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71. 发明授权

US4661435A Photosensitive polyamic acid derivative, compounds used in the manufacture of the derivative, method of manufacturing polyimide pattern on a substrate, and semiconductor device comprising a polyimide pattern obtained by using the said method 失效
标题翻译：感光聚酰胺酸衍生物，用于制造衍生物的化合物，在基材上制造聚酰亚胺图案的方法，以及包含通过使用所述方法获得的聚酰亚胺图案的半导体器件
公开(公告)号：US4661435A
公开(公告)日：1987-04-28
申请号：US828093
申请日：1986-02-10
申请人： Lourens Minnema , Johan M. van der Zande
发明人： Lourens Minnema , Johan M. van der Zande
IPC分类号： G03F7/26 , C08F290/00 , C08F299/00 , C08F299/02 , C08G73/00 , C08G73/10 , G03C5/00 , G03F7/037 , G03F7/038 , G03F7/40 , G03C5/16
CPC分类号： G03F7/0387 , G03F7/037
摘要： A photosensitive polyamic acid derivative, compounds used in the manufacture of the derivative, method of manufacturing a polyimide pattern on a substrate, and semiconductor device comprising a polyimide pattern obtained by using the said method.
摘要翻译：感光性聚酰胺酸衍生物，用于制造衍生物的化合物，在基材上制造聚酰亚胺图案的方法，以及包含通过使用所述方法获得的聚酰亚胺图案的半导体器件。

72. 发明授权

US4657832A Photosensitive polymers as coating materials 失效
标题翻译：光敏聚合物作为涂料
公开(公告)号：US4657832A
公开(公告)日：1987-04-14
申请号：US608754
申请日：1984-05-10
申请人： Josef Pfeifer
发明人： Josef Pfeifer
IPC分类号： C08G73/10 , C08G73/14 , C08G73/16 , G03F7/038 , G03C5/16 , G03C1/71
CPC分类号： G03F7/0387 , C08G73/1046 , C08G73/1057 , C08G73/1067 , C08G73/1082 , C08G73/1085 , C08G73/14 , C08G73/16 , Y10S522/904 , Y10S522/908
摘要： Coated material of a support, onto which is applied a radiation-sensitive coating of a homopolymer or copolymer with at least 5 mol %, based on the polymer, of structural units of the formula I ##STR1## in which R is a divalent aliphatic radical which can be interrupted by hetero-atoms or aromatic, heterocyclic or cycloaliphatic groups, a cycloaliphatic, heterocyclic or araliphatic radical, an aromatic radical in which two aryl nuclei are linked via an aliphatic group, or an aromatic radical which is substituted by at least one alkyl, cycloalkyl, alkoxy, alkoxyalkyl, alkylthio, alkylthioalkyl, hydroxyalkyl, hydroxyalkoxy, hydroxyalkylthio or aralkyl group or in which two adjacent C atoms of the aromatic radical are substituted by an alkylene group, R' independently has the same meaning as R and q is 0 or 1, and in which an aromatic radical R is not substituted by alkylene or by the abovementioned radicals if q is 0. The coating can be crosslinked directly by the effect of radiation. The material is suitable, for example, for the production of protective films and relief images.
摘要翻译：使用基于聚合物的至少5摩尔％的均聚物或共聚物的辐射敏感性涂层的支持体涂覆材料，其中R为一个或多个结构单元的结构单元可以被杂原子或芳族，杂环或脂环族基团间隔的二价脂族基团，脂环族基团，杂环基或芳脂族基团，其中两个芳基核通过脂族基团连接的芳族基团或被至少一个烷基，环烷基，烷氧基，烷氧基烷基，烷硫基，烷硫基烷基，羟烷基，羟烷氧基，羟烷基硫基或芳烷基，或其中芳族基团的两个相邻C原子被亚烷基取代，R'独立地具有与R q为0或1，如果q为0，则芳族基团R不被亚烷基或上述基团取代。涂层可以通过辐射的作用直接交联。该材料例如用于生产保护膜和浮雕图像是合适的。

73. 发明授权

US4558117A Organic solvent-soluble photosensitive polyimide resin 失效
标题翻译：有机溶剂可溶性光敏聚酰亚胺树脂
公开(公告)号：US4558117A
公开(公告)日：1985-12-10
申请号：US615309
申请日：1984-05-30
申请人： Tsunetomo Nakano , Hiroshi Yasuno , Kazuaki Nishio
发明人： Tsunetomo Nakano , Hiroshi Yasuno , Kazuaki Nishio
IPC分类号： G03F7/004 , C08G73/10 , G03C1/73 , G03F7/038 , C08G73/12
CPC分类号： C08G73/1042 , C08G73/1025 , C08G73/1071 , G03F7/0387
摘要： An organic solvent-soluble photosensitive polyimide resin having excellent heat resistance and electrical and mechanical properties, comprising a copolycondensation product of a biphenyltetracarboxylic acid component with an aromatic diamine component consisting of 40 to 90 molar % of a diamine compound of the formula (I) and 10 to 60 molar % of a diaminodiphenylether compound of the formula (II), ##STR1## wherein X=--CO--O-- or --CH.sub.2 --O--, R.sub.1 and R.sub.2 =an organic residue having an ethylenically unsaturated radical, and R.sub.3 =H or --NHCOR.sub.2.
摘要翻译：一种具有优异的耐热性和机电性能的有机溶剂可溶性光敏聚酰亚胺树脂，其包含联苯四羧酸组分与由40-90摩尔％的式（I）二胺化合物组成的芳族二胺组分的共缩聚产物和 10至60摩尔％的式（II）的二氨基二苯醚化合物，其中X = -CO-O-或-CH 2 -O-，R 1和R 2 =有机残基具有烯键式不饱和基团，且R 3 = H或-NHCOR 2。

74. 发明授权

US4520097A Negative-type resist sensitive to ionizing radiation 失效
标题翻译：对电离辐射敏感的负型抗蚀剂
公开(公告)号：US4520097A
公开(公告)日：1985-05-28
申请号：US432448
申请日：1982-10-04
申请人： Kiyoshi Oguchi
发明人： Kiyoshi Oguchi
IPC分类号： C08G69/00 , C08G69/26 , C08G73/06 , C08L77/00 , G03F7/038 , G03C1/71 , G03C1/70
CPC分类号： C08G73/06 , G03F7/0387
摘要： A polyamide polymer having recurring units represented by the formula: ##STR1## wherein R represents at least one divalent organic group, has excellent characteristics such as high sensitivity, high resolving power and excellent dry etching resistance suitable as a negative-type resist in ionizing radiation lithography.
摘要翻译：具有由下式表示的重复单元的聚酰胺聚合物：其中R表示至少一个二价有机基团，具有优异的特性，如高灵敏度，高分辨能力和优异的耐蚀刻性，适合作为电离辐射中的负型抗蚀剂平版印刷

75. 发明授权

US4451551A Radiation-sensitive poly(amic acid) polymer composition 失效
标题翻译：辐射敏感聚（酰胺酸）聚合物组合物
公开(公告)号：US4451551A
公开(公告)日：1984-05-29
申请号：US331875
申请日：1981-12-17
申请人： Fumio Kataoka , Fusaji Shoji , Isao Obara , Hitoshi Yokono , Tokio Isogai , Mitumasa Kojima
发明人： Fumio Kataoka , Fusaji Shoji , Isao Obara , Hitoshi Yokono , Tokio Isogai , Mitumasa Kojima
IPC分类号： C08K5/00 , C08L79/08 , G03F7/008 , G03F7/038 , G03C1/68
CPC分类号： G03F7/0387 , C08K5/0041 , C08L79/08 , G03F7/008 , Y10S430/12 , Y10S430/121 , Y10S522/904
摘要： A light- or radiation-sensitive polymer composition comprising (a) a poly(amic acid) having as a major component a repeating unit of the formula: ##STR1## (b) one or more light- or radiation-sensitive compounds having an amino group and an aromatic azide group or aromatic sulfonylazide group in one molecule, and if necessary (c) one or more photosensitizers and/or amine compounds having at least one unsaturated bonding, and/or (d) one or more compounds having at least two unsaturated bonding in one molecule, is highly sensitive to light and radiation and can give a precise relief pattern on a substrate. Further, a finally obtained polyimide film is excellent in heat resistance.
摘要翻译：一种光或辐射敏感性聚合物组合物，其包含（a）作为主要组分的具有下式的重复单元的聚（酰胺酸）：（b）一种或多种具有氨基的光或辐射敏感性化合物（c）一种或多种具有至少一个不饱和键的光敏剂和/或胺化合物，和/或（d）一种或多种具有至少两个不饱和键的化合物，在一个分子中的不饱和键，对光和辐射具有高度敏感性，并且可以在基底上给出精确的浮雕图案。此外，最终得到的聚酰亚胺膜的耐热性优异。

76. 发明授权

US4321319A Photosensitive compositions containing polyamides acid with photosensitive groups 失效
标题翻译：含有光敏基团的聚酰胺酸的光敏组合物
公开(公告)号：US4321319A
公开(公告)日：1982-03-23
申请号：US198952
申请日：1980-05-22
申请人： Fusaji Shoji , Issei Takemoto , Hitoshi Yokono , Tokio Isogai
发明人： Fusaji Shoji , Issei Takemoto , Hitoshi Yokono , Tokio Isogai
IPC分类号： C08G73/10 , C08G73/12 , C08G73/14 , G03F7/038 , G03C1/68
CPC分类号： C08G73/121 , C08G73/1025 , C08G73/1042 , C08G73/14 , G03F7/0387
摘要： There is described photosensitive polymer composition and a polyimide film-coated material made by applying the composition to a support, irradiating with ultraviolet and thereafter heating. The photosensitive polymer composition is prepared by adding a sensitizer to a photosensitive polyamide acid intermediate solution which is obtained by reacting in an inert solvent a first compound comprising 100 to 5% by weight of a photosensitive group-containing diamine and 0 to 95% by weight of a diamine having no photosensitive group, with a second compound comprising at least one compound selected from a tetracarboxylic acid dianhydride and a tricarboxylic acid anhydride monohalide.
摘要翻译：描述了感光聚合物组合物和通过将该组合物施加到载体上，用紫外线照射并随后加热而制成的聚酰亚胺膜涂覆材料。光敏聚合物组合物是通过将感光性聚酰胺酸中间体溶液加入到感光性聚酰胺酸中间体溶液中制备的，该溶液是通过在惰性溶剂中使包含100-5重量％含光敏基团的二胺和0至95重量％的具有无光敏基团的二胺，第二化合物包含至少一种选自四羧酸二酐和三羧酸酐一卤化物的化合物。

77. 发明授权

US4316974A Polymers for use in heat resistant photoresist composition and process for preparing the same 失效
标题翻译：用于耐热光致抗蚀剂组合物的聚合物及其制备方法
公开(公告)号：US4316974A
公开(公告)日：1982-02-23
申请号：US104050
申请日：1979-12-17
申请人： Kaoru Ohmura , Ichiro Shibasaki , Takeo Kimura
发明人： Kaoru Ohmura , Ichiro Shibasaki , Takeo Kimura
IPC分类号： C08G73/14 , G03F7/037 , G03F7/038 , C08G73/10 , C08F8/00
CPC分类号： C08G73/14 , G03F7/037 , G03F7/0387
摘要： An organic polar solvent-soluble aromatic polyamide-imide having therein aromatic nuclei linked at their respective 1 - and 3 - positions and having therein amide linkages and terminal groups unsubstituted or partially substituted with acrylate or methacrylate groups is found to impart excellent heat resistance and insulating property to a photoresist composition produced therefrom.
摘要翻译：其中具有芳香族核的有机极性溶剂可溶性芳族聚酰胺 - 酰亚胺在其相应的1和3位上连接并且具有未取代或部分被丙烯酸酯或甲基丙烯酸酯基团取代的酰胺键和端基的化合物被发现赋予优异的耐热性和绝缘性性质由其制备的光致抗蚀剂组合物。

78. 发明授权

US4242437A Photosensitized polyamic acids curable by exposure to actinic radiation 失效
标题翻译：通过暴露于光化辐射可固化的光敏聚酰胺酸
公开(公告)号：US4242437A
公开(公告)日：1980-12-30
申请号：US038061
申请日：1979-05-11
申请人： Robert R. Rohloff
发明人： Robert R. Rohloff
IPC分类号： G03F7/038 , G03C1/68
CPC分类号： G03F7/0387 , Y10S430/107
摘要： A photosensitized polyamic acid film comprising polyamic acid and a photoinitiator, which is curable to a polyimide upon exposure to actinic radiation in the absence of externally applied heat.
摘要翻译：一种光敏聚酰胺酸膜，其包含聚酰胺酸和光引发剂，其在没有外部施加的热量下暴露于光化辐射下可固化至聚酰亚胺。

79. 发明授权

US3953877A Semiconductors covered by a polymeric heat resistant relief structure 失效
标题翻译：由聚合物耐热浮雕结构覆盖的半导体
公开(公告)号：US3953877A
公开(公告)日：1976-04-27
申请号：US471952
申请日：1974-05-21
申请人： Reiner Sigusch , Dietrich Widmann
发明人： Reiner Sigusch , Dietrich Widmann
IPC分类号： H01L21/283 , G03F7/038 , H01G4/14 , H01L23/29 , H01L23/31 , H01L23/485 , H01L29/00 , H01L49/02 , H01L23/28
CPC分类号： H01L29/00 , G03F7/0387 , H01G4/145 , H01L23/293 , H01L23/3157 , H01L23/485 , H01L49/02 , H01L2224/4847 , H01L2924/0002 , H01L2924/12044 , H01L2924/19041
摘要： Described are novel semiconductor structures having a protective passivating layer made from photo- or radiation cross-linking of selected reactive sites of a soluble pre-polymer which is a poly-addition or poly-condensation product of a polyfunctional carbocyclic and/or heterocyclic compound having reactive groups for condensation or addition as well as photoreactive or radiation-reactive groups capable of further polymerization or dimerization. Selected non-cross-linked portions of the passivating layer may be removed by dissolution to form contact points for various useful semiconductor and capacitor components.
摘要翻译：描述了具有保护性钝化层的新型半导体结构，该保护性钝化层由选择的可溶性预聚物的反应性位点的光或辐射交联形成，该可溶性预聚物是多官能碳环和/或杂环化合物的多加性或多缩合产物，其具有用于缩合或加成的反应性基团以及能够进一步聚合或二聚的光反应性或辐射反应性基团。可以通过溶解来去除钝化层的选定的非交联部分，以形成各种有用的半导体和电容器组件的接触点。

80. 发明授权

US3628962A Photosensitive polyamide compositions 失效
标题翻译：感光性聚酰胺组合物
公开(公告)号：US3628962A
公开(公告)日：1971-12-21
申请号：US3628962D
申请日：1970-06-17
申请人： TIME INC
发明人： MURRAY MARGARET H , LEEKLEY ROBERT M
IPC分类号： G03F7/038 , G03C1/70
CPC分类号： G03F7/0387 , Y10S430/107 , Y10S430/124
摘要： Photosensitive compositions and printing plates formed therefrom wherein nylon is rendered photosensitive by the admixture therewith of a difunctional photoinitiator containing two nonadjacent or nonvicinal keto groups.

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