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81. 发明授权

US6098809A Storage container for precision substrates 有权
标题翻译：精密基板储存容器
公开(公告)号：US6098809A
公开(公告)日：2000-08-08
申请号：US347252
申请日：1999-07-02
申请人： Kazuya Okada , Tatsuaki Hirohata
发明人： Kazuya Okada , Tatsuaki Hirohata
IPC分类号： B65D85/86 , G03F7/20 , H01L21/673 , B65D85/48
CPC分类号： H01L21/67294 , G03F1/66 , G03F7/70541 , G03F7/70741 , G03F7/7075 , H01L21/67373 , H01L21/67379
摘要： A storage container for precision substrates comprising: an opening front face of a pod case for aligning and accommodating a plurality of wafers is covered with a pod door, a bottom plate attached to a bottom face of the pod case, and a pocket body integrally formed at the other end of the bottom plate and adjacent to the back face of the pod case in a standing condition. An identification plate for wafers is detachably inserted into the pocket. Since there is no need of peeling off an identification code seal from the storage container for precision substrates, contamination of the wafer can be prevented.
摘要翻译： 1.一种用于精密基板的储存容器，包括：用于对准和容纳多个晶片的荚壳的开口前面被荚门覆盖，安装在荚壳的底面的底板和一体形成的袋体在底板的另一端处，并且在静止状态下与荚壳的背面相邻。用于晶片的识别板可拆卸地插入袋中。由于不需要从用于精密基板的存储容器剥离识别码密封，因此可以防止晶片的污染。

82. 发明授权

US6059507A Substrate processing apparatus with small batch load lock 失效
标题翻译：基板加工设备，小批量装载锁
公开(公告)号：US6059507A
公开(公告)日：2000-05-09
申请号：US49314
申请日：1998-03-27
申请人： Douglas R. Adams
发明人： Douglas R. Adams
IPC分类号： G03F7/20 , H01L21/677 , B65G1/10
CPC分类号： H01L21/67748 , G03F7/7075 , G03F7/70808 , H01L21/67201 , H01L21/67751 , H01L21/67778 , Y10S414/137 , Y10S414/139
摘要： A substrate load lock comprising a frame and a substrate support movably mounted to the frame. The frame forms at least three chambers. The substrate support has at least two separate support areas. The first one of the support areas is movable between the first one of the chambers. A second one of the support areas is movable between the second chamber and a third one of the chambers.
摘要翻译：一种衬底加载锁，其包括可移动地安装到框架的框架和基板支撑件。框架至少形成三个室。衬底支撑件具有至少两个单独的支撑区域。第一个支撑区域可以在第一个腔室之间移动。支撑区域中的第二个可在第二腔室和第三腔室之间移动。

83. 发明授权

US6017663A Method of processing resist utilizing alkaline component monitoring 失效
标题翻译：利用碱性成分监测处理抗蚀剂的方法
公开(公告)号：US6017663A
公开(公告)日：2000-01-25
申请号：US277735
申请日：1999-03-29
申请人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
发明人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
IPC分类号： G03F7/30 , G03F7/16 , G03F7/20 , G03F7/26 , H01L21/00 , H01L21/027 , G03F9/00
CPC分类号： H01L21/67173 , G03F7/16 , G03F7/26 , G03F7/7075 , G03F7/70866 , H01L21/67017 , H01L21/67178 , Y10S414/135
摘要： A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold value.
摘要翻译：一种在基板上形成抗蚀剂并在具有空调的处理区域和非处理区域的抗蚀剂处理系统中处理抗蚀剂的方法，该方法包括以下步骤：将基板转移到非处理区域将抗蚀剂涂覆在基材上，使涂覆的抗蚀剂曝光，显影曝光的抗蚀剂，使涂覆的抗蚀剂至少一次，在从转印步骤到显影步骤的时间段内进行热处理，至少检测一次，在从转印步骤到显影步骤的期间，处理气氛中的抗蚀剂分辨率降低的碱性成分，在导致抗蚀剂分辨率不良的处理气氛中设定碱成分浓度的阈值，以及根据检测到的碱性com的浓度控制和改变步骤中的至少一种处理气氛 ponent和阈值。

84. 发明授权

US5849602A Resist processing process 失效
标题翻译：抗蚀加工工艺
公开(公告)号：US5849602A
公开(公告)日：1998-12-15
申请号：US582280
申请日：1996-01-03
申请人： Kouji Okamura , Masami Akimoto
发明人： Kouji Okamura , Masami Akimoto
IPC分类号： G03F7/20 , G03F7/38 , H01L21/00 , H01L21/3105 , H01L21/306 , G03C5/00 , H01L21/311 , H01L21/324
CPC分类号： H01L21/67173 , G03F7/38 , G03F7/7075 , G03F7/70991 , H01L21/3105 , H01L21/67225 , H01L21/67276 , Y10S438/908 , Y10T29/41
摘要： The substrate unloaded from the exposure device is received at the interface unit, and then carried by the substrate carrying means to the heat treatment unit, where a heat treatment is carried out on the substrate. After that, the substrate is carried from the heat treatment unit to the cooling unit, where the substrate is cooled. After the completion of the cooling process, the substrate is carried by the carrying means from the cooling unit to the development unit, where the resist film on the substrate is developed. In this resist process, the required time for the process at the heat treatment unit is changed in accordance with the required time for the process at the exposure unit. The required time for the process at the heat treatment unit is equalized with the required time for the process at the exposure device. The required time for the process at the heat treatment process is changed by prolonging or shortening the pre-process at the heat treatment unit.
摘要翻译：从曝光装置卸载的基板在界面单元处被接收，然后由基板承载装置承载到热处理单元上，在基板上进行热处理。之后，将基板从热处理单元运送到冷却单元，在该单元中冷却基板。在冷却过程完成之后，基板由承载装置从冷却单元传送到显影单元，在该显影单元上显影基板上的抗蚀剂膜。在该抗蚀剂工艺中，热处理单元处理所需的时间根据曝光单元处理所需的时间而改变。在热处理单元处理所需的时间与曝光装置处理所需的时间相等。通过延长或缩短热处理单元的预处理来改变热处理过程中所需的时间。

85. 发明授权

US5844662A Resist processing apparatus and a resist processing method 失效
标题翻译：抗蚀剂处理装置和抗蚀剂处理方法
公开(公告)号：US5844662A
公开(公告)日：1998-12-01
申请号：US686707
申请日：1996-07-25
申请人： Masami Akimoto , Hikaru Itoh
发明人： Masami Akimoto , Hikaru Itoh
IPC分类号： H01L21/677 , G03F7/20 , H01L21/00 , H01L21/027 , H01L21/304 , G03B27/32 , E05D7/00
CPC分类号： H01L21/67161 , G03F7/7075 , G03F7/70875 , H01L21/67173 , H01L21/67178
摘要： The resist processing apparatus comprises a loader/unloader section provided with a plurality of cassettes, a first convey mechanism provided in the loader/unloader section, and for taking out an unprocessed substrate from the cassette, and for putting a processed substrate into the cassette, a first processing section provided at one side of the loader/unloader section and having a resist coating section for coating a resist to the substrate, a second processing section provided at another side of the loader/unloader section to be apart from the first processing section, and having a development processing section for developing the resist coated to the substrate, a second convey mechanism for receiving an unprocessed substrate from the first convey mechanism, for conveying the unprocessed substrate to the first processing section, and for delivering the substrate coated with a resist by the resist coating section, to the first convey mechanism, and a third convey mechanism for receiving an unprocessed substrate from the first convey mechanism, for conveying the unprocessed substrate to the second processing section, and for delivering the substrate developed by the development processing section, to the first convey mechanism.
摘要翻译：抗蚀剂处理装置包括设置有多个盒的装载/卸载部分，设置在装载/卸载部分中的第一传送机构，并且用于从盒中取出未处理的基板，并将经处理的基板放入盒中，第一处理部，设置在装载机/卸载部的一侧，并且具有用于将抗蚀剂涂布到基板的抗蚀剂涂布部;第二处理部，设置在装载机/卸载部的另一侧，与第一处理部分并且具有用于显影涂布到基板上的抗蚀剂的显影处理部分，用于从第一输送机构接收未处理的基板的第二输送机构，用于将未处理的基板输送到第一处理部分，以及输送涂覆有基板的基板抗蚀剂涂层部分抵抗第一传送机构和用于接收的第三传送机构将来自第一传送机构的未处理的基板输送到第一传送机构，用于将未处理的基板传送到第二处理部分，以及将由显影处理部分开发的基板输送到第一输送机构。

86. 发明授权

US5725100A Semiconductor wafer case 失效
标题翻译：半导体晶圆盒
公开(公告)号：US5725100A
公开(公告)日：1998-03-10
申请号：US749972
申请日：1996-11-14
申请人： Naoki Yamada
发明人： Naoki Yamada
IPC分类号： B65D85/86 , G03F7/20 , H01L21/673 , B65D85/30
CPC分类号： G03F7/7075 , H01L21/67353 , H01L21/67383
摘要： A semiconductor wafer case provides high resistance to vibration. The semiconductor wafer can be easily accessed from the case. The semiconductor wafer case includes a case body and a holder in which blade-type presser feet are provided. An end of each of the presser feet has a V-shaped cross-section. Spaces are provided between presser feet (32a, 33a) and presser feet (32b, 33b). Two holders of the same shape are provided at opposite sides of the case body so that the holders can hold the semiconductor wafer horizontally.
摘要翻译：半导体晶片盒提供高抗振动性。可以从壳体容易地接近半导体晶片。半导体晶片壳体包括壳体和设置有叶片式压脚的保持器。每个压脚的端部具有V形横截面。压脚（32a，33a）和压脚（32b，33b）之间设有空间。具有相同形状的两个保持器设置在壳体的相对侧，使得保持器能够水平地保持半导体晶片。

87. 发明授权

US5537311A Apparatus for aligning substrates for loading and unloading using a robot mechanism 失效
标题翻译：用于使用机器人机构对准用于装载和卸载的基板的装置
公开(公告)号：US5537311A
公开(公告)日：1996-07-16
申请号：US380221
申请日：1995-01-23
申请人： Craig L. Stevens
发明人： Craig L. Stevens
IPC分类号： B25J9/10 , B25J9/18 , B25J13/08 , B65G1/00 , G03F7/20 , H01L21/00 , H01L21/677 , H01L21/68 , H05K13/02 , G06F19/00
CPC分类号： H01L21/67259 , G03F7/7075 , G03F7/70791 , G03F7/70808 , H01L21/68 , H01L21/681
摘要： A technique for automatically compensating for differences in orientation of a workpiece, such as a rectangular substrate, a substrate cassette, a loadlock for accessing a vacuum chamber, and a substrate support on a robot mechanism. Sensors on the substrate support detect the position of a front edge of a substrate, a cassette or a loadlock, and measurements taken at the time the sensors are tripped by the edge are used to compute linear, angular and radial position corrections. More specifically, in moving a substrate from a cassette to the loadlock, the substrate support compensates for the orientation of the cassette, compensates for the orientation of the substrate within the cassette, and withdraws the substrate without contact with the cassette walls, and without the need for moving edge guides to orient the substrate. Before placing the substrate in the loadlock, the mechanism translates the substrate past a fixed sensor to determine the substrate position on the substrate support, and makes appropriate corrections to predicted linear and radial positions of the loadlock. The procedure for removing a substrate from the loadlock and placing it in a cassette employs a similar set of steps.
摘要翻译：用于自动补偿工件的方位差的技术，例如矩形基板，基板盒，用于访问真空室的负载锁和机器人机构上的基板支撑。基板支撑上的传感器检测基板，磁带盒或负载锁的前边缘的位置，以及在传感器被边缘跳闸时进行的测量用于计算线性，角度和径向位置校正。更具体地说，在将衬底从盒子移动到负荷锁定器时，衬底支撑件补偿盒的取向，补偿盒内的衬底的取向，并且将衬底取出而不与盒壁接触，需要移动边缘引导件来定向基板。在将基板放置在装载锁中之前，该机构将基板平移通过固定的传感器以确定基板支撑件上的基板位置，并对负载锁的预测的线性和径向位置进行适当的校正。从负载锁中去除衬底并将其放置在盒中的步骤采用了类似的步骤。

88. 发明授权

US5339074A Very low frequency tracking system 失效
标题翻译：超低频跟踪系统
公开(公告)号：US5339074A
公开(公告)日：1994-08-16
申请号：US759538
申请日：1991-09-13
申请人： Richard P. Shindley , Randall S. Williams
发明人： Richard P. Shindley , Randall S. Williams
IPC分类号： G06K17/00 , G01S13/75 , G03F7/20 , G07C9/00 , G07D9/00 , H04B5/00
CPC分类号： G03F7/70541 , G01S13/75 , G03F7/7075 , G07C9/00111
摘要： Apparatus identifying an instrumentality such as a person's hand or an article of merchandise, wherein the instrumentality carries a tag incorporating a transponder generating and transmitting a radio frequency identification signal in response to a radio frequency transmitted inquiry, a nest comprising an identifying station and incorporating a proximity sensor sensing the presence of the instrumentality at the identifying station and producing an indication of the presence or absence of the instrumentality, the identifying station comprising a radio frequency sensor portion generating a radio frequency transmitted inquiry transmitted to the transponder in response to sensing the presence of the instrumentality and receiving the radio frequency identification signal from the transponder, the proximity sensor terminating generation of the radio frequency transmitted inquiry when a clear and reliable output indication identifying the tag has been produced, and the proximity sensor also preventing, after producing a clear and reliable output indication, generation of a subsequent radio frequency transmitted inquiry until the proximity sensor has subsequently produced indications of the absence of the instrumentality at the identifying station.
摘要翻译：识别诸如人的手或商品的工具的装置，其中，所述工具携带包含响应于射频发送的查询产生和发射射频识别信号的转发器的标签，包含识别站的巢，接近传感器感测识别站处的工具的存在并且产生工具的存在或不存在的指示，识别站包括射频传感器部分，其产生响应于感测存在而发送到应答器的射频发送的查询并且接收来自应答器的射频识别信号，当已经产生识别标签的清晰可靠的输出指示时，接近传感器终止发射无线电频率的查询，并且接近传感器也在产生清晰可靠的输出指示之后，防止随后的射频发送询问的产生，直到接近传感器随后产生在识别站处不存在仪器的指示。

89. 发明授权

US5166884A Intelligent system for processing and storing articles 失效
标题翻译：用于处理和存储物品的智能系统
公开(公告)号：US5166884A
公开(公告)日：1992-11-24
申请号：US797714
申请日：1991-11-25
申请人： George A. Maney , Anthony C. Bonora , Mihir Parikh , Michael D. Brain
发明人： George A. Maney , Anthony C. Bonora , Mihir Parikh , Michael D. Brain
IPC分类号： G03F7/20 , H01L21/673
CPC分类号： H01L21/67294 , G03F7/70541 , G03F7/7075 , G03F7/70991
摘要： A system mounted with a transportable container for carrying articles such as semiconductor wafers which comprises a non-volatile memory used to store the identity, status and history of the articles in the container. Further, the system includes means for transmitting data from the memory to an information processor associated with a processing station which processes the articles in a carrier. In a preferred embodiment, the system includes data processing capability and both receives data from and transmits data to the processing station.
摘要翻译：一种安装有用于携带诸如半导体晶片的物品的可移动容器的系统，其包括用于存储容器中物品的身份，状态和历史的非易失性存储器。此外，该系统包括用于将数据从存储器传送到与处理载体中的物品的处理站相关联的信息处理器的装置。在优选实施例中，该系统包括数据处理能力，并且都从数据处理站接收数据并传输数据。

90. 发明授权

US4887904A Device for positioning a semi-conductor wafer 失效
标题翻译：用于定位半导体晶片的装置
公开(公告)号：US4887904A
公开(公告)日：1989-12-19
申请号：US222297
申请日：1988-07-22
申请人： Hiroshi Nakazato , Takashi Matsumura , Takahiro Akamatsu , Kenji Fukui
发明人： Hiroshi Nakazato , Takashi Matsumura , Takahiro Akamatsu , Kenji Fukui
IPC分类号： G03F7/20 , H01L21/68
CPC分类号： G03F7/70716 , G03F7/7075 , H01L21/681 , H01L21/682 , H01L2223/54493 , Y10S414/136
摘要： A device for detecting a position of an edge of a disk-like workpiece having an outer periphery whose shape includes a portion bearing positional information related to the workpiece, the device including a system for rotationally moving the workpiece; an illuminating system; and a photodetecting system; wherein the illuminating system and the photodetecting system are disposed so as to sandwich therebetween an outer peripheral portion of the workpiece when it is rotationally moved by the moving system and wherein the illuminating system projects, toward the photodetecting system, a light beam having an elongated shape in cross-section.
摘要翻译：一种用于检测具有外周的圆盘状工件的边缘的位置的装置，该外周的形状包括与工件相关的位置信息的部分，该装置包括用于旋转移动工件的系统; 照明系统; 和光电检测系统; 其中所述照明系统和所述光电检测系统被设置成当由所述移动系统旋转移动时将所述工件的外周部分夹在其间，并且所述照明系统向所述光电检测系统突出具有细长形状的光束横截面。

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