会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 88. 发明申请
    • COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION
    • 抗敏化合物和辐射敏感性组合物规格
    • US20130004896A1
    • 2013-01-03
    • US13614976
    • 2012-09-13
    • Masatoshi ECHIGODai Oguro
    • Masatoshi ECHIGODai Oguro
    • G03F7/004G03F7/20
    • G03F7/0045C07C39/15C07C43/164C07C43/18C07C43/196C07C43/2055C07C43/225C07C43/315C07C49/747C07C69/96C07C2601/14C07C2603/74G03F7/0392Y10S430/106
    • A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.
    • 含有1至80重量%固体组分和20至99重量%溶剂的辐射敏感组合物。 固体成分含有化合物B,该化合物B具有(a)由多酚化合物A导入的结构,该酸结合基通过将多元酚化合物A中的至少一个酚羟基引入到通过二 - 具有5至36个碳原子的四官能芳族酮或芳族醛与具有1至3个酚羟基和6至15个碳原子的化合物,和(b)分子量为400至2000.含有化合物B的组合物是有用的 作为酸性扩增的非聚合抗蚀剂材料,因为它对诸如KrF准分子激光器,极紫外线,电子束和X射线的辐射高度敏感,并且提供具有高分辨率,高耐热性的抗蚀剂图案, 耐腐蚀性高。