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81. 发明授权

US07205560B2 Method and apparatus for processing a micro sample 有权
公开(公告)号：US07205560B2
公开(公告)日：2007-04-17
申请号：US11127240
申请日：2005-05-12
申请人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
发明人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
IPC分类号： H01J37/256 , G21K7/00
CPC分类号： H04L29/06 , G01N23/225 , H01J37/256 , H01J37/3056 , H01J2237/20 , H01J2237/202 , H01J2237/31745 , H04L67/16 , H04L69/329
摘要： An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.

82. 发明申请

US20070045536A1 Method for inspecting substrate, substrate inspecting system and electron beam apparatus 审中-公开
标题翻译：检查基板，基板检查系统和电子束装置的方法
公开(公告)号：US20070045536A1
公开(公告)日：2007-03-01
申请号：US11350009
申请日：2006-02-09
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Masahiro Hatakeyama , Kenji Watanabe , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Masahiro Hatakeyama , Kenji Watanabe , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： G21K7/00
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention relates to a substrate inspection apparatus for inspecting a pattern formed on a substrate by irradiating a charged particle beam onto the substrate. The substrate inspection apparatus comprises: an electron beam apparatus including a charged particle beam source for emitting a charged particle beam, a primary optical system for irradiating the charged particle beam onto the substrate, a secondary optical system into which a secondary charged particle beam is introduced, the secondary charged particle beam being emitted from the substrate by an irradiation of the charged particle beam, a detection system for detecting the secondary charged particle beam introduced into said secondary optical system and outputting as an electric signal, and a process control system for processing and evaluating the electric signal; a stage unit for holding the substrate and moving the substrate relatively to said electron beam apparatus; a working chamber capable of shielding at least an upper region of the stage unit form outside to control under desired atmosphere; and a substrate load-unload mechanism for transferring the substrate into or out of the stage.
摘要翻译：本发明涉及一种基板检查装置，用于通过将带电粒子束照射到基板上来检查形成在基板上的图案。基板检查装置包括：电子束装置，其包括用于发射带电粒子束的带电粒子束源，用于将带电粒子束照射到基板上的主光学系统，引入二次带电粒子束的二次光学系统通过照射带电粒子束从基板发射的二次带电粒子束，用于检测引入到所述二次光学系统中并输出作为电信号的二次带电粒子束的检测系统和用于处理的过程控制系统并评估电信号; 用于保持基板并相对于所述电子束装置移动基板的载物台单元; 能够至少屏蔽舞台单元的上部区域的工作室形成外部以在期望的气氛下进行控制; 以及用于将衬底转移到或离开工作台的衬底装载 - 卸载机构。

83. 发明授权

US07071475B2 Method and apparatus for specimen fabrication 有权
公开(公告)号：US07071475B2
公开(公告)日：2006-07-04
申请号：US10941913
申请日：2004-09-16
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J37/20
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A specimen fabrication apparatus including a movable sample stage on which a specimen substrate is mounted, a probe connector for firmly joining a tip of a probe to a portion of the specimen substrate in a vicinity of an area on the specimen substrate to be observed in an observation apparatus, a micro-specimen separator for separating from the specimen substrate a micro-specimen to which the tip of the probe is firmly joined, the micro-specimen including the area on the specimen substrate to be observed and the portion of the specimen substrate to which the tip of the probe is firmly joined, a micro-specimen fixer for fixing the micro-specimen separated from the specimen substrate to a specimen holder of the observation apparatus, and a probe separator for separating the tip of the probe from the micro-specimen fixed to the specimen holder.

84. 发明申请

US20050189901A1 Stage devices and exposure systems comprising same 审中-公开
标题翻译：舞台装置和包括它们的曝光系统
公开(公告)号：US20050189901A1
公开(公告)日：2005-09-01
申请号：US11097036
申请日：2005-04-01
申请人： Keiichi Tanaka
发明人： Keiichi Tanaka
IPC分类号： G03F7/20 , B64C17/06
CPC分类号： H01J37/20 , B82Y10/00 , B82Y40/00 , G03F7/70716 , G03F7/70758 , G03F7/70858 , H01J37/3174 , H01J2237/2005 , H01J2237/202 , H01J2237/20221
摘要： Stage devices are disclosed that can be made small and lightweight and that produce little magnetic-field disturbance. As a result, high-precision scan positioning can be performed using them. In an exemplary configuration, a Y-slider driven by a linear motor is deployed on each of two fixed guides that extend in the Y-direction. Between the two Y-sliders are suspended two movement guides that extend in the X-direction. On the movement guide is an X-slider driven by an air cylinder. A stage projects from the X-slider. On the stage is a table driven in the O,-direction (about the Z-axis). The stage device is configured so that a continuous movement (scan) requiring precise positioning is achieved in the Y-direction by linear motors, and intermittent movement and stopping in the X-direction is achieved using an air cylinder.
摘要翻译：公开了可以制造得小而轻的并且产生很小的磁场干扰的平台装置。因此，可以使用它们进行高精度扫描定位。在示例性构造中，由线性电动机驱动的Y滑块在Y方向上延伸的两个固定导轨中的每一个上展开。在两个Y滑块之间悬挂着两个沿X方向延伸的移动导轨。在移动引导件上是由气缸驱动的X滑块。一个舞台从X滑块上进行。在舞台上是以O， - 方向（大约Z轴）驱动的表。舞台装置被配置为使得通过线性电动机在Y方向上实现需要精确定位的连续移动（扫描），并且使用气缸来实现X方向上的间歇运动和停止。

85. 发明申请

US20050054029A1 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US20050054029A1
公开(公告)日：2005-03-10
申请号：US10941913
申请日：2004-09-16
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： G01N1/02 , G01N1/04 , G01N1/28 , G01Q20/00 , H01J37/305 , G01N1/30 , C12M1/34 , G01N33/48
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A specimen fabrication apparatus including a movable sample stage on which a specimen substrate is mounted, a probe connector for firmly joining a tip of a probe to a portion of the specimen substrate in a vicinity of an area on the specimen substrate to be observed in an observation apparatus, a micro-specimen separator for separating from the specimen substrate a micro-specimen to which the tip of the probe is firmly joined, the micro-specimen including the area on the specimen substrate to be observed and the portion of the specimen substrate to which the tip of the probe is firmly joined, a micro-specimen fixer for fixing the micro-specimen separated from the specimen substrate to a specimen holder of the observation apparatus, and a probe separator for separating the tip of the probe from the micro-specimen fixed to the specimen holder.
摘要翻译：一种试样制造装置，包括：安装有试样基板的可动试样台;探针连接器，用于将探针的前端牢固地接合到试样基板的一部分附近，以在待观察的样品基板上的区域观察装置，用于从试样基板分离与探针的前端牢固接合的微型试样的微量试样分离体，包括待观察的试样基板上的区域的微量试样和试样基板的一部分探针的尖端牢固地接合到其上的微型试样固定器，用于将从试样基板分离的微量样品固定到观察装置的试样支架上的探针分离器和用于将探针的尖端从微型固定在样品架上。

86. 发明授权

US06855929B2 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former 有权
标题翻译：用于电子束检查的装置，其操作方法以及使用前者制造半导体器件的方法
公开(公告)号：US06855929B2
公开(公告)日：2005-02-15
申请号：US09985324
申请日：2001-11-02
申请人： Toshifumi Kimba , Tohru Satake , Tsutomu Karimata , Kenji Watanabe , Nobuharu Noji , Takeshi Murakami , Masahiro Hatakeyama , Mamoru Nakasuji , Hirosi Sobukawa , Shoji Yoshikawa , Shin Oowada , Mutsumi Saito
发明人： Toshifumi Kimba , Tohru Satake , Tsutomu Karimata , Kenji Watanabe , Nobuharu Noji , Takeshi Murakami , Masahiro Hatakeyama , Mamoru Nakasuji , Hirosi Sobukawa , Shoji Yoshikawa , Shin Oowada , Mutsumi Saito
IPC分类号： G01N23/225 , G01Q30/02 , H01J37/06 , H01J37/073 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , G01N23/00 , G21K7/00
CPC分类号： H01J37/222 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/0216 , H01J2237/082 , H01J2237/2002 , H01J2237/2007 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2813 , H01J2237/2816 , H01J2237/2817 , H01L2224/48227 , H01L2924/01019 , H01L2924/01025 , H01L2924/01057 , H01L2924/01067 , H01L2924/01078 , H01L2924/10253 , H01L2924/12032 , H01L2924/3025 , H01L2924/00
摘要： A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1 maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.
摘要翻译：本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到在检查室中保持真空的检查室23-1中; 将所述检查室与振动隔离; 通过具有至少一个自由度的平台26-1连续移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

87. 发明申请

US20040216992A1 Sputtering apparatus 有权
标题翻译：溅射装置
公开(公告)号：US20040216992A1
公开(公告)日：2004-11-04
申请号：US10795315
申请日：2004-03-09
发明人： Kenji Ando , Hidehiro Kanazawa
IPC分类号： C23C014/32
CPC分类号： C23C14/225 , C23C14/3464 , C23C14/505 , H01J2237/202
摘要： A sputtering apparatus for forming a film by a physical gas-phase growth on a substrate having a irregular or flat shape is provided including three or more axes for independently varying a relative positional relationship between a substrate and a cathode in the course of film formation.
摘要翻译：提供了一种用于在具有不规则或平坦形状的基板上通过物理气相生长形成膜的溅射装置，其包括三个或更多个轴，用于在成膜过程中独立地改变基板和阴极之间的相对位置关系。

88. 发明授权

US06764383B1 Methods and apparatuses for processing microfeature workpiece samples 失效
标题翻译：微加工样品加工方法和装置
公开(公告)号：US06764383B1
公开(公告)日：2004-07-20
申请号：US10448916
申请日：2003-05-30
申请人： Phillip L. Chandler , Mark J. Fiechter , Colin A. Green
发明人： Phillip L. Chandler , Mark J. Fiechter , Colin A. Green
IPC分类号： B24B100
CPC分类号： G01N1/32 , G01N2203/04 , H01J37/20 , H01J2237/202
摘要： Methods and apparatuses for processing microfeature workpiece samples are disclosed herein. An apparatus in accordance with one embodiment of the invention includes a support body, a first contact surface portion, a second contact surface portion, and a sample holder configured to releasably carry the microfeature workpiece sample. The sample holder can be movable relative to the support body between a first position and a second position, wherein the sample holder has a first orientation relative to the first and second contact surface portions when in the first position and a second orientation when in the second position. At least one of the first and second contact surface portions can also be movable relative to the support body. Accordingly, an operator can move the first and/or second contact surface portions to make minor adjustments to an angle at which material is removed from the workpiece, and can move the sample holder to make more substantial adjustments.
摘要翻译：本文公开了用于处理微特征工件样品的方法和装置。根据本发明的一个实施例的装置包括支撑体，第一接触表面部分，第二接触表面部分和构造成可释放地携带微特征工件样品的样品保持器。样品保持器可以在第一位置和第二位置之间相对于支撑体移动，其中当处于第一位置时，样品保持器相对于第一和第二接触表面部分具有第一取向，当第二位置处于第二位置时位置。第一和第二接触表面部分中的至少一个也可以相对于支撑体移动。因此，操作者可以移动第一和/或第二接触表面部分以对材料从工件移除的角度进行微调，并且可移动样品保持器进行更实质的调整。

89. 发明授权

US06639225B2 Six-axis positioning system having a zero-magnetic-field space 失效
公开(公告)号：US06639225B2
公开(公告)日：2003-10-28
申请号：US09951762
申请日：2001-09-14
申请人： Ulf-Carsten Kirschstein , Erik Beckert , Andrew Hoffmann , Christoph Schaeffel , Eugen Saffert , Johannes Zentner , Torsten Gramsch
发明人： Ulf-Carsten Kirschstein , Erik Beckert , Andrew Hoffmann , Christoph Schaeffel , Eugen Saffert , Johannes Zentner , Torsten Gramsch
IPC分类号： G21K510
CPC分类号： G03F7/707 , G03F7/70716 , H01J2237/202 , H01L21/68
摘要： The invention refers to an arrangement for positioning substrates, in particular for positioning wafers, within a device that is provided for exposure of the substrates and/or for measurement on the substrates by means of radiation under high-vacuum conditions. The following are provided according to the present invention: a retention system (4), displaceable on a linear guidance system (3), for receiving the substrate, the guidance direction of the linear guidance system (3) being oriented parallel or substantially parallel to the Y coordinate of an X, Y, Z spatial coordinate system; drives for limited modification of the inclination of the guidance direction relative to the Y coordinate; drives for limited rotation of the linear guidance system (3), including the retention system (4), about the guidance direction; and drives for parallel displacement of the linear guidance system (3), including the retention system (4), in the direction of the X coordinate, the Y coordinate, and/or the Z coordinate.

90. 发明申请

US20030111614A1 Stage devices including linear motors that produce reduced beam-perturbing stray magnetic fields, and charged-particle-beam microlithography systems comprising same 失效
标题翻译：包括产生减小的束扰动杂散磁场的线性电动机的舞台装置，以及包括它的带电粒子束微光刻系统
公开(公告)号：US20030111614A1
公开(公告)日：2003-06-19
申请号：US10318999
申请日：2002-12-12
申请人： Nikon Corporation
发明人： Keiichi Tanaka
IPC分类号： H01J037/20
CPC分类号： H01J37/20 , H01J2237/202 , H01J2237/3175
摘要： Stage devices are disclosed that achieve high positioning and movement accuracy while producing substantially reduced outwardly extending stray magnetic fields. The stage devices are especially suitable for use in a charged-particle-beam (CPB) microlithography system because they cause substantially reduced beam perturbations. A stage device comprises multiple linear motors and a slider arranged relative to each other such that the intersection point of drive forces applied by the linear motors to move the slider coincides with the center of gravity of the slider. Each linear motor includes a respective yoke in which permanent magnets are disposed such that pairs of opposing magnets face one another across a gap, each pair of opposing magnets has similarly oriented respective poles, and the orientation is alternatingly reversed in each subsequent pair of opposing magnets in the yoke. Also, the poles of respective opposing pairs of magnets in adjacent yokes are similarly oriented, with the orientation being alternatingly reversed in each subsequent pair in the yokes. Consequently, circuits of magnetic flux are kept tightly confined to the yokes, which substantially reduces interaction of the magnetic flux with the charged particle beam.
摘要翻译：公开了实现高定位和移动精度同时产生大大减小的向外延伸的杂散磁场的平台装置。舞台装置特别适合用于带电粒子束（CPB）微光刻系统，因为它们引起实质上减小的束扰动。舞台装置包括多个线性电动机和相对于彼此布置的滑块，使得由线性电动机施加的移动滑块的驱动力的交点与滑块的重心重合。每个线性电动机包括相应的磁轭，其中永磁体被布置成使得成对的相对磁体跨越间隙彼此面对，每对相对的磁体具有相似的取向的各个极，并且在随后的每对相对的磁体中交替地反向取向在轭。而且，相邻磁轭中相应的相对磁体对的磁极类似地定向，其中在磁轭中的每个后续对中的取向交替地反向。因此，磁通量的电路被紧密地限制在磁轭上，这大大降低了磁通与带电粒子束的相互作用。

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