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    • 71. 发明授权
    • Method and apparatus for inspecting foreign particle defects
    • 用于检查外来颗粒缺陷的方法和装置
    • US07724360B2
    • 2010-05-25
    • US12273174
    • 2008-11-18
    • Sachio UtoHiroyuki Nakano
    • Sachio UtoHiroyuki Nakano
    • G01N21/00
    • G01N21/94G01N21/47G01N21/9501
    • The invention relates to a device production process for forming a circuit pattern on a substrate such as semiconductor device. To enable a stable inspection of a minute foreign particle and a pattern defect occurring in manufacture of a device at a high speed and with a high sensitivity, an object to be inspected on which a transparent film is formed, is irradiated with a beam which is emitted from an illuminator whose illumination direction and illumination angle are selected from a plurality of choices to be optimum, so that scattered reflected light from a minute foreign particle defect on the object or the transparent film is effectively detected by eliminating a noise from the pattern formed on the object, and a detection optical system is optimized by evaluating and adjusting, with an image forming performance checker, an image forming performance of the detection optical system included in an inspecting apparatus.
    • 本发明涉及用于在诸如半导体器件的衬底上形成电路图案的器件制造工艺。 为了能够在高速,高灵敏度的装置的制造中能够稳定地检查微小的外来粒子和图案缺陷,对要形成透明膜的检查对象进行照射, 从照明方向和照明角度从多个选择中选择为最佳的发光体发射,从而通过从形成的图案中消除噪声来有效地检测来自物体或透明膜上的微小异物缺陷的散射反射光 并且通过利用图像形成性能检查器评估和调整包括在检查装置中的检测光学系统的图像形成性能来优化检测光学系统。
    • 72. 发明授权
    • Method and apparatus for detecting defects
    • 检测缺陷的方法和装置
    • US07643139B2
    • 2010-01-05
    • US11206209
    • 2005-08-18
    • Yoshimasa OhshimaMinori NoguchiHiroyuki Nakano
    • Yoshimasa OhshimaMinori NoguchiHiroyuki Nakano
    • G01N21/00
    • G01N21/9505G01N21/47G01N21/94G01N21/9501
    • An inspection apparatus projects a laser beam on the surface of a SOI wafer and detects foreign matter on and defects in the surface of the SOI wafer by receiving scattered light reflected from the surface of the SOI wafer. The wavelength of the laser beam used by the inspection apparatus is determined so that a penetration depth of the laser beam in a Si thin film may be 10 nm or below to detect only foreign matter on and defects in the outermost surface and not to detect foreign matter and defects in a BOX layer. Only the foreign matter on and defects in the outermost surface layer can be detected without being influenced by thin-film interference by projecting the laser beam on the surface of the SOI wafer and receiving scattered light rays.
    • 检查装置将激光束投射在SOI晶片的表面上,通过接收从SOI晶片的表面反射的散射光来检测SOI晶片的异物和表面的缺陷。 确定检查装置使用的激光束的波长,使得Si薄膜中的激光束的穿透深度可以为10nm以下,仅检测异物和最外表面的缺陷,并且不检测外部 BOX层的物质和缺陷。 只有通过将激光束投射在SOI晶片的表面上并且接收散射光线,才能够检测出最外层的异物和缺陷,而不受薄膜干涉的影响。
    • 73. 发明授权
    • Wiper blade having cover member
    • 刮水片具有盖构件
    • US07636980B2
    • 2009-12-29
    • US11229605
    • 2005-09-20
    • Hiroyuki Nakano
    • Hiroyuki Nakano
    • B60S1/38B60S1/40
    • B60S1/3806
    • A wiper blade includes a wiper strip, a lever assembly and a cover member. The lever assembly has a connecting arrangement and holding claws. The connecting arrangement is connected to a wiper arm. The holding claws hold the wiper strip. The cover member has a cover opening, which is opened on a wiper strip side thereof. The cover member receives the lever assembly through the cover opening. In an interior space between the cover member and the wiper strip, holder end side openings, each of which is a part of the cover opening, are covered by two connecting arrangement end side cover parts. In this way, in the interior space between the cover member and the wiper strip, spaces, into which fluid intrudes, are reduced.
    • 刮水片包括刮水条,杆组件和盖构件。 杠杆组件具有连接装置和固定爪。 连接装置连接到刮水臂。 固定爪握住刮水条。 盖构件具有在其刮片条侧上打开的盖开口。 盖构件通过盖开口接收杠杆组件。 在盖构件和擦拭带之间的内部空间中,保持器端侧开口(其中的每一个是盖开口的一部分)被两个连接装置端侧盖部分覆盖。 以这种方式,在盖构件和擦拭带之间的内部空间中,流体侵入的空间减小。
    • 76. 发明授权
    • Rim disk assembling device for full face wheel for vehicle
    • 车轮全轮车轮盘装配装置
    • US07513034B2
    • 2009-04-07
    • US10596233
    • 2003-12-26
    • Hiroyuki Nakano
    • Hiroyuki Nakano
    • B23P19/00
    • B21D53/26B23K9/0026B60B31/00Y10T29/49481Y10T29/49499Y10T29/53448
    • A mounting device for a rim disk of a full face wheel for a vehicle has a disk disposed on a rotating table rotated by a rotating device about the center axis (X) of a full face wheel and radially positioned by a hub hole fitting piece and a rim disposed on the disk and radially positioned by arresting a rim drop part by a rim position arresting means, with the disk and rim being pressingly held between a disk support piece and a rim support piece by upwardly pulling an aligning rod connected to the rotating table through a rod connection means along the center axis (X) of the full face wheel while downwardly pressing a rim flange part by the rim support piece to bring the disk and the rim into a pressed state. By the rim disk mounting device, the disk and the rim radially positioned with high accuracy can be brought into pressed state with a strong holding pressure, and both the disk and the rim can be stably rotated. Thus, a thermal deformation can be suppressed and welding can be uniformly and accurately performed.
    • 用于车辆的全轮的轮辋盘的安装装置具有设置在由旋转装置围绕全面轮的中心轴线(X)旋转并由轮毂孔配件片径向定位的旋转台上的盘, 设置在盘上的边缘,并且通过边缘位置限制装置阻止边缘落下部分径向定位,其中盘和边缘通过向上拉动连接到旋转的对准杆而被压紧地保持在盘支撑件和轮辋支撑件之间 通过杆连接装置沿着全面轮的中心轴线(X)工作,同时通过轮辋支撑件向下按压轮辋凸缘部分,以使盘和轮辋处于压制状态。 通过轮辋盘安装装置,以高精度径向定位的盘和轮辋可以以较高的保持压力进入压力状态,并且盘和轮辋可以稳定地旋转。 因此,可以抑制热变形,并且能够均匀且准确地进行焊接。
    • 78. 发明授权
    • Method and apparatus for inspecting foreign particle defects
    • 用于检查外来颗粒缺陷的方法和装置
    • US07453561B2
    • 2008-11-18
    • US11325548
    • 2006-01-05
    • Sachio UtoHiroyuki Nakano
    • Sachio UtoHiroyuki Nakano
    • G01N21/00
    • G01N21/94G01N21/47G01N21/9501
    • The invention relates to a device production process for forming a circuit pattern on a substrate such as semiconductor device. To enable a stable inspection of a minute foreign particle and a pattern defect occurring in manufacture of a device at a high speed and with a high sensitivity, an object to be inspected on which a transparent film is formed, is irradiated with a beam which is emitted from an illuminator whose illumination direction and illumination angle are selected from a plurality of choices to be optimum, so that scattered reflected light from a minute foreign particle defect on the object or the transparent film is effectively detected by eliminating a noise from the pattern formed on the object, and a detection optical system is optimized by evaluating and adjusting, with an image forming performance checker, an image forming performance of the detection optical system included in an inspecting apparatus.
    • 本发明涉及用于在诸如半导体器件的衬底上形成电路图案的器件制造工艺。 为了能够在高速,高灵敏度的装置的制造中能够稳定地检查微小的外来粒子和图案缺陷,对要形成透明膜的检查对象进行照射, 从照明方向和照明角度从多个选择中选择为最佳的发光体发射,从而通过从形成的图案中消除噪声来有效地检测来自物体或透明膜上的微小异物缺陷的散射反射光 并且通过利用图像形成性能检查器评估和调整包括在检查装置中的检测光学系统的图像形成性能来优化检测光学系统。