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81. 发明申请

US20120274919A1 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：US20120274919A1
公开(公告)日：2012-11-01
申请号：US13532282
申请日：2012-06-25
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/08 , G03B27/70 , G03F7/20 , G02B17/06
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A reflection mirror assembly for use in a catadioptric imaging optical system includes two curved reflection mirrors, each including a reflection surface expressed by equation (a), where y represents height in a direction perpendicular to the optical axis, z represents distance (sag amount) along the optical axis from a tangent plane at a vertex of the reflection surface to a position on the reflection surface at height y, r represents a vertex curvature radius, and R represents a conical coefficient; z=(y2/r)/[1+{1−(1+κ)·y2/r2}1/2] (a), wherein −1
摘要翻译：用于反折射成像光学系统的反射镜组件包括两个弯曲反射镜，每个反射镜包括由等式（a）表示的反射表面，其中y表示垂直于光轴的方向的高度，z表示距离（下垂量）沿着光轴从反射面的顶点处的切线平面到高度y处的反射面上的位置，r表示顶点曲率半径，R表示圆锥系数; z =（y2 / r）/ [1+ {1-（1 +＆kgr;）·y2 / r2} 1/2]（a），其中-1

82. 发明申请

US20120274918A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20120274918A1
公开(公告)日：2012-11-01
申请号：US13495763
申请日：2012-06-13
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/08 , G03F7/20 , G03B27/70
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern onto an image plane includes: a first objective part for imaging the pattern into a first intermediate image; a second objective part for imaging the first intermediate image into a second intermediate image; and a third objective part for imaging the second intermediate image onto the image plane. A first concave mirror having a continuous mirror surface and a second concave mirror having a continuous mirror surface are upstream of the second intermediate image. A pupil surface is formed between the object plane and the first intermediate image, between the first and the second intermediate image, and between the second intermediate image and the image plane. A plate having essentially parallel plate surfaces is positioned in the first objective part near the pupil surface. At least one plate surface is aspherized to correct for aberrations.
摘要翻译：用于将图案成像到图像平面上的反射折射投射物镜包括：用于将图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间图像成像为第二中间图像; 以及用于将第二中间图像成像到图像平面上的第三目标部分。具有连续镜面的第一凹面镜和具有连续镜面的第二凹面镜位于第二中间图像的上游。在物平面和第一中间图像之间，在第一和第二中间图像之间以及在第二中间图像和图像平面之间形成瞳孔表面。具有基本上平行的板表面的板被定位在瞳孔表面附近的第一物镜部分中。至少一个板表面被挤压以校正像差。

83. 发明申请

US20120069314A1 IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS OF THIS TYPE 审中-公开
标题翻译：使用这种类型的成像光学的成像光学和投影曝光安装
公开(公告)号：US20120069314A1
公开(公告)日：2012-03-22
申请号：US13235866
申请日：2011-09-19
申请人： Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Hans-Juergen Mann
发明人： Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Hans-Juergen Mann
IPC分类号： G03F7/20 , G03B27/70 , G02B17/06
CPC分类号： G02B17/0657 , G03F7/70233
摘要： An imaging optics has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. A pupil plane is arranged in the imaging beam path between the object field and the image field. A stop is arranged in the pupil plane. The pupil plane is tilted at an angle (α) with respect to the object plane, where α is greater than 0.1°. The imaging optics results allows for a manageable combination of small imaging errors, manageable production and good throughput.
摘要翻译：成像光学器件具有多个反射镜，其对图像平面中的图像场中的物体平面中的物体场进行成像。在对象场和图像场之间的成像光束路径中布置瞳面。在瞳孔平面上设置一个停止点。瞳平面相对于物平面角度（α）倾斜，其中α大于0.1°。成像光学结果允许小的成像错误，可管理的生产和良好的吞吐量的可管理的组合。

84. 发明授权

US08107162B2 Catadioptric projection objective with intermediate images 有权
标题翻译：反射折射投影物镜与中间图像
公开(公告)号：US08107162B2
公开(公告)日：2012-01-31
申请号：US11596868
申请日：2005-05-13
申请人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror. A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided. A field lens with a positive refractive power is arranged between the first intermediate image and/or the first folding mirror and the concave mirror, in an area close to the field of the first intermediate image.
摘要翻译：用于对投影物镜的物平面上配置的图案进行成像的反射折射投射物镜具有用于对物场进行成像以形成第一实际中间像的第一物镜部分，使用来自第一目标部分的辐射来生成第二实际中间图像的第二目标部分; 以及用于在图像平面上成像第二实际中间图像的第三目标部分。第二个目标部分是具有凹面镜的反射折射物镜部分。提供了用于使来自物平面的辐射在凹面镜的方向上偏转的第一折叠镜和用于在像面方向上偏转来自凹面镜的辐射的第二折叠镜。在第一中间图像和/或第一折叠镜和凹面镜之间，在靠近第一中间图像的场的区域内布置具有正屈光力的场透镜。

85. 发明授权

US08064040B2 Projection objective, projection exposure apparatus and reflective reticle for microlithography 有权
标题翻译：投影目标，投影曝光装置和微光刻反射掩模版
公开(公告)号：US08064040B2
公开(公告)日：2011-11-22
申请号：US11547085
申请日：2005-03-18
申请人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70291 , G03F7/70225 , G03F7/70283
摘要： A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|
摘要翻译：用于微光刻的投影物镜用于将布置在其物体表面中的掩模的图案成像成具有缩小成像刻度的布置在其图像表面中的图像场。它具有沿着投影物镜的光轴布置的多个光学元件，光学元件被设计和布置成使得投影物镜具有图像数值孔径NA> 0.85和缩小成像刻度，其中| b | 0.05，并且具有适合于大于1mm的微光刻的最小像场直径的平面图像场。

86. 发明申请

US20110261444A1 Catadioptric Projection Objective With Mirror Group 有权
标题翻译：反射折射投影目标与镜组
公开(公告)号：US20110261444A1
公开(公告)日：2011-10-27
申请号：US11578101
申请日：2005-04-07
申请人： Alexander Epple , Wilhelm Ulrich , Aurelian Dodoc , Hans-Juergen Mann , David Shafer
发明人： Alexander Epple , Wilhelm Ulrich , Aurelian Dodoc , Hans-Juergen Mann , David Shafer
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/0808 , G02B17/0812 , G02B17/0816 , G02B17/0836 , G02B17/0844 , G02B17/0848 , G02B17/086 , G02B17/0892 , G03F7/70058 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective for imaging an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the projection objective has a front lens group, a mirror group comprising four mirrors and having an object side mirror group entry, an image side mirror group exit, and a mirror group plane aligned transversly to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit; and a rear lens group. The mirrors of the mirror group are arranged such that at least one intermediate image is positioned inside the mirror group between mirror group entry and mirror group exit, and that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. The mirror group entry is positioned in a region where radiation exiting the front lens group has an entry chief ray height. A second reflecting area is positioned in a region where radiation impinging on the second mirror has a second chief ray height deviating from the entry chief ray height in a first direction; and a fourth reflecting area is positioned in a region where radiation impinging on the fourth mirror has a fourth chief ray height deviating from the entry chief ray height in a second direction opposite to the first direction.
摘要翻译：用于将布置在投影物镜的物体表面中的离轴物体场成像到布置在投影物镜的图像表面中的离轴图像场的反射折射投射物镜具有前透镜组，包括四个反射镜的镜组和具有物体侧反射镜组入口，图像侧反射镜组出口和反射镜组平面，其横向对准光轴并几何地布置在反射镜组入口和反射镜组出口之间; 和后透镜组。反射镜组的镜子被布置成使得至少一个中间图像位于反射镜组入口和反射镜组出口之间的反射镜组内，并且来自镜组入口的辐射至少穿过镜组平面四次，在镜组出口处离开镜组之前，在镜组的凹面镜面上反射至少两次。反射镜组入口位于离开前透镜组的辐射具有入射主光线高度的区域中。第二反射区域位于辐射入射在第二反射镜上的第一主光线高度偏离第一方向上的入射光线高度的区域中; 并且第四反射区域位于与第一反射镜相反的第二方向上具有偏离入射光线高度的第四主光线高度的入射在第四反射镜上的辐射区域。

87. 发明授权

US07920338B2 Reduction projection objective and projection exposure apparatus including the same 有权
标题翻译：还原投影物镜和包括其的投影曝光设备
公开(公告)号：US07920338B2
公开(公告)日：2011-04-05
申请号：US11723854
申请日：2007-03-22
申请人： Wilhelm Ulrich , Aurelian Dodoc
发明人： Wilhelm Ulrich , Aurelian Dodoc
IPC分类号： G02B17/08
CPC分类号： G02B17/0812 , G03F7/70225 , G03F7/70275
摘要： A reduction projection objective for projection lithography has a plurality of optical elements arranged along an optical axis and designed for imaging an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio. The optical elements include at least one concave mirror. The optical elements are designed to provide an image-side numerical aperture NA>0.6 in a large effective image field having a maximum image field height Y′>25 mm. A compact, low mass projection objective enabling high throughput of exposed substrates is thereby obtained.
摘要翻译：用于投影光刻的缩小投影物镜具有沿着光轴布置的多个光学元件，其被设计用于将布置在投影物镜的物体表面中的有效物场成像为布置在投影物镜的图像表面中的有效图像场降低放大率。光学元件包括至少一个凹面镜。光学元件被设计成在具有最大图像场高度Y'> 25mm的大的有效图像场中提供图像侧数值孔径NA> 0.6。从而获得了能够实现暴露的基板的高通过量的紧凑的低质量投影物镜。

88. 发明授权

US07679821B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US07679821B2
公开(公告)日：2010-03-16
申请号：US12184818
申请日：2008-08-01
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/00 , G02B21/00
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

89. 发明申请

US20090034061A1 Catadioptric projection objective with intermediate images 有权
标题翻译：反射折射投影物镜与中间图像
公开(公告)号：US20090034061A1
公开(公告)日：2009-02-05
申请号：US11596868
申请日：2005-05-13
申请人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided. A field lens with a positive refractive power is arranged between the first intermediate image and/or the first folding mirror and the concave mirror, in an area close to the field of the first intermediate image.
摘要翻译：用于对投影物镜的物平面上配置的图案进行成像的反射折射投射物镜具有用于对物场进行成像以形成第一实际中间像的第一物镜部分，使用来自第一目标部分的辐射来生成第二实际中间图像的第二目标部分; 以及用于在图像平面上成像第二实际中间图像的第三目标部分。第二目标部分是具有凹面镜的反射折射物镜部分。第一折叠镜，用于在凹面镜的方向上偏转来自物体平面的辐射;以及第二折叠镜，用于偏转来自凹面镜的辐射提供图像平面的方向。在第一中间图像和/或第一折叠镜和凹面镜之间，在靠近第一中间图像的场的区域内布置具有正屈光力的场透镜。

90. 发明申请

US20080198353A1 Projection Objective, Projection Exposure Apparatus and Reflective Reticle For Microlithography 有权
标题翻译：投影目标，投影曝光装置和微光刻反射光罩
公开(公告)号：US20080198353A1
公开(公告)日：2008-08-21
申请号：US11547085
申请日：2005-03-18
申请人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
IPC分类号： G03B27/54 , G02B9/34
CPC分类号： G03F7/70291 , G03F7/70225 , G03F7/70283
摘要： A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|
摘要翻译：用于微光刻的投影物镜用于将布置在其物体表面中的掩模的图案成像成具有缩小成像刻度的布置在其图像表面中的图像场。它具有沿着投影物镜的光轴布置的多个光学元件，光学元件被设计和布置成使得投影物镜具有图像数值孔径NA> 0.85和缩小成像刻度，其中| b | 0.05，并且具有适合于大于1mm的微光刻的最小像场直径的平面图像场。

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