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81. 发明申请

US20120064278A1 PACKAGE OF ENVIRONMENTAL SENSITIVE ELEMENT AND ENCAPSULATION METHOD THEREOF 审中-公开
标题翻译：环境敏感元件的包装及其包装方法
公开(公告)号：US20120064278A1
公开(公告)日：2012-03-15
申请号：US12915018
申请日：2010-10-29
申请人： Kuang-Jung Chen
发明人： Kuang-Jung Chen
IPC分类号： B32B33/00 , B44C1/22 , B32B3/02
CPC分类号： H01L51/5246 , Y10T428/239
摘要： A package of environmental sensitive element including a first substrate, a second substrate, an environmental sensitive element and a filler is provided. The second substrate is disposed above the first substrate and has a first barrier structure. The first barrier structure is located between the first substrate and the second substrate. The first barrier structure and the second substrate are integrally formed and made of the same material. The environmental sensitive element is disposed on the first substrate and located between the first substrate and the second substrate. The first barrier structure surrounds the environmental sensitive element. The filler is disposed between the first substrate and the second substrate and covers the environmental sensitive element and the first barrier structure.
摘要翻译：提供包括第一基板，第二基板，环境敏感元件和填充物的环境敏感元件的封装。第二基板设置在第一基板上方并具有第一阻挡结构。第一阻挡结构位于第一基板和第二基板之间。第一阻挡结构和第二基板一体地形成并由相同的材料制成。环境敏感元件设置在第一基板上并且位于第一基板和第二基板之间。第一屏障结构围绕环境敏感元件。填料设置在第一基板和第二基板之间并且覆盖环境敏感元件和第一阻挡结构。

82. 发明申请

US20070243484A1 Wet developable bottom antireflective coating composition and method for use thereof 失效
标题翻译：湿可显影底部抗反射涂料组合物及其使用方法
公开(公告)号：US20070243484A1
公开(公告)日：2007-10-18
申请号：US11405879
申请日：2006-04-18
申请人： Kuang-Jung Chen , Mahmoud Khojasteh , Ranee Kwong , Margaret Lawson , Wenjie Li , Kaushal Patel , Pushkara Varanasi
发明人： Kuang-Jung Chen , Mahmoud Khojasteh , Ranee Kwong , Margaret Lawson , Wenjie Li , Kaushal Patel , Pushkara Varanasi
IPC分类号： G03C1/00
CPC分类号： G03F7/091 , C08F220/28 , C08F222/40 , C08F232/08 , Y10S430/151
摘要： The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
摘要翻译：本发明公开了一种用于在基材表面和正性光致抗蚀剂组合物之间施加的抗反射涂料组合物。抗反射涂料组合物可在含水碱性显影剂中显影。抗反射涂料组合物包括聚合物，其包含至少一种含有一个或多个选自内酯，马来酰亚胺和N-烷基马来酰亚胺的部分的单体单元; 和含有一个或多个吸收部分的至少一个单体单元。聚合物不包含酸不稳定基团。本发明还公开了一种通过在光刻中使用本发明的抗反射涂料组合物来形成和转印浮雕图像的方法。

83. 发明申请

US20070231736A1 Bottom antireflective coating composition and method for use thereof 审中-公开
标题翻译：底部防反射涂料组合物及其使用方法
公开(公告)号：US20070231736A1
公开(公告)日：2007-10-04
申请号：US11391187
申请日：2006-03-28
申请人： Kuang-Jung Chen , Mahmoud Khojasteh , Ranee Kwong , Wenjie Li , Kaushal Patel , Pushkara Varanasi
发明人： Kuang-Jung Chen , Mahmoud Khojasteh , Ranee Kwong , Wenjie Li , Kaushal Patel , Pushkara Varanasi
IPC分类号： G03C1/00
CPC分类号： G03F7/091
摘要： The present invention discloses an antireflective coating composition for applying between a substrate surface and a photoresist composition. The antireflective coating composition of the present invention comprises a polymer, which includes at least one monomer unit containing a lactone moiety and at least one monomer unit containing an absorbing moiety. The inventive antireflective coating composition is preferably organic solvent-strippable, insoluble in an aqueous alkaline developer for the photoresist composition after exposure to an imaging radiation, and inert to contact reactions with the photoresist composition. The present invention also discloses a method of forming patterned material features on a substrate using the compositions of the invention.
摘要翻译：本发明公开了一种用于在基材表面和光致抗蚀剂组合物之间施加的抗反射涂料组合物。本发明的抗反射涂料组合物包括聚合物，其包含至少一个含有内酯部分的单体单元和至少一个含有吸收部分的单体单元。本发明的抗反射涂料组合物优选是有机溶剂可剥离的，在暴露于成像辐射之后不溶于用于光致抗蚀剂组合物的水性碱性显影剂，并且与光致抗蚀剂组合物的接触反应惰性。本发明还公开了使用本发明的组合物在衬底上形成图案化材料特征的方法。

84. 发明申请

US20070145892A1 Electro-luminescent display panel and electronic device using the same 审中-公开
标题翻译：电致发光显示面板及使用其的电子装置
公开(公告)号：US20070145892A1
公开(公告)日：2007-06-28
申请号：US11318779
申请日：2005-12-27
申请人： Kuang-Jung Chen
发明人： Kuang-Jung Chen
IPC分类号： H01J1/62
CPC分类号： H01L51/5271 , H01L27/3295 , H01L51/5284 , H01L2251/5315
摘要： An electro-luminescent display panel includes a first substrate having an array of light emitting elements corresponding to a plurality of pixels thereon and a second substrate having light transmissive regions and a reflective light enhancing pattern layer facing the light emitting elements in the first substrate, wherein the reflective light enhancing pattern layer directs oblique light emitted from the light emitting elements to the light transmissive regions. In another aspect, a spacer layer defines a predetermined gap between the first and second substrates. The space layer may provide a light enhancing structure.
摘要翻译：电致发光显示面板包括具有对应于其上的多个像素的发光元件阵列的第一基板和具有透光区域的第二基板和面对第一基板中的发光元件的反射光增强图案层，其中反射光增强图案层将从发光元件发射的倾斜光引导到透光区域。在另一方面，间隔层限定了第一和第二基底之间的预定间隙。空间层可以提供光增强结构。

85. 发明授权

US07129016B2 Positive resist containing naphthol functionality 有权
公开(公告)号：US07129016B2
公开(公告)日：2006-10-31
申请号：US10987540
申请日：2004-11-12
申请人： Mahmoud Khojasteh , Kuang-Jung Chen , Pushkara Rao Varanasi
发明人： Mahmoud Khojasteh , Kuang-Jung Chen , Pushkara Rao Varanasi
IPC分类号： G03F7/039 , G03F7/30
CPC分类号： G03F7/40 , G03F7/0397
摘要： Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation are obtained using a polymer having acrylate/methacrylate monomeric units comprising a naphthol ester group. The resist may optionally contain polymer having acrylate/methacrylate monomeric units with fluorine-containing functional groups. The resists containing the polymer having acrylate/methacrylate monomeric units comprising a naphthol ester group have an improved process window, including improved etch resistance and reduced swelling compared to conventional fluorine-containing 193 nm resist.

86. 发明授权

US07087356B2 193nm resist with improved post-exposure properties 失效
标题翻译： 193nm抗蚀剂，具有改善的曝光后特性
公开(公告)号：US07087356B2
公开(公告)日：2006-08-08
申请号：US10261249
申请日：2002-09-30
申请人： Mahmoud H. Khojasteh , Kuang-Jung Chen , Pushkara Rao Varanasi , Yukio Nishimura , Eiichi Kobayashi
发明人： Mahmoud H. Khojasteh , Kuang-Jung Chen , Pushkara Rao Varanasi , Yukio Nishimura , Eiichi Kobayashi
IPC分类号： G03C1/73 , G03F7/039 , G03F7/20 , G03F7/30 , G03F7/36 , G03F7/38
CPC分类号： G03F7/0392 , G03F7/0395 , Y10S430/106 , Y10S430/108 , Y10S430/111 , Y10S430/115
摘要： Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer component comprising an acid-sensitive polymer having a monomeric unit with a pendant group containing a remote acid labile moiety.
摘要翻译：可以通过193nm辐射和/或可能的其它辐射成像并且可显影以形成改进的显影特性和改善的耐蚀刻性的抗蚀剂结构的酸催化的正性抗蚀剂组合物是通过使用含有成像聚合物组分的抗蚀剂组合物来实现的，具有具有含有远离酸不稳定部分的侧基的单体单元的敏感性聚合物。

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