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1. 发明授权

US6125551A Gas seal and support for rotating semiconductor processor 失效
标题翻译：气密封和支撑旋转半导体处理器
公开(公告)号：US6125551A
公开(公告)日：2000-10-03
申请号：US40176
申请日：1998-03-17
申请人： James R. C. Bushong , Mario S. Manriquez
发明人： James R. C. Bushong , Mario S. Manriquez
IPC分类号： H01L21/00 , F26B5/08
CPC分类号： H01L21/67017
摘要： A rotating wafer processor uses a non-contacting gas seal mounted to a process chamber and a vibration isolation mount between the chamber and a support structure. The non-contacting seal incorporates a housing with a chamfer on opposing ends of an annular land encircling a rotating drive shaft, and one or more outlet ports on the chamfers to form a gas-purged, noncontacting seal. The seal is directly mounted to the chamber and interposed between the chamber and bearings that support the drive shaft, so the shaft, chamber and rotating load vibrate together.
摘要翻译：旋转的晶片处理器使用安装到处理室的非接触气体密封件和在腔室和支撑结构之间的隔振安装件。非接触式密封件包括在包围旋转驱动轴的环形区域的相对端部上的倒角的壳体和倒角上的一个或多个出口端口，以形成气体吹扫的非接触式密封件。密封件直接安装在腔室中，并插在腔室和支撑驱动轴的轴承之间，因此轴，腔室和旋转负载一起振动。

2. 发明授权

US5037481A Megasonic cleaning method 失效
标题翻译：超声波清洗方式
公开(公告)号：US5037481A
公开(公告)日：1991-08-06
申请号：US482086
申请日：1990-02-15
申请人： Mario E. Bran
发明人： Mario E. Bran
IPC分类号： B06B1/06 , B06B3/00 , B08B3/12
CPC分类号： B06B3/00 , B06B1/0607 , B08B3/12
摘要： A transducer array for use in a megasonic cleaning system including a transmitter element made of a material which will efficiently transmit megasonic energy when bonded to one conductive surface of a transducer. In one form, the transmitter and the transducer are flat plates. In another form, a flat transducer is bonded to a solid semi-cylindrical transmitter which causes the megasonic energy pattern to diverge. In another form, the transmitter is a semi-cylindrical shell or is tubular, and the transducer is bonded to and curved to conform to the transmitter. The transducer extends about 120.degree., and produces a straight line of sight diverging energy pattern.
摘要翻译：一种用于兆声波清洁系统的换能器阵列，包括由材料制成的发射器元件，当与换能器的一个导电表面接合时，能够有效地传输兆声波能量。在一种形式中，发射器和换能器是平板。在另一种形式中，平坦换能器被结合到实心的半圆柱形发射器，这导致兆声波能量模式发散。在另一种形式中，变送器是半圆柱形壳体或管状的，并且换能器被接合并弯曲以符合变送器。传感器延伸约120°，产生直线视线发散能量图。

3. 发明授权

US5286657A Single wafer megasonic semiconductor wafer processing system 失效
标题翻译：单晶片超声波半导体晶圆处理系统
公开(公告)号：US5286657A
公开(公告)日：1994-02-15
申请号：US809799
申请日：1991-12-18
申请人： Mario E. Bran
发明人： Mario E. Bran
IPC分类号： B08B3/12 , H01L21/00 , H01L21/304 , H01L21/302
CPC分类号： H01L21/67057 , B08B3/12 , H01L21/67051 , Y10S134/902 , Y10S438/906
摘要： A semiconductor wafer processing system utilizing a specially constructed wet processing chamber for a single wafer and a megasonic, or high frequency, energy dispensing system. The construction of the container causes megasonic energy to become intensified near the surface of the wafer, thereby providing more cleaning power, and resulting cleaning. The megasonic device may be mounted on a bottom wall dump valve. Also, the energy output may be used to rotate a wafer.
摘要翻译：一种半导体晶片处理系统，其利用专门构造的用于单晶片和兆声波或高频能量分配系统的湿式处理室。容器的结构使得在晶片表面附近的兆声波能量增强，从而提供更多的清洁能力和最终的清洁。兆声道装置可以安装在底壁倾倒阀上。此外，可以使用能量输出来旋转晶片。

4. 发明授权

US4998549A Megasonic cleaning apparatus 失效
标题翻译：超声波清洗设备
公开(公告)号：US4998549A
公开(公告)日：1991-03-12
申请号：US272501
申请日：1988-11-16
申请人： Mario E. Bran
发明人： Mario E. Bran
IPC分类号： B06B1/06 , B06B3/00 , B08B3/12
CPC分类号： B08B3/12 , B06B1/0607 , B06B3/00
摘要： A transducer array for use in a megansonic cleaning system including a transmitter element made of a material which will efficiently transmit megasonic energy when bonded to one conductive surface of a transducer. In one form, the transmitter and the transducer are flat plates. In another form, a flat transducer is bonded to a solid semi-cylindrical transmitter which causes the megasonic energy pattern to diverge. In another form, the transmitter is a semi-cylindrical shell or is tubular, and the transducer is bonded to and curved to conform to the transmitter. The transducer extends about 120.degree., and produces a straight line of sight diverging energy pattern.
摘要翻译：一种用于超音速清洁系统的换能器阵列，包括由材料制成的发射器元件，当与换能器的一个导电表面接合时，能够有效地传输兆声波能量。在一种形式中，发射器和换能器是平板。在另一种形式中，平坦换能器被结合到实心的半圆柱形发射器，这导致兆声波能量模式发散。在另一种形式中，变送器是半圆柱形壳体或管状的，并且换能器被接合并弯曲以符合变送器。传感器延伸约120°，产生直线视线发散能量图。

5. 发明授权

US4804007A Cleaning apparatus 失效
标题翻译：清洁装置
公开(公告)号：US4804007A
公开(公告)日：1989-02-14
申请号：US43852
申请日：1987-04-29
申请人： Mario E. Bran
发明人： Mario E. Bran
IPC分类号： B06B1/06 , B06B3/00 , B08B3/12 , B08B3/10
CPC分类号： B06B3/00 , B06B1/0607 , B08B3/12 , Y10S134/902
摘要： A transducer array for use in a megasonic cleaning system comprising a flat plate made of quartz or sapphire or boron nitride and a transducer having a conductive flat surface bonded to the flat plate and a conductive surface spaced from the flat plate.
摘要翻译：一种用于兆声波清洁系统的换能器阵列，包括由石英或蓝宝石或氮化硼制成的平板和具有结合到平板的导电平坦表面的换能器以及与平板间隔开的导电表面。

6. 发明授权

US6122837A Centrifugal wafer processor and method 失效
标题翻译：离心晶圆处理器及方法
公开(公告)号：US6122837A
公开(公告)日：2000-09-26
申请号：US103930
申请日：1998-06-24
申请人： Michael B. Olesen , Mario E. Bran
发明人： Michael B. Olesen , Mario E. Bran
IPC分类号： H01L21/00 , F26B5/08
CPC分类号： H01L21/67028
摘要： A dryer for processing semiconductor substrates which rotates a carrier containing the substrates within a housing in combination with a bubbler which heats and directs a gas containing a water tension reducing vapor to the housing to contact the substrates and thereby hasten drying, decrease water marking, and decrease contamination.
摘要翻译：一种用于处理半导体衬底的干燥器，其将包含基底的载体旋转在壳体内，与起泡器组合，起泡器将含有减压蒸汽的气体加热并引导到壳体以接触基底，从而加速干燥，减少水分，以及减少污染

7. 发明授权

US5950645A Semiconductor wafer cleaning system 失效
标题翻译：半导体晶圆清洗系统
公开(公告)号：US5950645A
公开(公告)日：1999-09-14
申请号：US910033
申请日：1997-08-11
申请人： Michael B. Olesen , Mario E. Bran
发明人： Michael B. Olesen , Mario E. Bran
IPC分类号： B08B3/12 , C11D3/39 , C11D7/06 , C11D7/08 , C11D11/00 , H01L21/00 , H01L21/306 , B08B3/10
CPC分类号： H01L21/02052 , B08B3/12 , C11D11/0047 , C11D11/007 , C11D3/3947 , C11D7/06 , C11D7/08 , H01L21/67051 , H01L21/67057 , Y10S134/902
摘要： Semiconductor wafers are positioned in a cleaning tank and subjected to sequential flows of one or more highly diluted cleaning solutions that are injected into the lower end of the tank and allowed to overflow at the upper end. One solution comprises one part ammonium hydroxide, two parts hydrogen peroxide, and 300-600 parts deionized water together with a trace of high purity surfactant. Rinsing water is flowed through the tank after the first solution is dumped. A second solution comprises highly dilute hydrofluoric acid. A third solution is more dilute than the first solution. A fourth solution contains hydrochloric acid greatly diluted with deionized water. The solutions are initiated either by injecting the chemicals into an incoming DI water line or directly into the tank. The cleaning tank is provided with a megasonic generator in its lower portion for selective application of megasonic energy. Quick dump valves in the tank bottom enable the solutions to be quickly dumped followed by one or more rinse steps, including a quick refill while spraying and then dumping of the rinsing water.
摘要翻译：将半导体晶片定位在清洗槽中并经受一个或多个高度稀释的清洁溶液的顺序流动，其被注入到罐的下端并允许在上端溢出。一种溶液包括一部分氢氧化铵，两份过氧化氢和300-600份去离子水以及一些痕量的高纯度表面活性剂。第一个溶液倾倒后，冲洗水流过罐。第二种溶液包括高度稀释的氢氟酸。第三个解决方案比第一个解决方案更稀。第四种溶液含有用去离子水大大稀释的盐酸。解决方案是通过将化学品注入进入的DI水管线或直接进入罐中来启动。清洗槽在其下部设有兆声波发生器，用于选择性地应用兆声波能量。罐底快速排放阀能够快速倾倒溶液，然后进行一个或多个冲洗步骤，包括在喷涂时快速补充，然后倾倒冲洗水。

8. 发明授权

US5090432A Single wafer megasonic semiconductor wafer processing system 失效
标题翻译：单晶片超声波半导体晶圆处理系统
公开(公告)号：US5090432A
公开(公告)日：1992-02-25
申请号：US598426
申请日：1990-10-16
申请人： Mario E. Bran
发明人： Mario E. Bran
IPC分类号： B08B3/12 , H01L21/00 , H01L21/304
CPC分类号： H01L21/67057 , B08B3/12 , H01L21/67051 , Y10S134/902 , Y10S438/906
摘要： A semiconductor wafer processing system utilizing a specially constructed wet processing chamber for a single wafer and a megasonic, or high frequency, energy dispensing system. The construction of the container causes megasonic energy to become intensified near the surface of the wafer, thereby providing more cleaning power, and resulting cleaning. The megasonic device may be mounted on a bottom wall dump valve. Also, the energy output may be used to rotate a wafer.
摘要翻译：一种半导体晶片处理系统，其利用专门构造的用于单晶片和兆声波或高频能量分配系统的湿式处理室。容器的结构使得在晶片表面附近的兆声波能量增强，从而提供更多的清洁能力和最终的清洁。兆声道装置可以安装在底壁倾倒阀上。此外，可以使用能量输出来旋转晶片。

9. 发明授权

US5908509A Semiconductor wafer cleaning system 失效
公开(公告)号：US5908509A
公开(公告)日：1999-06-01
申请号：US908330
申请日：1997-08-07
申请人： Michael B. Olesen , Mario E. Bran
发明人： Michael B. Olesen , Mario E. Bran
IPC分类号： B08B3/12 , C11D3/39 , C11D7/06 , C11D7/08 , C11D11/00 , H01L21/00 , H01L21/306 , B08B3/08 , B08B7/02 , C23G1/02
CPC分类号： H01L21/02052 , B08B3/12 , C11D11/0047 , C11D11/007 , C11D3/3947 , C11D7/06 , C11D7/08 , H01L21/67051 , H01L21/67057 , Y10S134/902 , Y10S438/906
摘要： Semiconductor wafers are positioned in a cleaning tank and subjected to sequential flows of one or more highly diluted cleaning solutions that are injected from the lower end of the tank and allowed to overflow at the upper end. One solution comprises one part ammonium hydroxide, two parts hydrogen peroxide, and 300-600 parts deionized water together with a trace of high purity surfactant. Rinsing water is flowed through the tank after the first solution is dumped. A second solution comprises highly dilute hydrofluoric acid. A third solution is more dilute than the first solution. A fourth solution contains hydrochloric acid greatly diluted with deionized water. The cleaning tank is provided with a megasonic generator in its lower portion for selective application of megasonic energy. Quick dump valves in the tank bottom enable the solutions to be quickly dumped followed by one or more rinse steps, including a quick refill while spraying and then dumping of the rinsing water.

10. 发明授权

US5656097A Semiconductor wafer cleaning system 失效
标题翻译：半导体晶圆清洗系统
公开(公告)号：US5656097A
公开(公告)日：1997-08-12
申请号：US361139
申请日：1994-12-21
申请人： Michael B. Olesen , Mario E. Bran
发明人： Michael B. Olesen , Mario E. Bran
IPC分类号： B08B3/12 , C11D3/39 , C11D7/06 , C11D7/08 , C11D11/00 , H01L21/00 , H01L21/306 , B08B3/08 , B08B7/02 , C23G1/02
CPC分类号： H01L21/02052 , B08B3/12 , C11D11/0047 , C11D11/007 , C11D3/3947 , C11D7/06 , C11D7/08 , H01L21/67051 , H01L21/67057 , Y10S134/902 , Y10S438/906
摘要： Semiconductor wafers are positioned in a cleaning tank and subjected to sequential flows of one or more highly diluted cleaning solutions that are injected from the lower end of the tank and allowed to overflow at the upper end. One solution contains one part ammonium hydroxide, two parts hydrogen peroxide, and 300-600 parts deionized water together with a trace of high purity surfactant. Rinsing water is flowed through the tank after the first solution is dumped. A second solutions contains highly dilute hydrofluoric acid. A third solution is more dilute than the first solution. A fourth solution contains hydrochloric acid greatly diluted with deionized water. The cleaning tank is provided with a megasonic generator in its lower portion for selective application of megasonic energy. Quick dump valves in the tank bottom enable the solutions to be quickly dumped followed by one or more rinse steps, including a quick refill while spraying and then dumping of the rinsing water.
摘要翻译：将半导体晶片定位在清洗槽中并经受从罐的下端喷射并允许在上端溢出的一个或多个高度稀释的清洁溶液的顺序流动。一种溶液含有一部分氢氧化铵，两份过氧化氢和300-600份去离子水以及一些痕量的高纯度表面活性剂。第一个溶液倾倒后，冲洗水流过罐。第二种溶液含有高度稀释的氢氟酸。第三个解决方案比第一个解决方案更稀。第四种溶液含有用去离子水大大稀释的盐酸。清洗槽在其下部设有兆声波发生器，用于选择性地应用兆声波能量。罐底快速排放阀能够快速倾倒溶液，然后进行一个或多个冲洗步骤，包括在喷涂时快速补充，然后倾倒冲洗水。

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