization-file processing circuit, the end-of-optimization-file processing circuit flagging an end of the first portion of the first optimizable frame to the optimization processor, wherein the optimization processor is configured to optimize the first portion of the first optimizable frame by performing at least one of compression and encryption on the first portion of the first optimizable frame.
    • 一种用于优化第一数据流的所选帧的数据优化引擎。 数据优化引擎包括耦合到优化处理器的发射接口电路,所述发射接口电路被配置用于接收第一数据流。 发射接口电路包括用于将第一数据流中的帧分离为第一可优化帧和第一不可优化帧的业务控制器电路,以及耦合到业务控制器电路的优化前端电路,以接收至少第一 第一个可优化框架的一部分。 优化前端电路包括协议转换电路,其被配置为将第一可优化帧的第一部分中的数据从第一协议转换成适于由优化处理器处理的第二协议,第一协议指定第一字长, 第二协议规定与第一字长不同的第二字长度。 优化前端电路还包括最终优化文件处理电路,最终优化文件处理电路将第一可优化帧的第一部分的一端标记到优化处理器,其中优化处理器 被配置为通过在第一可优化帧的第一部分上执行压缩和加密中的至少一个来优化第一可优化帧的第一部分。
    • 7. 发明授权
    • Systems and methods for high speed data transmission using TCP/IP
    • 使用TCP / IP进行高速数据传输的系统和方法
    • US06981014B2
    • 2005-12-27
    • US10233302
    • 2002-08-30
    • Ramkumar JayamAnil KapatkarSivakumar MunnangiSrinivasan Venkataraman
    • Ramkumar JayamAnil KapatkarSivakumar MunnangiSrinivasan Venkataraman
    • H04L1/18H04L12/56H04L29/06H04L29/08G06F13/00
    • H04L67/06H04L1/1832H04L1/1841H04L1/187H04L1/1883H04L29/06H04L47/10H04L47/193H04L69/10H04L69/16H04L69/161H04L69/163H04L69/166H04L69/22H04L69/24H04L69/329
    • A method for exchanging data in a first host computer coupled to a network. The network is also coupled to a second host computer. The method includes employing a first Transmit Control Block (Tx TCB) to facilitate transmitting first data associated with a bi-directional data flow from the first host computer to the second host computer. The first data is transmitted using the TCP protocol. The first Tx TCB is associated with the first host computer and is configured for storing transmit-facilitating parameters associated with the transmitting the first data using the TCP protocol. The method also includes employing a first Receive Control Block (Rx TCB) to facilitate receiving second data associated with the bi-directional data flow. The second data is transmitted from the second host computer to the first host computer using the TCP protocol. The first Rx TCB is associated with the first host computer and is configured for storing receive-facilitating parameters associated with the receiving the second data using the TCP protocol. In accordance with this embodiment of the invention, the first Tx TCB and the first Rx TCB are employed to simultaneously service a transmit request pertaining the first data and a receive request pertaining the second data.
    • 一种用于在耦合到网络的第一主计算机中交换数据的方法。 网络还耦合到第二主计算机。 该方法包括采用第一传输控制块(Tx TCB)来促进将与双向数据流相关联的第一数据从第一主计算机发送到第二主计算机。 第一个数据使用TCP协议传输。 第一Tx TCB与第一主计算机相关联,并被配置为存储与使用TCP协议发送第一数据相关联的发送便利参数。 该方法还包括采用第一接收控制块(Rx TCB)以便于接收与双向数据流相关联的第二数据。 使用TCP协议将第二数据从第二主计算机发送到第一主计算机。 第一Rx TCB与第一主计算机相关联,并且被配置为存储与使用TCP协议接收第二数据相关联的接收促进参数。 根据本发明的该实施例,采用第一Tx TCB和第一Rx TCB来同时服务关于第一数据的发送请求和与第二数据有关的接收请求。
    • 10. 发明授权
    • Methods and apparatus for in situ substrate temperature monitoring
    • 用于原位底物温度监测的方法和装置
    • US06976782B1
    • 2005-12-20
    • US10720839
    • 2003-11-24
    • Robert J. Steger
    • Robert J. Steger
    • G01J5/00G01K15/00H01L20060101
    • G01J5/0003G01J5/0007
    • In a plasma processing system, a method of determining the temperature of a substrate is disclosed. The method includes positioning the substrate on a substrate support structure, wherein the substrate support structure includes a chuck. The method further includes creating a temperature calibration curve for the substrate, the temperature calibration curve being created by measuring at least a first substrate temperature with an electromagnetic measuring device, and measuring a first chuck temperature with a physical measuring device during a first isothermal state. The method also includes employing a measurement from the electromagnetic measurement device and the temperature calibration curve to determine a temperature of the substrate during plasma processing.
    • 在等离子体处理系统中,公开了一种确定衬底温度的方法。 该方法包括将衬底定位在衬底支撑结构上,其中衬底支撑结构包括卡盘。 该方法进一步包括为衬底创建温度校准曲线,通过用电磁测量装置测量至少第一衬底温度并在第一等温状态下用物理测量装置测量第一夹具温度来产生温度校准曲线。 该方法还包括采用来自电磁测量装置和温度校准曲线的测量来确定等离子体处理期间的衬底的温度。