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    • 84. 发明授权
    • Methods of producing damascene main pole for perpendicular magnetic recording head
    • 生产用于垂直磁记录头的镶嵌主极的方法
    • US08262918B1
    • 2012-09-11
    • US12411270
    • 2009-03-25
    • Yun-Fei LiRonghui ZhouGuanghong LuoMing Jiang
    • Yun-Fei LiRonghui ZhouGuanghong LuoMing Jiang
    • B44C1/22
    • G11B5/1278G11B5/3116G11B5/3163
    • Methods of producing magnetic recording heads are disclosed. The methods can include providing a wafer comprising a substrate layer in which are disposed a plurality of damascene trenches. The method can further include depositing a pole material across the whole wafer, wherein the plurality of trenches are filled with the pole material. The methods can further include depositing a mask material over the pole material across the whole wafer. The methods can further include performing a first material removal process across the whole wafer to remove the mask material and a first portion of the pole material at a same material removal rate. The methods can further include performing a second material removal process to remove a second portion of the pole material above the substrate layer.
    • 公开了制造磁记录头的方法。 所述方法可以包括提供包括其中布置有多个镶嵌沟槽的基底层的晶片。 该方法还可以包括在整个晶片上沉积极材料,其中多个沟槽用极材料填充。 该方法还可以包括在整个晶片上沉积超过极材料的掩模材料。 该方法还可以包括在整个晶片上执行第一材料去除工艺,以相同的材料去除速率移除掩模材料和极材料的第一部分。 所述方法还可以包括执行第二材料去除工艺以去除衬底层上方的极材料的第二部分。
    • 85. 发明授权
    • Double rie damascene process for nose length control
    • 用于鼻长度控制的双重镶嵌工艺
    • US08257597B1
    • 2012-09-04
    • US12717090
    • 2010-03-03
    • Lijie GuanChangqing ShiMing JiangYun-Fei Li
    • Lijie GuanChangqing ShiMing JiangYun-Fei Li
    • B44C1/22
    • G11B5/3163G11B5/3116Y10T29/49021Y10T29/49048
    • Methods of forming a write pole are disclosed. A first photomask having a first opening over one of a yoke region and a pole tip region of the write pole is formed over an insulation layer having an insulator material. A first etch process is performed on the insulation layer via the first opening, the first etch process removing the insulator material from a corresponding one of the yoke region and the pole tip region. A second photomask having a second opening over the other one of the yoke region and the pole tip region is formed over the insulation layer. A second etch process is performed on the insulation layer via the second opening, the second etch process removing the insulator material from a corresponding one of the yoke region and the pole tip region.
    • 公开了形成写极的方法。 在具有绝缘体材料的绝缘层上形成第一光掩模,其具有位于写磁极的磁轭区域和极尖区域之一上的第一开口。 通过第一开口在绝缘层上执行第一蚀刻工艺,第一蚀刻工艺从磁轭区域和极尖区域中的对应的一个去除绝缘体材料。 在绝缘层上形成第二光掩模,该第二光掩模具有位于轭区域和极尖区域另一个之上的第二开口。 经由第二开口在绝缘层上执行第二蚀刻工艺,第二蚀刻工艺从磁轭区域和极尖区域中的对应的一个去除绝缘体材料。
    • 86. 发明授权
    • Perpendicular magnetic write head with a thin wrap around magnetic shield
    • 垂直磁写头与磁屏蔽薄环绕
    • US08000059B2
    • 2011-08-16
    • US11955305
    • 2007-12-12
    • Ming JiangChangqing Shi
    • Ming JiangChangqing Shi
    • G11B5/11G11B5/23
    • G11B5/3116G11B5/1278G11B5/315
    • A magnetic write head for perpendicular magnetic recording having a thin wrap-around magnetic shield. The small thickness and forming method of the thin wrap-around magnetic shield allow it to be electroplated using a thin photoresist frame mask. The thin photoresist frame mask has better critical dimension and straight wall control than a thicker mask, which allows the wrap-around magnetic shield to be constructed with much more straight and uniform back edge for shield throat height control than is possible when forming a thicker (i.e. taller) shield. The thin wrap-around magnetic shield can be stitched to a trailing return pole to avoid magnetic saturation of the wrap-around shield.
    • 用于垂直磁记录的磁写头,具有薄的环绕磁屏蔽。 薄环绕磁屏蔽的小厚度和形成方法允许其使用薄的光致抗蚀剂框架掩模进行电镀。 薄的光致抗蚀剂框架掩模具有比较厚的掩模更好的临界尺寸和直壁控制,这使得环绕的磁屏蔽件构造成具有更加直线和均匀的后边缘,用于在形成更厚的( 即更高)的盾牌。 薄环绕磁屏蔽可以缝合到尾部返回极,以避免环绕屏蔽的磁饱和。
    • 88. 发明授权
    • Perpendicular magnetic recording write head with magnetic shields separated by nonmagnetic layers
    • 垂直磁记录磁头,磁屏蔽由非磁性层分隔
    • US07920358B2
    • 2011-04-05
    • US11952019
    • 2007-12-06
    • Ming JiangChangqing Shi
    • Ming JiangChangqing Shi
    • G11B5/147
    • G11B5/1278G11B5/3116G11B5/315
    • A perpendicular magnetic recording write head that may be used in magnetic recording disk drives has a magnetic write pole (WP) with an end that is generally the same width as the width of the data tracks on the disk. A trailing shield (TS) is spaced from the WP in the along-the-track direction, a pair of side shields are located on opposite sides of the WP in the cross-track direction, and an optional leading shield (LS) is located on the opposite side of the WP from the TS in the along-the-track direction. The TS, side shields and LS are formed of magnetically permeable soft ferromagnetic material and are separated from each other by nonmagnetic separation layers. The TS, side shields and LS each has a throat height (TH) thickness in its region facing the WP. The throat heights for the shields may be different.
    • 可用于磁记录盘驱动器的垂直磁记录写头具有磁写磁极(WP),其端部的宽度通常与磁盘上数据磁道的宽度相同。 后沿屏蔽(TS)沿着沿轨道方向与WP间隔开,一对侧屏蔽沿着横向方向位于WP的相对侧上,并且可选择的前屏蔽(LS)位于 在WP的相对侧沿着TS沿着轨道方向。 TS,侧屏蔽和LS由导磁软铁磁材料形成,并通过非磁性分离层彼此分离。 TS,侧护罩和LS在其面向WP的区域中具有喉部高度(TH)厚度。 盾牌的喉咙高度可能不同。