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81. 发明授权

US08847252B2 III-nitride light emitting device with double heterostructure light emitting region 有权
标题翻译：具有双异质结构发光区域的III族氮化物发光器件
公开(公告)号：US08847252B2
公开(公告)日：2014-09-30
申请号：US12495464
申请日：2009-06-30
申请人： Yu-Chen Shen , Nathan F. Gardner , Satoshi Watanabe , Michael R. Krames , Gerd O. Mueller
发明人： Yu-Chen Shen , Nathan F. Gardner , Satoshi Watanabe , Michael R. Krames , Gerd O. Mueller
IPC分类号： H01L33/32 , H01L33/04 , H01L33/06
CPC分类号： H01L33/32 , H01L33/02 , H01L33/025 , H01L33/06 , H01L33/325
摘要： A III-nitride light emitting layer is disposed between an n-type region and a p-type region in a double heterostructure. At least a portion of the III-nitride light emitting layer has a graded composition.
摘要翻译： III族氮化物发光层设置在双异质结构中的n型区域和p型区域之间。 III族氮化物发光层的至少一部分具有渐变组成。

82. 发明授权

US08835096B2 Chemically amplified negative resist composition and patterning process 有权
标题翻译：化学放大负光刻胶组合物和图案化工艺
公开(公告)号：US08835096B2
公开(公告)日：2014-09-16
申请号：US13407062
申请日：2012-02-28
申请人： Keiichi Masunaga , Daisuke Domon , Satoshi Watanabe
发明人： Keiichi Masunaga , Daisuke Domon , Satoshi Watanabe
IPC分类号： G03F7/004 , G03F7/028
CPC分类号： G03F7/0045 , C08F26/06 , C08F214/18 , C08F220/30 , G03F7/0046 , G03F7/0382 , G03F7/2041 , H01L21/0271 , Y10S430/114
摘要： A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition ensures an effective sensitivity, makes more uniform the distribution and diffusion of the acid generating component in a resist film, and suppresses deactivation of acid at the substrate interface. The pattern can be formed to a profile which is improved in LER and undercut.
摘要翻译：使用包含0.5-10摩尔％具有产酸能力的重复单元和50-99.5摩尔％的在碱性显影剂中溶解的重复单元的聚合物来配制化学放大的负性抗蚀剂组合物。当在光刻工艺中使用时，组合物确保有效的灵敏度，使酸产生组分在抗蚀剂膜中的分布和扩散更均匀，并抑制底物界面处酸的失活。该图案可以形成为在LER和底切方面得到改善的轮廓。

83. 发明申请

US20140212717A1 LITHIUM-ION SECONDARY BATTERY AND MANUFACTURING METHOD FOR SAME 有权
标题翻译：锂离子二次电池及其制造方法
公开(公告)号：US20140212717A1
公开(公告)日：2014-07-31
申请号：US14238900
申请日：2011-08-25
申请人： Toshiyuki Ariga , Satoshi Watanabe , Yoshikazu Noiri
发明人： Toshiyuki Ariga , Satoshi Watanabe , Yoshikazu Noiri
IPC分类号： H01M10/04
CPC分类号： H01M10/0431 , H01M2/14 , H01M10/052 , H01M10/0587 , Y02E60/122 , Y02P70/54 , Y10T29/49108
摘要： An object of this present invention is to provide: a lithium-ion secondary battery 1 constructed to easily interpose an electrical insulating protection film 41 between a battery container 2 and an electricity-generating element 3, to facilitate automatic mounting of the insulating protection film 41, and thus to be highly producible; and a method of manufacturing the battery. The lithium-ion secondary battery 1 of the invention is characterized in that the battery is electrically insulated between the battery container 2 and the electricity-generating element 3, and in that the insulating protection film 41 of a sheet-like form is wrapped around the electricity-generating element 3.
摘要翻译：本发明的目的是提供：锂离子二次电池1，其被构造成容易地将电绝缘保护膜41插入在电池容器2和发电元件3之间，以便于绝缘保护膜41的自动安装，从而高度可生产; 以及制造电池的方法。本发明的锂离子二次电池1的特征在于，电池在电池容器2和发电元件3之间电绝缘，并且片状形式的绝缘保护膜41缠绕在发电元件3。

84. 发明授权

US08761554B2 Wavelength selective switch 有权
标题翻译：波长选择开关
公开(公告)号：US08761554B2
公开(公告)日：2014-06-24
申请号：US13419646
申请日：2012-03-14
申请人： Koji Matsumoto , Satoshi Watanabe , Toshiro Okamura , Takeshi Yamazaki
发明人： Koji Matsumoto , Satoshi Watanabe , Toshiro Okamura , Takeshi Yamazaki
IPC分类号： G02B6/26 , G02B6/42
CPC分类号： G02B6/3518 , G02B6/3534
摘要： Provided is a wavelength selective switch, which includes: an input/output unit; a dispersive portion; a condensing optical system; and the deflection portion. The input/output unit has input/output ports. The dispersive portion disperses signal light incident from the input/output ports. The condensing optical system condenses a plurality of signal light beams dispersed by the dispersive portion. The deflection portion has a plurality of deflection elements. The deflection elements deflect, along a second direction, the signal light beams condensed by the condensing optical system. In the condensing optical system, the aberration amount of the meridional component in a sagittal coma aberration remains substantially constant irrespective of an angle formed between the optical axis of the condensing optical system and a signal light beam incident on the condensing optical system from the input/output portion, at an incident position of the incident signal light beam at a certain height in the second direction.
摘要翻译：提供一种波长选择开关，其包括：输入/输出单元; 分散部分; 聚光光学系统; 和偏转部。输入/输出单元具有输入/输出端口。色散部分分散从输入/输出端口入射的信号光。聚光光学系统凝聚由分散部分散射的多个信号光束。偏转部分具有多个偏转元件。偏转元件沿着第二方向偏转由聚光光学系统会聚的信号光束。在聚光光学系统中，与聚光光学系统的光轴和入射到聚光光学系统的信号光束之间的角度不同，矢状彗差中的子午分量的像差量保持基本恒定，在入射信号光束的入射位置处，在第二方向上处于一定高度。

85. 发明授权

US08709300B2 Process for production of nickel oxide-stabilized zirconia composite oxide 有权
标题翻译：生产氧化镍稳定氧化锆复合氧化物的方法
公开(公告)号：US08709300B2
公开(公告)日：2014-04-29
申请号：US13058091
申请日：2009-08-07
申请人： Kyosuke Domae , Takeshi Usui , Tadashi Yasui , Satoshi Watanabe
发明人： Kyosuke Domae , Takeshi Usui , Tadashi Yasui , Satoshi Watanabe
IPC分类号： H01B1/08 , C01G53/00
CPC分类号： H01M4/9025 , C01G53/006 , C01P2002/52 , C01P2002/76 , C01P2002/88 , C01P2004/61 , C01P2004/62 , H01M4/8621 , H01M4/8652 , H01M4/8882 , H01M4/9066 , H01M8/12 , H01M2008/1293 , Y02P70/56
摘要： The present invention relates to a nickel oxide-stabilized zirconia composite in which nickel oxide is dispersed uniformly, a process for readily producing the composite oxide, and an anode for a solid oxide fuel cell having excellent output characteristics.More specifically, the present invention provides a nickel oxide-stabilized zirconia composite that is produced by sintering a mixture of nickel hydroxide and/or nickel carbonate and a hydroxide of stabilized zirconium.
摘要翻译：本发明涉及氧化镍稳定化的氧化锆复合体，其中氧化镍分散均匀，易于生产复合氧化物的方法和具有优异输出特性的固体氧化物燃料电池的阳极。更具体地说，本发明提供了通过烧结氢氧化镍和/或碳酸镍的混合物和稳定化的锆的氢氧化物制备的氧化镍稳定的氧化锆复合材料。

86. 发明授权

US08613529B2 Lighting fixture 有权
标题翻译：照明灯具
公开(公告)号：US08613529B2
公开(公告)日：2013-12-24
申请号：US13119519
申请日：2009-11-16
申请人： Satoshi Watanabe , Keiichi Shimizu , Takeshi Osada , Keiichi Shimizu , Toshiya Tanaka , Shigeru Osawa , Takeshi Hisayasu , Hirokazu Otake , Hitoshi Kawano , Makoto Sakai
发明人： Satoshi Watanabe , Keiichi Shimizu , Takeshi Osada , Keiichi Shimizu , Toshiya Tanaka , Shigeru Osawa , Takeshi Hisayasu , Hirokazu Otake , Hitoshi Kawano , Makoto Sakai
IPC分类号： F21V29/00 , H01R33/00
CPC分类号： F21V29/004 , F21K9/20 , F21V19/001 , F21V19/006 , F21V29/67 , F21V29/73 , F21V29/74 , F21Y2115/10 , H01R33/9456 , Y10T29/49879
摘要： There is provided a lighting fixture 11 capable of efficiently radiating heat of a lamp device 14 attached to a socket device 13. By attaching the lamp device 14 to the socket device 13, a cap portion 38 of the lamp device is brought into contact with a fixture body 12, and pressed against and brought into contact with the fixture body 12 by an elastic body 30. Heat generated by lighting of LEDs 35 of the lamp device 14 is conducted from the cap portion 38 to the fixture body 12 and efficiently radiated.
摘要翻译：提供了能够有效地散发安装在插座装置13上的灯装置14的热量的照明器具11.通过将灯装置14安装到插座装置13，使灯装置的盖部38与夹具本体12，并通过弹性体30压靠固定主体12.与灯装置14的LED35的照明产生的热量从盖部38向夹具本体12传导并有效地照射。

87. 发明授权

US08603724B2 Negative resist composition and patterning process 有权
标题翻译：负阻抗组成和图案化工艺
公开(公告)号：US08603724B2
公开(公告)日：2013-12-10
申请号：US12911338
申请日：2010-10-25
申请人： Akinobu Tanaka , Keiichi Masunaga , Daisuke Domon , Satoshi Watanabe
发明人： Akinobu Tanaka , Keiichi Masunaga , Daisuke Domon , Satoshi Watanabe
IPC分类号： G03F7/004 , G03F7/26
CPC分类号： G03F7/038 , G03F1/08 , G03F7/0045 , G03F7/0382 , G03F7/20 , Y10S430/111
摘要： There is disclosed a negative resist composition comprising at least: (A) a base polymer that is alkaline-soluble and is made alkaline-insoluble by action of an acid; (B) an acid generator; and (C) a basic component, wherein the base polymer at least contains a polymer including repeating units represented by the following general formula (1) and general formula (2) and having a weight average molecular weight of 1,000 to 10,000. There can be a negative resist composition hardly causing a bridge in forming a pattern and providing a high resolution and a patterning process using the same.
摘要翻译：公开了一种负性抗蚀剂组合物，其至少包含：（A）碱溶性碱性聚合物，并且通过酸的作用使其不溶于碱; （B）酸发生剂; 和（C）碱性成分，其中，所述基础聚合物至少含有包含由以下通式（1）和通式（2）表示的重均分子量为1,000〜10,000的聚合物。可以存在在形成图案时难以引起桥的负的抗蚀剂组合物，并且提供高分辨率和使用其的图案化工艺。

88. 发明授权

US08586282B2 Resist composition and patterning process 有权
公开(公告)号：US08586282B2
公开(公告)日：2013-11-19
申请号：US13427653
申请日：2012-03-22
申请人： Satoshi Watanabe , Akinobu Tanaka , Takeru Watanabe , Takeshi Kinsho
发明人： Satoshi Watanabe , Akinobu Tanaka , Takeru Watanabe , Takeshi Kinsho
IPC分类号： G03F7/00 , G03F7/028 , G03F7/40
CPC分类号： G03F7/0045 , G03F7/0382 , Y10S430/114 , Y10S430/128
摘要： The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F2 laser, ultra-short ultraviolet light, electron beam, X-rays, or the like; and a patterning process utilizing the resist composition. The present invention provides a chemically amplified resist composition comprising one or more kinds of amine compounds or amine oxide compounds (except for those having a nitrogen atom of amine or amine oxide included in a ring structure of an aromatic ring) at least having a carboxyl group and having no hydrogen atoms covalently bonded to a nitrogen atom as a basic center.

89. 发明授权

US08546060B2 Chemically amplified positive resist composition and pattern forming process 有权
标题翻译：化学扩增正光刻胶组成和图案形成过程
公开(公告)号：US08546060B2
公开(公告)日：2013-10-01
申请号：US13027362
申请日：2011-02-15
申请人： Keiichi Masunaga , Satoshi Watanabe , Akinobu Tanaka , Daisuke Domon
发明人： Keiichi Masunaga , Satoshi Watanabe , Akinobu Tanaka , Daisuke Domon
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0395 , G03F7/0397
摘要： A chemically amplified positive resist composition is provided comprising a polymer PB having an amine structure bound thereto and a polymer PA comprising recurring units having an acidic side chain protected with an acid labile protective group and recurring units having an acid generating moiety on a side chain.
摘要翻译：提供化学放大的正性抗蚀剂组合物，其包含具有结合于其上的胺结构的聚合物PB和包含具有由酸不稳定保护基保护的酸性侧链的重复单元的聚合物PA和在侧链上具有产酸部分的重复单元。

90. 发明授权

US08540399B2 Socket device 有权
公开(公告)号：US08540399B2
公开(公告)日：2013-09-24
申请号：US13597804
申请日：2012-08-29
申请人： Satoshi Watanabe , Keiichi Shimizu , Takeshi Osada , Keiichi Shimizu , Toshiya Tanaka , Shigeru Osawa , Takeshi Hisayasu , Hirokazu Otake , Hitoshi Kawano , Makoto Sakai
发明人： Satoshi Watanabe , Keiichi Shimizu , Takeshi Osada , Keiichi Shimizu , Toshiya Tanaka , Shigeru Osawa , Takeshi Hisayasu , Hirokazu Otake , Hitoshi Kawano , Makoto Sakai
IPC分类号： F21V29/00
CPC分类号： F21V29/004 , F21K9/20 , F21V19/001 , F21V19/006 , F21V29/67 , F21V29/73 , F21V29/74 , F21Y2115/10 , H01R33/9456 , Y10T29/49879
摘要： A lighting fixture capable of efficiently radiating heat of a lamp device may be configured to be attached to a socket device. In some examples, by attaching the lamp device to the socket device, a cap portion of the lamp device is brought into contact with a fixture body, and pressed against and brought into close contact with the fixture body by an elastic body. Heat generated by lighting of LEDs of the lamp device is conducted from the cap portion to the fixture body and efficiently radiated.

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