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    • 71. 发明申请
    • Microlens manufacturing method
    • 微透镜制造方法
    • US20060105490A1
    • 2006-05-18
    • US11235276
    • 2005-09-27
    • Minoru Watanabe
    • Minoru Watanabe
    • H01L21/00
    • H01L27/14685H01L27/14627H01L31/02327
    • The present invention provides a method for manufacturing a microlens in a semiconductor substrate having a first surface and a second surface, comprising the steps of preparing the semiconductor substrate, forming a first resist layer approximately cylindrical in form on the first surface of the semiconductor substrate, reflowing the first resist layer by heat treatment while holding the semiconductor substrate in such a manner that the first surface is normal to a vertical line and placed below the second surface, thereby to deform the first resist layer into a second resist layer approximately hemispherical in form, and simultaneously etching the second resist layer and the semiconductor substrate by means of anisotropic etching to form the corresponding lens in the semiconductor substrate.
    • 本发明提供一种用于制造具有第一表面和第二表面的半导体衬底中的微透镜的方法,包括以下步骤:制备半导体衬底,在半导体衬底的第一表面上形成大致圆柱形的第一抗蚀剂层, 通过热处理来回流第一抗蚀剂层,同时以使第一表面垂直于垂直线并放置在第二表面下方的方式保持半导体衬底,从而使第一抗蚀剂层变形为大致半球形的第二抗蚀剂层 并且通过各向异性蚀刻同时蚀刻第二抗蚀剂层和半导体衬底,以在半导体衬底中形成相应的透镜。
    • 78. 发明授权
    • Planigraphic X-ray apparatus
    • 平面X射线仪
    • US5506879A
    • 1996-04-09
    • US332716
    • 1994-11-01
    • Keisuke MoriKozo NakanoEiichi AraiTakahiro YoshimuraMasanori OtsukaKouichi SonobeMinoru WatanabeTakashi BesshoKazuyuki Fujita
    • Keisuke MoriKozo NakanoEiichi AraiTakahiro YoshimuraMasanori OtsukaKouichi SonobeMinoru WatanabeTakashi BesshoKazuyuki Fujita
    • G03B42/02A61B6/02A61B6/14
    • A61B6/14
    • A planigraphic X-ray apparatus comprising a rotation mechanism for rotating a support member which supports an X-ray generator and an X-ray detection surface to rotate the X-ray generator and the X-ray detection surface around a subject, a position adjustment mechanism for setting the position of the rotation center of the support member rotated by the rotation mechanism and a linear movement means for moving the support member in the direction approximately perpendicular to the direction of the X-ray irradiated from the X-ray generator, whereby the X-ray detection surface is driven in the direction opposite to the movement of the linear movement means and the X-ray generator is rotated toward the X-ray detection surface in synchronization with the movement of the linear movement means. The position adjustment mechanism and the rotation mechanism are used only to set the position and direction of the support member with respect to the subject, and planigraphic photographing is possible only by moving the support member using a linear movement means exclusively provided for the support member, thereby facilitating the positioning operation of the support member with respect to a given planigraphic plane, simplifying the control program and making the entire apparatus compact and inexpensive.
    • 一种平面X射线设备,包括:旋转机构,用于旋转支撑X射线发生器的支撑构件和X射线检测表面,以使X射线发生器和X射线检测表面围绕被摄体旋转,位置调整 用于设定由旋转机构旋转的支撑构件的旋转中心的位置的机构和用于使支撑构件沿与X射线发生器照射的X射线的方向大致垂直的方向移动的线性移动装置,由此 与线性运动装置的运动相反的方向驱动X射线检测面,并且与线性运动装置的运动同步地使X射线发生器向X射线检测面转动。 位置调节机构和旋转机构仅用于设定支撑构件相对于被摄体的位置和方向,并且只有通过使用专门为支撑构件设置的线性移动装置移动支撑构件才能进行平面图像拍摄, 从而便于支撑构件相对于给定的平面图的定位操作,简化了控制程序并使整个设备紧凑且便宜。