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    • 76. 发明授权
    • Diaphragm valve for the vacuum exhaustion system
    • 用于真空排气系统的隔膜阀
    • US07416165B2
    • 2008-08-26
    • US10546032
    • 2004-02-09
    • Tadahiro OhmiNobukazu IkedaMichio YamajiMasafumi KitanoAkihiro Morimoto
    • Tadahiro OhmiNobukazu IkedaMichio YamajiMasafumi KitanoAkihiro Morimoto
    • F16K31/122F16K7/17
    • F16K7/16F16K51/02
    • A diaphragm valve 1 is provided with a body 2 having a flow-in passage 6, a flow-out passage 7, and a valve seat 8 formed between the passages; a diaphragm 3 installed in the body 2 and permitted to rest on and move away from the valve seat 8; and a driving means 4 installed on the body 2 to allow the diaphragm 3 to rest on and move away from the valve seat 8, wherein synthetic resin films 5 of predetermined thickness are coated on fluid-contacting parts 25 of the afore-mentioned body 2 and diaphragm 3. A diaphragm valve in accordance with the present invention prevents corrosion of the valve members caused by accumulation and adherence of substances produced by thermal decomposition, and prevents clogging caused by substances produced, and prevents seat leakage when applied in the vacuum exhaust system of a semiconductor manufacturing facility.
    • 隔膜阀1设置有主体2,主体2具有形成在通道之间的流入通道6,流出通道7和阀座8; 隔膜3安装在主体2中并允许搁置在阀座8上并远离阀座8; 以及安装在主体2上的驱动装置4,以允许隔膜3搁置在阀座8上并远离阀座8,其中预定厚度的合成树脂膜5涂覆在上述主体2的流体接触部分25上 和隔膜3.根据本发明的隔膜阀防止由热分解产生的物质的积聚和粘附引起的阀构件的腐蚀,并且防止由所产生的物质引起的堵塞,并且当应用于真空排气系统时防止阀座泄漏 的半导体制造设施。