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1. 发明授权

US06160612A Scanning type exposure apparatus, position control apparatus, and method therefor 有权
标题翻译：扫描型曝光装置，位置控制装置及其方法
公开(公告)号：US06160612A
公开(公告)日：2000-12-12
申请号：US353059
申请日：1999-07-13
申请人： Hiroshi Itoh , Masahiro Morisada
发明人： Hiroshi Itoh , Masahiro Morisada
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70558 , G03F7/70358 , G03F7/70725 , G03F9/70 , G03F9/7015
摘要： A position control apparatus which controls a position of a stage. The apparatus includes an input device for inputting a reference locus for the stage, the reference locus including a group of scanning sections, each of which includes an acceleration section, a settling section associated with a provisional settling time, and a section for constant speed scanning, the stage settling to a constant speed in each settling section, a storage medium storing information regarding actual settling times, each of which corresponds to each scanning section, a correction device for correcting the reference locus on the basis of the information on the actual settling times, and a driving device for moving the stage in accordance with the reference locus corrected by the correction device.
摘要翻译：控制台的位置的位置控制装置。该装置包括：用于输入舞台基准轨迹的输入装置，基准轨迹包括一组扫描部分，每组扫描部分包括加速部分，与临时建立时间相关联的稳定部分和用于恒速扫描的部分在每个建立部分中阶段稳定到恒定速度;存储介质，存储关于实际建立时间的信息，每个扫描部分对应于每个扫描部分，根据关于实际结算的信息来校正参考轨迹的校正装置以及用于根据由校正装置校正的参考轨迹移动舞台的驱动装置。

2. 发明授权

US07264235B2 Active damping apparatus, exposure apparatus and device manufacturing method 有权
标题翻译：主动阻尼装置，曝光装置及装置的制造方法
公开(公告)号：US07264235B2
公开(公告)日：2007-09-04
申请号：US11130240
申请日：2005-05-17
申请人： Masahiro Morisada
发明人： Masahiro Morisada
IPC分类号： F16F5/00
CPC分类号： G03F7/70766 , G03F7/70725 , G03F7/70833 , G03F7/709
摘要： An active damping apparatus for damping vibration due to driving of a stage and/or counter-mass mounted on an isolation table in an exposure device for the manufacture of semiconductor devices has a setting unit for selecting the stage and/or the counter-mass to drive and setting a control mode according to what is to be driven. The apparatus further has a control input switch that sets up a control loop for inputting control target values for driving the stage and/or the counter-mass to an isolation table controller so as to offset the drive reaction torque generated by the movement of the stage and/or counter-mass.
摘要翻译：一种用于在用于制造半导体器件的曝光装置中的用于阻挡安装在隔离台上的台架和/或反质量驱动的阻尼振动的主动阻尼装置具有设置单元，用于选择级和/或反质量至驱动并根据要驱动的方式设置控制模式。该装置还具有一个控制输入开关，该控制输入开关设置一个控制回路，用于将用于驱动该载物台的控制目标值和/或该反向质量输入到一个隔离台控制器，以便偏移该台架的运动产生的驱动反作用力矩和/或反质量。

3. 发明授权

US5936710A Scanning type exposure apparatus, position control apparatus, and method therefor 失效
标题翻译：扫描型曝光装置，位置控制装置及其方法
公开(公告)号：US5936710A
公开(公告)日：1999-08-10
申请号：US772767
申请日：1996-12-24
申请人： Hiroshi Itoh , Masahiro Morisada
发明人： Hiroshi Itoh , Masahiro Morisada
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70558 , G03F7/70358 , G03F7/70725 , G03F9/70 , G03F9/7015
摘要： In a scanning type exposure apparatus, throughput is increased by omitting an unnecessary scanning period for settling. The scanning type exposure apparatus includes an exposure unit for exposing a substrate by projecting a pattern by a strip of light, an exposure control unit which turns on and off the exposure operation by the exposure unit, a designation value generator for designating a chip to be scanned and exposed next and a scanning speed, a reference position generator for generating a reference position of the pattern and a reference position of the substrate in accordance with the designation, and a position controller for controlling the positions of the pattern and the substrate on the basis of the reference positions. The reference position generator obtains a settling time for each chip by referring to a table storing predetermined settling times between the pattern and the substrate corresponding to each chip on the substrate and scanning speeds, and generates the reference positions of the pattern and the substrate for each chip on the basis of the settling time when performing exposure operation.
摘要翻译：在扫描型曝光装置中，通过省略用于稳定的不必要的扫描周期来增加吞吐量。扫描型曝光装置包括：曝光单元，用于通过用光条投影图案来曝光基板;曝光控制单元，其通过曝光单元打开和关闭曝光操作;指定值发生器，用于指定芯片为扫描和曝光的下一个扫描速度，基准位置发生器，用于根据该指定产生图案的基准位置和基准基准位置;以及位置控制器，用于控制图案和基板上的位置参考职位的基础。参考位置发生器通过参考在基板上对应于每个芯片的图案和基板之间存储预定的稳定时间的表格和扫描速度来获得每个芯片的建立时间，并且为每个芯片生成图案和基板的参考位置基于执行曝光操作时的建立时间的芯片。

4. 发明授权

US5233586A Servo control system for controlling tracking of an optical head on an optical disk 失效
标题翻译：伺服控制系统，用于控制光盘上光头的跟踪
公开(公告)号：US5233586A
公开(公告)日：1993-08-03
申请号：US1406
申请日：1993-01-07
申请人： Masahiro Morisada
发明人： Masahiro Morisada
IPC分类号： G11B7/09
CPC分类号： G11B7/09
摘要： Disclosed is a servo control system, which controls the position of a recording and/or reproducing head at the desired track on a record medium, comprising an actuator for moving the head relative to the track, a positional deviation detector, a controller for outputting the control signals for the actuator in such a manner that the head is put in the desired position relative to the track, a component for applying disturbance signals to the output of the controller, and a component for adjusting parameters of the controller which determines the correlation of the transfer characteristics at each frequency.
摘要翻译：公开了一种伺服控制系统，其控制在记录介质上的期望轨道处的记录和/或再现头的位置，包括用于相对于轨道移动头的致动器，位置偏差检测器，用于输出用于执行器的控制信号，使得头部相对于轨道被放置在期望的位置，用于向控制器的输出施加干扰信号的部件，以及用于调整控制器的参数的部件，该部件确定控制器的相关性每个频率的传输特性。

5. 发明授权

US07119879B2 Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method 有权
公开(公告)号：US07119879B2
公开(公告)日：2006-10-10
申请号：US11188620
申请日：2005-07-26
申请人： Masahiro Morisada
发明人： Masahiro Morisada
IPC分类号： G03B27/42 , G03B27/58 , H02K41/00 , G05B11/00
CPC分类号： H01L21/67276 , G03F7/70725 , G03F7/70775 , H01L21/682
摘要： A stage alignment apparatus includes a first moving member which moves in a first direction, a second moving member which moves in a second direction different from the first direction, a stage which is slidably supported by the first moving member and the second moving member and is guided in the first and second directions, a first control section which controls a posture of the first moving member in a third direction, the third direction being a direction rotatable about an axis substantially perpendicular to the first and second directions, and a second control section which controls a posture of the second moving member in the third direction on the basis of a signal which controls the posture of the first moving member in the third direction.

6. 发明授权

US06975383B2 Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method 失效
标题翻译：舞台对准装置及其控制方法，曝光装置和半导体装置的制造方法
公开(公告)号：US06975383B2
公开(公告)日：2005-12-13
申请号：US10368621
申请日：2003-02-20
申请人： Masahiro Morisada
发明人： Masahiro Morisada
IPC分类号： B23Q5/28 , G03F7/20 , G03F9/00 , H01L21/00 , H01L21/027 , H01L21/68 , G03B27/42 , G03B27/58 , G05B11/00
CPC分类号： H01L21/67276 , G03F7/70725 , G03F7/70775 , H01L21/682
摘要： A stage alignment apparatus includes a first moving member which can move in a first direction, a second moving member which can move in a second direction different from the first direction, a stage which is slidably supported by the first moving member and the second moving member and is guided in the first and second directions, a first control section which controls a posture, in a third direction different from the first and second directions, of the first moving member, and a second control section which controls a posture, in the third direction, of the second moving member on the basis of a signal which controls the posture of the first moving member. The second control section controls the posture of the second moving member on the basis of a signal which controls the posture of the first moving member filtered by a predetermined filter.
摘要翻译：舞台对准装置包括能够沿第一方向移动的第一移动构件，能够沿与第一方向不同的第二方向移动的第二移动构件，由第一移动构件和第二移动构件可滑动地支撑的台并且在第一和第二方向上被引导，第一控制部分控制第一移动部件的与第一和第二方向不同的第三方向的姿势，以及控制姿势的第二控制部，第三控制部基于控制第一移动部件的姿势的信号，第二移动部件的方向。第二控制部基于控制由规定的过滤器过滤的第一移动部件的姿势的信号来控制第二移动部件的姿势。

7. 发明申请

US20050217956A1 Active damping apparatus, exposure apparatus and device manufacturing method 有权
标题翻译：主动阻尼装置，曝光装置及装置的制造方法
公开(公告)号：US20050217956A1
公开(公告)日：2005-10-06
申请号：US11130240
申请日：2005-05-17
申请人： Masahiro Morisada
发明人： Masahiro Morisada
IPC分类号： F16F15/02 , G03F7/20 , H01L21/027 , F16M1/00
CPC分类号： G03F7/70766 , G03F7/70725 , G03F7/70833 , G03F7/709
摘要： An active damping apparatus for damping vibration due to driving of a stage and/or counter-mass mounted on an isolation table in an exposure device for the manufacture of semiconductor devices has a setting unit for selecting the stage and/or the counter-mass to drive and setting a control mode according to what is to be driven. The apparatus further has a control input switch that sets up a control loop for inputting control target values for driving the stage and/or the counter-mass to an isolation table controller so as to offset the drive reaction torque generated by the movement of the stage and/or counter-mass.
摘要翻译：一种用于在用于制造半导体器件的曝光装置中的用于阻挡安装在隔离台上的台架和/或反质量驱动的阻尼振动的主动阻尼装置具有设置单元，用于选择级和/或反质量至驱动并根据要驱动的方式设置控制模式。该装置还具有一个控制输入开关，该控制输入开关设置一个控制回路，用于将用于驱动该载物台的控制目标值和/或该反向质量输入到一个隔离台控制器，以便偏移该台架的运动产生的驱动反作用力矩和/或反质量。

8. 发明授权

US07342645B2 Stage control apparatus and method, stage apparatus and exposure apparatus 失效
标题翻译：舞台控制装置和方法，舞台装置和曝光装置
公开(公告)号：US07342645B2
公开(公告)日：2008-03-11
申请号：US11338773
申请日：2006-01-25
申请人： Masahiro Morisada
发明人： Masahiro Morisada
IPC分类号： G03B27/58 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70725 , G03F7/70783
摘要： A stage control apparatus for controlling a stage on which a substrate can be placed and moved generates a target value relating to a vertical direction of the stage based upon substrate surface position information that corresponds to unevenness of the surface of the substrate and generates a drive command signal of the stage based upon a deviation signal between the target value generated and a measured position of the stage. A target frequency is decided upon a spatial frequency possessed by the unevenness of the substrate surface. In order to generate the drive command signal, use is made of a signal obtained by amplifying a component of the target frequency of the deviation signal.
摘要翻译：用于控制可以放置和移动基板的载物台的载物台控制装置基于与基板的表面的不平坦度相对应的基板表面位置信息产生与载物台的垂直方向有关的目标值，并产生驱动指令基于产生的目标值与载物台的测量位置之间的偏差信号的载物台信号。目标频率由基板表面的不平坦度所具有的空间频率决定。为了产生驱动指令信号，使用通过放大偏差信号的目标频率的分量而获得的信号。

9. 发明授权

US07069114B2 Anti-vibration technique 有权
公开(公告)号：US07069114B2
公开(公告)日：2006-06-27
申请号：US11249458
申请日：2005-10-14
申请人： Masahiro Morisada
发明人： Masahiro Morisada
IPC分类号： G01M1/38
CPC分类号： F16F15/02 , F16F15/00 , F16F2228/10 , G05D19/02
摘要： A supporting apparatus includes a supporting member configured to support a movable member, an acceleration sensor configured to detect acceleration of the supporting member, an actuator configured to drive the supporting member, a memory configured to memorize offset data for the acceleration sensor, an offset unit configured to offset an output of the acceleration sensor in accordance with the offset data in the memory, a discrimination unit configured to discriminate whether the offset data should be renewed or not on the basis of an output of the acceleration sensor, and a renewing unit configured to renew the offset data on the basis of the result of the discrimination made by the discrimination unit.

10. 发明申请

US20060044537A1 Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method 有权
标题翻译：舞台对准装置及其控制方法，曝光装置及半导体装置的制造方法
公开(公告)号：US20060044537A1
公开(公告)日：2006-03-02
申请号：US11188620
申请日：2005-07-26
申请人： Masahiro Morisada
发明人： Masahiro Morisada
IPC分类号： G03B27/42
CPC分类号： H01L21/67276 , G03F7/70725 , G03F7/70775 , H01L21/682
摘要： A stage alignment apparatus includes a first moving member which moves in a first direction, a second moving member which moves in a second direction different from the first direction, a stage which is slidably supported by the first moving member and the second moving member and is guided in the first and second directions, a first control section which controls a posture of the first moving member in a third direction, the third direction being a direction rotatable about an axis substantially perpendicular to the first and second directions, and a second control section which controls a posture of the second moving member in the third direction on the basis of a signal which controls the posture of the first moving member in the third direction.
摘要翻译：台阶对准装置包括沿第一方向移动的第一移动构件，沿与第一方向不同的第二方向移动的第二移动构件，由第一移动构件和第二移动构件可滑动地支撑的台阶，在第一方向和第二方向上被引导的第一控制部分，第一控制部分，其在第三方向上控制第一移动部件的姿态，第三方向是可绕基本上垂直于第一和第二方向的轴线旋转的方向;以及第二控制部分其基于控制第一移动构件在第三方向上的姿势的信号来控制第二移动构件在第三方向上的姿势。

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