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71. 发明授权

US08235610B2 Printing apparatus and conveyance control method 有权
标题翻译：印刷装置和输送控制方法
公开(公告)号：US08235610B2
公开(公告)日：2012-08-07
申请号：US11842553
申请日：2007-08-21
申请人： Hiroyuki Saito , Haruyuki Yanagi , Kentaro Onuma , Tetsuya Ishikawa , Yuichiro Suzuki , Hiroyuki Kakishima , Michiharu Shoji
发明人： Hiroyuki Saito , Haruyuki Yanagi , Kentaro Onuma , Tetsuya Ishikawa , Yuichiro Suzuki , Hiroyuki Kakishima , Michiharu Shoji
IPC分类号： B41J13/03 , B41J13/00
CPC分类号： B41J13/0027 , B41J11/42 , B41J23/025
摘要： This invention relates to a printing apparatus and a conveyance control method capable of allowing even an arrangement having a plurality of conveyance rollers in a printing medium conveyance path to accurately control conveyance of a printing medium. According to this invention, a first encoder detects a conveyance amount by a first conveyance roller, provided in a conveyance path, for conveying a printing medium. A second encoder detects a conveyance amount by a second conveyance roller provided in the conveyance path in the conveyance direction of the printing medium at the downstream side of the first conveyance roller for conveying the printing medium. On the other hand, a signal output from the first or second encoder is selected on the basis of the position of the printing medium on the conveyance path. Conveyance of the printing medium is controlled on the basis of the selected output signal.
摘要翻译：本发明涉及一种打印设备和输送控制方法，其能够允许甚至在打印介质输送路径中具有多个传送辊的布置，以精确地控制打印介质的传送。根据本发明，第一编码器通过设置在输送路径中的第一输送辊检测输送量，用于输送打印介质。第二编码器通过设置在第一输送辊的下游侧的打印介质的传送方向上的输送路径中的第二输送辊检测输送量，用于输送打印介质。另一方面，基于打印介质在输送路径上的位置来选择从第一或第二编码器输出的信号。基于选择的输出信号来控制打印介质的输送。

72. 发明授权

US08181596B2 Cluster tool architecture for processing a substrate 有权
标题翻译：用于处理基板的集群工具架构
公开(公告)号：US08181596B2
公开(公告)日：2012-05-22
申请号：US12254750
申请日：2008-10-20
申请人： Tetsuya Ishikawa , Rick J. Roberts , Helen R. Armer , Leon Volfovski , Jay D. Pinson , Michael Rice , David H. Quach , Mohsen S. Salek , Robert Lowrance , John A. Backer , William Tyler Weaver , Charles Carlson , Chongyang Wang , Jeffrey Hudgens , Harald Herchen , Brian Lu
发明人： Tetsuya Ishikawa , Rick J. Roberts , Helen R. Armer , Leon Volfovski , Jay D. Pinson , Michael Rice , David H. Quach , Mohsen S. Salek , Robert Lowrance , John A. Backer , William Tyler Weaver , Charles Carlson , Chongyang Wang , Jeffrey Hudgens , Harald Herchen , Brian Lu
IPC分类号： B05C13/02 , C23C14/00 , H01L21/677
CPC分类号： H01L21/67225 , G03B27/32 , G03D13/006 , G03F7/40 , G05B19/41825 , G05B2219/40476 , G05B2219/45031 , G05B2219/49137 , H01L21/67109 , H01L21/6715 , H01L21/67161 , H01L21/67173 , H01L21/67178 , H01L21/67184 , H01L21/6719 , H01L21/67196 , H01L21/67742 , H01L21/67745 , H01L21/67748 , H01L21/67754 , H01L21/6831 , H01L21/6838 , H01L21/68707 , H01L22/26 , Y02P90/087 , Y10S414/135 , Y10S414/136 , Y10T29/53187 , Y10T29/5323
摘要： An apparatus for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, a smaller system footprint, and a more repeatable wafer history. Embodiments provide for a cluster tool comprising first and second processing racks, each having two or more vertically stacked substrate processing chambers, a first robot assembly able to access the first processing rack from a first side, a second robot assembly able to access the first processing rack from a second side and the second processing rack from a first side, a third robot assembly able to access the second processing rack from a second side, and a fourth robot assembly able to access the first and second processing racks and to load substrates in a cassette.
摘要翻译：一种使用具有增加的系统吞吐量，增加的系统可靠性，更小的系统占用面积和更可重复的晶片历史的多室处理系统（例如，集群工具）处理衬底的设备。实施例提供了一种集群工具，其包括第一和第二处理机架，每个具有两个或更多个垂直堆叠的衬底处理室，能够从第一侧接近第一处理架的第一机器人组件，能够访问第一处理的第二机器人组件从第二侧起第二机架和从第二侧起第二处理齿条的第三机器人组件，以及能够从第二侧进入第二处理齿条的第三机器人组件，以及能够接近第一和第二处理机架并将基板装入的第四机器人组件一个盒子。

73. 发明申请

US20120095376A1 MASSAGE DEVICE 有权
标题翻译：按摩装置
公开(公告)号：US20120095376A1
公开(公告)日：2012-04-19
申请号：US13255773
申请日：2010-08-23
申请人： Tetsuya Ishikawa , Shigeki Noda , Shinsaku Shimizu
发明人： Tetsuya Ishikawa , Shigeki Noda , Shinsaku Shimizu
IPC分类号： A61H7/00
CPC分类号： A61H15/0078 , A61H2015/0014 , A61H2201/1669 , A61H2201/1676 , A61H2205/106 , A61H2205/12
摘要： There is provided a massage device capable of producing innovative and comfortable massage effect by massaging a target body part over a wide area in its lengthwise direction with substantially rectilinear motion of a pressure-applying point. The massage device 1 comprises a pair of treatment members 23, 24 arranged face-to-face with each other at a spacing large enough for insertion of part of human body; a holding mechanism 162 for holding and pressing the body part in sandwich style by moving at least one of the paired treatment members or both of them 23, 24 in the direction of width of the body part set in place between the paired treatment members; and a moving mechanism 26 for moving the treatment member 23, 24 in the direction of length of the body part while maintaining the holding condition of the treatment member 23, 24 effected by the holding mechanism 162.
摘要翻译：本发明提供一种能够通过按压施加点的大致直线运动沿长度方向在广泛的区域上按摩目标体部而产生创新舒适的按摩效果的按摩装置。按摩装置1包括以足够大的间隔彼此面对面地布置的一对处理构件23,24，以便插入人体的一部分; 保持机构162，用于通过使成对处理部件或其中的两个处理部件23,24中的至少一个沿设置在配对处理部件之间的身体部位的宽度方向移动来夹持和按压夹层型主体部; 以及移动机构26，用于在保持由保持机构162实现的处理构件23,24的保持状态的同时，使主体部分的长度方向上移动处理构件23,24。

74. 发明授权

US08146530B2 Cluster tool architecture for processing a substrate 有权
标题翻译：用于处理基板的集群工具架构
公开(公告)号：US08146530B2
公开(公告)日：2012-04-03
申请号：US12254778
申请日：2008-10-20
申请人： Tetsuya Ishikawa , Rick J. Roberts , Helen R. Armer , Leon Volfovski , Jay D. Pinson , Michael Rice , David H. Quach , Mohsen S. Salek , Robert Lowrance , John A. Backer , William Tyler Weaver , Charles Carlson , Chongyang Wang , Jeffrey Hudgens , Harald Herchen , Brian Lu
发明人： Tetsuya Ishikawa , Rick J. Roberts , Helen R. Armer , Leon Volfovski , Jay D. Pinson , Michael Rice , David H. Quach , Mohsen S. Salek , Robert Lowrance , John A. Backer , William Tyler Weaver , Charles Carlson , Chongyang Wang , Jeffrey Hudgens , Harald Herchen , Brian Lu
IPC分类号： B05C13/02 , C23C14/00 , H01L21/67
CPC分类号： H01L21/67225 , G03B27/32 , G03D13/006 , G03F7/40 , G05B19/41825 , G05B2219/40476 , G05B2219/45031 , G05B2219/49137 , H01L21/67109 , H01L21/6715 , H01L21/67161 , H01L21/67173 , H01L21/67178 , H01L21/67184 , H01L21/6719 , H01L21/67196 , H01L21/67742 , H01L21/67745 , H01L21/67748 , H01L21/67754 , H01L21/6831 , H01L21/6838 , H01L21/68707 , H01L22/26 , Y02P90/087 , Y10S414/135 , Y10S414/136 , Y10T29/53187 , Y10T29/5323
摘要： Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. Embodiments also provide for a method and apparatus that are used to improve the coater chamber, the developer chamber, the post exposure bake chamber, the chill chamber, and the bake chamber process results. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.
摘要翻译：实施例通常提供使用具有增加的系统吞吐量，增加的系统可靠性的多腔室处理系统（例如，集群工具）来处理衬底的装置和方法，在集群工具中处理的衬底具有更可重复的晶片历史，并且还集群工具具有更小的系统占用空间。实施例还提供了用于改进涂布室，显影室，曝光后烘烤室，冷却室和烘焙室处理结果的方法和装置。实施例还提供了用于增加衬底转移过程以减少系统停机时间的可靠性的方法和装置。

75. 发明授权

US08140836B2 Information processing apparatus and program 有权
标题翻译：信息处理装置和程序
公开(公告)号：US08140836B2
公开(公告)日：2012-03-20
申请号：US12188080
申请日：2008-08-07
申请人： Tomoya Ogawa , Tomohiro Suzuki , Tetsuya Ishikawa , Fumikage Uchida , Munetoshi Eguchi , Hiroaki Yago
发明人： Tomoya Ogawa , Tomohiro Suzuki , Tetsuya Ishikawa , Fumikage Uchida , Munetoshi Eguchi , Hiroaki Yago
IPC分类号： G06F9/24
CPC分类号： G06F11/1417
摘要： If a defect flag stored in a CF 19 while a BIOS is being booted, an information processing device 10 boots a second program stored in an external device 31 connected to a connection section 21, and if the defect flag is not detected, the information processing device 10 confirms whether or not the first program is bootable. If the first program is confirmed to be bootable, the first program is booted and if not, the defect flag is set in the CF 19 and the power of the information processing apparatus 10 is turned off.
摘要翻译：如果在BIOS被引导时存储在CF 19中的缺陷标志，则信息处理设备10启动存储在连接到连接部分21的外部设备31中的第二程序，并且如果未检测到缺陷标志，则信息处理设备10确认第一程序是否可引导。如果第一程序被确认为可引导，则第一程序被引导，如果不是，则在CF 19中设置缺陷标志，并且关闭信息处理设备10的电源。

76. 发明申请

US20120050423A1 INKJET PRINTING APPARATUS 有权
标题翻译：喷墨打印设备
公开(公告)号：US20120050423A1
公开(公告)日：2012-03-01
申请号：US13218626
申请日：2011-08-26
申请人： Tetsuya Ishikawa
发明人： Tetsuya Ishikawa
IPC分类号： B41J2/175
CPC分类号： B41J2/17509 , B41J2/175 , B41J2/17513 , B41J2/1752 , B41J2/17523 , B41J2/17553 , B41J2/17596
摘要： An inkjet printing apparatus comprises an ink tank including an ink accommodating unit, an ink leading-out mechanism for leading out the ink in the ink accommodating unit to an outside, and a housing, and an ink tank holder for removably retaining the ink tank, wherein a space is formed between the ink leading-out mechanism and the housing, and when the ink tank is mounted to the ink tank holder, an ink flow passage is formed by contact of an outer periphery of an ink leading-out needle in the ink tank holder with a sealing member in the ink leading-out mechanism, further comprising restriction means for restricting a position of the ink tank to the ink tank holder such that when removing the ink tank from the ink tank holder, the ink tank stops in a state where a tip end of the ink leading-out needle is in the space.
摘要翻译：一种喷墨打印设备包括一个墨盒，包括墨水容纳单元，用于将墨水容纳单元中的墨水引导到外部的墨水引出机构和外壳以及用于可拆卸地保持墨水盒的墨水盒保持器，其中在所述墨水引出机构和所述壳体之间形成空间，并且当所述墨水罐安装到所述墨水盒保持器时，墨水流动通道通过所述墨水引出针的外周部在墨水引出机构中具有密封构件的墨水盒保持器还包括限制装置，用于将墨水罐的位置限制到墨水盒保持器，使得当从墨水盒保持器移除墨水盒时，墨水罐停止墨水引出针的前端位于空间中的状态。

77. 发明授权

US08047724B2 Bearing device for wheel 有权
标题翻译：车轮轴承装置
公开(公告)号：US08047724B2
公开(公告)日：2011-11-01
申请号：US12094160
申请日：2007-03-26
申请人： Tsuyoshi Kamikawa , Yoshito Takada , Masaru Deguchi , Ken Adachi , Youichi Tsuzaki , Seiji Yamamoto , Changxin Yu , Masao Takimoto , Tetsuya Ishikawa , Syuuji Nagata
发明人： Tsuyoshi Kamikawa , Yoshito Takada , Masaru Deguchi , Ken Adachi , Youichi Tsuzaki , Seiji Yamamoto , Changxin Yu , Masao Takimoto , Tetsuya Ishikawa , Syuuji Nagata
IPC分类号： F16C13/00 , B60B27/00
CPC分类号： F16C35/063 , B60B27/001 , F16C19/386 , F16C2326/02
摘要： A wheel bearing apparatus includes a roller bearing, an inner shaft having an outer circumferential surface to which an inner ring of the roller bearing is installed, a coupler ring attached to an end portion of the inner shaft, and a caulked portion provided in an end portion of the inner shaft so as to fix the coupler ring and the roller bearing to the inner shaft so as to be immovable in an axial direction of the inner shaft. An outer diameter of the coupler ring is set smaller than a diameter of a shoulder portion of the inner ring. Alternatively, a protruding portion is provided in any one of opposing end surfaces of the coupler ring and the inner ring, whereby the coupler ring is arranged away from a seal member. Accordingly, it is possible to avoid an interference of the coupler ring with the seal member.
摘要翻译：一种车轮轴承装置，包括：滚子轴承，具有安装有滚子轴承的内圈的外周面的内轴，安装在内轴的端部的联接环，以及设置在所述内轴的端部的铆接部从而将联轴器环和滚柱轴承固定在内轴上，使其不能沿内轴的轴向固定。联接环的外径设定为小于内圈的肩部的直径。或者，在耦合环和内环的相对的端面中的任一个中设置有突出部，由此将耦合环设置成远离密封构件。因此，可以避免联接环与密封构件的干涉。

78. 发明授权

US07925377B2 Cluster tool architecture for processing a substrate 有权
标题翻译：用于处理基板的集群工具架构
公开(公告)号：US07925377B2
公开(公告)日：2011-04-12
申请号：US11458667
申请日：2006-07-19
申请人： Tetsuya Ishikawa , Rick J. Roberts , Helen R. Armer , Leon Volfovski , Jay D. Pinson , Michael Rice , David H. Quach , Mohsen S. Salek , Robert Lowrance , William Tyler Weaver , Charles Carlson , Chongyang Wang , Jeffrey Hudgens , Harald Herchen , Brian Lue , John A. Backer
发明人： Tetsuya Ishikawa , Rick J. Roberts , Helen R. Armer , Leon Volfovski , Jay D. Pinson , Michael Rice , David H. Quach , Mohsen S. Salek , Robert Lowrance , William Tyler Weaver , Charles Carlson , Chongyang Wang , Jeffrey Hudgens , Harald Herchen , Brian Lue , John A. Backer
IPC分类号： G06F7/00
CPC分类号： H01L21/67225 , G03B27/32 , G03D13/006 , G03F7/40 , G05B19/41825 , G05B2219/40476 , G05B2219/45031 , G05B2219/49137 , H01L21/67109 , H01L21/6715 , H01L21/67161 , H01L21/67173 , H01L21/67178 , H01L21/67184 , H01L21/6719 , H01L21/67196 , H01L21/67742 , H01L21/67745 , H01L21/67748 , H01L21/67754 , H01L21/6831 , H01L21/6838 , H01L21/68707 , H01L22/26 , Y02P90/087 , Y10S414/135 , Y10S414/136 , Y10T29/53187 , Y10T29/5323
摘要： Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. In one embodiment of the cluster tool, grouping substrates together, and transferring and processing the substrates in groups of two or more, improves system throughput, and reduces the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, thus reducing wear on the robot and increasing system reliability. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.
摘要翻译：实施例通常提供使用具有增加的系统吞吐量，增加的系统可靠性的多腔室处理系统（例如，集群工具）来处理衬底的装置和方法，在集群工具中处理的衬底具有更可重复的晶片历史，并且还集群工具具有更小的系统占用空间。在集群工具的一个实施例中，将基板分组在一起，并且以两个或更多个组的方式传送和处理基板，提高了系统吞吐量，并且减少了机器人必须在处理室之间传送一批基板的移动次数从而减少机器人的磨损，提高系统的可靠性。实施例还提供了用于增加衬底转移过程以减少系统停机时间的可靠性的方法和装置。

79. 发明申请

US20110045206A1 IN-SITU DEPOSITION OF BATTERY ACTIVE LITHIUM MATERIALS BY PLASMA SPRAYING 有权
标题翻译：电池活性锂离子电池原位沉积
公开(公告)号：US20110045206A1
公开(公告)日：2011-02-24
申请号：US12862244
申请日：2010-08-24
申请人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J.K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
发明人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J.K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
IPC分类号： C23C16/513 , H05H1/24 , C23C16/06
CPC分类号： H01M4/0419 , H01M4/1391
摘要： A method and apparatus for forming an electrochemical layer of a thin film battery is provided. A precursor mixture comprising precursor particles dispersed in a carrying medium is activated in an activation chamber by application of an electric field to ionize at least a portion of the precursor mixture. The activated precursor mixture is then mixed with a combustible gas mixture to add thermal energy to the precursor particles, converting them to nanocrystals, which deposit on a substrate. A second precursor may be blended with the nanocrystals as they deposit on the surface to enhance adhesion and conductivity.
摘要翻译：提供一种用于形成薄膜电池的电化学层的方法和装置。包含分散在携带介质中的前体颗粒的前体混合物通过施加电场在活化室中活化，以电离至少一部分前体混合物。然后将活化的前体混合物与可燃气体混合物混合，以向前体颗粒添加热能，将其转化成沉积在基材上的纳米晶体。当第二前体沉积在表面上以增强粘附性和导电性时，可与纳米晶体共混。

80. 发明申请

US20100279020A1 METHOD OF FORMING IN-SITU PRE-GaN DEPOSITION LAYER IN HVPE 审中-公开
标题翻译：在HVPE中形成原位前置GaN沉积层的方法
公开(公告)号：US20100279020A1
公开(公告)日：2010-11-04
申请号：US12770306
申请日：2010-04-29
申请人： Yuriy Melnik , Hidehiro Kojiri , Olga Kryliouk , Tetsuya Ishikawa
发明人： Yuriy Melnik , Hidehiro Kojiri , Olga Kryliouk , Tetsuya Ishikawa
IPC分类号： B05D1/36
CPC分类号： C23C16/4488 , C23C16/303 , C23C16/45523 , C30B25/02 , C30B29/403
摘要： A method and apparatus is provided for preparing a substrate for forming electronic devices incorporating III/V compound semiconductors. Elemental halogen gases, hydrogen halide gases, or other halogen or halide gases, are contacted with liquid or solid group III metals to form precursors which are reacted with nitrogen sources to deposit a nitride buffer layer on the substrate. The buffer layer, which may be a transition layer, may incorporate more than one group III metal, and may be deposited with amorphous or crystalline morphology. An amorphous layer may be partially or fully recrystallized by thermal treatment. Instead of a layer, a plurality of discrete nucleation sites may be formed, whose size, density, and distribution may be controlled. The nitrogen source may include reactive nitrogen compounds as well as active nitrogen from a remote plasma source. The composition of the buffer or transition layer may also vary with depth according to a desired profile.
摘要翻译：提供了一种用于制备用于形成结合III / V化合物半导体的电子器件的衬底的方法和装置。元素卤素气体，卤化氢气体或其它卤素或卤化物气体与液体或固体III族金属接触以形成与氮源反应以在衬底上沉积氮化物缓冲层的前体。可以是过渡层的缓冲层可以结合多于一个III族金属，并且可以以无定形或结晶形态沉积。非晶层可以通过热处理部分或完全重结晶。代替层，可以形成多个离散的成核位点，其尺寸，密度和分布可以被控制。氮源可以包括反应性氮化合物以及来自远程等离子体源的活性氮。缓冲层或过渡层的组成也可根据所需的轮廓随深度而变化。

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