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    • 3. 发明申请
    • Method for Fabricating a Photovolataic Element with Stabilised Efficiency
    • 用稳定效率制造光电元件的方法
    • US20100243036A1
    • 2010-09-30
    • US12225337
    • 2007-03-21
    • Axel HerguthGunnar SchubertMartin KäsGiso HahnIhor Melnyk
    • Axel HerguthGunnar SchubertMartin KäsGiso HahnIhor Melnyk
    • H01L31/0256H01L21/56H01L21/26
    • H01L31/1864H01L31/1804Y02E10/547Y02P70/521
    • A method for fabricating a photovoltaic element with stabilised efficiency is proposed. The method comprises the following steps: preparing a boron-doped, oxygen-containing silicon substrate; forming an emitter layer on a surface of the silicon substrate; and a stabilisation treatment step. The stabilisation treatment step comprises keeping the temperature of the substrate during a treatment time within a selectable temperature range having a lower temperature limit of 50° C., preferably 90° C., more preferably 130° C. and even more preferably 160° C. and an upper temperature limit of 230° C., preferably 210° C., more preferably 190° C. and even more preferably 180° C., and generating excess minority carriers in the silicon substrate during the treatment time, for example, by illuminating the substrate or by applying an external voltage. This method can be used to fabricate a photovoltaic element, e.g. a solar cell or a solar module having an efficiency which is stable at a value higher than that of photovoltaic elements fabricated without the stabilisation treatment step.
    • 提出了一种制造具有稳定效率的光伏元件的方法。 该方法包括以下步骤:制备硼掺杂的含氧硅衬底; 在所述硅衬底的表面上形成发射极层; 和稳定化处理步骤。 稳定化处理步骤包括将处理时间内的基板的温度保持在温度下限为50℃,优选为90℃,更优选为130℃,甚至更优选为160℃的可选温度范围内 并且上限温度为230℃,优选为210℃,更优选为190℃,甚至更优选为180℃,并且在处理时间内在硅衬底中产生过量的少数载流子,例如, 通过照射衬底或施加外部电压。 该方法可用于制造光电元件,例如, 太阳能电池或太阳能组件,其效率比在没有稳定化处理步骤的光电元件的值高的情况下是稳定的。
    • 7. 发明申请
    • DEVICE FOR FABRICATING A PHOTOVOLTAIC ELEMENT WITH STABILISED EFFICIENCY
    • 用于制造具有稳定效率的光伏元件的装置
    • US20110162716A1
    • 2011-07-07
    • US12971232
    • 2010-12-17
    • Axel HerguthGunnar SchubertGiso HahnIhor MelnykMartin Käs
    • Axel HerguthGunnar SchubertGiso HahnIhor MelnykMartin Käs
    • H01L31/0264H01L31/18H05B3/68
    • H01L31/1864H01L31/1804Y02E10/547Y02P70/521
    • A method and device for fabricating a photovoltaic element with stabilized efficiency is proposed. The method comprises the following steps: preparing a boron-doped, oxygen-containing silicon substrate; forming an emitter layer on a surface of the silicon substrate; and a stabilization treatment step. The stabilization treatment step comprises keeping the temperature of the substrate during a treatment time within a selectable temperature range having a lower temperature limit of 50° C., preferably 90° C., more preferably 130° C. and even more preferably 160° C. and an upper temperature limit of 230° C., preferably 210° C., more preferably 190° C. and even more preferably 180° C., and generating excess minority carriers in the silicon substrate during the treatment time, for example, by illuminating the substrate or by applying an external voltage. This method can be used to fabricate a photovoltaic element, e.g. a solar cell or a solar module having an efficiency which is stable at a value higher than that of photovoltaic elements fabricated without the stabilization treatment step.
    • 提出了一种用于制造具有稳定效率的光电元件的方法和装置。 该方法包括以下步骤:制备硼掺杂的含氧硅衬底; 在所述硅衬底的表面上形成发射极层; 和稳定化处理步骤。 稳定化处理步骤包括将处理时间内的基板的温度保持在温度下限为50℃,优选为90℃,更优选为130℃,甚至更优选为160℃的可选温度范围内 并且上限温度为230℃,优选为210℃,更优选为190℃,甚至更优选为180℃,并且在处理时间内在硅衬底中产生过量的少数载流子,例如, 通过照射衬底或施加外部电压。 该方法可用于制造光电元件,例如, 太阳能电池或太阳能组件,其效率比在没有稳定化处理步骤的光电元件的值高的情况下是稳定的。
    • 10. 发明授权
    • Method for cleavage of labile functional groups from chemical compounds
    • 从化合物中切割不稳定官能团的方法
    • US07598019B2
    • 2009-10-06
    • US10934102
    • 2004-09-02
    • Ulrich SteinerDominik WollStefan Walbert
    • Ulrich SteinerDominik WollStefan Walbert
    • G03F7/00G03F7/004
    • B82Y30/00B01J2219/00529B01J2219/00608B01J2219/00617B01J2219/00626B01J2219/00659B01J2219/00677B01J2219/00711C07B2200/11C07H21/00C40B40/00Y02P20/55
    • The present invention provides a method for cleavage of labile functional groups from molecules by the action of electromagnetic radiation, wherein the molecules are contacted with a chemical compound whose triplet state is energetically higher than the triplet state of the labile functional group, and are subsequently exposed to electromagnetic radiation. Further, the invention provides a method for preparing DNA chips by spatially addressed, light-controlled nucleotide synthesis on solid substrates, said method comprising the following steps: a) reacting the unprotected terminal 3′ or 5′ hydroxy group of a nucleoside and/or of a nucleotide arranged on the solid substrate under usual conditions with a photolabile protective group and optionally purifying the reaction product, b) applying a solution, suspension or dispersion of a chemical compound, whose triplet state is energetically higher than the triplet state of the photolabile protective group, to the surface of the carrier, said surface comprising the nucleotides and/or nucleosides modified in step a): c) irradiating, in a spatially selective manner, the surface of the carrier treated in step b) with electromagnetic radiation in the UV/VIS range with simultaneous, spatially selective release of a reactive OH group and subsequently reacting it with a nucleoside and/or nucleotide comprising a 5′ or 3′OH group, said nucleoside and/or nucleotide being further provided with a photolabile functional group. Moreover, the present invention provides a chemical composition comprising a molecule having a labile functional group, as well as a chemical compound whose triplet state is higher than the triplet state of the labile functional group, and it describes the use of the chemical composition for preparing DNA chips.
    • 本发明提供了一种通过电磁辐射作用从分子中切割不稳定官能团的方法,其中分子与其三重态在能量上高于不稳定官能团的三线态的化合物接触,随后暴露 到电磁辐射。 此外,本发明提供了一种通过在固体底物上进行空间寻址的光控核苷酸合成来制备DNA芯片的方法,所述方法包括以下步骤:a)使未被保护的核苷末端3'或5'羟基与/ 在常规条件下用光不稳定保护基团排列在固体基质上的核苷酸,并任选地纯化反应产物,b)施加化学化合物的溶液,悬浮液或分散体,其三重态在能量上高于光不稳定性的三线态 保护基团,所述表面包含在步骤a)中修饰的核苷酸和/或核苷:c)以空间选择性方式照射在步骤b)中处理的载体的表面,其中电磁辐射在 UV / VIS范围,同时空间选择性释放反应性OH基团,随后使其与核苷和/或核苷酸共同反应 令人惊奇的是5'或3'OH基团,所述核苷和/或核苷酸进一步具有光不稳定官能团。 此外,本发明提供包含具有不稳定官能团的分子的化学组合物,以及其三重态高于不稳定官能团的三线态的化合物,并且描述了用于制备化学组合物的用途 DNA芯片。