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81. 发明授权

US07652751B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07652751B2
公开(公告)日：2010-01-26
申请号：US12081291
申请日：2008-04-14
申请人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
IPC分类号： G03B27/32 , G03B27/42 , G03B27/52
CPC分类号： G03F9/7034 , G03F7/70341
摘要： A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which leveling and exposure are performed simultaneously.
摘要翻译：在用于浸没式光刻的实施例中的光刻设备和方法被公开在其中同时执行调平和曝光的单个阶段。

82. 发明授权

US07649702B2 Immersion lithography objective 有权
标题翻译：浸没光刻目标
公开(公告)号：US07649702B2
公开(公告)日：2010-01-19
申请号：US12019830
申请日：2008-01-25
申请人： Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
发明人： Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
IPC分类号： G02B7/02 , G02B3/00 , G02B3/12
CPC分类号： G03F7/70341 , G03F7/70825
摘要： An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.
摘要翻译：浸没式光刻物镜具有其中布置有至少一个第一光学元件的壳体，沿着物镜的光轴方向跟随第一光学元件的第二光学元件，与第二光学元件邻接的浸没介质，位于后者的光轴的方向的下游，以及用于第二光学元件的保持结构。保持结构在光轴的方向上具有比垂直于光轴的方向更大的刚度。

83. 发明授权

US07649676B2 System and method to form unpolarized light 有权
标题翻译：系统和方法形成非偏振光
公开(公告)号：US07649676B2
公开(公告)日：2010-01-19
申请号：US11452435
申请日：2006-06-14
申请人： Johannes Jacobus Matheus Baselmans , Huibert Visser
发明人： Johannes Jacobus Matheus Baselmans , Huibert Visser
IPC分类号： G02B26/08
CPC分类号： G02B27/123 , G03F7/70566
摘要： A system and method are used to form an unpolarized light beam from a polarized light beam. A system comprises a source of radiation and a unpolarizing system. The source of radiation produces a linear polarized beam. The unpolarizing system has first and second optical paths and splits the linear polarized beam. A first portion of the split beam travels along the first optical path having a first path length. A second portion of the split beam travels along the second optical path having a second, different path length. The first and second portions of the split beam are combined to form the unpolarized beam.
摘要翻译：使用系统和方法来形成来自偏振光束的非偏振光束。系统包括辐射源和非偏振系统。辐射源产生线偏振光束。非偏振系统具有第一和第二光路，并分裂线偏振光束。分束的第一部分沿着具有第一路径长度的第一光路行进。分束的第二部分沿着具有第二不同路径长度的第二光路传播。分束的第一和第二部分被组合以形成非偏振光束。

84. 发明授权

US07561252B2 Interferometric lithography system and method used to generate equal path lengths of interfering beams 有权
标题翻译：用于产生相等路径长度的干涉光束的干涉光刻系统和方法
公开(公告)号：US07561252B2
公开(公告)日：2009-07-14
申请号：US11320473
申请日：2005-12-29
申请人： Harry Sewell , Johannes Jacobus Matheus Baselmans
发明人： Harry Sewell , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G03B27/54 , G03F7/70408
摘要： A system and method are provided for writing patterns onto substrates. First and second beams are directed to converge and substantially overlap in a common region on a substrate. This can be done so that the first and second beams are mutually temporally coherent and spatially coherent in the region of overlap to form interference fringes to define a writing image. A beam width of the first and second beams is adjusted. This can be done so that respective path lengths of the beams are matched when they reach the common region to ensure the first and second beams are mutually spatially coherent and temporally coherent across an entire width of the common region. In one example, the substrate is moved with respect to the writing image, while writing patterns onto the substrate. In another example, the substrate remains stationary.
摘要翻译：提供了将图案写入基板的系统和方法。引导第一和第二光束在基板上的公共区域中会聚并基本重叠。这可以进行，使得第一和第二波束在重叠区域中相互时空相干和空间相干以形成干涉条纹以限定写入图像。调整第一和第二光束的光束宽度。这可以进行，使得当它们到达公共区域时，波束的相应路径长度匹配，以确保第一和第二波束在公共区域的整个宽度上相互空间相干和时间相干。在一个示例中，当将图案写入基板时，基板相对于写入图像移动。在另一个实例中，衬底保持静止。

85. 发明申请

US20090168039A1 Device Manufacturing Method and Lithographic Apparatus 有权
标题翻译：设备制造方法和平版印刷设备
公开(公告)号：US20090168039A1
公开(公告)日：2009-07-02
申请号：US12345105
申请日：2008-12-29
申请人： Haico Victor KOK , Johannes Jacobus Matheus Baselmans , Marcus Adrianus Van De Kerkhof
发明人： Haico Victor KOK , Johannes Jacobus Matheus Baselmans , Marcus Adrianus Van De Kerkhof
IPC分类号： G03B27/42
CPC分类号： G03F7/70116 , G03F7/70075 , G03F7/706
摘要： A device manufacturing method includes a measurement phase and an exposure phase. The measurement phase includes conditioning a radiation beam with a first beam condition, forming the patterned radiation beam by imparting the radiation beam with the first beam condition with a first pattern in its cross-section, and projecting the patterned beam onto a sensor capable of providing a sensor output signal. The exposure phase includes fast switching the conditioning of the radiation beam to a second beam condition, the second beam condition being different from the first beam condition, forming the patterned radiation beam by imparting the radiation beam with the second beam condition with a second pattern in its cross-section, the second pattern being provided by a patterning device, and projecting the patterned beam onto a target portion of the substrate.
摘要翻译：装置制造方法包括测量阶段和曝光阶段。测量阶段包括对具有第一光束条件的辐射束进行调节，通过在其横截面中赋予具有第一图案的第一光束条件的辐射束来形成图案化的辐射束，并且将图案化的光束投影到能够提供传感器输出信号。曝光阶段包括将辐射束的调理快速切换到第二光束状态，第二光束条件不同于第一光束条件，通过将第二光束条件赋予具有第二光束条件的第二光束条件来形成图案化辐射束其横截面，第二图案由图案形成装置提供，并且将图案化的光束投影到基板的目标部分上。

86. 发明授权

US07528929B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07528929B2
公开(公告)日：2009-05-05
申请号：US10986178
申请日：2004-11-12
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
IPC分类号： G03B27/53 , G03B27/54
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
摘要翻译：公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。

87. 发明授权

US07433015B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07433015B2
公开(公告)日：2008-10-07
申请号：US10961369
申请日：2004-10-12
申请人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
发明人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70891 , G02B3/14 , G02B21/33 , G03F7/70341
摘要： An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
摘要翻译：浸没式光刻设备包括液体供应系统，其被配置为将液体供应到辐射束通过的空间，该液体具有可由调谐器调谐的光学特性。该空间可以位于投影系统和基板之间。调谐器布置成调节液体的一个或多个特性，例如作为空间和/或时间的函数的形状，组成，折射率和/或吸收率，以便改变光刻设备的成像性能。

88. 发明申请

US20080239268A1 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US20080239268A1
公开(公告)日：2008-10-02
申请号：US11729960
申请日：2007-03-30
申请人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
发明人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
IPC分类号： G03B27/52
CPC分类号： G03F7/70291 , G03F7/70116 , G03F7/702 , G03F7/70516
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
摘要翻译：装置制造方法包括使用照明系统来调节辐射束。调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。该方法还包括以其横截面中的图案图案化辐射束以形成图案化的辐射束，并将图案化的辐射束投影到基板的目标部分上。

89. 发明申请

US20080212211A1 IMMERSION LITHOGRAPHY OBJECTIVE 有权
标题翻译：倾斜平面图目标
公开(公告)号：US20080212211A1
公开(公告)日：2008-09-04
申请号：US12019830
申请日：2008-01-25
申请人： Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
发明人： Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
IPC分类号： G02B7/02 , H01L21/00
CPC分类号： G03F7/70341 , G03F7/70825
摘要： An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.
摘要翻译：浸没式光刻物镜具有其中布置有至少一个第一光学元件的壳体，沿着物镜的光轴方向跟随第一光学元件的第二光学元件，与第二光学元件邻接的浸没介质，位于后者的光轴的方向的下游，以及用于第二光学元件的保持结构。保持结构在光轴的方向上具有比垂直于光轴的方向更大的刚度。

90. 发明授权

US07403265B2 Lithographic apparatus and device manufacturing method utilizing data filtering 有权
标题翻译：利用数据滤波的平版印刷设备和器件制造方法
公开(公告)号：US07403265B2
公开(公告)日：2008-07-22
申请号：US11093259
申请日：2005-03-30
申请人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
发明人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/54 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70191 , G03F7/70291 , G03F7/70433 , G03F7/70508
摘要： An apparatus and method are used to form patterns on a substrate. The comprise a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams of radiation. The patterning device modulates the sub-beams of radiation to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters for pattern sharpening, image log slope control, and/or CD biasing can also be used.
摘要翻译：使用装置和方法在基板上形成图案。包括投影系统，图案形成装置，低通滤波器和数据操作装置。投影系统将辐射束投射到基板上作为辐射子束阵列。图案形成装置调制辐射的子光束以在衬底上基本上产生所要求的剂量图案。低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。在各种示例中，还可以使用用于图案锐化，图像对数斜率控制和/或CD偏置的滤波器。

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