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    • 81. 发明申请
    • MICROSCOPE SYSTEM AND METHOD OF CONTROLLING A MICROSCOPE SYSTEM
    • 微阵列系统及其控制方法
    • US20110102572A1
    • 2011-05-05
    • US12912204
    • 2010-10-26
    • Nobuhiro KiharaKiyoshi OsatoKoichiro Kishima
    • Nobuhiro KiharaKiyoshi OsatoKoichiro Kishima
    • H04N7/18
    • G02B21/365G02B21/006G02B21/244G02B21/34G02B27/0025
    • A microscope system includes an accommodation unit, a stage, an optical system, an image pickup unit, a movement mechanism, a control unit, an image processing unit, and a display unit. The accommodation unit is capable of accommodating a plurality of specimens. On the stage, each of the specimens loaded from the accommodation unit is placed. The optical system includes a lens for spherical aberration correction. The image pickup unit is capable of capturing a partial image of each of the specimens placed on the stage, via the optical system. The movement mechanism moves the lens for spherical aberration correction along an optical axis. The control unit controls movement of the lens for spherical aberration correction by the movement mechanism and correct spherical aberration. The image processing unit combines the partial images captured by the image pickup unit and generate a composite image. The display unit displays the generated composite image.
    • 显微镜系统包括调节单元,台,光学系统,图像拾取单元,移动机构,控制单元,图像处理单元和显示单元。 住宿单元能够容纳多个标本。 在舞台上,放置从住宿单元装载的每个样本。 光学系统包括用于球面像差校正的透镜。 摄像单元能够通过光学系统拍摄放置在舞台上的每个样本的部分图像。 移动机构沿着光轴移动用于球面像差校正的透镜。 控制单元通过移动机构控制用于球面像差校正的透镜的移动,并且校正球面像差。 图像处理单元组合由图像拾取单元捕获的部分图像并生成合成图像。 显示单元显示生成的合成图像。
    • 86. 发明申请
    • Biometrics authentication system
    • 生物识别认证系统
    • US20090028396A1
    • 2009-01-29
    • US12218412
    • 2008-07-15
    • Koichiro Kishima
    • Koichiro Kishima
    • G06K9/00
    • A61B5/1172A61B5/0062A61B5/489G06K9/0004G06K9/00906G06K2009/0006G06K2009/00932
    • A biometrics authentication system includes: a detection section; a light source section including a plurality of unit light sources capable of illuminating independently of one another; an image pickup device being arranged on the same side as a side where the light source section is arranged with respect to the detection section; a driving section driving the light source section so that the unit light sources periodically illuminate by time division, and driving the image pickup device so that while an image pickup operation by a first image pickup cell group positioned near each of illuminating unit light sources is suspended, an image pickup operation by a second image pickup cell group positioned farther from each of illuminating unit light sources than the first image pickup cell group is performed; an image processing section; and an authentication section.
    • 生物识别认证系统包括:检测部分; 光源部,其包括能够彼此独立地照明的多个单位光源; 图像拾取装置布置在与所述光源部相对于所述检测部配置的一侧的同一侧; 驱动部,驱动光源部,使得单位光源通过时分周期性地点亮,并驱动图像拾取装置,使得在位于每个照明单元光源附近的第一图像拾取单元组的图像拾取操作被暂停时 执行由比第一图像拾取单元组更靠近每个照明单元光源的第二图像拾取单元组的图像拾取操作; 图像处理部; 和认证部分。
    • 87. 发明授权
    • Method for manufacturing semiconductor substrate and semiconductor substrate
    • 半导体衬底和半导体衬底的制造方法
    • US07368359B2
    • 2008-05-06
    • US10540720
    • 2004-10-25
    • Koichiro KishimaPrakash Koonath
    • Koichiro KishimaPrakash Koonath
    • H01L21/331H01L21/8222
    • H01L21/76243H01L21/76264H01L21/76267H01L21/76281
    • A semiconductor substrate (100) is acquired by forming a mask with a target thickness on a major surface of a single-crystal silicon substrate, implanting oxygen ions to the major surface at a high temperature, forming a surface protection layer for blocking oxygen on the major surface, performing annealing, and then stripping off the mask and the surface protection layer. A silicon dioxide layer (102) has a first tip surface (102a) corresponding to an area where the mask has not existed and having a relatively long distance from the major surface (100a), and a second top surface (102b) corresponding to an area where the mask has existed and having a relatively short distance from the major surface (100a). As this major surface (100a) is polished by a predetermined quantity, a semiconductor substrate is provided in which only a part of a single-crystal silicon substrate is a SOI substrate.
    • 通过在单晶硅衬底的主表面上形成具有目标厚度的掩模,在高温下将氧离子注入主表面而获得半导体衬底(100),形成用于阻挡氧的表面保护层 主表面进行退火,然后剥离掩模和表面保护层。 二氧化硅层(102)具有对应于不存在掩模的区域并且与主表面(100a)具有相对较长距离的区域的第一末端表面(102a)和第二顶表面(102b) 对应于掩模已经存在并且与主表面(100a)具有相对较短距离的区域。 由于该主表面(100a)被预定量抛光,所以提供半导体衬底,其中仅一部分单晶硅衬底是SOI衬底。
    • 88. 发明授权
    • Liquid crystal device and its manufacturing method
    • 液晶装置及其制造方法
    • US07184119B2
    • 2007-02-27
    • US10501229
    • 2003-12-04
    • Kenji YamamotoKoichiro Kishima
    • Kenji YamamotoKoichiro Kishima
    • G02F1/13
    • G11B7/0948G02F1/133371G02F2203/50G11B7/0956G11B7/1369G11B7/13927G11B2007/0013
    • A liquid crystal device capable of giving a phase distribution to transmitted light without the need for complicated calculations, thereby making it possible to easily perform manufacturing of liquid crystal devices and device evaluations thereof. A liquid crystal layer (120) sealed between glass substrates (100) and (110) has a given thickness distribution owing to the unevenness of a sub-substrate (111) provided inwardly of the glass substrate (110). Electrodes (130) and (140) disposed on the opposite sides of this liquid crystal layer (120) have planar shapes and are disposed in parallel. Accordingly, the distance between the two electrodes (130) and (140) is constantly uniform, and an electric field distribution applied to the liquid crystal layer (120) is uniform. Accordingly, the shape of a phase distribution to be given to the transmitted light through the liquid crystal is determined by only the thickness distribution of the liquid crystal layer, and the magnitude is determined by an applied voltage value to be applied to the electrodes. Accordingly, by making the electric field distribution applied to the liquid crystal layer uniform, it is possible to easily and accurately calculate the phase distribution of the transmitted light, by using the thickness distribution of the liquid crystal layer.
    • 一种能够对透射光进行相位分布而不需要复杂的计算的液晶装置,从而可以容易地进行液晶装置的制造及其装置评估。 密封在玻璃基板(100)和(110)之间的液晶层(120)由于设置在玻璃基板(110)内部的副基板(111)的不均匀而具有给定的厚度分布。 设置在该液晶层(120)的相对侧上的电极(130)和(140)具有平面形状并且平行设置。 因此,两个电极(130)和(140)之间的距离是恒定均匀的,施加到液晶层(120)的电场分布是均匀的。 因此,通过液晶的透射光的相位分布形状仅由液晶层的厚度分布决定,其大小由施加于电极的施加电压值决定。 因此,通过使液晶层中施加的电场分布均匀,可以通过使用液晶层的厚度分布来容易且准确地计算透射光的相位分布。