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1. 发明申请

US20110037259A1 CONNECTOR FOR GAS OR LIQUID LINES AND USE THEREOF 审中-公开
标题翻译：气体或液体管接头及其用途
公开(公告)号：US20110037259A1
公开(公告)日：2011-02-17
申请号：US12852055
申请日：2010-08-06
申请人： Claus Rade , Alexander Piechulla , Robert Scherer
发明人： Claus Rade , Alexander Piechulla , Robert Scherer
IPC分类号： F16L21/02 , F16L21/00
CPC分类号： B01J3/03 , B01J3/02 , B01J2219/00119
摘要： A connector for gas or liquid lines has a core piece with a core and a sleeve piece with a sleeve. A pressure space surrounds the core and the sleeve when the two are connected to one another. The pressure space is set at an overpressure with respect to a line space of the connector. The connector is useful, for example, in connecting a diffusion tube of a low-pressure diffusion furnace to a gas outlet lance.
摘要翻译：用于气体或液体管线的连接器具有带芯的芯部件和具有套筒的套筒件。当两者彼此连接时，压力空间围绕芯部和套筒。压力空间相对于连接器的线空间设定为过压。连接器例如在将低压扩散炉的扩散管连接到气体出口喷枪时是有用的。

2. 发明申请

US20100215853A1 METHOD FOR CONTROLLING PROCESS GAS CONCENTRATION 审中-公开
标题翻译：控制过程气体浓度的方法
公开(公告)号：US20100215853A1
公开(公告)日：2010-08-26
申请号：US12601311
申请日：2008-05-19
申请人： Hans Ulrich Voeller , Rolf Mueller , Robert Michael Hartung
发明人： Hans Ulrich Voeller , Rolf Mueller , Robert Michael Hartung
IPC分类号： C23C16/52 , C23C16/448
CPC分类号： C23C16/4482 , C23C16/52
摘要： A method for controlling process gas concentration for treatment of substrates in a process space in which a medium is evaporated in a bubbler by bubbles of a carrier gas passed through the medium is achieved by producing a stipulated constant internal pressure in the bubbler and subsequent introduction of the carrier gas into the bubbler with simultaneous temperature control of the medium being evaporated within the bubbler to set a stipulated vapor pressure.
摘要翻译：通过在起泡器中产生规定的恒定的内部压力并随后引入在发泡器中产生规定的恒定的内部压力来实现控制处理空气浓度的方法，所述处理空间中的介质通过通过介质的载气的气泡在起泡器中蒸发，载体气体进入起泡器，同时温度控制介质在起泡器内蒸发以设定规定的蒸气压。

3. 发明申请

US20140179117A1 METHOD FOR FORMING A LAYER ON A SUBSTRATE AT LOW TEMPERATURES 有权
标题翻译：在低温下在基材上形成层的方法
公开(公告)号：US20140179117A1
公开(公告)日：2014-06-26
申请号：US14131943
申请日：2012-07-12
申请人： Jurgen Niess , Wilfried Lerch , Wilhelm Kegel , Alexander Gschwandtner
发明人： Jurgen Niess , Wilfried Lerch , Wilhelm Kegel , Alexander Gschwandtner
IPC分类号： H01L21/02
CPC分类号： H01L21/02238 , C23C8/10 , C23C8/36 , C23C8/38 , H01J37/32192 , H01J37/3222 , H01L21/02164 , H01L21/02252 , H01L21/67115 , H01L31/02167 , H01L31/18 , Y02E10/50
摘要： A method for forming an oxide layer on a substrate is described, wherein a plasma is generated adjacent to at least one surface of the substrate by means of microwaves from a gas containing oxygen, wherein the microwaves are coupled into the gas by a magnetron via at least one microwave rod, which is arranged opposite to the substrate and comprises an outer conductor and an inner conductor. During the formation of the oxide layer, the mean microwave power density is set to P=0.8-10 W/cm2, the plasma duration is set to t=0.1 to 600 s, the pressure is set to p=2.67-266.64 Pa (20 to 2000 mTorr) and a distance between substrate surface and microwave rod is set to d=5-120 mm. The above and potentially further process conditions are matched to each other such that the substrate is held at a temperature below 200° C. and an oxide growth is induced on the surface of the substrate facing the plasma.
摘要翻译：描述了在衬底上形成氧化物层的方法，其中通过来自含氧气体的微波在邻近于衬底的至少一个表面处产生等离子体，其中微波通过磁控管通过至少一个微波棒，其布置成与衬底相对并且包括外部导体和内部导体。在形成氧化物层期间，将平均微波功率密度设定为P = 0.8-10W / cm 2，将等离子体持续时间设定为t = 0.1〜600s，将压力设定为p = 2.67-266.64Pa（ 20〜2000mTorr），将基板表面与微波棒之间的距离设定为d = 5-120mm。上述和潜在的另外的工艺条件彼此匹配，使得衬底保持在低于200℃的温度，并且在面向等离子体的衬底的表面上诱导氧化物生长。

4. 发明授权

US09612158B2 Device for determining the temperature of a substrate 有权
公开(公告)号：US09612158B2
公开(公告)日：2017-04-04
申请号：US14351590
申请日：2012-10-17
申请人： CENTROTHERM THERMAL SOLUTIONS GMBH & CO. KG
发明人： Denise Reichel , Wilfried Lerch , Jeff Gelpey , Wolfgang Skorupa , Thomas Schumann
IPC分类号： H01L21/66 , H01L21/67 , G01J5/00 , G01J5/08
CPC分类号： G01J5/0007 , G01J5/0834 , H01L21/67115 , H01L21/67248 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： An apparatus for determining the temperature of a substrate, in particular of a semiconductor wafer during a heating thereof by means of a first radiation source is described. Furthermore, an apparatus and a method for thermally treating substrates are described, in which the substrate is heated by means of at least one first radiation source. The apparatus comprises a first grating structure having grating lines, which are opaque with respect to a substantial portion of the radiation of the first radiation source, wherein the grating structure is arranged between the first radiation source and the substrate, and a drive unit for moving the first grating structure. Furthermore, a first radiation detector is provided, which is directed directly onto the surface of the substrate facing the grating structure, and a device for determining radiation emitted by the substrate due to its own temperature and for determining the temperature of the substrate on the basis of the radiation detected by the first radiation detector.

5. 发明申请

US20140248720A1 DEVICE FOR DETERMINING THE TEMPERATURE OF A SUBSTRATE 有权
标题翻译：用于确定基板温度的装置
公开(公告)号：US20140248720A1
公开(公告)日：2014-09-04
申请号：US14351590
申请日：2012-10-17
申请人： CENTROTHERM THEMAL SOLUTIONS GMBH & CO. KG
发明人： Denise Reichel , Wilfried Lerch , Jeff Gelpey , Wolfgang Skorupa , Thomas Schumann
IPC分类号： G01J5/00 , H01L21/67 , H01L21/66
CPC分类号： G01J5/0007 , G01J5/0834 , H01L21/67115 , H01L21/67248 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： An apparatus for determining the temperature of a substrate, in particular of a semiconductor wafer during a heating thereof by means of a first radiation source is described. Furthermore, an apparatus and a method for thermally treating substrates are described, in which the substrate is heated by means of at least one first radiation source. The apparatus comprises a first grating structure having grating lines, which are opaque with respect to a substantial portion of the radiation of the first radiation source, wherein the grating structure is arranged between the first radiation source and the substrate, and a drive unit for moving the first grating structure. Furthermore, a first radiation detector is provided, which is directed directly onto the surface of the substrate facing the grating structure, and a device for determining radiation emitted by the substrate due to its own temperature and for determining the temperature of the substrate on the basis of the radiation detected by the first radiation detector.
摘要翻译：描述了通过第一辐射源在其加热期间确定衬底，特别是半导体晶片的温度的装置。此外，描述了一种用于热处理衬底的设备和方法，其中衬底通过至少一个第一辐射源被加热。该装置包括具有相对于第一辐射源的辐射的实质部分不透明的光栅线的第一光栅结构，其中光栅结构布置在第一辐射源和衬底之间，以及用于移动的驱动单元第一光栅结构。此外，提供了第一辐射检测器，其被直接引导到面向光栅结构的基板的表面上，以及用于根据其自身温度来确定由基板发射的辐射的装置，并且用于基于该基板确定基板的温度由第一辐射检测器检测到的辐射。

6. 发明申请

US20130299130A1 COOLING MODULE AND APPARATUS FOR THERMALLY TREATING SUBSTRATES 审中-公开
标题翻译：用于热处理基板的冷却模块和装置
公开(公告)号：US20130299130A1
公开(公告)日：2013-11-14
申请号：US13994796
申请日：2012-01-27
申请人： Hans-Peter Elser , Matthias Tumback , Reinhard Lenz , Moritz Vogt
发明人： Hans-Peter Elser , Matthias Tumback , Reinhard Lenz , Moritz Vogt
IPC分类号： F28F9/00
CPC分类号： F28F9/00 , H01L21/67098
摘要： A cooling module for cooling substrates, in particular solar cells having a paste printed thereon after passing through a heating module is described. The cooling module comprises an elongated cooling chamber having an inlet opening, which is adjacent to a heating module, and an outlet opening, as well as a transport unit for transporting substrates through the elongated cooling chamber, wherein the transport unit defines a transport plane for the substrates. At least one first cooling unit is provided. The cooling unit has a plurality of first plate elements, which are arranged in substance perpendicular to and above the transport plane in the cooling chamber, at least one first conduit which extends through the first plate elements and is in a thermally conducting relationship therewith, and at least one conveying unit for conveying a cooling fluid through the first conduit. A conveying unit for conveying gas, in particular air, via spaces between the plate elements towards the transport plane is also provided. Also, an apparatus for thermally treating substrates, in particular solar cells, having a paste printed thereon is described. Said apparatus comprises a heating module having an elongated heating chamber and at least one adjacent cooling module having an elongated cooling chamber. A transport unit for transporting that substrates through the heating chamber and the cooling chamber is provided, wherein the transport unit comprises a revolving, gas permeable transport belt, which forms a transport section and a return section. The transport section extends through the heating chamber and the cooling chamber, while the return section has a portion which extends through at least a portion of the cooling chamber and wherein the return section is arranged outside of the heating chamber.
摘要翻译：描述了用于冷却基板的冷却模块，特别是在通过加热模块之后具有印刷在其上的糊状物的太阳能电池。冷却模块包括细长的冷却室，其具有与加热模块相邻的入口开口和出口开口，以及用于通过细长冷却室输送基板的输送单元，其中运输单元限定用于底物。提供至少一个第一冷却单元。冷却单元具有多个第一板元件，其在物体中垂直于冷却室中的输送平面并且高于输送平面;至少一个第一导管，其延伸穿过第一板元件并与其导热关系;以及至少一个输送单元，用于输送冷却流体通过第一导管。还提供了用于经由板元件之间的空间朝向输送平面输送气体，特别是空气的输送单元。此外，描述了一种用于热处理印刷有糊状物的基板，特别是太阳能电池的设备。所述装置包括具有细长加热室的加热模块和具有细长冷却室的至少一个相邻冷却模块。提供了一种用于将基板输送通过加热室和冷却室的输送单元，其中运输单元包括形成运输部分和返回部分的旋转的透气输送带。输送部分延伸穿过加热室和冷却室，而返回部分具有延伸穿过冷却室的至少一部分的部分，并且其中返回部分设置在加热室的外部。

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