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    • 81. 发明申请
    • Moving mechanism with high bandwidth response and low force transmissibility
    • 具有高带宽响应和低力传递性的移动机构
    • US20060033903A1
    • 2006-02-16
    • US10918182
    • 2004-08-13
    • Bausan YuanMartin LeeW. Novak
    • Bausan YuanMartin LeeW. Novak
    • G03B27/62
    • G03F7/70775G03F7/70725G03F7/70758G03F7/70766
    • Methods and apparatus for providing a stage with a relatively high positioning bandwidth and low transmissibility are disclosed. According to one aspect of the present invention, a method for positioning a stage including providing a first force of a first magnitude to the stage using a primary actuator and providing a second force of a second magnitude to the stage using a secondary actuator. The first force is arranged to cause the stage to translate along a first axis. The secondary actuator is also arranged to cause the stage to translate along the first axis, and has a relatively high positioning bandwidth. The first force is arranged to enable the stage to be relatively coarsely positioned and the second force is arranged to enable the stage to be relatively finely positioned. In one embodiment, the secondary actuator is one of a voice coil motor and a piezoelectric motor.
    • 公开了提供具有相对高的定位带宽和低传输性的平台的方法和装置。 根据本发明的一个方面,一种用于定位平台的方法,包括使用主致动器向舞台提供第一幅度的第一力,并使用辅助致动器向舞台提供第二大小的第二力。 第一力布置成使得台架沿着第一轴线平移。 次级致动器还被布置成使得平台沿着第一轴线平移,并且具有相对较高的定位带宽。 第一力被布置成使得台架能够相对粗略地定位,并且第二力被布置成使得台架能够相对精细地定位。 在一个实施例中,次级致动器是音圈电动机和压电电动机之一。
    • 82. 发明授权
    • Electromagnetic alignment and scanning apparatus
    • 电磁对准和扫描装置
    • US06969966B2
    • 2005-11-29
    • US10974787
    • 2004-10-28
    • Akimitsu EbiharaThomas Novak
    • Akimitsu EbiharaThomas Novak
    • B64C17/06G03B27/42G03F7/20G03F9/00H01L21/027
    • G03F7/70766G03F7/20G03F7/70358G03F7/70716G03F7/70725G03F7/70775G03F7/709G03F7/70991G03F9/00Y10S414/135Y10S414/136
    • In a scanning exposure method, a mask stage that holds a mask is moved in a scanning direction by a first electromagnetic driver having a first portion coupled to the mask stage, and a second portion. A position of the mask stage is detected by a position detector that cooperates with a reflective portion of the mask stage that is positioned along the scanning direction. A counter weight having a bearing and at least one beam extending along the scanning direction moves in a direction opposite to a movement direction of the mask stage in response to a reaction force generated by movement of the mask stage by the first electromagnetic driver. The counter weight preferably is heavier than the mask stage, and a length of the at least one beam along the scanning direction preferably is longer than a length of the reflective portion along the scanning direction.
    • 在扫描曝光方法中,保持掩模的掩模台通过具有耦合到掩模台的第一部分的第一电磁驱动器和第二部分在扫描方向上移动。 通过与沿扫描方向定位的掩模台的反射部分配合的位置检测器来检测掩模台的位置。 具有轴承和沿着扫描方向延伸的至少一个光束的配重响应于由第一电磁驱动器通过掩模台的移动产生的反作用力而沿与掩模台的移动方向相反的方向移动。 所述配重优选地比所述掩模台重,并且沿所述扫描方向的所述至少一个光束的长度优选地比所述反射部分沿着所述扫描方向的长度长。
    • 84. 发明申请
    • Stage device, exposure apparatus, and method of manufacturing devices
    • 舞台装置,曝光装置和制造装置的方法
    • US20050248744A1
    • 2005-11-10
    • US11147287
    • 2005-06-08
    • Yuichi Shibazaki
    • Yuichi Shibazaki
    • G03F7/20G03B27/58
    • G03F7/70058G03F7/70716G03F7/70758G03F7/70766H01L21/68
    • A stage device includes a stage and a frame-shaped member that move in three degrees of freedom directions in a two-dimensional plane while floating above a surface plate. The stage also holds an object. First fixed elements and second fixed elements are fitted to the frame-shaped member, and cooperate with first movable elements and second movable elements to generate drive forces to drive the stage in the two-dimensional plane. A reaction force generated by the driving of the stage acts on the first and/or second fixed elements, and causes the frame-shaped member to move in the two-dimensional plane. Because the reaction force caused by the movement of the stage is substantially completely cancelled, and because the movement of a center of gravity of a system including the stage and the frame-shaped member does not occur, no unbalanced load acts on the surface plate.
    • 舞台装置包括在浮动在表面板上方的二维平面中以三自由度方向移动的舞台和框架构件。 舞台也是一个对象。 第一固定元件和第二固定元件装配到框架构件,并与第一可移动元件和第二可移动元件配合以产生驱动二维平面中的平台的驱动力。 由舞台驱动产生的反作用力作用在第一固定元件和/或第二固定元件上,并使框架元件在二维平面内移动。 由于由台架的运动引起的反作用力基本上被完全抵消,并且由于不会发生包括载物台和框架构件的系统的重心的运动,所以在平板上不产生不平衡的载荷。
    • 85. 发明授权
    • Active damping apparatus, exposure apparatus and device manufacturing method
    • 主动阻尼装置,曝光装置及装置的制造方法
    • US06937317B2
    • 2005-08-30
    • US10412315
    • 2003-04-14
    • Masahiro Morisada
    • Masahiro Morisada
    • F16F15/02G03F7/20H01L21/027G03B27/42G03B27/58G03B27/62
    • G03F7/70766G03F7/70725G03F7/70833G03F7/709
    • An active damping apparatus including an isolation table mounting a stage and a counter-mass, an isolation table controller operatively connected to the isolation table for supporting the isolation table and adjusting a position and an attitude of the isolation table, a setting unit operatively connected to the controller and adapted to select a combination of the stage and/or the counter-mass to be driven and to set a drive control mode according to what is to be driven, and a control input switch operatively connected to the setting unit and adapted to select a control loop that inputs into the isolation table controller a control target value for adjusting the drive of that which is to be driven according to the drive control mode selected by the setting unit. The active damping apparatus damps vibration by driving the stage and/or counter-mass mounted on the isolation table so as to offset a drive reaction torque and a counter-mass movement moment.
    • 一种主动阻尼装置,包括安装平台和反质量块的隔离台,可操作地连接到隔离台的隔离台控制器,用于支撑隔离台并调节隔离台的位置和姿态;设置单元,可操作地连接到 控制器,并且适于选择要被驱动的级和/或反质量的组合,并且根据要驱动的内容来设置驱动控制模式;以及控制输入开关,其可操作地连接到所述设置单元,并且适于 选择控制回路,其输入到隔离台控制器中的控制目标值,用于根据由设置单元选择的驱动控制模式来调节要驱动的驱动的驱动。 主动阻尼装置通过驱动安装在隔离台上的平台和/或反质量块来抵消振动,以抵消驱动反作用力矩和反质量运动力矩。
    • 86. 发明申请
    • Movable stage system, lithographic apparatus, and device manufacturing method
    • 移动平台系统,光刻设备和设备制造方法
    • US20050099616A1
    • 2005-05-12
    • US10864805
    • 2004-06-10
    • Erik LoopstraRobert-Han Schmidt
    • Erik LoopstraRobert-Han Schmidt
    • G03F7/20H01L21/027H01L21/68G03B27/62
    • G03F7/70766G03F7/70716G03F7/70758G03F7/709
    • A movable stage system capable of operating in a lithographic apparatus, is presented. The movable stage system includes a base, a platform that is movable relative to the base, a balance mass that is movable relative to the base and is configured to compensate for forces generated by a movement of the platform, and a drive mechanism configured to move the platform and the balance mass relative to the base. The drive mechanism comprises at least one belt transmission that couples the platform and the balance mass such that when the platform moves along a direction, the balance mass is moved in an at least partially opposite direction, and a driving device configured to mechanically engage the balance mass or the platform to directly drive the platform or the balance mass.
    • 提出了一种能够在光刻设备中工作的可移动平台系统。 可移动平台系统包括基座,可相对于基座移动的平台,可相对于基座移动的平衡块,其构造成补偿由平台的运动产生的力;以及驱动机构,其构造成移动 平台和平衡质量相对于基座。 所述驱动机构包括至少一个皮带传动装置,其连接所述平台和所述平衡块,使得当所述平台沿着一个方向移动时,所述平衡块沿至少部分相反的方向移动,并且驱动装置构造成机械地接合所述平衡 质量或平台直接驱动平台或平衡块。
    • 89. 发明申请
    • MODULAR STAGE WITH REACTION FORCE CANCELLATION
    • 具有反作用力消除的模块级
    • US20040165172A1
    • 2004-08-26
    • US10375785
    • 2003-02-26
    • Alex Ka Tim PoonLeonard Wai Fung KhoPai-Hsueh YangPing-Wei Chang
    • G03B027/58
    • G03F7/70766G03F7/70716G03F7/70758
    • Methods and apparatus for providing a stage apparatus which is modular and allows for reaction force cancellation are described. According to one aspect of the present invention, a stage apparatus includes a table assembly and a first stage. The table assembly supports an object, e.g., a wafer or a reticle, which is to be moved. The first stage includes a counter mass arrangement, a plurality of carriages, and a plurality of linkages. The plurality of carriages is coupled to the table assembly through the plurality of linkages such that a first carriage and a second carriage are arranged to move in substantially opposite directions along a first axis to cause the table assembly to move along a second axis while reaction forces generated when the first carriage and the second carriage are substantially cancelled by the counter mass arrangement.
    • 描述了用于提供模块化并允许反作用力抵消的平台装置的方法和装置。 根据本发明的一个方面,一种台架装置包括台组件和第一台。 桌子组件支撑要移动的物体,例如,晶片或掩模版。 第一阶段包括对质量布置,多个托架和多个连杆。 多个滑架通过多个连杆联接到工作台组件,使得第一滑架和第二滑架被布置成沿着第一轴线在基本上相反的方向上移动,以使台面组件沿着第二轴线移动,同时反作用力 当第一托架和第二托架基本上被反质量布置取消时产生。