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    • 89. 发明授权
    • III nitride single crystal manufacturing method
    • III族氮化物单晶制造方法
    • US07534295B2
    • 2009-05-19
    • US10569813
    • 2005-07-13
    • Seiji Nakahata
    • Seiji Nakahata
    • C30B7/00H01L21/36
    • C30B19/04C30B7/00C30B7/005C30B9/06C30B13/02C30B29/403
    • A III nitride single-crystal manufacturing method in which a liquid layer (3) of 200 μm or less thickness is formed in between a substrate (1) and a III nitride source-material baseplate (2), and III nitride single crystal (4) is grown onto the face (1s) on the liquid-layer side of the substrate (1). Herein, the substrate (1) in at least a superficial layer (1a) on the liquid-layer side may be formed of a III nitride single crystal, while the III nitride source-material baseplate (2) can be formed of a III nitride polycrystal. Further, the substrate (1) in at least a superficial layer (1a) on the liquid-layer side, and the III nitride source-material baseplate (2) can be formed of a III nitride single crystal, while the face (1s) on the liquid-layer side of the substrate (1) can be made a III-atom surface, and the face (2s) on the liquid-layer side of the III nitride source-material baseplate (2) can be made a nitrogen-atom surface.
    • 在基板(1)和III族氮化物源材料基板(2)之间形成厚度为200μm以下的液体层(3)和III族氮化物单晶(4)的III族氮化物单晶体制造方法 )生长在基板(1)的液体层侧的面(1s)上。 这里,液面侧的至少表面层(1a)中的基板(1)可以由III族氮化物单晶形成,而III族氮化物源材料基板(2)可以由III族氮化物 多晶体 此外,液面层至少表层(1a)中的基板(1)和III族氮化物源材料基板(2)可以由III族氮化物单晶形成,而面(1s) 可以在基板(1)的液面侧形成III原子表面,并且可以将III族氮化物源材料基板(2)的液体层侧的面(2s) 原子表面。
    • 90. 发明申请
    • THICK POROUS ANODIC ALUMINA FILMS AND NANOWIRE ARRAYS GROWN ON A SOLID SUBSTRATE
    • 厚多孔阳极氧化铝膜和固体基底上的纳米阵列
    • US20080210662A1
    • 2008-09-04
    • US11832309
    • 2007-08-01
    • Oded RabinPaul R. HerzMildred S. DresselhausAkintunde I. AkinwandeYu-Ming Lin
    • Oded RabinPaul R. HerzMildred S. DresselhausAkintunde I. AkinwandeYu-Ming Lin
    • H01B13/00B29C65/72
    • C23C14/024B82Y30/00C23C14/16C23C14/5873C30B7/00C30B7/005C30B29/605H01L35/32H01L35/34Y10T156/10Y10T428/12486Y10T428/1259Y10T428/24273Y10T428/24322Y10T428/24917
    • The presently disclosed invention provides for the fabrication of porous anodic alumina (PAA) films on a wide variety of substrates. The substrate comprises a wafer layer and may further include an adhesion layer deposited on the wafer layer. An anodic alumina template is formed on the substrate. When a rigid substrate such as Si is used, the resulting anodic alumina film is more tractable, easily grown on extensive areas in a uniform manner, and manipulated without danger of cracking. The substrate can be manipulated to obtain free-standing alumina templates of high optical quality and substantially flat surfaces. PAA films can also be grown this way on patterned and non-planar surfaces. Furthermore, under certain conditions the resulting PAA is missing the barrier layer (partially or completely) and the bottom of the pores can be readily accessed electrically. The resultant film can be used as a template for forming an array of nanowires wherein the nanowires are deposited electrochemically into the pores of the template. By patterning the electrically conducting adhesion layer, pores in different areas of the template can be addressed independently, and can be filled electrochemically by different materials. Single-stage and multi-stage nanowire-based thermoelectric devices, consisting of both n-type and p-type nanowires, can be assembled on a silicon substrate by this method.
    • 目前公开的发明提供了在各种基底上制造多孔阳极氧化铝(PAA)膜。 衬底包括晶片层,并且还可以包括沉积在晶片层上的粘附层。 在基板上形成阳极氧化铝模板。 当使用诸如Si的刚性基材时,所得的阳极氧化铝膜更易于处理,容易在均匀的方式在广泛的区域生长,并且操作而没有开裂的危险。 可以操作基底以获得高光学质量和基本平坦表面的独立氧化铝模板。 PAA膜也可以在图案和非平面表面上生长。 此外,在某些条件下,所得PAA缺少阻挡层(部分或完全),并且孔的底部可以容易地电接触。 所得膜可以用作形成纳米线阵列的模板,其中纳米线电化学沉积到模板的孔中。 通过图案化导电粘合层,可以独立地解决模板的不同区域中的孔,并且可以通过不同的材料电化学填充。 通过这种方法,可以在硅衬底上组装由n型和p型纳米线组成的单级和多级纳米线型热电装置。