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81. 发明授权

US5844662A Resist processing apparatus and a resist processing method 失效
标题翻译：抗蚀剂处理装置和抗蚀剂处理方法
公开(公告)号：US5844662A
公开(公告)日：1998-12-01
申请号：US686707
申请日：1996-07-25
申请人： Masami Akimoto , Hikaru Itoh
发明人： Masami Akimoto , Hikaru Itoh
IPC分类号： H01L21/677 , G03F7/20 , H01L21/00 , H01L21/027 , H01L21/304 , G03B27/32 , E05D7/00
CPC分类号： H01L21/67161 , G03F7/7075 , G03F7/70875 , H01L21/67173 , H01L21/67178
摘要： The resist processing apparatus comprises a loader/unloader section provided with a plurality of cassettes, a first convey mechanism provided in the loader/unloader section, and for taking out an unprocessed substrate from the cassette, and for putting a processed substrate into the cassette, a first processing section provided at one side of the loader/unloader section and having a resist coating section for coating a resist to the substrate, a second processing section provided at another side of the loader/unloader section to be apart from the first processing section, and having a development processing section for developing the resist coated to the substrate, a second convey mechanism for receiving an unprocessed substrate from the first convey mechanism, for conveying the unprocessed substrate to the first processing section, and for delivering the substrate coated with a resist by the resist coating section, to the first convey mechanism, and a third convey mechanism for receiving an unprocessed substrate from the first convey mechanism, for conveying the unprocessed substrate to the second processing section, and for delivering the substrate developed by the development processing section, to the first convey mechanism.
摘要翻译：抗蚀剂处理装置包括设置有多个盒的装载/卸载部分，设置在装载/卸载部分中的第一传送机构，并且用于从盒中取出未处理的基板，并将经处理的基板放入盒中，第一处理部，设置在装载机/卸载部的一侧，并且具有用于将抗蚀剂涂布到基板的抗蚀剂涂布部;第二处理部，设置在装载机/卸载部的另一侧，与第一处理部分并且具有用于显影涂布到基板上的抗蚀剂的显影处理部分，用于从第一输送机构接收未处理的基板的第二输送机构，用于将未处理的基板输送到第一处理部分，以及输送涂覆有基板的基板抗蚀剂涂层部分抵抗第一传送机构和用于接收的第三传送机构将来自第一传送机构的未处理的基板输送到第一传送机构，用于将未处理的基板传送到第二处理部分，以及将由显影处理部分开发的基板输送到第一输送机构。

82. 发明授权

US5725100A Semiconductor wafer case 失效
标题翻译：半导体晶圆盒
公开(公告)号：US5725100A
公开(公告)日：1998-03-10
申请号：US749972
申请日：1996-11-14
申请人： Naoki Yamada
发明人： Naoki Yamada
IPC分类号： B65D85/86 , G03F7/20 , H01L21/673 , B65D85/30
CPC分类号： G03F7/7075 , H01L21/67353 , H01L21/67383
摘要： A semiconductor wafer case provides high resistance to vibration. The semiconductor wafer can be easily accessed from the case. The semiconductor wafer case includes a case body and a holder in which blade-type presser feet are provided. An end of each of the presser feet has a V-shaped cross-section. Spaces are provided between presser feet (32a, 33a) and presser feet (32b, 33b). Two holders of the same shape are provided at opposite sides of the case body so that the holders can hold the semiconductor wafer horizontally.
摘要翻译：半导体晶片盒提供高抗振动性。可以从壳体容易地接近半导体晶片。半导体晶片壳体包括壳体和设置有叶片式压脚的保持器。每个压脚的端部具有V形横截面。压脚（32a，33a）和压脚（32b，33b）之间设有空间。具有相同形状的两个保持器设置在壳体的相对侧，使得保持器能够水平地保持半导体晶片。

83. 发明授权

US5537311A Apparatus for aligning substrates for loading and unloading using a robot mechanism 失效
标题翻译：用于使用机器人机构对准用于装载和卸载的基板的装置
公开(公告)号：US5537311A
公开(公告)日：1996-07-16
申请号：US380221
申请日：1995-01-23
申请人： Craig L. Stevens
发明人： Craig L. Stevens
IPC分类号： B25J9/10 , B25J9/18 , B25J13/08 , B65G1/00 , G03F7/20 , H01L21/00 , H01L21/677 , H01L21/68 , H05K13/02 , G06F19/00
CPC分类号： H01L21/67259 , G03F7/7075 , G03F7/70791 , G03F7/70808 , H01L21/68 , H01L21/681
摘要： A technique for automatically compensating for differences in orientation of a workpiece, such as a rectangular substrate, a substrate cassette, a loadlock for accessing a vacuum chamber, and a substrate support on a robot mechanism. Sensors on the substrate support detect the position of a front edge of a substrate, a cassette or a loadlock, and measurements taken at the time the sensors are tripped by the edge are used to compute linear, angular and radial position corrections. More specifically, in moving a substrate from a cassette to the loadlock, the substrate support compensates for the orientation of the cassette, compensates for the orientation of the substrate within the cassette, and withdraws the substrate without contact with the cassette walls, and without the need for moving edge guides to orient the substrate. Before placing the substrate in the loadlock, the mechanism translates the substrate past a fixed sensor to determine the substrate position on the substrate support, and makes appropriate corrections to predicted linear and radial positions of the loadlock. The procedure for removing a substrate from the loadlock and placing it in a cassette employs a similar set of steps.
摘要翻译：用于自动补偿工件的方位差的技术，例如矩形基板，基板盒，用于访问真空室的负载锁和机器人机构上的基板支撑。基板支撑上的传感器检测基板，磁带盒或负载锁的前边缘的位置，以及在传感器被边缘跳闸时进行的测量用于计算线性，角度和径向位置校正。更具体地说，在将衬底从盒子移动到负荷锁定器时，衬底支撑件补偿盒的取向，补偿盒内的衬底的取向，并且将衬底取出而不与盒壁接触，需要移动边缘引导件来定向基板。在将基板放置在装载锁中之前，该机构将基板平移通过固定的传感器以确定基板支撑件上的基板位置，并对负载锁的预测的线性和径向位置进行适当的校正。从负载锁中去除衬底并将其放置在盒中的步骤采用了类似的步骤。

84. 发明授权

US5339074A Very low frequency tracking system 失效
标题翻译：超低频跟踪系统
公开(公告)号：US5339074A
公开(公告)日：1994-08-16
申请号：US759538
申请日：1991-09-13
申请人： Richard P. Shindley , Randall S. Williams
发明人： Richard P. Shindley , Randall S. Williams
IPC分类号： G06K17/00 , G01S13/75 , G03F7/20 , G07C9/00 , G07D9/00 , H04B5/00
CPC分类号： G03F7/70541 , G01S13/75 , G03F7/7075 , G07C9/00111
摘要： Apparatus identifying an instrumentality such as a person's hand or an article of merchandise, wherein the instrumentality carries a tag incorporating a transponder generating and transmitting a radio frequency identification signal in response to a radio frequency transmitted inquiry, a nest comprising an identifying station and incorporating a proximity sensor sensing the presence of the instrumentality at the identifying station and producing an indication of the presence or absence of the instrumentality, the identifying station comprising a radio frequency sensor portion generating a radio frequency transmitted inquiry transmitted to the transponder in response to sensing the presence of the instrumentality and receiving the radio frequency identification signal from the transponder, the proximity sensor terminating generation of the radio frequency transmitted inquiry when a clear and reliable output indication identifying the tag has been produced, and the proximity sensor also preventing, after producing a clear and reliable output indication, generation of a subsequent radio frequency transmitted inquiry until the proximity sensor has subsequently produced indications of the absence of the instrumentality at the identifying station.
摘要翻译：识别诸如人的手或商品的工具的装置，其中，所述工具携带包含响应于射频发送的查询产生和发射射频识别信号的转发器的标签，包含识别站的巢，接近传感器感测识别站处的工具的存在并且产生工具的存在或不存在的指示，识别站包括射频传感器部分，其产生响应于感测存在而发送到应答器的射频发送的查询并且接收来自应答器的射频识别信号，当已经产生识别标签的清晰可靠的输出指示时，接近传感器终止发射无线电频率的查询，并且接近传感器也在产生清晰可靠的输出指示之后，防止随后的射频发送询问的产生，直到接近传感器随后产生在识别站处不存在仪器的指示。

85. 发明授权

US5166884A Intelligent system for processing and storing articles 失效
标题翻译：用于处理和存储物品的智能系统
公开(公告)号：US5166884A
公开(公告)日：1992-11-24
申请号：US797714
申请日：1991-11-25
申请人： George A. Maney , Anthony C. Bonora , Mihir Parikh , Michael D. Brain
发明人： George A. Maney , Anthony C. Bonora , Mihir Parikh , Michael D. Brain
IPC分类号： G03F7/20 , H01L21/673
CPC分类号： H01L21/67294 , G03F7/70541 , G03F7/7075 , G03F7/70991
摘要： A system mounted with a transportable container for carrying articles such as semiconductor wafers which comprises a non-volatile memory used to store the identity, status and history of the articles in the container. Further, the system includes means for transmitting data from the memory to an information processor associated with a processing station which processes the articles in a carrier. In a preferred embodiment, the system includes data processing capability and both receives data from and transmits data to the processing station.
摘要翻译：一种安装有用于携带诸如半导体晶片的物品的可移动容器的系统，其包括用于存储容器中物品的身份，状态和历史的非易失性存储器。此外，该系统包括用于将数据从存储器传送到与处理载体中的物品的处理站相关联的信息处理器的装置。在优选实施例中，该系统包括数据处理能力，并且都从数据处理站接收数据并传输数据。

86. 发明授权

US4887904A Device for positioning a semi-conductor wafer 失效
标题翻译：用于定位半导体晶片的装置
公开(公告)号：US4887904A
公开(公告)日：1989-12-19
申请号：US222297
申请日：1988-07-22
申请人： Hiroshi Nakazato , Takashi Matsumura , Takahiro Akamatsu , Kenji Fukui
发明人： Hiroshi Nakazato , Takashi Matsumura , Takahiro Akamatsu , Kenji Fukui
IPC分类号： G03F7/20 , H01L21/68
CPC分类号： G03F7/70716 , G03F7/7075 , H01L21/681 , H01L21/682 , H01L2223/54493 , Y10S414/136
摘要： A device for detecting a position of an edge of a disk-like workpiece having an outer periphery whose shape includes a portion bearing positional information related to the workpiece, the device including a system for rotationally moving the workpiece; an illuminating system; and a photodetecting system; wherein the illuminating system and the photodetecting system are disposed so as to sandwich therebetween an outer peripheral portion of the workpiece when it is rotationally moved by the moving system and wherein the illuminating system projects, toward the photodetecting system, a light beam having an elongated shape in cross-section.
摘要翻译：一种用于检测具有外周的圆盘状工件的边缘的位置的装置，该外周的形状包括与工件相关的位置信息的部分，该装置包括用于旋转移动工件的系统; 照明系统; 和光电检测系统; 其中所述照明系统和所述光电检测系统被设置成当由所述移动系统旋转移动时将所述工件的外周部分夹在其间，并且所述照明系统向所述光电检测系统突出具有细长形状的光束横截面。

87. 发明授权

US4827110A Method and apparatus for monitoring the location of wafer disks 失效
标题翻译：用于监测晶圆盘位置的方法和装置
公开(公告)号：US4827110A
公开(公告)日：1989-05-02
申请号：US61935
申请日：1987-06-11
申请人： Alexander N. Rossi , Mario N. Sancen
发明人： Alexander N. Rossi , Mario N. Sancen
IPC分类号： G03F7/20 , G06K7/10 , H01L21/00 , H01L21/673 , G06F15/46
CPC分类号： H01L21/67326 , G03F7/70541 , G03F7/7075 , G06K7/10009 , H01L21/67294
摘要： A method and system for monitoring the process of a plurality of batches of semiconductor wafers or memory disks through a series of processing operations. Each batch is placed in a carrier in which it is transported to the locations where the processing operations are performed. Each carrier is provided with a transponder tag coded to be responsive to within reading range of a reader unit which transmits a radio frequency signal to the transponder tag and reads and decodes a phase modulated signal returned by the transponder tag to uniquely identify the carrier that is positioned within range of the reader unit. Further control apparatus receives information from the reader units to permit the monitoring process of semiconductor wafer or memory disk batches through multiple processing operations.
摘要翻译：一种用于通过一系列处理操作监视多批半导体晶片或存储盘的处理的方法和系统。每个批次被放置在载体中，将其输送到执行处理操作的位置。每个载波都设置有一个编码为响应于在读取器单元的读取范围内的应答器标签，读取器单元向应答器标签发送射频信号，并且读取和解码由应答器标签返回的相位调制信号，以唯一地识别作为位于读取器单元的范围内。进一步的控制装置从读取器单元接收信息，以通过多个处理操作来允许半导体晶片或存储器盘批次的监视处理。

88. 发明授权

US4522489A Device for photolithographically treating a thin substrate 失效
标题翻译：用于光刻处理薄基板的装置
公开(公告)号：US4522489A
公开(公告)日：1985-06-11
申请号：US567823
申请日：1984-01-03
申请人： Adrianus G. Bouwer
发明人： Adrianus G. Bouwer
IPC分类号： H01L21/30 , G03F7/20 , G03F7/30 , G03F9/00 , H01L21/027 , G03B27/60
CPC分类号： G03F7/7075
摘要： A device for photolithographically treating a thin substrate comprises pre-alignment station, a substrate-supporting table and a transport arm which is provided with a vacuum connection for holding the substrate by suction at its lower side during transport of the substrate from the pre-alignment station to the substrate table. The substrate table is provided with supporting means for the substrate which are adjustable in the direction of height and which have a supporting surface which is adjustable to a distance above the substrate table exceeding the thickness of the transport arm and is adjustable in a downward direction at least through a distance such that the supporting surface is level with the upper surface of the substrate table, the supporting means leaving a space free for the movement of the transport arm above a part of the substrate table.
摘要翻译：用于光刻处理薄基板的装置包括预对准台，基板支撑台和输送臂，该基板支撑台和输送臂设置有真空连接件，用于在基板从预对准运输期间的下侧通过抽吸来保持基板站到基板台。衬底台设置有用于衬底的支撑装置，其可在高度方向上调节，并且具有支撑表面，该支撑表面可调节到超过衬底台的距离，超过传送臂的厚度，并且可在下方方向上调节至少一段距离使得支撑表面与基板台的上表面平齐，支撑装置留下一个空间，使输送臂在基板台的一部分上方移动。

89. 发明申请

US20180348653A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20180348653A1
公开(公告)日：2018-12-06
申请号：US16053411
申请日：2018-08-02
申请人： NIKON CORPORATION
发明人： Naoyuki KOBAYASHI , Soichi OWA , Shigeru HIRUKAWA , Yasuhiro OMURA
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/7075 , G03F7/70875 , G03F7/70891
摘要： A liquid immersion exposure apparatus exposes a substrate by irradiating an exposure beam on the substrate through liquid. The apparatus has a substrate stage which is provided with a substrate holding portion on which the substrate is held and is provided with a stage member having an upper surface. The upper surface of the stage member is provided adjacent to the upper surface of the held substrate with a gap between the held substrate and the stage member. A temperature adjustment system, a part of which is provided under the upper surface of the stage member, performs temperature adjustment for the stage member.

90. 发明授权

US10007197B2 Sensor system, substrate handling system and lithographic apparatus 有权
公开(公告)号：US10007197B2
公开(公告)日：2018-06-26
申请号：US15121719
申请日：2015-03-02
申请人： ASML Netherlands B.V.
发明人： Joeri Lof , Joost Kauffman , Martin Dieter Nico Peters , Petrus Theodorus Rutgers , Martijn Hendrikus Wilhelmus Stopel , Gerard Van Den Eijkel , Harmen Klaas Van Der Schoot , Raimond Visser
IPC分类号： G03F7/20 , G03F9/00 , H01L21/68 , H01L21/687 , G01B11/27 , H01L21/66
CPC分类号： G03F7/70775 , G01B11/272 , G03F7/7075 , G03F9/7011 , H01L21/681 , H01L21/682 , H01L21/68707 , H01L22/12
摘要： A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.

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