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1. 发明授权

US09150491B2 Bicyclohexane derivative compound and manufacturing method of the same 有权
标题翻译：双环己烷衍生物化合物及其制备方法
公开(公告)号：US09150491B2
公开(公告)日：2015-10-06
申请号：US13522292
申请日：2011-01-13
申请人： Masatoshi Echigo , Dai Oguro
发明人： Masatoshi Echigo , Dai Oguro
IPC分类号： C07C69/54 , C07C43/12 , C07C43/23 , C07C59/72 , C07C69/712 , C08F20/28 , C08F220/28 , C08K5/04 , G03F7/039
CPC分类号： C07C69/54 , C07C43/12 , C07C43/23 , C07C59/72 , C07C69/712 , C07C2601/14 , C08F20/28 , C08F220/28 , C08K5/04 , G03F7/0392 , G03F7/0397 , C08F2220/282 , C08F2220/283 , C08F220/20
摘要： A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. (In formula (II), Y independently represents an alkyl group of 1 to 10 carbons, a halogen atom, an acyloxy group, an alkoxycarbonyl group or a hydroxyl group, X1 represents a halogen atom, m represents an integer of 0 to 11, and m represents an integer of 0 to 10.).
摘要翻译：提供了可用于光致抗蚀剂领域的双环己烷衍生物化合物，药物和农药中间体领域等及其制备方法。提供由以下通式（II）表示的双环己烷衍生物化合物。（式（II）中，Y独立地表示碳数1〜10的烷基，卤素原子，酰氧基，烷氧基羰基或羟基，X1表示卤素原子，m表示0〜11的整数， m表示0〜10的整数。

2. 发明授权

US08748078B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern 有权
标题翻译：环状化合物，其制备方法，辐射敏感性组合物和形成抗蚀剂图案的方法
公开(公告)号：US08748078B2
公开(公告)日：2014-06-10
申请号：US13393988
申请日：2010-08-30
申请人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
发明人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
IPC分类号： G03F7/004 , G03F7/028 , C07C69/95 , C07C39/12 , C07C39/16
CPC分类号： C07C37/20 , C07C39/17 , C07C47/546 , C07C2601/14 , C07C2603/92 , G03F7/038 , G03F7/0382
摘要： A cyclic compound represented by formula (1): wherein L, R1, R′, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
摘要翻译：由式（1）表示的环状化合物：其中L，R1，R'和m如说明书中所定义。式（1）的环状化合物对安全性溶剂高度可溶，高度敏感，能够形成具有良好外观的抗蚀剂图案。因此，环状化合物可用作辐射敏感性组合物的组分。

3. 发明申请

US20120251947A1 CYCLIC COMPOUND, METHOD OF PRODUCING THE SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：环化合物，其制造方法，辐射敏感性组合物和形成耐药性图案的方法
公开(公告)号：US20120251947A1
公开(公告)日：2012-10-04
申请号：US13500715
申请日：2010-09-27
申请人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
发明人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
IPC分类号： C07C39/17 , G03F7/20 , C07D319/06 , G03F7/027 , C07C37/00 , C07C47/36
CPC分类号： G03F7/0382 , C07C37/20 , C08G8/04 , C07C39/17
摘要： This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.
摘要翻译：本发明涉及提供在安全溶剂中具有高溶解度的环状化合物和高灵敏度并且所得抗蚀剂图案的形状良好的环状化合物的方法，其制备方法，包含其的辐射敏感组合物和方法使用该辐射敏感组合物形成抗蚀剂图案。作为解决问题的手段，提供了具有特定结构的环状化合物，包含该化合物的辐射敏感性组合物，以及使用该组合物形成抗蚀剂图案的方法。

4. 发明申请

US20120156615A1 CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN 审中-公开
标题翻译：环化合物，循环化合物的生产方法，辐射敏感性组合物和形成耐蚀图案的方法
公开(公告)号：US20120156615A1
公开(公告)日：2012-06-21
申请号：US13392254
申请日：2010-08-27
申请人： Masatoshi Echigo , Hiromi Hayashi
发明人： Masatoshi Echigo , Hiromi Hayashi
IPC分类号： G03F7/20 , C07C37/20 , G03F7/027 , C07C39/17
CPC分类号： C07C43/23 , C07C37/20 , C07C41/16 , C07C2601/14 , C07C2603/92 , G03F7/0382 , C07C39/17
摘要： A cyclic compound represented by formula (1): wherein L, R1, R′, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
摘要翻译：由式（1）表示的环状化合物：其中L，R1，R'和m如说明书中所定义。式（1）的环状化合物对安全性溶剂高度可溶，高度敏感，能够形成具有良好外观的抗蚀剂图案。因此，环状化合物可用作辐射敏感性组合物的组分。

5. 发明授权

US07473806B2 Modified chain aliphatic polyamine 有权
标题翻译：改性链脂族多胺
公开(公告)号：US07473806B2
公开(公告)日：2009-01-06
申请号：US10739006
申请日：2003-12-19
申请人： Masatoshi Echigo , Hisayuki Kuwahara , Takeshi Koyama
发明人： Masatoshi Echigo , Hisayuki Kuwahara , Takeshi Koyama
IPC分类号： C07C211/00
CPC分类号： C09D163/00 , C07C211/14 , C07C211/27 , C07C211/35 , C07C211/40 , C07C2601/14 , C07C2601/16 , C08G59/5006
摘要： A modified chain aliphatic polyamine obtained by addition reaction of a chain aliphatic polyamine having a specific structure and an unsaturated hydrocarbon compound has a low viscosity and it provides, when used as a curing agent for epoxy resin, an epoxy resin composition which can provide an epoxy resin cured product having an excellent property. Further, a modified chain aliphatic polyamine composition obtained by addition reaction of a chain aliphatic polyamine having a specific structure and an unsaturated hydrocarbon compound followed by the removing step of unreacted chain aliphatic polyamine to reduce its amount less than 2% by weight provides, when used as a curing agent for epoxy resin, an epoxy resin composition which can provide an epoxy resin cured product having an excellent property.
摘要翻译：通过具有特定结构的链状脂肪族多胺和不饱和烃化合物的加成反应获得的改性链状脂肪族聚胺具有低粘度，并且当用作环氧树脂的固化剂时，可提供可提供环氧树脂的环氧树脂组合物树脂固化物具有优异的性能。此外，通过具有特定结构的链状脂肪族多胺和不饱和烃化合物的加成反应得到的改性链脂肪族多胺组合物，然后除去未反应的链状脂肪族多胺的去除步骤以减少其小于2重量％的量，提供了当使用时作为环氧树脂的固化剂，可以提供具有优异性能的环氧树脂固化物的环氧树脂组合物。

6. 发明授权

US07396902B2 Epoxy resin curing agent of aliphatic diamine/styrene addition product 有权
标题翻译：脂肪族二胺/苯乙烯加成产物的环氧树脂固化剂
公开(公告)号：US07396902B2
公开(公告)日：2008-07-08
申请号：US10773277
申请日：2004-02-09
申请人： Hisayuki Kuwahara , Masatoshi Echigo , Takeshi Koyama
发明人： Hisayuki Kuwahara , Masatoshi Echigo , Takeshi Koyama
IPC分类号： C08G59/50 , C08L63/02 , C09K3/00
CPC分类号： C08G59/5026 , C08G59/5033 , C08G59/681
摘要： The epoxy resin curing agent of the present invention comprises a polyamino compound obtainable by addition reaction of aliphatic diamine represented by the formula (1) and styrene and a curing accelerator comprising an organic compound having at least one carboxyl group and at least one hydroxyl group within the molecule, which can achieve a low viscosity without containing environmental harmful substances such as phenol and solvents. In addition, the epoxy resin composition using said epoxy resin curing agent shows an excellent curability at low temperature and it provides a cured coating film having excellent appearance H2N—H2C-A-CH2—NH2 (1) wherein A is a phenylene group or a cyclohexylene group.
摘要翻译：本发明的环氧树脂固化剂包含通过由式（1）表示的脂族二胺和苯乙烯的加成反应获得的聚氨基化合物和包含至少一个羧基和至少一个羟基的有机化合物的固化促进剂，该分子可以实现低粘度而不含环境有害物质如苯酚和溶剂。此外，使用所述环氧树脂固化剂的环氧树脂组合物在低温下显示出优异的固化性，并且提供具有优异外观的固化涂膜<？在线配方描述=“在线配方”末端=“铅” （1）＆lt;＆lt; 2＆lt; 2＆gt; 2＆lt; 2＆gt; 式描述=“In-line Formulas”end =“tail”？>其中A是亚苯基或亚环己基。

7. 发明申请

US20080090990A1 Modified cyclic aliphatic polyamine 有权
标题翻译：改性环状脂肪族多胺
公开(公告)号：US20080090990A1
公开(公告)日：2008-04-17
申请号：US11976147
申请日：2007-10-22
申请人： Takeshi Koyama , Tetsushi Ichikawa , Hisayuki Kuwahara , Masatoshi Echigo
发明人： Takeshi Koyama , Tetsushi Ichikawa , Hisayuki Kuwahara , Masatoshi Echigo
IPC分类号： C08G59/50
CPC分类号： C07C211/36 , C07C211/38 , C07C2601/14 , C07C2602/42
摘要： An object of the present invention is to provide a modified cyclic aliphatic polyamine having a low viscosity and a small content of unreacted polyamine which can provide, when it is used as a curing agent for epoxy resin, an epoxy resin composition having an improved workability without adding solvent or diluent and an excellent property of epoxy resin cure product. The above modified cyclic aliphatic polyamine is obtained by addition reaction of a cyclic aliphatic polyamine such as isophoronediamine and norbornanediamine and an alkenyl compound such as styrene. The modified cyclic aliphatic polyamine thus obtained is added in epoxy resin to be used as a curing agent for epoxy resin.
摘要翻译：本发明的目的是提供具有低粘度和少量未反应的多胺的改性环状脂肪族聚胺，当用作环氧树脂的固化剂时，可以提供具有改善的可加工性的环氧树脂组合物，而没有加入溶剂或稀释剂和环氧树脂固化产物的优异性能。上述改性环状脂肪族多胺是通过环状脂肪族多胺如异佛尔酮二胺和降冰片二胺与链烯基化合物如苯乙烯的加成反应获得的。将这样得到的改性环状脂族聚胺加入到环氧树脂中，用作环氧树脂的固化剂。

8. 发明授权

US09598392B2 Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom 有权
公开(公告)号：US09598392B2
公开(公告)日：2017-03-21
申请号：US14238402
申请日：2012-08-09
申请人： Masatoshi Echigo , Masako Yamakawa
发明人： Masatoshi Echigo , Masako Yamakawa
IPC分类号： C07C37/20 , C07C39/225 , C07D311/78 , C07D311/96 , G03F7/031 , G03F7/038 , C07C39/14 , C07C39/17 , G03F7/004 , G03F7/20 , G03F7/32
CPC分类号： C07C37/20 , C07C39/14 , C07C39/17 , C07C39/225 , C07C2101/14 , C07C2103/18 , C07C2103/26 , C07C2103/50 , C07C2601/10 , C07C2601/14 , C07C2603/18 , C07C2603/26 , C07C2603/50 , C07D311/78 , C07D311/96 , G03F7/0045 , G03F7/031 , G03F7/038 , G03F7/162 , G03F7/168 , G03F7/20 , G03F7/2037 , G03F7/32 , G03F7/327 , G03F7/38 , C07C39/16
摘要： A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

9. 发明授权

US08889919B2 Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern 有权
标题翻译：环状化合物，环状化合物的制造方法，辐射敏感性组合物以及形成抗蚀剂图案的方法
公开(公告)号：US08889919B2
公开(公告)日：2014-11-18
申请号：US13392263
申请日：2010-08-26
申请人： Masatoshi Echigo , Hiromi Hayashi
发明人： Masatoshi Echigo , Hiromi Hayashi
IPC分类号： C07C43/23 , C07C41/30 , G03F7/004
CPC分类号： C07D303/26 , C07C39/17 , C07C2601/14 , C07C2603/92 , G03F7/0382
摘要： A cyclic compound represented by formula (1): wherein L, R1, R′, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
摘要翻译：由式（1）表示的环状化合物：其中L，R1，R'和m如说明书中所定义。式（1）的环状化合物对安全性溶剂高度可溶，高度敏感，能够形成具有良好外观的抗蚀剂图案。因此，环状化合物可用作辐射敏感性组合物的组分。

10. 发明授权

US08802353B2 Compound for resist and radiation-sensitive composition specification 有权
标题翻译：化合物抗蚀剂和辐射敏感组合物规格
公开(公告)号：US08802353B2
公开(公告)日：2014-08-12
申请号：US13614976
申请日：2012-09-13
申请人： Masatoshi Echigo , Dai Oguro
发明人： Masatoshi Echigo , Dai Oguro
IPC分类号： G03F7/039 , G03F7/004
CPC分类号： G03F7/0045 , C07C39/15 , C07C43/164 , C07C43/18 , C07C43/196 , C07C43/2055 , C07C43/225 , C07C43/315 , C07C49/747 , C07C69/96 , C07C2601/14 , C07C2603/74 , G03F7/0392 , Y10S430/106
摘要： A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.
摘要翻译：含有1至80重量％固体组分和20至99重量％溶剂的辐射敏感组合物。固体成分含有化合物B，该化合物B具有（a）由多酚化合物A导入的结构，该酸结合基通过将多元酚化合物A中的至少一个酚羟基引入到通过二 - 具有5至36个碳原子的四官能芳族酮或芳族醛与具有1至3个酚羟基和6至15个碳原子的化合物，和（b）分子量为400至2000.含有化合物B的组合物是有用的作为酸性扩增的非聚合抗蚀剂材料，因为它对诸如KrF准分子激光器，极紫外线，电子束和X射线的辐射高度敏感，并且提供具有高分辨率，高耐热性的抗蚀剂图案，耐腐蚀性高。

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