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    • 75. 发明授权
    • Power MOSFET having a strained channel in a semiconductor heterostructure on metal substrate
    • 功率MOSFET在金属衬底上的半导体异质结构中具有应变通道
    • US08237195B2
    • 2012-08-07
    • US12248874
    • 2008-10-09
    • Tat NgaiQi WangJoelle Sharp
    • Tat NgaiQi WangJoelle Sharp
    • H01L29/66
    • H01L29/7802H01L21/6835H01L29/1054H01L29/165H01L29/407H01L29/41741H01L29/45H01L29/66734H01L29/7813H01L2221/6835H01L2924/30105H01L2924/3025
    • A field effect transistor device having a strained semiconductor channel region overlying a heterostructure-semiconductor on a metal substrate includes a first semiconductor layer overlying a first metal layer. The first semiconductor layer has a first semiconductor material and a second semiconductor material in a relaxed heterostructure and is heavily doped. A second semiconductor layer overlies the first semiconductor layer and has a first semiconductor material and a second semiconductor material in a relaxed heterostructure. The second semiconductor layer is more lightly doped than the first semiconductor layer. A trench extends into the second semiconductor layer and a channel region has a strained layer of the first semiconductor material adjacent a trench sidewall. The strained channel region provides enhanced carrier mobility and improves performance of the field effect transistor.
    • 具有覆盖金属基板上的异质结构半导体的应变半导体沟道区域的场效应晶体管器件包括覆盖第一金属层的第一半导体层。 第一半导体层在松弛异质结构中具有第一半导体材料和第二半导体材料,并且是重掺杂的。 第二半导体层覆盖在第一半导体层上,并且在松弛的异质结构中具有第一半导体材料和第二半导体材料。 第二半导体层比第一半导体层更轻掺杂。 沟槽延伸到第二半导体层中,并且沟道区具有邻近沟槽侧壁的第一半导体材料的应变层。 应变通道区域提供增强的载流子迁移率并且改善场效应晶体管的性能。
    • 78. 发明授权
    • Semiconductor device with (110)-oriented silicon
    • 具有(110)取向硅的半导体器件
    • US08101500B2
    • 2012-01-24
    • US12174030
    • 2008-07-16
    • Qi WangMinhua LiYuri Sokolov
    • Qi WangMinhua LiYuri Sokolov
    • H01L21/30
    • H01L29/7813H01L21/30608H01L21/76254H01L29/045H01L29/407H01L29/41741H01L29/66348H01L29/66363H01L29/66734
    • A method of forming a semiconductor device on a heavily doped P-type (110) semiconductor layer over a metal substrate includes providing a first support substrate and forming a P-type heavily doped (110) silicon layer overlying the first support substrate. At least a top layer of the first support substrate is removable by a selective etching process with respect to the P-type heavily doped (110) silicon layer. A vertical semiconductor device structure is formed in and over the (110) silicon layer. The vertical device structure includes a top metal layer and is characterized by a current conduction in a direction. The method includes bonding a second support substrate to the top metal layer and removing the first support substrate using a mechanical grinding and a selective etching process to expose a surface of the P-type heavily doped (110) silicon layer and to allow a metal layer to be formed on the surface.
    • 在金属衬底上的重掺杂P型(110)半导体层上形成半导体器件的方法包括提供第一支撑衬底并形成覆盖在第一支撑衬底上的P型重掺杂(110)硅层。 至少第一支撑衬底的顶层可通过相对于P型重掺杂(110)硅层的选择性蚀刻工艺而移除。 在(110)硅层中和上方形成垂直半导体器件结构。 垂直装置结构包括顶部金属层,其特征在于沿<110>方向的电流传导。 该方法包括使用机械研磨和选择性蚀刻工艺将第二支撑衬底接合到顶部金属层并去除第一支撑衬底,以暴露P型重掺杂(110)硅层的表面并允许金属层 在表面上形成。
    • 80. 发明申请
    • HIGH SENSITIVITY, SOLID STATE NEUTRON DETECTOR
    • 高灵敏度,固态中性探测器
    • US20110284755A1
    • 2011-11-24
    • US13146780
    • 2009-01-30
    • Pauls StradinsHoward M. BranzQi WangHarold R. Mchugh
    • Pauls StradinsHoward M. BranzQi WangHarold R. Mchugh
    • G01T3/08H01L21/28
    • H01L31/115G01T3/00G01T3/08H01L31/02
    • An apparatus (200) for detecting slow or thermal neutrons (160) including an alpha particle-detecting layer (240) that is a hydrogenated amorphous silicon p-i-n diode structure. The apparatus includes a bottom metal contact (220) and a top metal contact (250) with the diode structure (240) positioned between the two contacts (220, 250) to facilitate detection of alpha particles (170). The apparatus (200) includes a neutron conversion layer (230) formed of a material containing boron-10 isotopes. The top contact (250) is pixilated with each contact pixel extending to or proximate to an edge of the apparatus to facilitate electrical contacting. The contact pixels have elongated bodies to allow them to extend across the apparatus surface (242) with each pixel having a small surface area to match capacitance based upon a current spike detecting circuit or amplifier connected to each pixel. The neutron conversion layer (860) may be deposited on the contact pixels (830) such as with use of inkjet printing of nanoparticle ink.
    • 一种用于检测包括作为氢化非晶硅p-i-n二极管结构的α粒子检测层(240)的慢或热中子(160)的装置(200)。 该装置包括底部金属触点(220)和顶部金属触点(250),二极管结构(240)位于两个触点(220,250)之间,以便于检测α粒子(170)。 装置(200)包括由含有硼-10同位素的材料形成的中子转换层(230)。 顶部接触(250)被像素化,每个接触像素延伸到或靠近设备的边缘以促进电接触。 接触像素具有细长体以允许它们跨越装置表面(242)延伸,每个像素具有小的表面积,以基于连接到每个像素的电流尖峰检测电路或放大器匹配电容。 中子转换层(860)可以沉积在接触像素(830)上,例如使用纳米颗粒油墨的喷墨印刷。