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    • 73. 发明授权
    • Wafer level chip scale package and method of laser marking the same
    • 晶圆级芯片级封装和激光打标方法相同
    • US07842543B2
    • 2010-11-30
    • US12378713
    • 2009-02-17
    • Ruisheng WuYan LiuTao Feng
    • Ruisheng WuYan LiuTao Feng
    • H01L21/50
    • H01L23/544H01L21/67282H01L2223/54406H01L2223/54433H01L2223/54473H01L2223/54486H01L2224/274H01L2924/01079H01L2924/10158H01L2924/10253H01L2924/13091
    • A wafer level chip scale package and method of laser marking the same are disclosed. The method includes forming a plurality of semiconductor devices on a frontside surface of a wafer, metallizing device contacts on the frontside surface of the wafer, grinding the backside surface of the wafer, silicon etching the backside surface of the wafer, laser marking the backside surface of the wafer following the silicon etch step, oxide etching the backside surface of the wafer following the laser marking step, depositing a metal layer on the backside surface of the wafer following the oxide etch step, and dicing the wafer into wafer level chip scale packages. A wafer level chip scale package includes a mark formed on a backside surface thereof, the mark comprising a plurality of trenches formed in a silicon backside surface and corresponding indentations formed in an overlaying back metal layer.
    • 公开了一种晶片级芯片级封装及其激光标记方法。 该方法包括在晶片的前表面上形成多个半导体器件,金属化器件接触晶片的前侧表面,研磨晶片的背面,硅蚀刻晶片的背面,激光标记背面 在所述硅蚀刻步骤之后的所述晶片的氧化物,在所述激光标记步骤之后,氧化物蚀刻所述晶片的所述背面,在所述氧化物蚀刻步骤之后,在所述晶片的所述背面表面上沉积金属层,以及将所述晶片切割成晶片级芯片级封装 。 晶片级芯片级封装包括在其背面形成的标记,该标记包括形成在硅背面中的多个沟槽和形成在覆盖背面金属层中的相应凹痕。