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81. 发明授权

US07917862B2 System and method for improving the performance of a plurality of peripheral devices 有权
标题翻译：用于提高多个外围设备的性能的系统和方法
公开(公告)号：US07917862B2
公开(公告)日：2011-03-29
申请号：US10046347
申请日：2001-10-26
申请人： Steven T. Breidenbach , Michael L Rudd , Michelle R. Lehmeier , Thomas R Mitchell , K Douglas Gennetten , Brian J. Brown , Jerlyn R Culp
发明人： Steven T. Breidenbach , Michael L Rudd , Michelle R. Lehmeier , Thomas R Mitchell , K Douglas Gennetten , Brian J. Brown , Jerlyn R Culp
IPC分类号： G06F3/048
CPC分类号： H04N1/32523 , G06F9/4411 , H04N1/00278 , H04N2201/0027 , H04N2201/0065 , Y10S715/97
摘要： A system for improving the performance of a plurality of peripheral devices is disclosed. In one embodiment, the invention comprises a first peripheral device associated with a first software component and having a first functionality, and a second peripheral device associated with a second software component and having a second functionality, the second peripheral device being coupled to the first peripheral device, the first and second peripheral devices together performing functionality in addition to the first and second functionalities and having a common user interface.
摘要翻译：公开了一种用于提高多个外围设备的性能的系统。在一个实施例中，本发明包括与第一软件组件相关联并且具有第一功能的第一外围设备和与第二软件组件相关联并具有第二功能的第二外围设备，所述第二外围设备耦合到所述第一外围设备设备，第一和第二外围设备一起除了第一和第二功能之外一起执行功能并且具有公共的用户界面。

82. 发明授权

US07914623B2 Post-ion implant cleaning for silicon on insulator substrate preparation 失效
标题翻译：用于硅绝缘体衬底制备的离子后植入物清洁
公开(公告)号：US07914623B2
公开(公告)日：2011-03-29
申请号：US11977701
申请日：2007-10-24
申请人： James S. Papanu , Han-Wen Chen , Brian J. Brown , Steven Verhaverbeke
发明人： James S. Papanu , Han-Wen Chen , Brian J. Brown , Steven Verhaverbeke
IPC分类号： H01L21/461
CPC分类号： H01L21/02057 , Y10S438/906 , Y10S438/907 , Y10S438/908 , Y10S438/928
摘要： A combination of a dry oxidizing, wet etching, and wet cleaning processes are used to remove particle defects from a wafer after ion implantation, as part of a wafer bonding process to fabricate a SOI wafer. The particle defects on the topside and the backside of the wafer are oxidized, in a dry strip chamber, with an energized gas. In a wet clean chamber, the backside of the wafer is treated with an etchant solution to remove completely or partially a thermal silicon oxide layer, followed by exposure of the topside and the backside to a cleaning solution. The cleaning solution contains ammonium hydroxide, hydrogen peroxide, DI water, and optionally a chelating agent, and a surfactant. The wet clean chamber is integrated with the dry strip chamber and contained in a single wafer processing system.
摘要翻译：干法氧化，湿蚀刻和湿法清洗工艺的组合被用于在离子注入之后从晶片去除颗粒缺陷，作为制造SOI晶片的晶片接合工艺的一部分。晶片顶面和背面的颗粒缺陷在干燥条带室中被激发的气体氧化。在湿式清洁室中，用蚀刻剂溶液处理晶片的背面以完全或部分地去除热氧化硅层，随后将顶侧和背面暴露于清洁溶液中。清洗液含有氢氧化铵，过氧化氢，去离子水，任选的螯合剂和表面活性剂。湿式清洁室与干燥条带室一体化，并包含在单个晶片处理系统中。

83. 发明授权

US07914570B2 Non-shortening helical stent 有权
标题翻译：不缩短螺旋支架
公开(公告)号：US07914570B2
公开(公告)日：2011-03-29
申请号：US10960265
申请日：2004-10-07
申请人： Brian J. Brown
发明人： Brian J. Brown
IPC分类号： A61F2/06
CPC分类号： A61F2/88 , A61F2/885 , A61F2/91 , A61F2220/0058
摘要： A stent may comprise a helically wound ribbon of material. The stent may comprise a plurality of ribbon turns about a longitudinal axis of the stent. Upon expansion of the stent, the diameter of the stent may increase and the number of ribbon turns may decrease. Upon expansion of the stent, the width of the ribbon may increase. The length of the stent may be the same in unexpanded and expanded states.
摘要翻译：支架可以包括螺旋缠绕的材料带。支架可以包括围绕支架的纵向轴线的多个带状匝。在支架膨胀时，支架的直径可能增加，带状匝数可能减少。在支架膨胀时，带的宽度可能增加。支架的长度可以在未膨胀和膨胀状态下相同。

84. 发明申请

US20100241217A1 Stent 有权
标题翻译：支架
公开(公告)号：US20100241217A1
公开(公告)日：2010-09-23
申请号：US12795443
申请日：2010-06-07
申请人： Graig L. Kveen , Timothy G.J. Ehr , Brian J. Brown
发明人： Graig L. Kveen , Timothy G.J. Ehr , Brian J. Brown
IPC分类号： A61F2/82
CPC分类号： A61F2/915 , A61F2/91 , A61F2002/91533 , A61F2002/91541 , A61F2002/91583
摘要： A radially expandable stent comprising a plurality of spaced band-like elements and intersecting links is disclosed. The band-like elements have a generally serpentine configuration to provide continuous waves of generally sinusoidal character to each band-like element. The waves are characterized by a plurality of peaks and troughs taking a generally longitudinal direction along the cylinder such that the waves in the band-like elements open as the stent is expanded from a first diameter to a second diameter. The intersecting links are substantially U-shaped and terminate in first and second shanks. The first shank of a link emanates from a region between a peak and trough on a band-like element and the second shank of the link emanates from a region between a peak and trough on an adjacent band-like element.
摘要翻译：公开了一种包括多个间隔开的带状元件和相交连接件的可径向扩张的支架。带状元件具有大致蛇形结构，以向每个带状元件提供大致正弦曲线的连续波。波的特征在于沿着圆柱体大致纵向方向的多个峰和谷，使得当支架从第一直径扩展到第二直径时，带状元件中的波浪打开。交叉连接件基本上为U形并终止在第一和第二柄部中。链节的第一柄从带状元件上的峰和谷之间的区域发出，并且链节的第二柄从相邻带状元件上的峰和谷之间的区域发出。

85. 发明申请

US20100120335A1 Partial Contact Wafer Retaining Ring Apparatus 审中-公开
标题翻译：局部接触片保持环设备
公开(公告)号：US20100120335A1
公开(公告)日：2010-05-13
申请号：US12267389
申请日：2008-11-07
申请人： Haoquan Fang , Ivelin Angelov , Brian Severson , Benjamin A. Bonner , Serge Kosche , Patrick J. Lord , Brian J. Brown
发明人： Haoquan Fang , Ivelin Angelov , Brian Severson , Benjamin A. Bonner , Serge Kosche , Patrick J. Lord , Brian J. Brown
IPC分类号： B24B41/06 , B24B1/00 , B24B7/04
CPC分类号： B24B37/32
摘要： The partial contact wafer retaining ring apparatus is disclosed. For example, one disclosed embodiment provides a wafer retaining ring comprising a ring for retaining the wafer, the ring having an inner diameter surface configured to restrict lateral wafer motion, and at least one interface surface configured to interface with a polishing surface. The interface surface comprises a recessed section adjacent to the ring inner diameter, configured to preclude contact between the recessed section and the polishing surface.
摘要翻译：公开了部分接触晶片保持环装置。例如，一个公开的实施例提供了一种晶片保持环，其包括用于保持晶片的环，该环具有被配置为限制横向晶片运动的内径表面以及被配置为与抛光表面相接合的至少一个界面。界面表面包括与环内径相邻的凹陷部分，其构造成防止凹部与抛光表面之间的接触。

86. 发明申请

US20080065196A1 Intra-Columnar Cell Features to Improve Drug Distribution and Scaffolding of a Stent 审中-公开
标题翻译：柱内细胞特征改善支架的药物分布和脚手架
公开(公告)号：US20080065196A1
公开(公告)日：2008-03-13
申请号：US11844583
申请日：2007-08-24
申请人： Michael Wayne Davis , Brian J. Brown
发明人： Michael Wayne Davis , Brian J. Brown
IPC分类号： A61F2/82
CPC分类号： A61F2/91 , A61F2/915 , A61F2002/91558 , A61F2002/91575 , A61F2220/005 , A61F2220/0058 , A61F2230/0054 , A61F2250/0068
摘要： The present invention is directed toward a stent having a plurality of axially spaced serpentine bands, each serpentine band having an axis circumferentially oriented around the longitudinal axis of the stent. The serpentine bands have a plurality of struts spaced along the axis of the serpentine band forming alternating peaks and troughs. The serpentine bands are interconnected via a plurality of interconnecting struts to form a plurality of cells defined by axially adjacent serpentine bands and circumferentially adjacent interconnecting struts. When the stent is in its unexpanded state, each serpentine comprises a plurality of slits, each slit being non-linear and continuous from a first end to a second end and being formed in at least a portion of each of three consecutively connected struts. Upon expansion of the stent to its expanded state, each of the slits expands in size to form an intra-columnar cell (ICC).
摘要翻译：本发明涉及具有多个轴向间隔的蛇形带的支架，每个蛇形带具有围绕支架的纵向轴线周向取向的轴线。蛇形带具有沿着蛇形带的轴线间隔开的多个支柱，形成交替的峰谷。蛇形带通过多个相互连接的支柱互连，以形成由轴向相邻的蛇形带和周向相邻的互连支柱限定的多个电池。当支架处于其未膨胀状态时，每个蛇形管包括多个狭缝，每个狭缝从第一端到第二端是非线性的并且连续的，并且形成在三个连续连接的支柱中的每一个的至少一部分中。在将支架膨胀到其膨胀状态时，每个狭缝的尺寸都扩大以形成柱内电池（ICC）。

87. 发明授权

US07035913B2 System for collection and distribution of calendar information 失效
标题翻译：用于收集和分发日历信息的系统
公开(公告)号：US07035913B2
公开(公告)日：2006-04-25
申请号：US09966281
申请日：2001-09-28
申请人： Jerlyn R Culp , K Douglas Gennetten , Michelle R. Lehmeier , Michael L Rudd , Steven L Webb , Brian J. Brown , Steven T. Breidenbach , James C Albritton-McDonald
发明人： Jerlyn R Culp , K Douglas Gennetten , Michelle R. Lehmeier , Michael L Rudd , Steven L Webb , Brian J. Brown , Steven T. Breidenbach , James C Albritton-McDonald
IPC分类号： G06F15/16 , G06F17/60
CPC分类号： G06Q10/109
摘要： The present invention provides a system for obtaining and distributing calendar information from one or more calendar sources, as may be defined by a user, in a manner that allows for easy incorporation of the obtained calendar information into a personal or group calendar database. A collection and distribution unit is provided for obtaining calendar information from a predetermined calendar source. If necessary, the collection and distribution unit may convert the obtained calendar information into a predetermined format. Calendar data is distributed by the collection and distribution unit in accordance with preferences specified by a subscriber record.
摘要翻译：本发明提供了一种用于从一个或多个日历源获得和分发日历信息的系统，其可以由用户定义，以允许将获得的日历信息容易地并入到个人或组日历数据库中的方式。提供收集和分配单元用于从预定日历源获取日历信息。如果需要，收集和分发单元可以将获得的日历信息转换成预定格式。日历数据由收集和分配单元根据用户记录指定的偏好来分发。

88. 发明授权

US06970734B2 Flexible marker bands 失效
标题翻译：灵活的标记带
公开(公告)号：US06970734B2
公开(公告)日：2005-11-29
申请号：US10308251
申请日：2002-12-02
申请人： Tracee E. J. Eidenschink , Scott E. Arndt , Brian J. Brown , Melissa Ann Frenkel
发明人： Tracee E. J. Eidenschink , Scott E. Arndt , Brian J. Brown , Melissa Ann Frenkel
IPC分类号： A61F2/00 , A61F2/06 , A61F2/84 , A61M25/01 , A61M25/088 , A61B5/05
CPC分类号： A61M25/0108 , A61F2/958 , A61F2250/0098
摘要： A catheter assembly comprises a catheter shaft having a first region and a second region. The first region is less radiopaque than the second region. The first region is constructed of a shaft material and the second region is constructed from the shaft material in combination with at least one radiopaque material. At least a portion of the shaft material of the second region defines at least one grooved region. The at least one radiopaque material is positioned at least partially within the at least one grooved region.
摘要翻译：导管组件包括具有第一区域和第二区域的导管轴。第一个区域比第二个区域的射线不透明。第一区域由轴材料构成，第二区域由至少一个不透射线材料的轴材料构成。第二区域的轴材料的至少一部分限定至少一个开槽区域。所述至少一个不透射线材料至少部分地定位在所述至少一个开槽区域内。

89. 发明授权

US06939119B2 Method of reducing the wall thickness of a PTFE tube and product formed thereby 失效
标题翻译：减少由其形成的PTFE管和产品的壁厚的方法
公开(公告)号：US06939119B2
公开(公告)日：2005-09-06
申请号：US10668517
申请日：2003-09-23
申请人： Jason P. Hill , James R. Lininger , Brian J. Brown
发明人： Jason P. Hill , James R. Lininger , Brian J. Brown
IPC分类号： A61M25/00 , B29C43/22 , B29C47/20 , B29C55/18 , B29C55/24 , B29C67/00 , B29D23/00 , B29K27/18 , B29L23/00 , B29C55/22
CPC分类号： B29C67/0014 , B29C55/24
摘要： A thin wall PTFE tube is formed from an extruded green tube. The PTFE tube includes an inner tubular surface and an opposed outer tubular surface defining a tubular wall of a first thickness. The tubular wall is compressed to uniformly reduce the wall-thickness and circumferentially orient the tube. The PTFE tube is positioned over a first elongate roller with the inner tubular surface being in contact therewith. A second roller is positioned against the outer tubular surface of the PTFE tube. The pair of rollers are counter rotated so as to circumferentially compress the tubular wall between the rollers. This results in the uniform reduction in the tubular wall from the first thickness to a lesser second thickness and a circumferential orientation otherwise not occurring in an extruded PTFE paste extrusion.
摘要翻译：由挤出的绿色管形成薄壁PTFE管。 PTFE管包括内部管状表面和限定具有第一厚度的管状壁的相对的外部管状表面。管状壁被压缩以均匀地减小壁厚并且周向地定向管。 PTFE管定位在第一细长辊上，内管表面与其接触。第二辊定位在PTFE管的外管表面上。一对辊被反向旋转，以便周向地压缩辊之间的管状壁。这导致管状壁从第一厚度均匀地减小到较小的第二厚度，并且在挤出的PTFE浆料挤出中不发生圆周取向。

90. 发明授权

US06921494B2 Backside etching in a scrubber 失效
标题翻译：洗涤器中的背面蚀刻
公开(公告)号：US06921494B2
公开(公告)日：2005-07-26
申请号：US10456723
申请日：2003-06-06
申请人： Brian J. Brown , Madhavi Chandrachood , Radha Nayak , Fred C. Redeker , Michael Sugarman , John M. White
发明人： Brian J. Brown , Madhavi Chandrachood , Radha Nayak , Fred C. Redeker , Michael Sugarman , John M. White
IPC分类号： B08B1/04 , B08B3/02 , B08B3/08 , B08B7/04 , H01L21/00 , H01L21/304 , H01L21/306 , B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： H01L21/6708 , H01L21/67075 , Y10S134/902
摘要： A scrubber device is provided. The scrubber device may etch a backside of a wafer and may clean a frontside of the wafer simultaneously. The scrubber device may comprise a programmed controller adapted to supply a non-etching fluid to a frontside of the wafer whenever an etching fluid is supplied to the backside of the wafer.
摘要翻译：提供洗涤器装置。洗涤器装置可以蚀刻晶片的背面并且可以同时清洁晶片的前侧。洗涤器装置可以包括编程控制器，其适用于每当将蚀刻流体供应到晶片的背面时，将非蚀刻流体提供给晶片的前侧。

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