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81. 发明申请

US20100007397A1 Delay line circuit for generating a fixed delay 审中-公开
标题翻译：用于产生固定延迟的延迟线电路
公开(公告)号：US20100007397A1
公开(公告)日：2010-01-14
申请号：US12218457
申请日：2008-07-11
申请人： Shengyuan Zhang , Yong Wang , Yanbo Wang
发明人： Shengyuan Zhang , Yong Wang , Yanbo Wang
IPC分类号： H03H11/26 , H03K3/011 , G05F1/00
CPC分类号： G05F3/30 , H03K5/133 , H03K2005/00032 , H03K2005/00078
摘要： A delay line circuit is provided. The delay line circuit includes a reference voltage generating circuit that generates a reference voltage, the reference voltage having a positive temperature coefficient. The delay line circuit also includes a voltage regulating circuit that generates a regulated voltage in response to the generated reference voltage as an input, and a delay chain circuit coupled to the voltage regulator to receive the regulated voltage, the delay chain circuit outputting a delay signal. In an embodiment consistent with the present invention, the reference voltage generating circuit includes a bandgap reference voltage circuit. In another embodiment consistent with the present invention, the reference voltage generating circuit includes a proportional to absolute temperature (PTAT) circuit.
摘要翻译：提供延迟线电路。延迟线电路包括产生参考电压的参考电压产生电路，该参考电压具有正温度系数。延迟线电路还包括电压调节电路，其响应于产生的参考电压作为输入而产生调节电压，以及延迟链电路，耦合到电压调节器以接收调节电压，延迟链电路输出延迟信号。在与本发明一致的实施例中，参考电压产生电路包括带隙基准电压电路。在与本发明一致的另一实施例中，参考电压产生电路包括与绝对温度（PTAT）成比例的电路。

82. 发明申请

US20090305161A1 LIQUID IMMERSION LITHOGRAPHY 审中-公开
标题翻译：液体渗透光刻
公开(公告)号：US20090305161A1
公开(公告)日：2009-12-10
申请号：US12094493
申请日：2006-11-20
申请人： Atsushi Nakamura , Yong Wang , Takayuki Tsuji
发明人： Atsushi Nakamura , Yong Wang , Takayuki Tsuji
IPC分类号： G03F7/004
CPC分类号： G03F7/2041 , G03F7/0397
摘要： A radiation-sensitive resin composition for liquid immersion lithography which produces an excellent pattern profile, exhibits excellent resolution, provides sufficient focal depth allowance, and elutes only the minimal amount in the liquid when brought in contact with the liquid during exposure to radiation. The radiation-sensitive resin composition forms a photoresist film in liquid immersion lithography, in which radiation is emitted through a liquid for use in liquid immersion lithography having a refractive index larger than 1.44 and smaller than 1.85 at a wavelength of 193 nm, existing between a lens and a photoresist, the composition comprising a resin having a recurring unit with a lactone structure, which is insoluble or scarcely soluble in alkali, but becomes soluble in alkali by the action of an acid, and a radiation-sensitive acid generator.
摘要翻译：用于液浸光刻的辐射敏感性树脂组合物，其产生优异的图案轮廓，显示出优异的分辨率，提供足够的焦点深度余量，并且在暴露于辐射期间与液体接触时仅洗脱液体中的最小量。辐射敏感树脂组合物在液浸光刻中形成光致抗蚀剂膜，其中辐射通过用于液体浸渍光刻的液体发射，其在193nm波长处的折射率大于1.44且小于1.85，存在于透镜和光致抗蚀剂，该组合物包含具有内酯结构的重复单元的树脂，其不溶于或几乎不溶于碱，但通过酸的作用变得可溶于碱，并且具有辐射敏感性的酸产生剂。

83. 发明授权

US07585899B2 Catalyst structure and method of Fischer-Tropsch synthesis 有权
公开(公告)号：US07585899B2
公开(公告)日：2009-09-08
申请号：US11364595
申请日：2006-02-27
申请人： Yong Wang , David P. Vanderwiel , Anna Lee Y. Tonkovich , Yufei Gao , Eddie G. Baker
发明人： Yong Wang , David P. Vanderwiel , Anna Lee Y. Tonkovich , Yufei Gao , Eddie G. Baker
IPC分类号： C07C27/00
CPC分类号： C10G2/332 , B01J8/0285 , B01J12/007 , B01J19/0093 , B01J19/248 , B01J19/249 , B01J19/2495 , B01J23/8913 , B01J35/0006 , B01J35/04 , B01J35/10 , B01J35/1076 , B01J37/0217 , B01J37/0225 , B01J37/0238 , B01J37/0244 , B01J37/0248 , B01J2219/00783 , B01J2219/00822 , B01J2219/00835 , B01J2219/00844 , B01J2219/0086 , B01J2219/00873 , B01J2219/00984 , B01J2219/2453 , B01J2219/2458 , B01J2219/2462 , B01J2219/32244 , B01J2219/32293 , B01J2219/32296 , B01J2219/32408 , B01J2219/32466 , B01J2219/32475 , C07C1/041 , C07C1/0425 , C07C1/0455 , C07C2523/46 , C07C2523/745 , C07C2523/75 , C10G2/32 , C10G2/33 , C10G2/34 , C10G2/341
摘要： The present invention includes a catalyst structure and method of making the catalyst structure for Fischer-Tropsch synthesis that both rely upon the catalyst structure having a first porous structure with a first pore surface area and a first pore size of at least about 0.1 μm, preferably from about 10 μm to about 300 μm. A porous interfacial layer with a second pore surface area and a second pore size less than the first pore size is placed upon the first pore surface area. Finally, a Fischer-Tropsch catalyst selected from the group consisting of cobalt, ruthenium, iron and combinations thereof is placed upon the second pore surface area. Further improvement is achieved by using a microchannel reactor wherein the reaction chamber walls define a microchannel with the catalyst structure placed therein through which pass reactants. The walls may separate the reaction chamber from at least one cooling chamber. The present invention also includes a method of Fischer-Tropsch synthesis.

84. 发明申请

US20090169443A1 Catalysts, Reactors and Methods of Producing Hydrogen Via the Water-Gas Shift Reaction 有权
标题翻译：催化剂，反应器和通过水煤气变换反应生成氢气的方法
公开(公告)号：US20090169443A1
公开(公告)日：2009-07-02
申请号：US12347966
申请日：2008-12-31
申请人： Yong Wang , Anna Lee Y. Tonkovich
发明人： Yong Wang , Anna Lee Y. Tonkovich
IPC分类号： B01J19/24 , B01J8/00
CPC分类号： B01J35/10 , B01J19/0093 , B01J23/58 , B01J35/1076 , B01J2219/00835 , B01J2219/00844 , B01J2219/00873 , C01B3/16 , C01B2203/0205 , C01B2203/0283 , C01B2203/047 , C01B2203/066 , C01B2203/0883 , C01B2203/1064 , C01B2203/1082 , C01B2203/1094 , F28F2260/02 , Y02P20/52
摘要： The reaction of carbon monoxide with steam over an alkali-modified ruthenium-on-zirconia catalyst has been found to yield surprisingly high yields of hydrogen gas at relatively low temperatures. Catalyst structures, reactors, hydrogen production systems, and methods for producing hydrogen utilizing the alkali-modified ruthenium-on-zirconia catalyst are described. Methods of making catalysts are also described.
摘要翻译：已经发现一氧化碳与蒸汽在碱改性的氧化钌 - 氧化锆催化剂上的反应在相对低的温度下产生令人惊讶的高产率的氢气。描述了使用碱改性的氧化钌 - 氧化锆催化剂的催化剂结构，反应器，氢生产系统和用于生产氢的方法。还描述了制备催化剂的方法。

85. 发明授权

US07530717B2 Recessed light can height adjustment 有权
标题翻译：嵌入式灯具可调节高度
公开(公告)号：US07530717B2
公开(公告)日：2009-05-12
申请号：US11672143
申请日：2007-02-07
申请人： Antonio Magisano , Yong Wang
发明人： Antonio Magisano , Yong Wang
IPC分类号： F21V15/00
CPC分类号： F21V21/043 , F21V21/045
摘要： A recessed down lighting system having an adjustable retaining bracket. The adjustable retaining bracket facilitates attachment of a reflector to ceilings, walls, or the like of variable thicknesses. The recessed down lighting system may be installed in locations having reduced overhead space above the ceiling or where minimal lateral clearance is available behind the ceiling. The retaining bracket and fastener can be installed and vertically adjusted through the open end of the reflector to secure the reflector to the ceiling.
摘要翻译：具有可调保持支架的凹陷照明系统。可调节的固定支架便于将反射器连接到可变厚度的天花板，墙壁等上。凹陷式照明系统可以安装在天花板上方具有减少的顶部空间的位置或者在天花板后方可获得最小侧向间隙的位置。保持支架和紧固件可以通过反射器的开口端安装和垂直调节，以将反射器固定在天花板上。

86. 发明申请

US20090105211A1 INHIBITORS OF HEDGEHOG PATHWAY 有权
标题翻译： HEDGEHOG PATHWAY的抑制剂
公开(公告)号：US20090105211A1
公开(公告)日：2009-04-23
申请号：US12049225
申请日：2008-03-14
申请人： Suleyman Bahceci , William Bajjalieh , Jeff Chen , Sergey Epshteyn , Timothy Patrick Forsyth , Tai Phat Huynh , Byung Gyu Kim , James W. Leahy , Matthew Sangyup Lee , Gary L. Lewis , Morrison B. Mac , Grace Mann , Charles K. Marlowe , Brian Hugh Ridgway , Joan C. Sangalang , Xian Shi , Craig Stacy Takeuchi , Yong Wang
发明人： Suleyman Bahceci , William Bajjalieh , Jeff Chen , Sergey Epshteyn , Timothy Patrick Forsyth , Tai Phat Huynh , Byung Gyu Kim , James W. Leahy , Matthew Sangyup Lee , Gary L. Lewis , Morrison B. Mac , Grace Mann , Charles K. Marlowe , Brian Hugh Ridgway , Joan C. Sangalang , Xian Shi , Craig Stacy Takeuchi , Yong Wang
IPC分类号： C07D239/84 , C07D413/12 , A61K31/517 , A61K31/5377 , A61K31/496 , A61K31/553 , A61K31/55 , C07D401/12 , C07D403/12 , A61P35/00 , C07D401/14
CPC分类号： C07D239/42 , C07D239/70 , C07D239/84 , C07D239/95 , C07D401/04 , C07D403/12
摘要： The present invention is directed to a compound of Formula I or a single isomer thereof; where the compound is optionally as a pharmaceutically acceptable salt, hydrate, solvate or combination thereof, in addition to methods of preparing a Compound of Formula I, and methods of using a Compound of Formula I to treat cancer.
摘要翻译：本发明涉及式I化合物或其单一异构体; 其中除了制备式I化合物的方法之外，化合物任选为其药学上可接受的盐，水合物，溶剂合物或其组合，以及使用式I化合物治疗癌症的方法。

87. 发明授权

US07517634B2 Photoresist polymers 有权
标题翻译：光致抗蚀剂聚合物
公开(公告)号：US07517634B2
公开(公告)日：2009-04-14
申请号：US11300658
申请日：2005-12-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： C08F220/28 , C08F20/18 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译：本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。用作单体体积大的酯单体作为聚合组分。链转移剂的使用包括在聚合工艺条件中。描述了包含杂原子的聚合物末端基团的切割。

88. 发明授权

US07498001B2 Catalyst, method of making, and reactions using the catalyst 有权
公开(公告)号：US07498001B2
公开(公告)日：2009-03-03
申请号：US10822839
申请日：2004-04-13
申请人： Anna Lee Y. Tonkovich , Yong Wang , Yufei Gao
发明人： Anna Lee Y. Tonkovich , Yong Wang , Yufei Gao
IPC分类号： B01J8/04 , B21D51/16
CPC分类号： B01J37/0244 , B01J35/04 , B01J37/0225 , B01J2219/00835 , Y10T29/49345
摘要： The present invention includes a catalyst having a layered structure with, (1) a porous support, (2) a buffer layer, (3) an interfacial layer, and optionally (4) a catalyst layer. The invention also provides a process in which a reactant is converted to a product by passing through a reaction chamber containing the catalyst.

89. 发明申请

US20090053102A2 SYSTEM AND METHOD FOR NONINVASIVE ELECTROCARDIOGRAPHIC IMAGING (ECGI) 有权
标题翻译：非线性电子成像（ECGI）的系统和方法
公开(公告)号：US20090053102A2
公开(公告)日：2009-02-26
申请号：US11996441
申请日：2008-01-22
申请人： Yoram Rudy , Yong Wang , Ping Jia
发明人： Yoram Rudy , Yong Wang , Ping Jia
IPC分类号： A61L2/10 , B01J19/12
CPC分类号： A61B5/0402 , A61B5/0044 , A61B5/04085 , A61B5/055 , A61B6/03
摘要： Noninvasive systems and methods are provided for determining electrical activity for a heart of a living being. A processor is configured to meshlessly compute data that represents heart electrical activity from a set of noninvasively measured body surface electrical potentials. This is accomplished using data that describes a geometric relationship between a plurality of locations corresponding to where the body surface electrical potentials were measured and the heart.
摘要翻译：提供无创系统和方法来确定生命的心脏的电活动。处理器被配置为从一组非侵入性测量的身体表面电势无网格地计算表示心脏电活动的数据。这是使用描述对应于测量身体表面电位的位置与心脏之间的多个位置之间的几何关系的数据来实现的。

90. 发明授权

US07462713B2 Tricyclic compounds protein kinase inhibitors for enhancing the efficacy of anti-neoplastic agents and radiation therapy 失效
标题翻译：三环化合物蛋白激酶抑制剂，用于增强抗肿瘤药物和放射治疗的疗效
公开(公告)号：US07462713B2
公开(公告)日：2008-12-09
申请号：US11426132
申请日：2006-06-23
申请人： Suzanne Benedict , Michael Bennett , Sacha Ninkovic , Min Teng , Eugene Rui , Fen Wang , Yong Wang , Jinjiang Zhu
发明人： Suzanne Benedict , Michael Bennett , Sacha Ninkovic , Min Teng , Eugene Rui , Fen Wang , Yong Wang , Jinjiang Zhu
IPC分类号： C07D489/02
CPC分类号： C07D487/06 , C07D498/06
摘要： Protein kinase, such as CHK-1, inhibiting tricyclic compounds of the following formula (wherein R2, R3 and R4 are as defined in the specification) pharmaceutical compositions containing effective amounts of said compounds or their salts are useful as a single agent or in combination with an anti-neoplastic agent or therapeutic radiation having an anti-neoplastic effect for treating diseases or conditions such as cancers. The current invention relates to the making and using of such compounds.
摘要翻译：蛋白激酶，如CHK-1，抑制下式（其中R2，R3和R4如说明书中所定义）的三环化合物含有有效量的所述化合物或其盐的药物组合物可用作单一试剂或组合使用具有抗肿瘤剂或具有治疗疾病或病症如癌症的抗肿瘤作用的治疗放射线。本发明涉及制备和使用这些化合物。

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