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81. 发明授权

US6083665A Photoresist laminate and method for patterning using the same 有权
标题翻译：光刻胶层压板和使用其的图案化方法
公开(公告)号：US6083665A
公开(公告)日：2000-07-04
申请号：US273262
申请日：1999-03-22
申请人： Mitsuru Sato , Katsumi Oomori , Etsuko Iguchi , Kiyoshi Ishikawa , Fumitake Kaneko , Toshimasa Nakayama
发明人： Mitsuru Sato , Katsumi Oomori , Etsuko Iguchi , Kiyoshi Ishikawa , Fumitake Kaneko , Toshimasa Nakayama
IPC分类号： G03F7/004 , G03F7/038 , G03F7/09 , G03F7/11 , H01L21/027 , H01L21/302 , H01L21/3065 , G03F7/40
CPC分类号： G03F7/091 , G03F7/0045 , Y10S430/12 , Y10S430/122
摘要： A proposal is made for the photolithographic formation of a patterned resist layer on a substrate without the troubles due to reflection of the exposure light on the substrate surface. Thus, patterning is conducted on a photo-resist laminate comprising (a) a substrate; (b) a specific anti-reflection coating layer formed on one surface of the substrate; and (c) a photoresist layer formed on the anti-reflection coating layer from a specific negative-working chemical-sensitization photoresist composition. The patterning procedure comprises the steps of: (A) exposing, pattern-wise to actinic rays, the photoresist layer of the photoresist laminate; (B) subjecting the photoresist layer to a heat treatment; (C) subjecting the photoresist layer to a development treatment to dissolve away the photoresist layer in the areas unexposed to actinic rays in step (A) so as to expose bare the anti-reflection coating layer in the areas unexposed to the actinic rays leaving a patterned resist layer in the areas exposed to the actinic rays; and (D) removing the pattern-wise exposed anti-reflection coating layer by dry etching with the patterned photoresist layer as a mask.
摘要翻译：提出了在基板上的图案化抗蚀剂层的光刻形成，而不会由于基板表面上的曝光光的反射而引起的问题。因此，在包含（a）基材的光致抗蚀剂层压体上进行图案化; （b）形成在所述基板的一个表面上的特定抗反射涂层; 和（c）由特定的负性化学增感光致抗蚀剂组合物形成在抗反射涂层上的光致抗蚀剂层。图案化步骤包括以下步骤：（A）以光致抗蚀剂层压板的光致抗蚀剂层将光致抗蚀剂层以图形方式曝光于光化射线; （B）对光致抗蚀剂层进行热处理; （C）在步骤（A）中对光致抗蚀剂层进行显影处理以将光致抗蚀剂层溶解在未暴露于光化射线的区域中，以便露出未暴露于光化离子的区域中的防反射涂层在暴露于光化射线的区域中的图案化抗蚀剂层; 和（D）通过用图案化的光致抗蚀剂层作为掩模的干蚀刻去除图案化的曝光的抗反射涂层。

82. 发明授权

US5928837A Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds 失效
标题翻译：包含肟磺酸盐化合物的负性化学增感光致抗蚀剂组合物
公开(公告)号：US5928837A
公开(公告)日：1999-07-27
申请号：US987023
申请日：1997-12-09
申请人： Mitsuru Sato , Kiyoshi Ishikawa , Yoshiki Sugeta , Hiroyuki Yamazaki , Toshikazu Tachikawa , Hiroshi Komano
发明人： Mitsuru Sato , Kiyoshi Ishikawa , Yoshiki Sugeta , Hiroyuki Yamazaki , Toshikazu Tachikawa , Hiroshi Komano
IPC分类号： G03F7/004 , G03F7/038 , H01L21/027 , G03C1/492
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/12 , Y10S430/122
摘要： Proposed is a novel negative-working chemical-sensitization photoresist composition used in the photolithographic patterning work for the manufacture of semiconductor devices and the like and capable of giving a patterned resist layer with high sensitivity and pattern resolution as well as excellent heat resistance and excellently orthogonal cross sectional profile of the patterned resist layer. The composition comprises, as a uniform solution:(A) 100 parts by weight of an alkali-soluble resin which is a polyhydroxystyrene-based resin having a weight-average molecular weight of at least 2000;(B) from 3 to 70 parts by weight of an acid-crosslinkable compound which is an amino resin having hydroxyalkyl and/or alkoxyalkyl groups;(C) from 0.5 to 30 parts by weight of a radiation-sensitive acid-generating compound selected from several types of specific oximesulfonate compounds; and(D) from 0.5 to 10 parts by weight of a phenolic compound, such as benzophenone compounds, having at least four hydroxyl groups in a molecule and a molecular weight smaller than 2000.
摘要翻译：提出了用于制造半导体器件等的光刻图案化工作中的新颖的负极化学增感光致抗蚀剂组合物，并且能够提供具有高灵敏度和图案分辨率的图案化抗蚀剂层以及优异的耐热性和良好的正交图案化抗蚀剂层的横截面轮廓。该组合物包含作为均匀溶液：（A）100重量份作为重均分子量为至少2000的聚羟基苯乙烯类树脂的碱溶性树脂; （B）3〜70重量份作为具有羟烷基和/或烷氧基烷基的氨基树脂的酸交联性化合物; （C）0.5〜30重量份选自几种特定肟磺酸酯化合物的辐射敏感产酸化合物; 和（D）0.5〜10重量份在分子中具有至少四个羟基并且分子量小于2000的酚类化合物，例如二苯甲酮化合物。

83. 发明授权

US5849467A Method for the pre-treatment of a photoresist layer on a substrate surface 失效
标题翻译：在基板表面上预处理光致抗蚀剂层的方法
公开(公告)号：US5849467A
公开(公告)日：1998-12-15
申请号：US788442
申请日：1997-01-28
申请人： Mitsuru Sato , Naomi Nagatsuka , Koichi Nagasawa , Hutoshi Shimai , Kouji Harada
发明人： Mitsuru Sato , Naomi Nagatsuka , Koichi Nagasawa , Hutoshi Shimai , Kouji Harada
IPC分类号： G03F7/42 , G03F7/16 , G03F7/26 , H01L21/027 , H01L21/304 , H01L21/308 , G03C5/00
CPC分类号： G03F7/168
摘要： The invention proposes an improved method for the pre-treatment of a photoresist layer formed on a substrate surface prior to pattern-wise exposure of the photoresist layer to actinic rays, in which extraneous portions of the resist layer formed by overspreading of the photoresist solution as in the marginal zone of the patterning area and on the peripheral and back surfaces of the substrate, by dissolving away with a cleaning solution. In contrast to the conventional cleaning solutions consisting entirely or mainly of an organic solvent capable of dissolving the photoresist composition, the cleaning solution used in the inventive method is an aqueous alkaline solution containing a water-soluble alkaline compound dissolved in an aqueous medium consisting of water and a limited amount of a water-miscible organic solvent such as monohydric alcohols, alkyleneglycol monoalkyl ethers and aprotic solvents. The cleaning solution may optionally contain an anti-corrosion agent.
摘要翻译：本发明提出了一种用于在将光致抗蚀剂层图案化地曝光于光化射线之前，在基板表面上形成的光致抗蚀剂层的预处理的改进方法，其中通过将光致抗蚀剂溶液的过度扩展形成的抗蚀剂层的外部部分在图案化区域的边缘区域和衬底的周边和背面上，通过用清洁溶液溶解。与完全或主要由可溶解光致抗蚀剂组合物的有机溶剂组成的常规清洁溶液相反，本发明方法中使用的清洗溶液是含有溶于水中的水溶性碱性化合物的碱性水溶液，和有限量的水混溶性有机溶剂如一元醇，亚烷基二醇单烷基醚和非质子溶剂。清洁溶液可以任选地含有防腐蚀剂。

84. 发明授权

US5845184A Developing unit having improved toner density control 失效
标题翻译：显影单元具有改进的调色剂浓度控制
公开(公告)号：US5845184A
公开(公告)日：1998-12-01
申请号：US220436
申请日：1994-03-30
申请人： Akira Nagahara , Yoshio Yamaguchi , Shigenobu Utaka , Toshio Tooda , Haruyasu Watanabe , Sachio Sasaki , Mitsuhito Furukawa , Mitsuru Sato , Nobuo Kuwabara , Takefumi Takahashi
发明人： Akira Nagahara , Yoshio Yamaguchi , Shigenobu Utaka , Toshio Tooda , Haruyasu Watanabe , Sachio Sasaki , Mitsuhito Furukawa , Mitsuru Sato , Nobuo Kuwabara , Takefumi Takahashi
IPC分类号： G03G9/083 , G03G15/08 , G03G15/09
CPC分类号： G03G15/09 , G03G15/0896 , G03G2215/00012 , G03G2215/0609
摘要： A developing apparatus is provided for developing an electrostatic latent image on a latent image carrier by supplying the latent image carrier with a developer. This developing apparatus includes a toner accommodating chamber for accommodating magnetic toners. The apparatus also includes a developing roller, having a plurality of fixed magnetic pole members and sleeves provided along peripheries of the fixed magnetic pole members and rotating thereabout, for feeding the developer composed of magnetic carriers and magnetic toners to the latent image carrier. The apparatus further includes a developing chamber having a partition wall formed along the developing roller and assuming a configuration adapted to a shape of the developing roller, and a toner supply port for supplying the magnetic toners to the developing chamber from the toner accommodating chamber. In another mode of the developing apparatus, the center of each magnetic pole of the fixed magnetic pole members is located in a position deviating from the toner supply port. Further, in still another mode of the developing apparatus, there is employed the magnetic carrier the core of which is iron powder exhibiting strong saturation magnetization.
摘要翻译：提供一种显影装置，用于通过向潜像载体提供显影剂来使潜像载体上的静电潜像显影。该显影装置包括用于容纳磁性调色剂的调色剂容纳室。该装置还包括一个显影辊，具有多个固定磁极件和沿固定磁极件的周边设置并在其周围旋转的套筒，用于将由磁性载体和磁性调色剂构成的显影剂供给潜像载体。该装置还包括具有沿着显影辊形成的分隔壁并具有适于显影辊形状的分隔壁的显影室和用于从调色剂容纳室将磁性调色剂供应到显影室的调色剂供给口。在显影装置的另一种模式中，固定磁极件的每个磁极的中心位于偏离调色剂供给口的位置。此外，在显影装置的另一种模式中，使用磁性载体，其核心是呈现强饱和磁化强度的铁粉。

85. 发明授权

US5815767A Image forming apparatus 失效
标题翻译：图像形成装置
公开(公告)号：US5815767A
公开(公告)日：1998-09-29
申请号：US857899
申请日：1997-05-16
申请人： Akio Kutsuwada , Masaru Tanaka , Takeo Suda , Mitsuru Sato , Toshitaka Yamaguchi , Kenzou Tatsumi
发明人： Akio Kutsuwada , Masaru Tanaka , Takeo Suda , Mitsuru Sato , Toshitaka Yamaguchi , Kenzou Tatsumi
IPC分类号： G03G15/00 , G03G15/09 , G03G21/18
CPC分类号： G03G15/09 , G03G15/65 , G03G15/75 , G03G21/181 , G03G5/147 , G03G2215/00675 , G03G2215/0607 , G03G2221/163 , G03G2221/1663 , G03G2221/1666
摘要： In an image forming apparatus, a latent image electrostatically formed on a photoconductive element is developed by a two-ingredient type developer consisting of toner and carrier. The photoconductive element has a life coincident with the life of the developer. When the photoconductive element and developer reach the end of their life, they are replaced at the same time.
摘要翻译：在图像形成装置中，通过由调色剂和载体构成的双组分型显影剂显影静电形成在光电导元件上的潜像。光导元件具有与显影剂寿命一致的寿命。当光导元件和显影剂达到使用寿命时，它们将被同时更换。

86. 发明授权

US5789136A Negative-working photoresist composition 失效
标题翻译：负性光刻胶组合物
公开(公告)号：US5789136A
公开(公告)日：1998-08-04
申请号：US626147
申请日：1996-04-05
申请人： Mitsuru Sato , Katsumi Oomori , Kiyoshi Ishikawa , Etsuko Iguchi , Fumitake Kaneko
发明人： Mitsuru Sato , Katsumi Oomori , Kiyoshi Ishikawa , Etsuko Iguchi , Fumitake Kaneko
IPC分类号： G03F7/004 , G03F7/038 , G03C1/73
CPC分类号： G03F7/0045 , G03F7/038 , Y10S430/121 , Y10S430/122 , Y10S430/126 , Y10S430/128
摘要： Proposed is an alkali-developable negative-working photoresist composition in the form of a solution capable of exhibiting high sensitivity and greatly improved stability of the resist layer of the composition on a substrate surface after pattern-wise exposure to actinic rays and kept for a substantial length of time before further processing. The photoresist composition comprises, as the essential ingredients, (a) an alkali-soluble resin such as a copolymer of hydroxystyrene and styrene; (b) a compound capable of releasing an acid when irradiated with actinic rays such as tris(2,3-dibromopropyl) isocyanurate; (c) a crosslinking agent selected from the group consisting of melamine resins and urea resins substituted at the N-positions by methylol groups, alkoxy methyl groups or a combination thereof; and (d) a sensitivity improver which is hexa(methoxymethyl) melamine or di(methoxymethyl) urea, each in a specified proportion.
摘要翻译：提出了一种可显影的负性光致抗蚀剂组合物，其形式为能够显示出高灵敏度并且大大提高组合物的抗蚀剂层在图案形式暴露于光化射线之后在基材表面上的稳定性，并保持基本上进一步处理之前的时间长短。光致抗蚀剂组合物包含作为必要成分的（a）碱溶性树脂，例如羟基苯乙烯和苯乙烯的共聚物; （b）当用诸如三（2,3-二溴丙基）异氰脲酸酯的光化射线照射时能够释放酸的化合物; （c）选自三聚氰胺树脂和在N-位被羟甲基取代的尿素树脂的交联剂，烷氧基甲基或其组合; 和（d）灵敏度改进剂，其为六（甲氧基甲基）三聚氰胺或二（甲氧基甲基）脲，各自为特定比例。

87. 发明授权

US5747224A Stock developer solutions for photoresists and developer solutions prepared by dilution thereof 失效
标题翻译：用于通过稀释制备的光致抗蚀剂和显影剂溶液的库存显影剂溶液
公开(公告)号：US5747224A
公开(公告)日：1998-05-05
申请号：US630622
申请日：1996-04-10
申请人： Mitsuru Sato , Masakazu Kobayashi , Toshimasa Nakayama
发明人： Mitsuru Sato , Masakazu Kobayashi , Toshimasa Nakayama
IPC分类号： G03F7/32
CPC分类号： G03F7/32
摘要： Stock developer solutions for photoresists contain an organic base free from metal ions and at least one compound having a specified weight average molecular weight that is selected from among polyethylene oxide compounds, polypropylene oxide compounds and ethylene oxide/propylene oxide adducts. The stock developer solutions may be diluted to requisite concentrations to prepare developer solutions for photoresists. By adding one or more of the specified compounds to the organic base free from metal ions, one can produce highly compatible stock developer solutions for photoresists that are concentrated, that have high stability in quality and that permit ease in handling and quality control. The stock developer solutions may be diluted to prepare developer solutions that are small in the tendency to foam and effective in defoaming, that assure uniform wetting and that are capable of forming resist patterns faithful to mask patterns.
摘要翻译：用于光致抗蚀剂的储备显影剂溶液含有不含金属离子的有机碱和至少一种具有指定重均分子量的化合物，其选自聚环氧乙烷化合物，聚环氧丙烷化合物和环氧乙烷/环氧丙烷加合物。原料显影剂溶液可以稀释至必需的浓度以制备用于光致抗蚀剂的显影剂溶液。通过将一种或多种指定的化合物加入到不含金属离子的有机基质中，可以生产高浓度的光致抗蚀剂的高度相容的原料显影剂溶液，其具有高的质量稳定性并且易于处理和质量控制。可以将原料显影剂溶液稀释以制备发泡趋势小并且有效消泡的显影剂溶液，其确保均匀润湿并且能够形成忠实于掩模图案的抗蚀剂图案。

88. 发明授权

US5543268A Developer solution for actinic ray-sensitive resist 失效
标题翻译：用于光化射线敏感抗蚀剂的显影剂溶液
公开(公告)号：US5543268A
公开(公告)日：1996-08-06
申请号：US231877
申请日：1994-04-22
申请人： Hatsuyuki Tanaka , Mitsuru Sato , Toshimasa Nakayama , Hiroshi Komano
发明人： Hatsuyuki Tanaka , Mitsuru Sato , Toshimasa Nakayama , Hiroshi Komano
IPC分类号： G03F7/32
CPC分类号： G03F7/322
摘要： Disclosed is a novel aqueous developer solution used in the development treatment of an actinic ray-sensitive resist for the manufacture of, for example, semiconductor devices, which is capable of giving a patterned resist layer free from the troubles of film residue or scum deposition in any finest patterning. The developer solution contains, in addition to a nitrogen-containing organic basic compound, e.g., tetramethyl ammonium hydroxide, dissolved in an aqueous medium as the solvent, an anionic surface active agent which is a diphenyl ether compound having at least one ammonium sulfonate group, such as an ammonium alkyl diphenylether sulfonate, in a concentration of 0.05 to 5% by weight.
摘要翻译：公开了一种用于显影处理用于制造例如半导体器件的光化抗敏抗蚀剂的新型水性显影剂溶液，其能够提供没有膜残留物或浮渣沉积问题的图案化抗蚀剂层任何最好的图案。除了溶解在作为溶剂的水性介质中的含氮有机碱性化合物例如四甲基氢氧化铵之外，显影剂溶液还含有具有至少一个磺酸铵基团的二苯基醚化合物的阴离子表面活性剂，例如烷基二苯基醚磺酸铵，其浓度为0.05-5重量％。

89. 发明授权

US5448341A Image forming apparatus 失效
标题翻译：图像形成装置
公开(公告)号：US5448341A
公开(公告)日：1995-09-05
申请号：US220096
申请日：1994-03-30
申请人： Akira Nagahara , Sachio Sasaki , Mitsuru Sato , Shigenobu Utaka , Takefumi Takahashi , Masahiro Wanou , Masao Konishi
发明人： Akira Nagahara , Sachio Sasaki , Mitsuru Sato , Shigenobu Utaka , Takefumi Takahashi , Masahiro Wanou , Masao Konishi
IPC分类号： G03G15/00 , G03G15/08 , G03G15/09 , G03G21/00
CPC分类号： G03G15/00 , G03G15/0896 , G03G2215/00012 , G03G2215/0609
摘要： Disclosed is an image forming apparatus capable of performing an image forming operation in both a horizontal position and an upright position. This image forming apparatus comprises a rotary endless latent image carrier; image forming unit for forming an electrostatic latent image on the latent image carrier; developing unit for developing the electrostatic latent image on the latent image carrier with a powdery developer, the developing unit having a developing room, a developing roller provided in the developing room for supplying the powdery developer to the latent image carrier, a toner supply room for supplying toners, toner supply roller provided in the toner supply room and rotatable to supply the toners to the developing room, and a partition member for partitioning the developing room and the toner supply room and forming a toner supply passage for supplying the toners to the developing room; and transfer unit for transferring the developed image on the latent image carrier to a sheet.
摘要翻译：公开了一种能够在水平位置和直立位置进行图像形成操作的图像形成装置。该图像形成装置包括旋转式无端潜像载体; 图像形成单元，用于在潜像载体上形成静电潜像; 显影单元，其用粉状显影剂在潜像载体上显影静电潜像，显影单元具有显影室;显影辊，设置在显影室中，用于将粉状显影剂供应到潜像载体;调色剂供应室，用于提供调色剂，设置在调色剂供应室中的调色剂供给辊，并且可旋转地将调色剂供应到显影室;以及分隔构件，用于分隔显影室和调色剂供应室，并形成调色剂供应通道，用于将调色剂供应到显影房间; 以及用于将潜像载体上的显影图像转印到片材上的转印单元。

90. 发明授权

US5097345A Magnetic video recording apparatus 失效
标题翻译：磁性录像机
公开(公告)号：US5097345A
公开(公告)日：1992-03-17
申请号：US322501
申请日：1989-03-13
申请人： Toshizumi Ando , Mitsuru Sato , Kazuyuki Taniguchi , Yoshiyuki Takekawa
发明人： Toshizumi Ando , Mitsuru Sato , Kazuyuki Taniguchi , Yoshiyuki Takekawa
IPC分类号： H04N5/91 , G11B5/027 , H04N9/793
CPC分类号： H04N9/793
摘要： A magnetic video recording apparatus applicable to a video tape recorder or the like is designed integrally with a television camera. The apparatus has a video signal output unit for outputting first video signals, and a video signal recording unit for recording the first video signals outputting from the video signal output unit or second video signals obtained from an external video appliance. The video signal recording unit records the second video signals via correction means inserted for correcting the video signals to predetermined levels, but bypasses the correction means when recording the first video signals. Such bypass of the correction means eliminates any reduction of the signal-to-noise ratio that may otherwise be caused, hence preventing deterioration of the image quality in the reproduced video signals.
摘要翻译：适用于录像机等的磁性录像装置与电视摄影机一体设计。该装置具有用于输出第一视频信号的视频信号输出单元和用于记录从视频信号输出单元输出的第一视频信号或从外部视频设备获得的第二视频信号的视频信号记录单元。视频信号记录单元通过插入的用于将视频信号校正为预定电平的校正装置记录第二视频信号，但是当记录第一视频信号时，旁路校正装置。校正装置的这种旁路消除了否则可能导致的信噪比的任何降低，从而防止再现的视频信号中的图像质量的劣化。

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