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    • 82. 发明申请
    • Substrate Carrier Measuring Jig, Collision Preventing Jig, and Collision Preventing Method Using the Collision Preventing Jig
    • 基板载具测量夹具,防撞夹具和碰撞防止方法使用碰撞防止夹具
    • US20120118083A1
    • 2012-05-17
    • US13259736
    • 2010-04-12
    • Shoichi MoriHirofumi Nakamura
    • Shoichi MoriHirofumi Nakamura
    • B01L3/00
    • H01L21/681H01L21/67259H01L21/67265
    • [Objective] To provide a wafer carrier measuring jig which can measure a slot height of a wafer carrier placed on a load port and which can determine whether or not an arbitrary slot is horizontal, a collision preventing jig, and a collision preventing method using the collision preventing jig.[Means for Solution] A wafer carrier measuring jig includes a base member 21 having a carrier placement section 210 where three kinematic pins 211 are disposed in correspondence with three V-shaped grooves provided on the bottom surface of a wafer carrier 10 having a pair of slot sections 12 where wafers 11 are accommodated; a measuring means 22 fixedly provided on the base member 21 and having sensors 250 for measuring height from a predetermined reference value, slot pitch, and slot horizontality with respect to at least some slots in the two slot sections 12; and a write means provided in the carrier placement section 210 of the base member 21 and adapted to write information from the measuring means 22 to an ID information storage means provided in the wafer carrier 10.
    • [目的]提供一种晶片载体测量夹具,其可以测量放置在负载端口上的晶片载体的槽高度,并且可以确定任意槽是否水平,防碰撞夹具以及使用 防撞夹具 [解决方案]晶片载体测量夹具包括:基部构件21,其具有载体放置部210,其中三个运动销211与设置在具有一对的晶片载体10的底面上的三个V形槽对应地设置 狭槽部分12,其中容纳晶片11; 固定地设置在基座构件21上的测量装置22,具有用于相对于两个狭槽部分12中的至少一些狭槽从预定基准值,槽间距和槽水平度测量高度的传感器250; 以及设置在基座构件21的载体放置部分210中并适于将信息从测量装置22写入设置在晶片载体10中的ID信息存储装置的写入装置。
    • 83. 发明授权
    • Semiconductor device
    • 半导体器件
    • US08164191B2
    • 2012-04-24
    • US12394911
    • 2009-02-27
    • Hirofumi Nakamura
    • Hirofumi Nakamura
    • H01L23/52
    • H01L27/14685H01L27/14618H01L27/14636H01L27/14683H01L2224/13
    • A semiconductor device including a semiconductor element and a functional member fixed thereto with an adhesive film is provided, where the performance or reliability degradation due to moisture entered by way of the adhesive film itself or the interfaces between the adhesive film and members adjacent thereto can be suppressed with a simple structure. The semiconductor element has an active region for realizing a predetermined function, formed on a surface of the element. The functional member has a predetermined function and is fixed on a surface side of the semiconductor element with the adhesive film. A metal film covers a region including at least all outer side faces of the semiconductor element, all outer side faces of the adhesive film, an interface between the adhesive film and the semiconductor element, and an interface between the adhesive film and the functional member.
    • 提供一种半导体器件,其包括具有粘合剂膜的半导体元件和固定到其上的功能元件,其中由于通过粘合剂膜本身进入的水分的性能或可靠性劣化或者粘合剂膜与其相邻的构件之间的界面可以是 用简单的结构抑制。 半导体元件具有用于实现形成在元件的表面上的预定功能的有源区域。 功能元件具有预定的功能,并用粘合剂膜固定在半导体元件的表面侧。 金属膜覆盖包括半导体元件的至少所有外侧面,粘合膜的所有外侧面,粘合膜和半导体元件之间的界面以及粘合膜和功能元件之间的界面的区域。
    • 84. 发明申请
    • FOUP OPENER AND OPERATING METHOD THEREOF
    • FOUP开口器及其操作方法
    • US20110188977A1
    • 2011-08-04
    • US13020912
    • 2011-02-04
    • Noriyoshi TOYODAHirofumi Nakamura
    • Noriyoshi TOYODAHirofumi Nakamura
    • H01L21/673H01L21/67
    • H01L21/67H01L21/673
    • To ensure that an abnormality in a closed state of a FOUP door serving as a lid of a FOUP can be detected quickly and reliably, a FOUP opener includes a port door attached detachably to an opening window in a port plate for separating the interior and exterior of a semiconductor processing device, and a dock unit for positioning the FOUP in a FOUP door attachment/detachment position. A suction disc mechanism and a lock mechanism for fixing the FOUP door to a FOUP main body and releasing the FOUP door are disposed on the port door. A FOUP door detection sensor for determining whether or not the FOUP door fixed to the FOUP main body, which is positioned in the FOUP door attachment/detachment position on the dock unit, is attached correctly to an opening portion of the FOUP main body is disposed on the port plate.
    • 为了确保快速可靠地检测作为FOUP的盖子的FOUP门的关闭状态的异常,FOUP开启器包括可拆卸地附接到端口板中的用于分离内部和外部的端口板的开口窗口的端口门 的半导体处理装置,以及用于将FOUP定位在FOUP门附接/拆卸位置中的坞站单元。 吸入盘机构和用于将FOUP门固定到FOUP主体并释放FOUP门的锁定机构设置在端口门上。 FOUP门检测传感器,用于确定固定在位于码头单元上的FOUP门安装/拆卸位置的FOUP主体上的FOUP门是否正确地安装到FOUP主体的开口部分, 在港口板上。
    • 89. 发明授权
    • Process for producing trans-1,4-cyclohexanedicarboxylic acid
    • 反式-1,4-环己烷二羧酸的制备方法
    • US07595423B2
    • 2009-09-29
    • US11924161
    • 2007-10-25
    • Koetsu EndouHirofumi NakamuraShinichi Tanaka
    • Koetsu EndouHirofumi NakamuraShinichi Tanaka
    • C07C61/00
    • C07C51/353C07C51/363C07C2601/14C07C61/09
    • A subject for the invention is to obtain trans-1,4-cyclohexanedicarboxylic acid (t-CHDA) in a high concentration by efficiently isomerizing cis-1,4-cyclohexanedicarboxylic acid (c-CHDA) by a simple method. The invention provides: (1) a process for producing t-CHDA which comprises heating crude CHDA to 180° C. or higher in an inert atmosphere and causing the t-CHDA formed by isomerization to precipitate in the molten c-CHDA while holding the crude CHDA at a temperature in the range of not lower than 180° C. and less than the melting point of t-CHDA; (2) a process for producing t-CHDA, wherein crude CHDA which is powdery or granular is heat-treated at a temperature of not lower than the melting point of c-CHDA and lower than the melting point of t-CHDA to thereby isomerize the cis isomer to the trans isomer while maintaining the powdery or granular state; (3) a process for producing t-CHDA, wherein crude CHDA is held at a temperature of not lower than the melting point of c-CHDA and lower than the melting point of t-CHDA in an inert atmosphere while maintaining flowing to thereby obtain powdery or granular t-CHDA; and (4) a process for purifying crude CHDA in which crude CHDA obtained through the step of hydrogenating TPA or the like is heated in an atmosphere of an inert gas to volatilize and remove impurities.
    • 本发明的目的是通过简单的方法有效地使顺式-1,4-环己烷二羧酸(c-CHDA)异构化,以高浓度获得反式-1,4-环己烷二羧酸(t-CHDA)。 本发明提供:(1)一种生产t-CHDA的方法,其包括在惰性气氛中将粗CHDA加热至180℃或更高,并使通过异构化形成的t-CHDA在熔融的c-CHDA中沉淀,同时保持 原料CHDA在不低于180℃且小于t-CHDA的熔点的温度范围内; (2)生产t-CHDA的方法,其中将粉末状或粒状的粗CHDA在不低于c-CHDA的熔点并低于t-CHDA的熔点的温度下进行热处理,从而异构化 顺式异构体反式异构体,同时保持粉状或颗粒状态; (3)生产t-CHDA的方法,其中将粗CHDA保持在不低于c-CHDA的熔点并低于在惰性气氛中的t-CHDA的熔点的温度,同时保持流动,从而获得 粉状或颗粒状t-CHDA; (4)一种纯化粗制CHDA的方法,其中通过氢化TPA等步骤得到的粗CHDA在惰性气体气氛中加热,挥发除去杂质。