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    • 85. 发明授权
    • Converter control device and air conditioner including converter control device
    • 转换器控制装置和空调包括转换器控制装置
    • US08941347B2
    • 2015-01-27
    • US13845286
    • 2013-03-18
    • Yu OtoriiKatsuhiko SaitoMasahiro Fukuda
    • Yu OtoriiKatsuhiko SaitoMasahiro Fukuda
    • H02P27/08F24F5/00H02M7/06
    • H02M7/06H02M1/4225H02P27/08Y02B70/126
    • A converter control device comprises: a voltage-zero-cross detection unit detecting zero cross of the alternate-current voltage and outputting a voltage zero-cross signal; a power-source-current detection unit detecting a power source current of the alternate-current power source; a bus-line-voltage detection unit detecting a bus-line voltage between terminals of the smoothing capacitor; a PWM-signal generation unit generating a PWM-signal for on/off-controlling the switching unit, based on the power-source current, the bus-line voltage and a bus-line-voltage command value as a target voltage of the bus-line voltage; a power-source voltage-state detection unit detecting a signal state of the alternate-current voltage based on the voltage zero-cross signal; and a fundamental-switching-frequency selection unit selecting a fundamental switching frequency of the PWM-signal based on the signal state of the alternate-current voltage. The PWM-signal generation unit generates the PWM-signal based on a fundamental switching signal having a fundamental switching frequency selected by the fundamental-switching-frequency selection unit.
    • A转换器控制装置包括:电压零交叉检测单元,检测交流电压的零交叉并输出电压零交叉信号; 电源电流检测单元,检测所述交流电源的电源电流; 总线电压检测单元,检测平滑电容器的端子之间的总线电压; PWM信号生成单元,基于电源电流,总线电压和总线电压指令值,作为总线的目标电压,生成用于开关单元的开/关控制的PWM信号 线电压; 电源电压状态检测单元,其基于所述电压过零信号来检测所述交流电压的信号状态; 以及基极开关频率选择单元,其基于所述交流电压的信号状态来选择所述PWM信号的基本开关频率。 PWM信号生成单元基于由基频开关频率选择单元选择的基本开关频率的基波开关信号来生成PWM信号。
    • 89. 发明授权
    • Semiconductor device fabrication method, semiconductor device, and semiconductor layer formation method
    • 半导体器件制造方法,半导体器件和半导体层形成方法
    • US08293622B2
    • 2012-10-23
    • US12120576
    • 2008-05-14
    • Masahiro FukudaYosuke Shimamune
    • Masahiro FukudaYosuke Shimamune
    • H01L21/20
    • H01L29/0847H01L21/02532H01L21/02579H01L21/0262H01L21/02636H01L29/165H01L29/66636H01L29/78H01L29/7848
    • A semiconductor device fabrication method and a semiconductor layer formation method for making a semiconductor layer having excellent morphology selectively epitaxial-grow over a semiconductor, and a semiconductor device. When a recessed source/drain pMOSFET is fabricated, a gate electrode is formed over a Si substrate in which STIs are formed with a gate insulating film therebetween (step S1). After a side wall is formed (step S2), recesses are formed in portions of the Si substrate on both sides of the side wall (step S3). A SiGe layer including a lower layer portion and an upper layer portion is formed in the recesses of the Si substrate. The lower layer portion and the upper layer portion included in the SiGe layer are made to epitaxial-grow under a condition that growth selectivity of the lower layer portion with respect to the side wall and the STIs is lower than growth selectivity of the upper layer portion with respect to the side wall and the STIs (steps S4 and S5). As a result, the SiGe layer the growth selectivity of which with respect to the side wall and the like is secured and in which morphological deterioration is suppressed can be formed in the recesses of the Si substrate.
    • 一种半导体器件制造方法和半导体层形成方法,用于制造在半导体上选择性地外延生长的具有优异形态的半导体层。 当制造凹陷源极/漏极pMOSFET时,在其上形成有栅绝缘膜的Si衬底上形成栅电极(步骤S1)。 在形成侧壁(步骤S2)之后,在侧壁两侧的Si基板的部分形成凹部(步骤S3)。 在Si衬底的凹部中形成包括下层部分和上层部分的SiGe层。 在SiGe层中包含的下层部分和上层部分在下层部分相对于侧壁和STI的生长选择性低于上层部分的生长选择性的条件下进行外延生长 相对于侧壁和STI(步骤S4和S5)。 结果,可以确保SiGe层相对于侧壁等的生长选择性,并且可以在Si衬底的凹部中形成抑制形态劣化的SiGe层。