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    • 82. 发明授权
    • Perpendicular pole having and adjacent non-magnetic CMP resistant structure
    • 垂直极具有和相邻的非磁性CMP抗磨结构
    • US07251103B2
    • 2007-07-31
    • US10882507
    • 2004-06-30
    • Richard HsiaoWipul Pemsiri JayasekaraJeffrey S. Lille
    • Richard HsiaoWipul Pemsiri JayasekaraJeffrey S. Lille
    • G11B5/147
    • G11B5/1278
    • A magnetic structure, such as a pole tip, and method for forming the same includes forming a pole tip layer of magnetic material. A layer of polyimide precursor material is added above the pole tip layer and cured. A silicon-containing resist layer is added above the layer of polyimide precursor material and patterned. The resist layer is exposed to oxygen plasma for converting the resist into a glass-like material. Exposed portions of the cured polyimide precursor material are removed for exposing portions of the pole tip layer. The exposed portions of the pole tip layer are removed for forming a pole tip. Chemical mechanical polishing (CMP) can then be performed to remove any unwanted material remaining above the pole tip.
    • 诸如极尖的磁性结构及其形成方法包括形成磁性材料的磁极末端层。 将一层聚酰亚胺前体材料添加到极尖层上方并固化。 将含硅抗蚀剂层添加到聚酰亚胺前体材料层上方并图案化。 将抗蚀剂层暴露于氧等离子体以将抗蚀剂转化为玻璃状材料。 去除固化的聚酰亚胺前体材料的暴露部分以暴露极尖层的部分。 去除极尖端部的暴露部分以形成极尖。 然后可以进行化学机械抛光(CMP)以除去残留在极尖顶部的任何不需要的材料。