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    • 82. 发明授权
    • Dielectric ceramic composition
    • 电介质陶瓷组合物
    • US5073523A
    • 1991-12-17
    • US578629
    • 1990-09-06
    • Masayuki YamadaHiroaki IchikawaTadashi MorimotoYasuyuki NaitoHiroshi TakagiHarufumi MandaiYukio Sakabe
    • Masayuki YamadaHiroaki IchikawaTadashi MorimotoYasuyuki NaitoHiroshi TakagiHarufumi MandaiYukio Sakabe
    • C04B35/46C04B35/47H01B3/12H01G4/12
    • H01G4/129C04B35/47H01B3/12
    • A dielectric ceramic composition consists essentially of 80 to 99.7 wt % of a main component of a system, SrTiO.sub.3 -PbTiO.sub.3 -CaTiO.sub.3 -Bi.sub.2 O.sub.3 -TiO.sub.2 -SnO.sub.2, at least one oxide of rare earth elements incorporated therein as an additive in an amount of 0.1 to 5.0 wt % in terms of Re.sub.2 O.sub.3 (where Re is at least one rare element selected from the group consisting of Nd, La, Ce, Pr and Sm), and 0.2 to 15 wt % of a vitreous component. The main component consists essentially of 20.0 to 50.0 wt % of SrTiO.sub.3, 8.0 to 37.6 wt % of PbTiO.sub.3, 3.2 to 33.9 wt % of CaTiO.sub.3, 4.4 to 35.2 wt % of Bi.sub.2 O.sub.3, 2.5 to 13.6 wt % of TiO.sub.2 and 0.2 to 12.0 wt % of SnO.sub.2. The vitreous component consists essentially of 10 to 45 mol % of Li.sub.2 O, 5 to 40 mol % of at least one oxide selected from the group consisting of BaO, MgO, CaO and SrO, 0.2 to 10 mol % of Al.sub.2 O.sub.3, 30 to 70 mol % of at least two oxide selected from the group consisting of SiO.sub.2, MnO.sub.2 and TiO.sub.2, the content of SiO.sub.2 in the vitreous component being not less than 15 mol % at least, and 1 to 35 mol % of CuO.
    • 电介质陶瓷组合物基本上由80-99.7重量%的体系主要成分SrTiO3-PbTiO3-CaTiO3-Bi2O3-TiO2-SnO2组成,至少一种掺入其中的稀土元素氧化物作为添加剂的量为0.1 以Re 2 O 3(其中,Re为选自Nd,La,Ce,Pr和Sm中的至少一种稀有元素)为5.0重量%,以及0.2〜15重量%的玻璃质成分。 主成分基本上由20.0〜50.0重量%的SrTiO 3,8.0〜37.6重量%的PbTiO 3,3.2〜33.9重量%的CaTiO 3,4.4〜35.2重量%的Bi 2 O 3,2.5〜13.6重量%的TiO 2和0.2〜12.0重量% %的SnO2。 玻璃质成分基本上由10〜45摩尔%的Li 2 O,5〜40摩尔%的选自BaO,MgO,CaO和SrO中的至少一种氧化物,0.2〜10摩尔%的Al 2 O 3,30〜70摩尔 %的至少两种选自SiO 2,MnO 2和TiO 2的氧化物,玻璃状组分中SiO 2的含量至少为15mol%以及1〜35mol%的CuO。
    • 83. 发明授权
    • Dielectric ceramic composition
    • 介电陶瓷组合物
    • US4820670A
    • 1989-04-11
    • US125483
    • 1987-11-25
    • Harunobu SanoHiroaki IchikawaGoro NishiokaYukio Sakabe
    • Harunobu SanoHiroaki IchikawaGoro NishiokaYukio Sakabe
    • C04B35/47C04B35/46
    • C04B35/47
    • A dielectric ceramic composition consists essentially of a main component of a SrTiO.sub.3 --PbTiO.sub.3 --Bi.sub.2 O.sub.3 --TiO.sub.2 --CaTiO.sub.3 system and secondary components of manganese oxides, at least one oxide of rare earth elements selected from the group consisting of Nd, La, Ce, Pr and Sm, and one of complex perovskite compounds expressed by the following general formula:A(Cu.sub.1/2 W.sub.1/2)O.sub.3(where A is at least one element selected from the group consisting of Pb, Sr and Ca),A(Cu.sub.1/3 Ta.sub.2/3)O.sub.3wherein A is at least one element selected from the group consisting of Pb, Sr and Ca), andA(Cu.sub.1/3 Nb.sub.2/3)O.sub.3(where A is at least one element selected from the group consisting of Pb, Sr and Ca). The main component consists essentially, by weight, of 19.5 to 42.8% of SrTiO.sub.3, 8.0 to 37.6% of PbTiO.sub.3, 4.2 to 33.9% of CaTiO.sub.3, 4.4 to 26.9% of Bi.sub.2 O.sub.3, 4.2 to 13.6% of TiO.sub.2 and 0.5 to 12% of SnO.sub.2. The contents of the secondary components per 100 parts by weight of the main component are 0.02 to 0.50 parts by weight for manganese oxide in terms of MnO.sub.2, 0.1 to 5.0 parts by weight for oxides of rare earth elements in terms of Re.sub.2 O.sub.3, and 0.1 to 5.0 parts by weight for the complex perovskite compound.
    • 电介质陶瓷组合物主要由SrTiO3-PbTiO3-Bi2O3-TiO2-CaTiO3体系的主要成分和锰氧化物的次要组分组成,至少一种稀土元素氧化物选自Nd,La,Ce,Pr 和Sm,以及由以下通式表示的复合钙钛矿化合物之一:(Cu1 / 2W1 / 2)O3(其中A为选自Pb,Sr和Ca中的至少一种元素),A(Cu1 / 3Ta2 / 3)O3,其中A是选自Pb,Sr和Ca中的至少一种元素)和A(Cu1 / 3Nb2 / 3)O3(其中A是选自Pb ,Sr和Ca)。 主要成分基本上由重量百分比计为19.5〜42.8%的SrTiO3,8.0〜37.6%的PbTiO3,4.2〜33.9%的CaTiO3,4.4〜26.9%的Bi2O3,4.2〜13.6%的TiO2和0.5〜12%的 SnO2。 相对于100重量份的主要成分,二次成分的含量相对于氧化锰为0.02〜0.50重量份,以MnO 2计,稀土类氧化物为Re 2 O 3为0.1〜5.0重量份, 对于复合钙钛矿化合物为5.0重量份。
    • 84. 发明授权
    • Semiconductor device
    • 半导体器件
    • US4412237A
    • 1983-10-25
    • US143472
    • 1980-08-29
    • Nobutake MatsumuraRyusuke HoshikawaYoshihide SugiuraHiroaki IchikawaSyoji Sato
    • Nobutake MatsumuraRyusuke HoshikawaYoshihide SugiuraHiroaki IchikawaSyoji Sato
    • H01L21/822G11C5/06G11C11/412G11C11/417G11C11/418H01L21/82H01L27/04H01L27/118H01L29/78H03K3/356H01L27/02
    • H01L27/11807G11C11/412G11C11/417G11C11/418G11C5/063H03K3/356104Y10S257/923
    • Disclosed is a semiconductor device having a large number of basic cells, wherein a plurality of basic cells arranged along rows of a semiconductor substrate form a basic cell array and a plurality of the basic cell arrays are arranged along columns of the substrate, and further including spaces formed between each adjoining column. Each basic cell is comprised of first and second P-channel MIS transistors and first and second N-channel MIS transistors. The gates of both the first P-channel and the first N-channel MIS transistors form a first single common gate, and the gates of both the second P-channel and the second N-channel MIS transistors form a second single common gate. The sources or the drains of both the first P-channel and the second P-channel MIS transistors form a first single common source or drain, and the sources or the drains of both the first N-channel and the second N-channel MIS transistors form a second single common source or drain. Each of the first and second single common gates has two terminal electrodes at both sides of respective basic cell array and a central terminal electrode at the center of the respective basic cell array. Further, each of the basic cells includes a small space extending between both sides of the basic cell array, which space can be utilized as a field for distributing, along a row, interconnecting lines.
    • PCT No.PCT / JP78 / 00048 Sec。 371日期1979年8月29日第 102(e)日期1979年8月29日PCT提交1978年12月11日PCT公布。 出版物WO79 / 00461 日期:1979年7月26日。公开是具有大量基本单元的半导体器件,其中沿着半导体衬底的行排列的多个基本单元形成基本单元阵列,并且多个基本单元阵列沿着列 并且还包括在每个相邻的柱之间形成的空间。 每个基本单元包括第一和第二P沟道MIS晶体管以及第一和第二N沟道MIS晶体管。 第一P沟道和第一N沟道MIS晶体管的栅极形成第一单个公共栅极,并且第二P沟道和第二N沟道MIS晶体管的栅极形成第二单个公共栅极。 第一P沟道和第二P沟道MIS晶体管的源极或漏极形成第一单个公共源极或漏极,并且第一N沟道和第二N沟道MIS晶体管的源极或漏极 形成第二个单一的共同来源或渠道。 第一和第二单个公共门中的每一个在各个基本单元阵列的两侧具有两个端子电极和位于各个基本单元阵列的中心的中心端子电极。 此外,每个基本单元包括在基本单元阵列的两侧之间延伸的小空间,该空间可以用作沿着一行互连线分布的场。