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81. 发明授权

US06891954B2 Vehicle-mounted noise control apparatus 有权
标题翻译：车载噪音控制装置
公开(公告)号：US06891954B2
公开(公告)日：2005-05-10
申请号：US09819718
申请日：2001-03-29
申请人： Akira Takahashi , Toshio Inoue , Tsuyoshi Yamashita , Hisashi Sano , Kenichi Terai , Hiroyuki Hashimoto , Isao Kakuhari , Yoshio Nakamura
发明人： Akira Takahashi , Toshio Inoue , Tsuyoshi Yamashita , Hisashi Sano , Kenichi Terai , Hiroyuki Hashimoto , Isao Kakuhari , Yoshio Nakamura
IPC分类号： B60R11/02 , G10K11/178 , H04B1/08 , H04R3/00 , A61F11/06 , H04B1/00 , H04R29/00 , H03G3/20
CPC分类号： H04B1/082 , G10K11/178
摘要： In an active noise control apparatus in which an audio signal and a noise control signal are mixed to thereby sound a loudspeaker inside a motor vehicle, a general-purpose audio head unit cannot conventionally be freely changed for the one already mounted on the motor vehicle. As a solution, an active noise control unit is provided with a buffer amplifier and a mixer. An audio signal amplified by a power amplifier in an audio head unit is adjusted in level by the buffer amplifier such that a level of an audio signal outputted after amplification by the first amplifier becomes substantially equal to a level of the audio signal outputted from the audio head unit. Then, at the mixer, a noise control signal outputted from an active noise controller is added to an audio signal outputted from the buffer amplifier. Therefore, any audio head unit can be freely changed for the one already mounted on the vehicle as long as the audio head unit contains therein a power amplifier.
摘要翻译：在其中混合有音频信号和噪声控制信号从而在汽车内部发出扬声器的有源噪声控制装置中，通用音频头单元对于已经安装在机动车辆上的扬声器通常不能自由地改变。作为解决方案，主动噪声控制单元设置有缓冲放大器和混频器。由音频头单元中的功率放大器放大的音频信号由缓冲放大器调节，使得由第一放大器放大后输出的音频信号的电平基本上等于从音频输出的音频信号的电平头单位然后，在混频器中，将从有源噪声控制器输出的噪声控制信号加到从缓冲放大器输出的音频信号中。因此，只要音频头单元包含功率放大器，任何音频头单元可以自由地改变已经安装在车辆上的音频头单元。

82. 发明申请

US20050034746A1 Method of cleaning abrasive plates of abrasive machine and cleaning device 失效
标题翻译：清洗研磨机研磨板和清洗装置的方法
公开(公告)号：US20050034746A1
公开(公告)日：2005-02-17
申请号：US10937830
申请日：2004-09-09
申请人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
发明人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
IPC分类号： B08B3/02 , B08B15/04 , B24B37/08 , B24B53/007 , B24B53/017 , B08B3/00
CPC分类号： B24B37/08 , B08B3/024 , B08B15/04 , B08B2203/0229 , B24B53/017 , Y10S134/902
摘要： The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.
摘要翻译：本发明的方法清洗研磨机的上磨料板和下研磨板的磨料面。该方法由清洁装置执行，该清洁装置包括：用于喷射水的喷嘴; 用于防止喷射水在空气中飞散的刷子，刷子包围喷嘴; 以及用于封闭防磨刷和上磨料板的外边缘之间的间隙的另一刷子，其特征在于以下步骤：从喷嘴向上磨料板的研磨面喷射水; 将喷嘴移向上磨料板的外边缘; 并且当在防磨刷和上磨料板的外边缘之间形成间隙时，通过闭合刷闭合间隙。

83. 发明授权

US06826916B2 Laser module, Peltier module, and Peltier module integrated heat spreader 失效
标题翻译：激光模块，Peltier模块和Peltier模块集成散热器
公开(公告)号：US06826916B2
公开(公告)日：2004-12-07
申请号：US10125299
申请日：2002-04-16
申请人： Mamoru Shimada , Naoki Kimura , Hajime Noda , Yoshio Nakamura
发明人： Mamoru Shimada , Naoki Kimura , Hajime Noda , Yoshio Nakamura
IPC分类号： F25B2102
CPC分类号： H01S5/02415 , F25B21/02 , H01L23/38 , H01L23/552 , H01L35/00 , H01L35/32 , H01L2924/16152
摘要： A Peltier module comprising: thermoelectric elements in which plural p-type and n-type thermoelectric elements are alternately arranged, metal electrodes placed in both ends of the thermoelectric elements in order to connect the thermoelectric elements in series, and metal substrates on at least a part of which surfaces an insulating thin film is formed, the metal substrates being oppositely placed so as to be connected to the metal electrodes and sandwich the metal electrodes and the thermoelectric elements.
摘要翻译：一种珀耳帖模块，包括：多个p型和n型热电元件交替布置的热电元件，将热电元件串联连接在热电元件的两端的金属电极和至少一个其一部分表面形成绝缘薄膜，金属基板相对地放置成与金属电极连接并夹着金属电极和热电元件。

84. 发明授权

US06807701B2 Method of cleaning abrasive plates of abrasive machine and cleaning device 失效
标题翻译：清洗研磨机研磨板和清洗装置的方法
公开(公告)号：US06807701B2
公开(公告)日：2004-10-26
申请号：US09992191
申请日：2001-11-06
申请人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
发明人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
IPC分类号： B08B1100
CPC分类号： B24B37/08 , B08B3/024 , B08B15/04 , B08B2203/0229 , B24B53/017 , Y10S134/902
摘要： The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.
摘要翻译：本发明的方法清洗研磨机的上磨料板和下研磨板的磨料面。该方法由清洁装置执行，该清洁装置包括：用于喷射水的喷嘴; 用于防止喷射水在空气中飞散的刷子，刷子包围喷嘴; 以及用于封闭防磨刷和上磨料板的外边缘之间的间隙的另一刷子，其特征在于以下步骤：从喷嘴向上磨料板的研磨面喷射水; 将喷嘴移向上磨料板的外边缘; 并且当在防磨刷和上磨料板的外边缘之间形成间隙时，通过闭合刷闭合间隙。

85. 发明授权

US06692342B2 Wafer abrasive machine 有权
标题翻译：晶圆磨机
公开(公告)号：US06692342B2
公开(公告)日：2004-02-17
申请号：US10081493
申请日：2002-02-22
申请人： Yoshio Nakamura , Tsuyoshi Hasegawa , Susumu Onishi
发明人： Yoshio Nakamura , Tsuyoshi Hasegawa , Susumu Onishi
IPC分类号： B24B2500
CPC分类号： B24B37/30
摘要： In the wafer abrasive machine of the present invention, a gravity center and a rotational axis of a wafer can be corresponded while abrading the wafer and a holding plate can be smoothly moved in a head member. The abrasive machine comprises: the head member including a concave section, in which the holding plate is accommodated; an elastic sheet member suspending the holding plate and being reinforced by a cloth-formed reinforcing member; a space for storing pressure fluid which pushes the holding plate toward the abrasive plate, the space being formed between the elastic sheet member and the concave section; and a plurality of spherical bodies being provided between an outer circumferential face of the holding plate and an inner circumferential face of the concave section, the spherical bodies simultaneously point-contact the both circumferential faces.
摘要翻译：在本发明的晶片研磨机中，在研磨晶片的同时可以使晶片的重心和旋转轴对应，并且保持板能够平滑地移动到头部构件中。所述研磨机包括：所述头部构件包括凹部，所述保持板容纳在所述凹部中; 弹性片构件，其将所述保持板悬挂并由布形加强构件加强; 用于存储将所述保持板向研磨板推动的压力流体的空间，所述空间形成在所述弹性片构件和所述凹部之间; 并且在所述保持板的外周面与所述凹部的内周面之间设置有多个球状体，所述球状体同时与所述两个圆周面进行点接触。

86. 发明授权

US5908347A Polishing system for polishing wafer 失效
标题翻译：抛光晶圆抛光系统
公开(公告)号：US5908347A
公开(公告)日：1999-06-01
申请号：US838636
申请日：1997-04-11
申请人： Makoto Nakajima , Yoshio Nakamura , Yasuhide Denda , Toshihisa Yanagisawa , Toshiaki Seki , Satoru Arakawa , Masahiro Takeuchi , Mitsue Ogawa , Masanori Fukushima
发明人： Makoto Nakajima , Yoshio Nakamura , Yasuhide Denda , Toshihisa Yanagisawa , Toshiaki Seki , Satoru Arakawa , Masahiro Takeuchi , Mitsue Ogawa , Masanori Fukushima
IPC分类号： B23Q41/04 , B24B37/00 , B24B37/04 , B24B49/00
CPC分类号： B24B37/345 , B23Q41/04
摘要： In the polishing system of the present invention, a adhering unit adheres a wafer on a carrying plate using liquid. A polishing unit polishes the wafer using a polishing plate. A feeding unit conveys the carrying plate from the adhering unit to the polishing unit. A dismounting unit removes the wafer from the carrying plate. A first discharging unit conveys the carrying plate from the polishing unit to the dismounting unit. A cleaning unit cleans the vacant carrying plate. A second discharging unit conveys the carrying plate from the dismounting unit to the cleaning unit. A third discharging unit conveys the carrying plate from the cleaning unit to the adhering unit. The units are formed into a loop lines so that the carrying plate is circulated in the loop line and the wafers are polished therein.
摘要翻译：在本发明的抛光系统中，粘合单元使用液体将晶片粘附在承载板上。抛光单元使用抛光板抛光晶片。馈送单元将承载板从粘合单元传送到抛光单元。拆卸单元从承载板上取下晶片。第一排放单元将承载板从抛光单元传送到拆卸单元。清洁单元清洁空载板。第二排放单元将搬运单元从拆卸单元传送到清洁单元。第三排放单元将承载板从清洁单元传送到粘附单元。这些单元形成为环线，使得承载板在环线中循环并且晶片在其中被抛光。

87. 发明授权

US5598037A Semiconductor device with a contact member made of semiconductor material having a columnar structure 失效
标题翻译：具有由具有柱状结构的半导体材料制成的接触构件的半导体器件
公开(公告)号：US5598037A
公开(公告)日：1997-01-28
申请号：US404746
申请日：1995-03-15
申请人： Shin Kikuchi , Mamoru Miyawaki , Genzo Monma , Hayao Ohzu , Shunsuke Inoue , Yoshio Nakamura , Takeshi Ichikawa , Osamu Ikeda , Tetsunobu Kohchi
发明人： Shin Kikuchi , Mamoru Miyawaki , Genzo Monma , Hayao Ohzu , Shunsuke Inoue , Yoshio Nakamura , Takeshi Ichikawa , Osamu Ikeda , Tetsunobu Kohchi
IPC分类号： H01L27/115 , H01L27/02 , H01L29/10
CPC分类号： H01L27/115 , H01L2924/0002
摘要： A semiconductor device including: an insulated gate type transistor having a columnar semiconductor region formed on the main side of a semiconductor substrate, a gate electrode formed on the side surface of the columnar semiconductor region while interposing a gate insulating film and main electrode regions respectively formed on and formed below the columnar semiconductor region; and a memory element which is formed on the upper main electrode region and which can be broken electrically.
摘要翻译：一种半导体器件，包括：绝缘栅型晶体管，其具有形成在半导体衬底的主侧上的柱状半导体区域，形成在柱状半导体区域的侧表面上的栅电极，同时插入栅极绝缘膜和分别形成的主电极区域形成在柱状半导体区域的下方; 以及形成在上主电极区域上并且可以被电断开的存储元件。

88. 发明授权

US5361545A Polishing machine 失效
标题翻译：抛光机
公开(公告)号：US5361545A
公开(公告)日：1994-11-08
申请号：US105534
申请日：1993-08-11
申请人： Yoshio Nakamura
发明人： Yoshio Nakamura
IPC分类号： B24B37/04 , B24B41/06 , B24B7/22
CPC分类号： B24B37/345
摘要： The polishing machine of the present invention is capable of moving a work away from a center roller and a guide roller without reference to other members. In the polishing machine, a circular polishing plate is capable of revolving so as to polish works. A center roller is capable of revolving. Guide rollers are arranged around the center roller and capable of revolving, wherein each work is rotatably held between each guide roller and the center roller. An arm shaft is provided in the vicinity of the polishing plate and capable of moving in the longitudinal direction. A work head is provided to the arm shaft and capable of holding and releasing the work. A driving mechanism moves the arm shaft so as to move the work head between a discharge position and a specified position. A releasing mechanism slightly moves the arm shaft in the longitudinal direction so as to slightly move the work away from the center roller and the guide roller.
摘要翻译：本发明的抛光机能够将工件从中心辊和引导辊移开而不参照其他部件。在抛光机中，圆形抛光板能够旋转以抛光作品。中心滚筒能旋转。引导辊布置在中心辊周围并且能够旋转，其中每个工件可旋转地保持在每个引导辊和中心辊之间。在抛光板附近设置有能够沿纵向移动的臂轴。工作头设置在臂轴上，能够保持和释放工件。驱动机构使臂轴移动，以使工作头在排出位置和指定位置之间移动。释放机构使臂轴在纵向方向稍微移动，以使工件从中心辊和引导辊稍微移动。

89. 发明授权

US5278598A Camera with non-TTL type finder 失效
标题翻译：相机与非TTL型取景器
公开(公告)号：US5278598A
公开(公告)日：1994-01-11
申请号：US964831
申请日：1992-10-22
申请人： Yoshio Nakamura
发明人： Yoshio Nakamura
IPC分类号： G03B13/20 , G03B13/24 , G03B13/34 , G03B13/02
CPC分类号： G03B13/34 , G03B13/20
摘要： A camera with a non-TTL type finder may avoid a mechanical complexity, may be produced with a gentler standard in dimensional accuracy than conventional cameras of such a type, and may lower consumption of a power battery.A finder focusing dial is manually rotated together with a cam member to swing an interlocking lever. An end of the interlocking lever moves an objective lens frame back and forth. When it is observed that an image of a target subject becomes focused on a finder focusing screen through a finder eye piece, the rotation of the dial is stopped. A focused state detecting device detects a stop position of an objective lens to supply a detection value to a photo-taking optical system focusing amount determining device to determine an amount of focusing. A drive device drives the photo-taking optical system into an in-focus state in accordance with the focusing amount thus determined.
摘要翻译：具有非TTL型取景器的相机可以避免机械复杂性，可以以比这种类型的传统照相机更小的尺寸精度标准产生，并且可以降低动力电池的消耗。取景器对焦表盘与凸轮构件一起手动旋转以摆动互锁杆。互锁杆的端部来回移动物镜框架。当观察到目标物体的图像通过取景器眼件聚焦在取景器聚焦屏幕上时，表盘的旋转停止。聚焦状态检测装置检测物镜的停止位置，以向感光光学系统聚焦量确定装置提供检测值，以确定聚焦量。驱动装置根据如此确定的聚焦量将照相光学系统驱动到聚焦状态。

90. 发明授权

US5126329A Glucosamine derivatives and compositions reagents and containing the same 失效
标题翻译：葡萄糖胺衍生物和组合物试剂并含有它们
公开(公告)号：US5126329A
公开(公告)日：1992-06-30
申请号：US457266
申请日：1989-12-27
申请人： Kenji Tani , Yoshio Nakamura , Takeshi Nagasawa
发明人： Kenji Tani , Yoshio Nakamura , Takeshi Nagasawa
IPC分类号： C07H15/203 , C12Q1/34 , G01N33/535
CPC分类号： C07H15/203 , C12Q1/34 , G01N33/535 , C12Q2334/00 , G01N2333/924
摘要： Novel phenylazonaphthol derivatives, e.g., 4-(4'-nitro-2'-sulfophenylazo)-1-naphthyl-N-acetyl-.beta.-D-glucosaminide sodium salt, are excellent substrates for determining N-acetyl-.beta.-D-glucosaminidase (NAG) activity in urine collected from the patient with renal disorders. The substrate has high water solubility, is not affected by interferences in urine and provides a simple method for determination of NAG activity which is suited for both rate and endpoint assays.
摘要翻译：新的苯基苯并萘酚衍生物，例如4-（4'-硝基-2'-磺基苯偶氮）-1-萘基-N-乙酰基-β-D-葡糖胺钠盐，是测定N-乙酰基-β-D-葡糖胺酶（NAG）从患有肾脏疾病的患者收集的尿液中的活性。底物具有高水溶性，不受尿中干扰的影响，并提供了适用于速率和终点测定两者的NAG活性测定的简单方法。

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