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    • 89. 发明授权
    • Fabrication of high-density trench DMOS using sidewall spacers
    • 使用侧壁间隔件制造高密度沟槽DMOS
    • US5904525A
    • 1999-05-18
    • US646593
    • 1996-05-08
    • Fwu-Iuan HshiehYueh-Se HoBosco LanJowei Dun
    • Fwu-Iuan HshiehYueh-Se HoBosco LanJowei Dun
    • H01L21/26H01L21/336H01L29/06H01L29/10H01L29/40H01L29/78H01L21/3205H01L21/4763
    • H01L29/7813H01L29/1095H01L29/404H01L29/0696Y10S148/126
    • A method for forming a trenched DMOS transistor with deep body regions that occupy minimal area on an epitaxial layer formed on a semiconductor substrate. A first oxide layer is formed over the epitaxial layer and patterned to define deep-body areas beneath which the deep body regions are to be formed. Next, diffusion-inhibiting regions of the first conductivity type are formed in each of the deep-body areas before forming a second oxide layer covering the deep-body areas and the remaining portion of the first oxide layer. Portions of the second oxide layer are then removed to expose the centers of the diffusion inhibiting regions, leaving the first oxide layer and oxide sidewall spacers from the second oxide layer to cover the peripheries of the diffusion-inhibiting regions. A deep-body diffusion of a second conductivity type is then performed, resulting in the formation of deep body regions in the epitaxial layer between the sidewall spacers. The peripheries of the diffusion-inhibiting regions covered by the remaining portions of the first and second oxide layers inhibit lateral diffusion of the deep body diffusions without significantly inhibiting diffusion depth.
    • 一种用于形成具有在半导体衬底上形成的外延层上占据最小面积的深体区的沟槽DMOS晶体管的方法。 第一氧化物层形成在外延层上并且被图案化以限定将在其下形成深体区域的深体区域。 接下来,在形成覆盖深体区域的第二氧化物层和第一氧化物层的剩余部分之前,在每个深体区域中形成第一导电类型的扩散抑制区域。 然后去除第二氧化物层的部分以暴露扩散抑制区域的中心,从第二氧化物层留下第一氧化物层和氧化物侧壁间隔物以覆盖扩散抑制区域的周边。 然后执行第二导电类型的深体扩散,导致在侧壁间隔件之间的外延层中形成深体区。 由第一和第二氧化物层的剩余部分覆盖的扩散抑制区域的周边阻止深体扩散的横向扩散,而不显着抑制扩散深度。